| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 121 | METHOD FOR MANUFACTURING GLASS CONTAINERS FOR PHARMACEUTICAL USE | US14893783 | 2014-05-27 | US20160107918A1 | 2016-04-21 | José de Jesús DELGADO CARRANZA |
| The present invention relates to a method for manufacturing glass containers for pharmaceutical use. This method allows obtaining containers with a low degree of alkalinity. In some preferred embodiments the process allows the manufacture of sterile containers and substantially free of particles ready to be used by the pharmaceutical industry. | ||||||
| 122 | METHOD FOR PRODUCING A BLANK OF FLUORINE-DOPED AND TITANIUM-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT AND A BLANK PRODUCED ACCORDING TO THE METHOD | US14862707 | 2015-09-23 | US20160085145A1 | 2016-03-24 | Stefan OCHS; Klaus BECKER |
| A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+. | ||||||
| 123 | WHITE GLASS | US14957832 | 2015-12-03 | US20160083289A1 | 2016-03-24 | JUNKO MIYASAKA; SEIKI OHARA |
| A white glass includes, in terms of mole percentage on the basis of oxides, from 50 to 73% of SiO2, from 0 to 10% of B2O3, from 3 to 17% of Na2O, from 0.5 to 10% of at least one of Nb2O5 and Gd2O3, and from 0.5 to 10% of P2O5. In the white glass, a total content RO of MgO, CaO, SrO and BaO is from 2 to 25%. | ||||||
| 124 | APPARATUS AND METHOD FOR THERMALLY TREATING AN ANNULAR REGION OF AN INNER SURFACE OF A GLASS CONTAINER PRODUCED FROM A BOROSILICATE GLASS TUBE | US14801876 | 2015-07-17 | US20160016841A1 | 2016-01-21 | Robert Frost; Georg Haselhorst |
| A method for thermally treating an annular region of an inner surface of a glass container produced from a borosilicate glass tube is provided. The annular region is disposed at a tubular portion of the glass container and is disposed adjacent to a glass container bottom. The method includes: forming the glass container bottom from the glass tube; heating the annular region of the inner surface of the tubular portion to a treatment temperature TBeh above the transformation temperature TG, wherein the annular region is adjacent to the glass container bottom; maintaining the treatment temperature TBeh for a certain time period; and cooling the glass container to room temperature. | ||||||
| 125 | OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT | US14769382 | 2014-02-19 | US20160002092A1 | 2016-01-07 | Bodo KUEHN |
| An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193nm when measured using the applied wavelength of 193 nm and a second measured value M633nm when measured using a measured wavelength of 633 nm. The ratio M193nm/M633nm is less than 1.7. | ||||||
| 126 | CONDUCTIVE DOPED METAL-GLASS COMPOSITIONS AND METHODS | US14831957 | 2015-08-21 | US20150353414A1 | 2015-12-10 | Himanshu JAIN |
| Provided herein are conductive glass-metal compositions, as well as methods of making and using such compositions. In one example, the compositions include gold (Au) doped lithium-borate glasses shown to exhibit a transition from ionic to electronic conduction within the same sample. This is achieved via appropriate heat treatment, and particularly by heat treatment after annealing, wherein the post-annealing heat treatment is performed at temperatures below the glass transition temperature (Tg). The methods described herein are believed to introducing polarons formed from the trapping of electrons at partially ionized gold atoms. This unique electrical response provides new functionality to this class of nanocomposites. Additionally, increased thermal conductivity can be provided to an otherwise low conductive glass composition using the inventive methods and other subject matter provided herein. | ||||||
| 127 | Apparatus and method for baking glass substrate | US13641664 | 2012-08-02 | US09206065B2 | 2015-12-08 | Tao Ma; Tao Ding; Ming Liu; Tao Song; Guodong Zhao; Yijun Liu |
| The present invention discloses an apparatus for baking a glass substrate, which includes: a baking oven, a support component, a temperature sensing device, a heating device, a cooling device, and a temperature controlling device. The present invention further discloses a method for baking a glass substrate. The present invention is capable of dynamically controlling the temperature of the support component, which contacts the glass substrate. The temperature of the glass substrate keeps identical and the temperature of the support component keep identical, so as to prevent a Mura defect appearing on the glass substrate. | ||||||
| 128 | White light emitting glass-ceramic and production method thereof | US13809679 | 2010-07-22 | US08936732B2 | 2015-01-20 | Mingjie Zhou; Wenbo Ma; Fangyi Weng |
| A white light emitting glass-ceramic. The chemical formula of the glass-ceramic is aSiO2.bAl2O3.cNaF.dCeF3.nDyF3.mAg, wherein a, b, c, d, n and m are, by mol part, 25-50, 15-30, 10-30, 10-25, 0.01-1 and 0.01-1, respectively, and a+b+c+d-100. A method for producing said glass-ceramic is also provided. Silver ion is doped in the glass-ceramic in the form of silver particles by means of sintering and reduction annealing treatment, and thus the luminescence properties of rare earth ion is improved. | ||||||
