子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 141 | MULTI-LAYER PRINTED CIRCUIT BOARD FABRICATION SYSTEM AND METHOD | PCT/IL0101027 | 2001-11-06 | WO0239793A3 | 2002-10-24 | GANOT AMNON; GINO HANAN; HANINA GOLAN; KANTOR ZEEV; KLING BORIS; SPINZI SHABTAY; BEN-EZRA BARRY |
| A method for aligning an image to be recorded by a direct image scanner on an upper layer of a printed circuit board with an image recorded on a lower layer thereof, the method comprising visually imaging a portion of the image on the lower layer (964) and recording a pattern on the upper layer (970), referenced to coordinates of the visual image of the portion (968). | ||||||
| 142 | SYSTEM AND METHOD FOR FABRICATING PRINTED CIRCUIT BOARDS | PCT/IL0101028 | 2001-11-06 | WO0239794A3 | 2002-08-29 | BEN-EZRA BARRY; GROSS ABRAHAM; GINO HANAN; KLING BORIS; ALON DAN; KANTOR ZEEV; GANOT AMNON |
| A method of recording aligned images on two sides of a printed circuit board substrate, comprising: recording and image of an electrical circuit pattern on a first side of a printed circuit board substrate (804); forming an alignment pattern on a side of the printed circuit board substrate, wherein said alignment pattern has a known spatial relationship to said image of an electrical circuit pattern; determining a location of the alignment pattern on the printed circuit board substrate (812, 814); and recording an image of an electrical circuit pattern on a second side of the printed circuit board substrate (818) in response to the determined location of the alignment pattern (816). | ||||||
| 143 | VIEWING AND IMAGING SYSTEMS | PCT/GB9800696 | 1998-03-09 | WO9842510A3 | 1998-11-05 | SQUIBB FRANK NORMAN |
| Viewing and imaging systems are provided for use in screen printers for example. In one aspect, in a viewing apparatus for location between the screen and board in a screen printer, light from first and second light sources (23, 24), for illuminating the screen (2) and board (1) respectively, is introduced into the return light channel of the apparatus, and a light barrier (39) is provided to inhibit cross-talk between light from the two sources introduced into the channel. In another aspect, in a video probe for imaging regions of the screen and/or board in a screen printer, lighting means is controlled to generate pulses of light. The lighting means is controlled to generate light pulses repeatedly at a sufficient rate to produce a substantially continuous picture when the video signal is displayed. The pulses are preferably synchronised with the video signal and generated at the video frame rate. In a further aspect, imaging apparatus for imaging regions of a screen and/or board in a screen printer includes a plurality of lighting means which are controlled to generate respective light pulses of different durations, the temporal mid-points of pulses from different lighting means being coincident. | ||||||
| 144 | LITHOGRAPHY SYSTEM AND METHOD FOR PROCESSING A TARGET, SUCH AS A WAFER | PCT/EP2013054782 | 2013-03-08 | WO2013132081A3 | 2013-12-19 | VERGEER NIELS |
| A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck. | ||||||
| 145 | SYSTEM AND METHOD FOR FABRICATING PRINTED CIRCUIT BOARDS | PCT/IL0101028 | 2001-11-06 | WO0239794A9 | 2011-08-11 | BEN-EZRA BARRY; GROSS ABRAHAM; GINO HANAN; KLING BORIS; ALON DAN; KANTOR ZEEV; GANOT AMNON |
| A method of recording aligned images on two sides of a printed circuit board substrate, comprising: recording and image of an electrical circuit pattern on a first side of a printed circuit board substrate (804); forming an alignment pattern on a side of the printed circuit board substrate, wherein said alignment pattern has a known spatial relationship to said image of an electrical circuit pattern; determining a location of the alignment pattern on the printed circuit board substrate (812, 814); and recording an image of an electrical circuit pattern on a second side of the printed circuit board substrate (818) in response to the determined location of the alignment pattern (816). | ||||||
| 146 | METHOD OF MANUFACTURING A DIAGNOSTIC TEST STRIP | PCT/US2007071885 | 2007-06-22 | WO2008002837A3 | 2008-07-10 | WEGNER GRETA; POPOVICH NATASHA |
