序号 专利名 申请号 申请日 公开(公告)号 公开(公告)日 发明人
1 混凝土结构辅以缓蚀剂的电化学再化修复技术 CN201010581820.6 2010-12-10 CN102002716A 2011-04-06 张俊喜; 鲁进亮; 蒋俊; 马行驰
发明公开一种混凝土结构的缓蚀剂辅助电化学再化修复技术。即首先将碳化混凝土中钢筋作为阴极连接直流电源负极,在混凝土外裹惰性阳极与直流电源正极连接;向阳极的海绵中浇注含有阳离子型缓蚀剂的碱性电解液,控制电流密度为1~4A/cm2,总电量在200~400Ah之间,再碱化时间一般控制在2~4周,并将电解液进行循环再利用,混凝土中钢筋在再碱化修复结束后,可使钢筋进入稳定状态。本发明的一种碳化钢筋混凝土结构的缓蚀剂辅助电化学再碱化修复技术,由于在电解液中引入阳离子型缓蚀剂,在再碱化修复的同时缓蚀剂通过电渗和电迁移引入到钢筋表面,即实现对碳化混凝土进行再碱化的同时降低钢筋腐蚀速率双重效果。
2 聚合物表面的改性方法及具有改性表面的聚合物 CN96193367.4 1996-02-29 CN1107124C 2003-04-30 高锡勤; 丁炯镇; 宋锡均; 崔源国; 尹荣洙; 赵俊植
发明涉及使聚合物表面改性的方法,它包括在真空条件下将带有能量的离子颗粒从预定的照射距离照射在所述表面上,同时将反应性气体吹在所述表面上,从而减小湿润或增加该表面的粘附强度,并涉及具有以这种方法改性了表面的聚合物。
3 金刚石表面离子束改性 CN92103887.9 1992-06-02 CN1079515A 1993-12-15 廖道达
当今人造(或自然)金刚石不能实现物尽其用的主要问题是由于它和金属(或合金)的浸润性差,粘结小,容易脱落。本发明采用气体或(和)金属离子注入(轰击)与金属真空敷相结合的方法,进行静态或动态离子束混合或束增强沉积,以达到提高金刚石与其它物质的粘结力,提高金刚石本身的抗压强度和自锐性,进而成倍地提高金刚石工具使用寿命的目的。用途——金刚石工具制品。
4 抗气蚀性环境隔离涂层 CN201310352389.1 2013-08-14 CN103587156A 2014-02-19 R.达斯
适合用于保护暴露于高温环境的组件,具有提高的抗脱层性和抗气蚀性的环境隔离涂层、其施加方法和由其制备的制品。用于含基底的环境隔离涂层系统包括在含硅基底上的粘合涂层和在粘合涂层上的至少一个陶瓷环境隔离层。粘合涂层包括硅和至少一种包括元素的掺杂材料。掺杂材料以足够提高粘合涂层的抗脱层性和抗气蚀性的量位于粘合涂层内的晶粒间界处。
5 改善陶瓷表面润滑耐磨性表面处理方法 CN97126168.7 1997-12-31 CN1221715A 1999-07-07 田军; 薛群基
改善陶瓷表面润滑耐磨性表面处理方法是利用离子加速器对红宝石陶瓷进行离子注入,造成陶瓷表层的非晶化和陶瓷表面非晶石墨相的产生。表面非晶石墨润滑相的出现,则会减小了表面电阻和滑动的摩擦系数,降低陶瓷与的摩擦。陶瓷表层的非晶化使注入层的表面韧性和耐破碎临界负荷提高,引起红宝石陶瓷表层的塑性变形,改善了磨损性能。
6 聚合物、金属或陶瓷表面的改性 CN96193367.4 1996-02-29 CN1181787A 1998-05-13 高锡勤; 丁炯镇; 宋锡均; 崔源国; 尹荣洙; 赵俊植
发明涉及使聚合物、金属和陶瓷表面改性的方法,它包括在真空条件下将带有能量的离子颗粒从预定的距离(照射距离)照射在所述表面上,同时将反应性气体吹在所述表面上,从而减小湿润或增加该表面的粘附强度,并涉及具有以这种方法改性了的表面的聚合物、金属或陶瓷。
7 금속막의 산화로 형성된 나노급 다공성기판상의 전해질 박막 KR1020047018992 2003-05-29 KR1020050013108A 2005-02-02 박,용일; 프린즈,프레드릭비; 차,숙원; 이,상준존; 사이토,유지
소정의 공간팽창율을 갖는 물질(4)을 다공성 기판(10)에 증착하여 유체불투과성 박막(20)을 형성한다. 물질(4)은 증착한 뒤 산화되면서 팽창하여 다공성 기판(10) 윗면에 무공극 막을 형성한다. 무공극 막의 입자경계(6)가 재결합하여 다공성 기판(10)상에 연속 박막(20)을 형성한다.
