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序号	专利名	申请号	申请日	公开（公告）号	公开（公告）日	发明人
121	Silicon nitride ceramic turbine member excellent in foreign matter impact resistance	JP31693293	1993-12-16	JPH07172960A	1995-07-11	AKIMUNE YOSHIO; IZUMI TAKAO
PURPOSE: To produce a lightweight silicon nitride ceramic turbine member excellent in foreign matter impact resistance. CONSTITUTION: The surface of a silicon nitride ceramic substrate is doped with nitrogen ions in sites ranging from the surface to 5μm depth to provide a lightweight silicon nitride ceramic turbine member containing the doped nitrogen ions in an amount of 2×10 ¹⁷ to 1×10 ¹⁸ions/cm ² and excellent in foreign matter impact resistance. COPYRIGHT: (C)1995,JPO
122	Production of carbon or graphite member having excellent heat resistance	JP22634293	1993-07-26	JPH0733563A	1995-02-03	IWAMOTO SHINYA; WATANABE MASANORI; OTANI SABURO; HIRAIWA JIRO; TOJO TETSURO; KURODA KOJI
PURPOSE:To provide production method of a heat-resistant structural material having excellent oxidation resistance.corrosion resistance in a high-temperature region by forming a coating film having excellent adhesivity on the surface of a carbon or graphite base. CONSTITUTION:One or more elements selected from group IVa, group Va and group VIa of the Peiodic Table, B and Si are dispersed into the surface layer part of a carbon or graphite base to form a compound layer on the surface of the carbon or graphite base.
123	Fine pattern forming method on substrate surface	JP17985793	1993-06-25	JPH06283475A	1994-10-07	YURUGEN GUSUPAN
PURPOSE: To make etching gas collide against working material only in the beam direction for improving directional selectivity of a corrosion process or an etching process, by performing projection on the substrate surface with an agglomerate beam. CONSTITUTION: Pattern formation on the surface of a substrate 3 by lithography is achieved by projection of a mask 2 which is mounted on the substrate 3 surface or held in a specified interval from the substrate and shields an agglomerate beam 1 region by region. The beam is ionized by, e.g. collision of electrons, and electrically accelerated to be a suitable collision velocity. Selectivity of an etching process, i.e., the ratio of etching rates of working material and the mask can be improved by selecting the working material and cluster material combined with volatility. Physical collision process is accelerated by chemical conversion of the working material. As a result, etching gas can be made to collide against the working material in only the beam direction. COPYRIGHT: (C)1994,JPO
124	Boron nitride film-coated member, its production and glass forming die	JP32770492	1992-12-08	JPH06172969A	1994-06-21	YAMAGUCHI KOICHI; OKURA TAKAHIRO
PURPOSE: To improve the adhesion of a film to a substrate and film hardness and to improve the durability in press-forming a glass when such a boron nitride film is used as the releasing film of a glass forming die. CONSTITUTION: Boron atom is vaporized from a vaporization source 3 consisting of boron or a boron-contg. substance and deposited on the surface of a substrate 1, and the substrate 1 surface is simultaneously irradiated with nitrogen-contg. ion and a rare-gas element ion to obtain a member coated with a boron nitride film contg. 0.001-6.0 atomic % of the rare-gas element formed on the substrate 1 surface. Such a boron nitride film is formed on the surface of the base body of a glass forming die as the releasing film. COPYRIGHT: (C)1994,JPO&Japio
125	Ti-rare earth element-n ultra-hard compound film and method for forming the film	JP13399192	1992-05-26	JPH05330956A	1993-12-14	O HIROMASA; SENDA NAKAYA; MATSUURA MASAMICHI
PURPOSE:To obtain the subject ultra-hard compound film having excellent surface hardness, abrasion resistance and sliding property by using one or several kinds of elements selected from Ti, N and rare earth elements constituting the ultra-hard compound in the form of an ion beam, using the remaining elements in the form of a beam of metallic vapor or a gas containing the elements and combinedly irradiating a substrate with both beams. CONSTITUTION:The following process is an example of the production process. A vacuum film-forming chamber l is evacuated to 10<->Pa with a vacuum pump 2. NH3 gas adjusted to 2.0 SCCM by a flow-controller 10 is introduced through a nozzle 11 in the form of a beam 12 and the film-forming chamber l is maintained to 4X10<-4>Pa by adjusting a pressure control valve 3. A substrate plate 4 (e.g. steel plate) held with a holder 5 is heated at 300 deg.C with a heater 14. Ti metal 13 in a metal evaporation source hearth 6 is melted and evaporated by electron beam heating and radiated to the substrate 4 in the form of Ti metal vapor 7. At the same time, Dy ion beam 9 generated by an ion source and an ion accelerator 8 is irradiated to the substrate 4 to obtain the subject compound film containing 0.5-20atom% of the rare earth elements.
126	Coated ceramic member and its production	JP2205792	1992-01-10	JPH05186287A	1993-07-27	YOSHIOKA TAKESHI; KAWAI HIROSHI
PURPOSE: To obtain a coated ceramic member having a coated layer of an amorphous carbon film with high hardness and a low coefficient of friction, showing excellent friction resistance and sliding characteristics. CONSTITUTION: An amorphous silicon middle layer having 50-5,000Å film thickness is formed on the surface of a ceramic base by ion implantation deposition method and the silicon middle layer is coated with an amorphous hard carbon film having 1,000Å to 3μm by PVD method or plasma CVD method to give the objective coated ceramic member. COPYRIGHT: (C)1993,JPO&Japio