| A method for manufacturing a biosensor is provided. The method may include positioning a shadow mask containing a pattern of a plurality of feature sets over a substantially planar base layer containing a plurality of registration points. The method may also include forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the shadow mask and removing the shadow mask from the substantially planar base layer. Alternatively, the method may include providing a laminate structure including a substantially planar base layer containing a plurality of registration points and a photoresist layer containing a pattern of a plurality of feature sets. The method may further include forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the photoresist layer and removing the photoresist layer from the substantially planar base layer. | ||||||
| 147 | IMPRINT LITHOGRAPHY SYSTEM | PCT/US2007008432 | 2007-04-03 | WO2007117523A3 | 2008-04-10 | SREENIVASAN SIDLGATA V; SCHUMAKER PHILIP D; MCMACKIN IAN M |
| The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats. | ||||||
| 148 | IMPRINT LITHOGRAPHY SYSTEM | PCT/US2007008076 | 2007-04-02 | WO2007123806A3 | 2007-12-27 | NIMMAKAYALA PAWAN K; CHOI BYUNG-JIN; RAFFERTY TOM H; SCHUMAKER PHILIP D |
| A imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other. | ||||||
| 149 | METHOD AND APPARATUS FOR REGISTRATION OF AN IMAGED LITHOGRAPHIC PLATE | PCT/US2007069680 | 2007-05-24 | WO2007140269A2 | 2007-12-06 | BURGESS DENNIS M; CAMPBELL WILLIAM J; STEIN JOSEPH A |
| The method and apparatus for registration of a lithographic plate includes a means for ensuring that the plate is in contact with registration pins on imaging and bending devices and a means for finely adjusting an initial position of the plate with respect to registration pins on the bender to bring the plate in registration with the specified plate lock-up position on the press cylinder. Three separate electrical circuits ensure that the plate is in contact with the registration pins if each separate circuit is able to conduct current between the respective pins and the plate. The fine adjustment is accomplished by rotation of eccentric registration pins until the plate is within tolerance. | ||||||
| 150 | MERGING A MASK AND A PRINTING PLATE | PCT/US2007002222 | 2007-01-25 | WO2007106241A2 | 2007-09-20 | ZWADLO GREGORY LLOYD |
| A mask and a printing plate are merged using a first cylinder configured to receive the mask and a second cylinder configured to receive the printing plate. At least one of the first cylinder and the second cylinder are rotatable. The mask and printing plate are merged by at least: (a) aligning the mask and the printing plate with the assistance of at least one of: a protrusion on one of the first cylinder and the second cylinder and an indent on the other of the first cylinder and the second cylinder, one or more markings at least on an end of at least one of the first cylinder and the second cylinder, and one or more encoders associated with at least one of the first cylinder and the second cylinder; and (b) rotating at least one of the first cylinder and the second cylinder. | ||||||
| 151 | SUBSTRATE POSITIONING MECHANISM, SUBSTRATE POSITIONING METHOD, SUBSTRATE CONVEYING DEVICE, AND IMAGE FORMING DEVICE | PCT/JP2005015377 | 2005-08-18 | WO2006022309A3 | 2006-08-10 | KOIZUMI TAKASHI |
| The present invention provides a substrate positioning mechanism and a substrate positioning method, and a substrate conveying device equipped with the substrate positioning mechanism, and an image forming device equipped with the substrate conveying device. A leading end positioning unit, which is disposed at a conveying direction downstream side of conveying/supporting rollers, has a plurality of sensor holders, and a holding block integrally holding the sensor holders. When a substrate material is detected by sensors for positioning which are mounted to the sensor holders, a ball screw is rotated by a leading end positioning motor, and the leading end positioning unit is moved toward a conveying direction downstream side. In this way, contract pressure at a time of contact is mitigated, and deformation and damage of the substrate material are prevented. | ||||||
| 152 | METHODS FOR HIGH-PRECISION GAP AND ORIENTATION SENSING BETWEEN A TRANSPARENT TEMPLATE AND SUBSTRATE FOR IMPRINT LITHOGRAPHY | PCT/US0124216 | 2001-08-01 | WO0210721A3 | 2003-03-06 | BAILEY TODD; CHOI BYUNG JIN; COLBURN MATTHEW; SREENIVASAN S V; WILLSON C GRANT; ECKERDT JOHN |
| Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques. | ||||||
| 153 | HIGH-RESOLUTION OVERLAY ALIGNMENT METHODS AND SYSTEMS FOR IMPRINT LITHOGRAPHY | PCT/US0122317 | 2001-07-16 | WO0208835A3 | 2003-01-23 | CHOI BYUNG JIN; COLBURN MATTHEW; SREENIVASAN S V; BAILEY TODD |