8 CAVITATION-RESISTANT ENVIRONMENTAL BARRIER COATINGS US13585998 2012-08-15 US20140050929A1 2014-02-20 Rupak Das
An environmental barrier coating, a method of application thereof, and an article made thereby suitable for protecting components exposed to high-temperature environments with improved delamination resistance and cavitation resistance. The environmental barrier coating system for a silicon-containing substrate includes a bond coat layer on the silicon-containing substrate and at least one ceramic environmental barrier layer on the bond coat layer. The bond coat layer includes silicon and at least one doping material including elemental titanium. The doping material is located at grain boundaries within the bond coat layer in sufficient quantity to improve the delamination resistance and the cavitation resistance of increase the bond coat layer.
9 Solid oxide electrolyte with ion conductivity enhancement by dislocation US10449709 2003-05-29 US07195833B2 2007-03-27 Yuji Saito; Friedrich B. Prinz; Yong-Il Park; Ryan O'Hayre
Dislocations are fabricated into electrolyte membrane films to increase ion conductivity. Ion and/or electron irradiation causes the growth of vacancy clusters within the thin film and collapsing into Frank dislocation loops that exhibit high ion conductivity. Maximum ion conductivity is accomplished by spatially reorienting the Frank dislocation loops during a following heat-treatment of the membrane. Thereby the dislocation loops form surface-to-surface continuous dislocations along which ions may propagate between membrane surfaces with minimal activation energies. Dislocation densities in the range of 108˜1014 cm/cm3 may be fabricated with conventional irradiation techniques into ceramics such as, for example yttria stabilized zirconia and doped ceria.
10 Ceramic in replacement components US11216182 2005-09-01 US20050287288A1 2005-12-29 Geoffrey Dearnaley
A method and apparatus for a prosthesis. At least a portion of the prosthesis is made from a ceramic that is treated with ion implantation, which causes a controllable, bilateral compressive stress of the ceramic. A diamond-like-coating (DLC) can be coated on the ceramic and in the same chamber as the ion implantation. After treating by ion implantation and coating with DLC, the ceramic will be strengthened and have a low coefficient of friction and thereby be made much less likely to fracture under load.
11 Method for fabricating high aspect ratio structures in perovskite material US09696050 2000-10-25 US06638895B1 2003-10-28 Goran T. Karapetrov; Wai-Kwong Kwok; George W. Crabtree; Maria Iavarone
A method of fabricating high aspect ratio ceramic structures in which a selected portion of perovskite or perovskite-like crystalline material is exposed to a high energy ion beam for a time sufficient to cause the crystalline material contacted by the ion beam to have substantially parallel columnar defects. Then selected portions of the material having substantially parallel columnar defects are etched leaving material with and without substantially parallel columnar defects in a predetermined shape having high aspect ratios of not less than 2 to 1. Etching is accomplished by optical or PMMA lithography. There is also disclosed a structure of a ceramic which is superconducting at a temperature in the range of from about 10° K. to about 90° K. with substantially parallel columnar defects in which the smallest lateral dimension of the structure is less than about 5 microns, and the thickness of the structure is greater than 2 times the smallest lateral dimension of the structure.
12 Process for modifying surfaces of materials, and materials having surfaces modified thereby US09149442 1998-09-09 US06300641B1 2001-10-09 Seok Keun Koh; Hyung Jin Jung; Won Kook Choi; Kyong Sop Han; Sik Sang Gam
A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or glass under a vacuum condition, to decrease the wetting angle of the surface. The process can be widely used in the fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the material surface.