127	Thin-film magnetic head and production thereof	JP11050190	1990-04-27	JPH0410208A	1992-01-14	KAWABE TAKASHI; FUYAMA MORIAKI; NARUSHIGE SHINJI; KONUMA AKIRA; OKAI TETSUYA; SUGITA KEN; HARA SHINICHI
PURPOSE:To obtain the above head having a track width of high accuracy by forming a mask material for etching an upper magnetic film and specifying the side face tape angle of the part of the mask material in contact with the upper magnetic film to a prescribed value. CONSTITUTION:An alumina film 98 as an underlying film, a 'Permalloy(R)' film 92 as a lower magnetic film, an alumina film 93 as a gap film, copper 99 as a conductor coil, and an org. resin film 94 as an insulating film are formed on the upper part of a substrate 91. A 'Permalloy(R)' film 95 as the upper magnetic film, an alumina film 96, and a 'Permalloy(R)' film 100 to serve as the mask material for alumina etching are formed thereon. A photoresist 97 is then applied thereon to form patterns. The film 100 is succession patterns by ion beam etching using gaseous Ar with the photoresist 97 as the mask material and the alumina film 96 is patterned by an ion beam etching method using gaseous 20vol.% CH2F2+CHF2. The film 95 is etched by the ion beam etching method using gaseous Ar with the film 96 as the mask to form the upper magnetic film pattern. The thin-film magnetic head having the track width of the high accuracy is thus obtd.
128	Ceramic sliding member and production thereof	JP12651590	1990-05-16	JPH03205387A	1991-09-06	KITA HIDENORI
PURPOSE: To obtain the subject member firmly covered with a solid lubricant without applying a binder to the sliding surface thereof by covering the sliding surface of a substrate comprising the ceramic sintered products of a Si compound with the compound of a IIa group element with Si and O in the substrate. CONSTITUTION: For example, CaF ₂ powder 4 is placed on the sliding surface of a disk substrate 1 comprising a Si ₃N ₄ sintered product and a lid 5 is downwardly moved to prevent the scatter of the powder 4. A heating oven 7 is heated with a heater 8 to heat and hold the lid 1 and the powder 4. A pressure is applied to the sliding surface of the disk substrate 1 with a pressing mechanism 6 and the substrate 1 is simultaneously rotated with a rotation mechanism 3, followed by stopping the rotation, removing the pressure from the sliding surface and cooling, thereby permitting to increase a contacting area between the substrate 1 and the powder 4 and accelerate a thermochemical reaction therebetween. The surface of the substrate 1 has microscopically many projections and depressions due to the failing, etc., of ceramic particles constituting the sintered product, but the powder 4 intrudes into the depressions to increase the adhesivity of the covering layer to the substrate 1. The sliding member has excellent sliding characteristics because of containing the CaF ₂ in the sliding surface in a high ratio. COPYRIGHT: (C)1991,JPO&Japio
129	Surface reforming method and device and surface reformed base material	JP33132889	1989-12-22	JPH03193681A	1991-08-23	OHATA KOKICHI; NATSUI KENICHI
PURPOSE: To improve reforming efficiency by allowing a base material which is an object to be reformed to exist in a vacuum vessel, imparting a reducing atmosphere thereto and irradiating the material with accelerated ions, thereby reforming the surface of the base material. CONSTITUTION: The substrate 1 which is supported on a holder 4 installed in the vacuum vessel 10 and consists of the oxide, nitride or carbide of metals, such as Al ₂O ₃, is irradiated with an ion beam 2 of N, etc., accelerated from an ion source 5 to sputter and clean the impurities sticking on the surface of the substrate 1. C vapor and S vapor or gaseous hydrocarbon is blown at a prescribed vapor deposition rate from a vapor deposition device 8 to form the reducing atmosphere and the substrate is irradiated with the ion beam 2 to part the bond of the metal and O constituting the metal oxide, etc. This O is discharged as CO or CO ₂ by bonding with the C vapor, etc. On the other hand, the metal existing in the surface part of the substrate 1 is reformed by the ions to a metal nitride, etc. COPYRIGHT: (C)1991,JPO&Japio
130	Method for reinforcing ceramics, ceramic modified layer and apparatus for producing the same	JP26152788	1988-10-19	JPH02111680A	1990-04-24	OTA HIROYUKI; MIYATA HIROSHI
PURPOSE: To improve collapse strength, etc., of ceramics by simultaneously carrying out irradiation treatment with high-energy ions and forming treatment of a metallic film having ductility on the surface of ceramics while changing the forming rate of the metallic film and irradiation dose. CONSTITUTION: The surface of ceramics is subjected to simultaneous irradiation treatment with high-energy ions (e.g., carbon or nitrogen ion) and forming treatment of a metallic film (e.g., nickel or titanium film having higher ductility than that of ceramics. The treatment is further carried out while changing the forming rate of the metallic film and irradiation dose of the high-energy ions in the surface treatment. Thereby, the composition of the formed modified layer can be continuously changed in the depth direction and values of physical properties, which can be also varied from values of metallic physical properties to those of compounds in the depth direction. As a result, stress in receiving a contact pressure from other objects can be moderated. COPYRIGHT: (C)1990,JPO&Japio
131	JPH022831B2 -	JP5152285	1985-03-14	JPH022831B2	1990-01-19	UEGAKITO OSAMI; DOI HARUO; NODA MASAHARU