| 129 | FUSED SILICA GLASS ARTICLE HAVING IMPROVED RESISTANCE TO LASER DAMAGE | US14269409 | 2014-05-05 | US20140373571A1 | 2014-12-25 | Kenneth Edward Hrdina; Changyi Lai; Lisa Anne Moore; Ulrich Wilhelm Heinz Neukirch; William Rogers Rosch |
| A fused silica glass article having greater resistance to damage induced by exposure to laser radiation such as laser induced wavefront distortion at deep ultraviolet (DUV) wavelengths, and behaviors such as fluence dependent transmission, which are related to intrinsic defects in the glass. The improved resistance to laser damage may be achieved in some embodiments by loading the glass article with molecular hydrogen (H2) at temperatures of about 400° C. or less, or 350° C. or less. The combined OH and deuteroxyl (OD) concentration may be less than 10 ppm by weight. In other embodiments, the improved resistance may be achieved by providing the glass with 10 to 60 ppm deuteroxyl (OD) species by weight. In still other embodiments, improved resistance to such laser damage may be achieved by both loading the glass article with molecular hydrogen at temperatures of about 350° C. or less and providing the glass with less than 10 ppm combined OH and OD, or 10 to 60 ppm OD by weight. | ||||||
| 130 | Inspectable Black Glass Containers | US13666644 | 2012-11-01 | US20140117240A1 | 2014-05-01 | Roger P. Smith; Carol A. Click; Rebecca Mullen; Stephen Daniel Barton |
| A soda-lime-silica glass container and related methods of manufacturing. A black-strikable glass composition having a base glass portion and a latent colorant portion is prepared. The base glass portion includes soda-lime-silica glass materials and one or more blue colorant materials, and the latent colorant portion includes cuprous oxide (Cu2O), stannous oxide (SnO), bismuth oxide (Bi2O3), and carbon (C). Glass containers may be formed from the black-strikable glass composition, and these glass containers may be heated to a temperature greater than 600 degrees Celsius to strike black therein. The glass containers formed from the black-strikable glass composition may be inspected—before or after striking—by infrared inspection equipment. | ||||||
| 131 | Process and device for producing a structure on one of the faces of a glass ribbon | US13056601 | 2009-06-30 | US08661851B2 | 2014-03-04 | Wolf Stefan Kuhn; Bertrand Strock; Francois Pahmer; Eric Bleuset |
| Process for producing a structure on one of the faces of a glass ribbon, carried out continuously using a printing device, in which: the printing device (8) is placed in a zone (A) in which the ribbon (B) is at an average temperature T1 insufficient for printing the pattern of the printing device onto the ribbon according to the nature of the pattern to be printed, to the pressure between the printing device and the ribbon and to the time during which the ribbon is in contact with the printing device; that face to be etched, upstream of the printing device (8), is heated so as to bring a limited and sufficient thickness of the ribbon to a temperature T2>T1 necessary for printing the pattern of the printing device onto the ribbon according to the nature of the pattern to be etched, to the pressure between the printing device and the ribbon and to the time during which the ribbon is in contact with the printing device, while still keeping the rest of the ribbon at a temperature close to T1; the heat flux transmitted through the ribbon by the heating means is such that the “printing number” is between 0.05 mm″1 and 2.00 mm″1 and preferably 0.3 mm″ 1. | ||||||
| 132 | NANOIMPRINT MOLD-FORMING SYNTHETIC QUARTZ GLASS AND MAKING METHOD | US13932685 | 2013-07-01 | US20140018229A1 | 2014-01-16 | Shigeru Maida; Hisatoshi Otsuka |
| Synthetic quartz glass is prepared by subjecting a silicon-providing feedstock to flame hydrolysis in oxyhydrogen flame, depositing silica fine particles on a rotating quartz glass target while concurrently melting and vitrifying them, thereby forming a synthetic quartz glass ingot, shaping, annealing, and effecting dehydrogenation treatment at a temperature of at least 600° C. and a pressure of up to 5 Pa for a holding time of at least 12 hours. The synthetic quartz glass has a high helium gas permeability and is suited for forming nanoimprint molds. | ||||||
| 133 | METHOD OF MANUFACTURING POROUS GLASS | US13884674 | 2011-11-25 | US20130233018A1 | 2013-09-12 | Kenji Takashima; Zuyi Zhang; Yoshinori Kotani; Akira Sugiyama; Naoyuki Koketsu |
| To provide a method of manufacturing a porous glass in which the porosity decreases as a function of the distance from the surface in the direction of depth. A method of manufacturing a porous glass includes a step of bringing one or more than one ion species selected from silver ion, potassium ion and lithium ion into contact with a matrix glass containing borosilicate glass as main ingredient and heating the matrix glass to form a glass body having an ion concentration distribution with a concentration of the one or more than one ion species decreasing as a function of a distance from a surface in a direction of depth, a step of heating and phase-separating the glass body to form a phase-separated glass, and a step of etching the phase-separated glass to form a porous glass having a porosity decreasing as the function of the distance from the surface in the direction of depth. | ||||||