13 Process for modifying surfaces of polymers, and polymers having surfaces modified by such process US608054 1996-02-28 US5783641A 1998-07-21 Seok-Keun Koh; Hyung-Jin Jung; Seok-Kyun Song; Won-Kook Choi; Young-Soo Yoon; Jun-Sik Cho
The present invention relates to a process for modifying a polymer surface by irradiating ion particles with energy on a polymer surface, while blowing the reactive gas directly on the polymer surface under vacuum condition, to decrease the wetting angle of the polymer surface. The process for modifying the polymer surface according to the present invention can be widely used in the application fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the polymer surface.
14 Method of adding a halogen element into oxide superconducting materials by ion injection or thermal diffusion US22440 1993-02-16 US5364835A 1994-11-15 Shunpei Yamazaki
A method of producing an oxide superconducting material comprises the steps of adding a halogen element to an oxide superconducting material by ion injection and thermal diffusion, forming a film either on the oxide material before or after the adding step, and applying heat treatment after the forming step to improve the electric property in the near-surface portion.
15 Dense high temperature ceramic oxide superconductors US73241 1987-07-14 US5252545A 1993-10-12 Richard L. Landingham
Dense superconducting ceramic oxide articles of manufacture and methods for producing these articles are described. Generally these articles are produced by first processing these superconducting oxides by ceramic processing techniques to optimize materials properties, followed by reestablishing the superconducting state in a desired portion of the ceramic oxide composite.
16 Controlled ion implant damage profile for etching US233511 1988-08-18 US4978418A 1990-12-18 George W. Arnold, Jr.; Carol I. H. Ashby; Paul J. Brannon
A process for etching a material such as LiNbO.sub.3 by implanting ions having a plurality of different kinetic energies in an area to be etched, and then contacting the ion implanted area with an etchant. The various energies of the ions are selected to produce implant damage substantially uniformly throughout the entire depth of the zone to be etched, thus tailoring the vertical profile of the damaged zone.
17 Ceramic composition having low friction coefficient at high operating temperatures US198936 1988-05-26 US4892849A 1990-01-09 James Lankford, Jr.
A composite of a first metal ion and a ceramic composition in the near surface region of the composition is formed by ion mixing of the first metal with the ceramic composition. The composite has been oxidized at high temperatures thereby resulting in an oxide gradient layer in the surface of the ceramic composition. Alternatively, a second metal ion is ion mixed with the first metal ion in the near surface region of the ceramic composition and then oxidized at high temperatures to form an oxide gradient layer in the surface of the ceramic composition.
18 Method for producing ceramic composition having low friction coefficient at high operating temperatures US18627 1987-02-25 US4775548A 1988-10-04 James Lankford, Jr.
A method for producing a stable ceramic composition having a surface with a low friction coefficient and high wear resistance at high operating temperatures. A first deposition of a thin film of a metal ion is made upon the surface of the ceramic composition and then a first ion implantation of at least a portion of the metal ion is made into the near surface region of the composition. The implantation mixes the metal ion and the ceramic composition to form a near surface composite. The near surface composite is then oxidized sufficiently at high oxidizing temperatures to form an oxide gradient layer in the surface of the ceramic composition.
19 Ion sputter textured graphite electrode plates US364072 1982-03-31 US4417175A 1983-11-22 Arthur N. Curren; Ralph Forman; James S. Sovey; Edwin G. Wintucky
A specially textured surface of pyrolytic graphite exhibits extremely low yields of secondary electrons and reduced numbers of reflected primary electrons after impingement of high energy primary electrons. Electrode plates of this material are used in multistage depressed collectors.An ion flux having an energy between 500 eV and 1000 eV and a current density between 1.0 mA/cm.sup.2 and 6.0 mA/cm.sup.2 produces surface roughening or texturing which is in the form of needles or spires.Such textured surfaces are especially useful as anode collector plates in high efficiency electron tube devices.
20 Transparent conductive film having areas of high and low resistivity US335707 1981-12-30 US4395467A 1983-07-26 John L. Vossen, Jr.; Joseph Zelez
A method of forming areas of high and low resistivity in a transparent film of indium oxide and zirconium oxide is disclosed. The film is selectively ion implanted with protons and then annealed to lower the resistivity in the non-implanted portion.
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