132	Pretreatment for carbide and nitride base ceramic material	JP11492087	1987-05-13	JPS62270479A	1987-11-24	KAARU GERUHARUTO HATSUKUSHIYUT; MIRAN FUROBUAATO; BERUNTO SUTORITSUTSUKAA

133	Change detection type reproduction stylus of electrostatic capacity value	JP6191083	1983-04-08	JPS59188860A	1984-10-26	MIZUNO HIDEAKI; DOI KEIICHIROU
PURPOSE: To prevent the total exfoliation of an electrode part during a reproduction mode by obtaining the highest graphitization factor on the electrode surface of a diamond part and a smaller average graphitization factor at the opposite side to the electrode surface than the variation factor obtained at the ion implantation of one time. CONSTITUTION: An electrode part 2A is formed by implanting an ion to the diamond of the main body 1A of a production stylus. The highest graphitization factor is set on the surface of the electrode 2A along with the electric resistance value set at a low level. In addition, the surface of the electrode 2A is easily worn. Therefore a sharp corner part where the surface of the electrode 2A crosses a rubbing surface 3 is easily rounded by the production stylus. Thus the stress is never concentrated at said corner part, and therefore no exfoliation is caused owing to the trigger produced by the concentration of stress. Otherwise the exfoliation is produced only at a part having a high graphitization factor. Thus the reproduction function is never lost. COPYRIGHT: (C)1984,JPO&Japio
134	Method of forming solderable metal layer on ceramic	JP2069980	1980-02-22	JPS55116686A	1980-09-08	BUORUFUGANGU KEERAA

135	合成ガーネット材料、改質された合成ガーネット組成物、および合成ガーネットを製造する方法	JP2016117873	2016-06-14	JP2017001945A	2017-01-05	デイビッド・ボウイ・クルイックシャンク; マイケル・デビッド・ヒル
【課題】超高誘電率を有する改質されたガーネットを提供する。【解決手段】無線周波数用途で使用される合成ガーネット材料の実施形態が開示される。いくつかの実施形態では、誘電率および磁化などの或る特性を高めるために、合成ガーネットの結晶構造における特定の位置に、増加した量のビスマスを添加することができる。したがって、開示された材料の実施形態は、基地局アンテナなどの高周波用途において使用可能である。【選択図】図5A
136	Processing method of the ceramic substrate and improved thin film magnetic recording head	JP2000617148	2000-05-01	JP4947838B2	2012-06-06	アーン，ジャンジー

137	Processing method of the ceramic substrate and improved thin film magnetic recording head	JP2000617148	2000-05-01	JP2002544108A	2002-12-24	アーン，ジャンジー
(57)【要約】【解決手段】基板の少なくとも一部分の電気抵抗率を大きくする方法は、セラミック基板に対して、少なくとも一種のイオン源からのイオンを用いて、イオン注入及び／又はプラズマ浸漬を行なうことを含んでおり、イオン源は、希ガス、窒素、酸素、ハロゲン、ハロゲン化合物、ケイ素及びアンチモンからなる群から選択される。この方法は、基板の表面から基板の内部に、電気抵抗率の高い変質領域を形成する。この方法は、薄膜磁気記録ヘッド及び該ヘッドを内蔵する装置に適用することができる。この方法は、従来の磁気記録ヘッドの製造において発生した欠点を解消するものである。
138	Sliding machine parts coated with self-repairing hard solid lubricant film	JP3726092	1992-01-28	JP3225576B2	2001-11-05	久典大原; 弘川合

139	Ti- rare earth element -N-based super-hard compound film and method of forming the same	JP13399192	1992-05-26	JP3205943B2	2001-09-04	中哉千田; 正道松浦; 裕昌王

140	Coated ceramic member and a method of manufacturing the same	JP2205792	1992-01-10	JP3189353B2	2001-07-16	剛吉岡; 弘川合

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