METHODS FOR HIGH-PRECISION GAP AND ORIENTATION SENSING BETWEEN A TRANSPARENT TEMPLATE AND SUBSTRATE FOR IMPRINT LITHOGRAPHY |
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| 申请号 | PCT/US0124216 | 申请日 | 2001-08-01 | 公开(公告)号 | WO0210721A3 | 公开(公告)日 | 2003-03-06 |
| 申请人 | UNIV TEXAS; | 发明人 | BAILEY TODD; CHOI BYUNG JIN; COLBURN MATTHEW; SREENIVASAN S V; WILLSON C GRANT; ECKERDT JOHN; | ||||
| 摘要 | Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques. | ||||||
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| 说明书全文 | |||||||
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