| 134 | BALANCE SPRING AND METHOD FOR MANUFACTURING SAME | US13325410 | 2011-12-14 | US20130135974A1 | 2013-05-30 | Philippe NIEDERMANN; Jacek BABOROWSKI |
| The present invention relates to a balance spring intended to equip a balance of a mechanical timepiece, formed by a spiral bar resulting from machining a fused quartz plate, which has a positive thermal coefficient of rigidity, the bar constituting a core at least locally covered by at least one outer layer having a different structure to modify the thermal coefficient of rigidity. | ||||||
| 135 | Glass-tube extended-baking process | US13113498 | 2011-05-23 | US08230702B2 | 2012-07-31 | Guangjun Xu; Larry Zeng; Ivo Flammer; Dennis Robert Simons; Cedric Gonnet; Rob Hubertus Matheus Deckers |
| Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss. | ||||||
| 136 | Method for reducing diameter of bubble existing in a glass plate | US11872354 | 2007-10-15 | US08225627B2 | 2012-07-24 | Yutaka Kuroiwa; Setsuro Ito; Motoichi Iga |
| It is an object of the present invention to provide a new method for reducing the diameter of a bubble existing in a glass plate. Specifically, the present invention provides a method for reducing the diameter of a bubble existing in a glass plate, which comprises irradiating the vicinity of the bubble existing in the glass plate with a light beam emitted from a light source, to raise the temperature of the glass in the vicinity of the bubble to at least the melting point of the glass to reduce the maximum diameter of the bubble. | ||||||
| 137 | Silica glass with saturated induced absorption and method of making | US12507950 | 2009-07-23 | US08176752B2 | 2012-05-15 | Susan Lee Schiefelbein; Charlene Marie Smith |
| A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C. | ||||||
| 138 | BLUE LIGHT EMITTING GLASS AND PREPARATION METHOD THEREOF | US13377569 | 2009-06-25 | US20120091394A1 | 2012-04-19 | Mingjie Zhou; Wenbo Ma; Zhaopu Shi |
| Blue light emitting glass and the preparation method thereof are provided. The blue light emitting glass has the following composition: aCaO.bAl2O3.cSiO2.xCeO2, wherein a, b, c and x are, by mol part, 15-55, 15-35, 20-60 and 0.01-5 respectively. The preparation method comprises: weighing the raw materials according to the composition of the blue light emitting glass; mixing the raw materials uniformly and melting the raw materials to obtain glass melt; moulding the glass melt to obtain transparent glass; thermally treating the transparent glass under reducing atmosphere, and thereafter obtaining the finished product. The blue light emitting glass obtained has intense broadband excitation spectrum in ultraviolet region and emits intense blue light under the excitation of ultraviolet light. It is suitable for using as luminescent medium material. | ||||||
| 139 | Inorganic composition article | US12078639 | 2008-04-02 | US08043706B2 | 2011-10-25 | Naoyuki Goto; Toshitaka Yagi |
| An inorganic composition article used in disk substrate for information recording media, with a low melting point and a high productivity, combining superior surface characteristics capable of sufficiently dealing with a ramp load system for high density recording in both an in-plane magnetic recording system and a perpendicular magnetic recording system, having a high mechanical strength capable of enduring high speed rotation and impact, and combining both a heat expansion characteristic and heat resistance corresponding to each drive component. The inorganic composition articles contain a Li2O component and an Al2O3 component, with the percent by mass ratio of Li2O to Al2O3 (Li2O/Al2O3) being at least 0.3, include crystals, and have a compressive stress layer arranged on a surface. | ||||||
| 140 | PROCESS AND DEVICE FOR PRODUCING A STRUCTURE ON ONE OF THE FACES OF A GLASS RIBBON | US13056601 | 2009-06-30 | US20110162411A1 | 2011-07-07 | Wolf Stefan Kuhn; Bertrand Strock; Francois Pahmer; Eric Bleuset |
| Process for producing a structure on one of the faces of a glass ribbon, carried out continuously using a printing device, in which: the printing device (8) is placed in a zone (A) in which the ribbon (B) is at an average temperature T1 insufficient for printing the pattern of the printing device onto the ribbon according to the nature of the pattern to be printed, to the pressure between the printing device and the ribbon and to the time during which the ribbon is in contact with the printing device; that face to be etched, upstream of the printing device (8), is heated so as to bring a limited and sufficient thickness of the ribbon to a temperature T2>T1 necessary for printing the pattern of the printing device onto the ribbon according to the nature of the pattern to be etched, to the pressure between the printing device and the ribbon and to the time during which the ribbon is in contact with the printing device, while still keeping the rest of the ribbon at a temperature close to T1; the heat flux transmitted through the ribbon by the heating means is such that the “printing number” is between 0.05 mm″1 and 2.00 mm″1 and preferably 0.3 mm″ 1. | ||||||
QQ群二维码
意见反馈
意见反馈