| A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed. | ||||||
| 154 | TEMPLATE FOR ROOM TEMPERATURE, LOW PRESSURE MICRO- AND NANO-IMPRINT LITHOGRAPHY | PCT/US0142688 | 2001-10-12 | WO02067055A3 | 2002-10-10 | CHOI BYUNG JIN; SREENIVASAN S V; BAILEY TODD; COLBURN MATTHEW; WILLSON C GRANT; EKERDT JOHN |
| Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and at least one piezo actuator coupled to the body. The piezo actuator may be configured to alter a physical dimension of the template during use. | ||||||
| 155 | HIGH PRECISION ORIENTATION ALIGNMENT AND GAP CONTROL STAGES FOR IMPRINT LITHOGRAPHY PROCESSES | PCT/US0030041 | 2000-10-30 | WO0133300A2 | 2001-05-10 | CHOI BYUNG JIN; SREENIVASAN SIDLGATA V; JOHNSON STEPHEN C |
| Processes and associated devices for high precision positioning of a template and substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate. | ||||||
| 156 | ALIGNMENT SYSTEM FOR VARIOUS MATERIALS AND MATERIAL FLOWS | PCT/US2012027842 | 2012-03-06 | WO2012122155A3 | 2014-04-17 | DOHSE HANS |
| A method and system for alignment of a tool to a workpiece in a continuous or discontinuous material flow are disclosed. The workpiece may be a portion of a web of material. An imaging system captures first and second images of the workpiece at first and second occasions respectively. Microscopic native features of the workpiece are selected, detected, tracked and/or compared in the first and second images. Based on the correspondence between, tracking or relative displacement of features as captured in the first and second images, an alignment to the workpiece is controlled. In embodiments, the workpiece and a tool, a projected image or a pattern to be imparted to the workpiece by a lithography or photolithography apparatus are aligned based upon positioning information determined from an analysis of correlated features or texture in the images. Positioning information may include a positioning error or a distortion indication. | ||||||
| 157 | LITHOGRAPHY SYSTEM AND METHOD FOR PROCESSING A TARGET, SUCH AS A WAFER | PCT/EP2013054782 | 2013-03-08 | WO2013132081A4 | 2014-02-20 | VERGEER NIELS |
| A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck. | ||||||
| 158 | IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD | PCT/KR2010006602 | 2010-09-29 | WO2011040745A3 | 2011-11-03 | KWON SUNGHOON; CHUNG SUEUN; LEE SEUNGAH; JANG JISUNG; HAN SANGKWON |
| Disclosed is a technology for a lithography system. According to one embodiment of the present invention, the lithography system comprises: at least one target object which is disposed on a substrate; a processor which determines optical patterns for coating layers of the at least one target object by performing the image processing for the at least one target object; and an exposure device which provides the light having the optical patterns determined by the processor to the substrate. | ||||||
| 159 | METHOD AND APPARATUS FOR REGISTRATION OF AN IMAGED LITHOGRAPHIC PLATE | PCT/US2007069680 | 2007-05-24 | WO2007140269B1 | 2008-11-27 | BURGESS DENNIS M; CAMPBELL WILLIAM J; STEIN JOSEPH A |
| The method and apparatus for registration of a lithographic plate includes a means for ens | ||||||
| 160 | ALIGNMENT METHOD, IMPRINT METHOD, ALIGNMENT APPARATUS, AND POSITION MEASUREMENT METHOD | PCT/JP2007058898 | 2007-04-18 | WO2007123249A3 | 2008-05-22 | SUEHIRA NOBUHITO; SEKI JUNICHI; INA HIDEKI; SENTOKU KOICHI |
| In an alignment method for effecting alignment between two plate-like objects, a first plate-like object provided with a first alignment mark and a second plate-like object provide with a second alignment mark are disposed opposite to each other. A first area and a second area are provided at mutually nonoverlapping positions in an image pickup area for being observed through an image pickup > device. Images of the first and second alignment marks are picked up by the image pickup device from a direction substantially perpendicular to an in-plane direction of the first and second plate-like objects. Alignment control is effected by using first information about a deviation of the first alignment mark from a predetermined position in the first area and second information about a deviation of the second alignment mark from a predetermined position in the second area. | ||||||
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