IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD |
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| 申请号 | PCT/KR2010006602 | 申请日 | 2010-09-29 | 公开(公告)号 | WO2011040745A3 | 公开(公告)日 | 2011-11-03 |
| 申请人 | SNU R&DB FOUNDATION; KWON SUNGHOON; CHUNG SUEUN; LEE SEUNGAH; JANG JISUNG; HAN SANGKWON; | 发明人 | KWON SUNGHOON; CHUNG SUEUN; LEE SEUNGAH; JANG JISUNG; HAN SANGKWON; | ||||
| 摘要 | Disclosed is a technology for a lithography system. According to one embodiment of the present invention, the lithography system comprises: at least one target object which is disposed on a substrate; a processor which determines optical patterns for coating layers of the at least one target object by performing the image processing for the at least one target object; and an exposure device which provides the light having the optical patterns determined by the processor to the substrate. | ||||||
| 权利要求 | |||||||
| 说明书全文 | |||||||
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