| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 141 | METHOD FOR THE PRODUCTION OF A CYLINDER MADE FROM QUARTZ GLASS USING A RETAINING DEVICE, AND RETAINING DEVICE | US12736970 | 2009-05-14 | US20110072852A1 | 2011-03-31 | Thomas Krause; Udo Peper; Steffen Zwarg; René Sowa |
| The invention relates to a known method for the production of a cylinder from quartz glass, comprising a step, wherein an SiO2 body which comprises a porous SiO2 soot layer and has a lower end, an upper end, and an outer casing, is sintered to form said quartz glass cylinder in a vitrification furnace, and is being held in a vertical orientation by means of a retaining device, which comprises an upper retaining element connected at the upper end of the SiO2 body, and a lower retaining element disposed on the lower end. In order to provide a method based thereon, by means of which even heavy bodies made of porous SiO2 can be safely retained during vitrification, the invention provides that the retaining device has a dimensionally stable connecting part, which extends inside the vitrification furnace along the outer casing of the SiO2 body and which connects the upper and the lower retaining elements to each other. | ||||||
| 142 | Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder | US11630405 | 2006-03-30 | US07749930B2 | 2010-07-06 | Juergen Weber; Tobias Pogge; Martin Trommer; Bodo Kuehn; Ulrich Kirst; Waltraud Werdecker |
| An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig. | ||||||
| 143 | Glass Polarizer and Manufacturing Method Thereof | US12226814 | 2008-03-04 | US20100134705A1 | 2010-06-03 | Khaled Jabri; Nobuhito Takeshima; Atsushi Arai; Hiromichi Nishimura; Toshiharu Yamashita; Yoshihiko Noro |
| A glass polarizer having an excellent transmittance and extinction ratio with respect to light in the visible light range including blue using silver halide containing glass as a starting material is provided.A manufacturing method according to the present invention to manufacture glass polarizers is characterized in that borosilicate glass in which silver halide particles are dispersed and deposited by heat treatment is reduced to generate metallic silver particles from at least a portion of silver halide and then, heated for stretching to generate silver halide particles oriented and stretched in the glass. | ||||||
| 144 | QUARTZ GLASS CRUCIBLE FOR SILICON SINGLE CRYSTAL PULLING OPERATION AND PROCESS FOR MANUFACTURING THE SAME | US12451753 | 2008-05-23 | US20100132609A1 | 2010-06-03 | Yasuo Ohama |
| A quartz glass crucible for silicon single crystal pulling operation that by a simple arrangement, attains prevention of any collapse onto the inside at a superior edge of straight trunk part; and a process for manufacturing the same. The quartz glass crucible for silicon single crystal pulling operation having a straight trunk part and a bottom part, is characterized in that at least the straight trunk part is provided with a gradient of fictive temperature so that the fictive temperature on the outermost side thereof is 25° C. or more lower than the fictive temperature on the innermost side thereof. | ||||||
| 145 | STABLE GLASS SHEET AND METHOD FOR MAKING SAME | US12357441 | 2009-01-22 | US20100126221A1 | 2010-05-27 | Paul Stephen Danielson; Adam James Ellison; Timothy J. Kiczenski |
| A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765° C., a CTE at most 42×10−7/° C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0×1010 poise to a temperature corresponding to a viscosity of 1.0×1015 poise at a cooling rate CR, where CR≧5° C./second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675° C. for a period of time. | ||||||
| 146 | METHOD FOR REDUCING INCLUSIONS IN SILICA-TITANIA GLASS | US12261694 | 2008-10-30 | US20100107696A1 | 2010-05-06 | John Edward Maxon; Eli F. Tracy; William J. Whispell |
| The invention in one aspect is directed to a silica-titania glass have reduced striae and reduced inclusions, the glass have a point-to-point variation in titania content is 0.1 wt % or less through its thickness and a CTE of 0±3 ppb/° C. in the temperature range 5-35° C. The invention is further directed to a method for producing by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less during preparation of the glass and after the glass has been prepared heating the glass at a temperature in the range of 1650-1700° C. for a time in the range of 4-10 day to reduce inclusions in the glass. | ||||||
| 147 | Quartz glass body having improved resistance against plasma corrosion, and method for production thereof | US11633136 | 2006-11-30 | USRE41249E1 | 2010-04-20 | Tatsuhiro Sato; Nobumasa Yoshida; Akira Fujinoki; Kyoichi Inaki; Tomoyuki Shirai |
| An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3. | ||||||
| 148 | SYNTHETIC SILICA GLASS OPTICAL MATERIAL HAVING HIGH RESISTANCE TO LASER INDUCED DAMAGE | US12420443 | 2009-04-08 | US20090203511A1 | 2009-08-13 | Dana Craig Bookbinder; Richard Michael Fiacco; Kenneth Edward Hrdina; Lisa Anne Moore; Susan Lee Schiefelbein |
| Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3′ and preferably less than about 2.0×1017 molecules/cm3. | ||||||
| 149 | POLARIZING PHOTOREFRACTIVE GLASS | US12337920 | 2008-12-18 | US20090190215A1 | 2009-07-30 | Nicholas Francis Borrelli; Joseph Francis Schroeder, III; Thomas P. Seward, III |
| The invention is directed to a glass composition and articles made from the composition that are both polarizing and photorefractive. The glass has, for example, a composition consisting essentially of, in weight percent (“wt. %”) of 70-73 SiO2, 13-17% B2O3, 8-10% Na2O, 2-4% Al2O3, 0.005-0.1% CuO, <0.4% Cl, 0.1-0.5% Ag, 0.1-0.3% Br. In another embodiment the composition consists essentially of 70-77% SiO2, 13-18% B2O3, 8-10% Na2O, 2-4% Al2O3, 0.005-0.1% CuO, <0.4% Cl, 0.1-0.5% Ag, 0.1-0.3% Br. The glass can be used make articles or elements that can exhibits both the photorefractive effect and the polarizing effect within a single element or article, and can be used to make a variety of optical elements including Bragg gratings, filtering elements, and beam shaping elements and light collection elements for use in display, security, defense, metrology, imaging and communications applications. | ||||||
| 150 | Abrasive particles, and methods of making and using the same | US10211630 | 2002-08-02 | US07501001B2 | 2009-03-10 | Anatoly Z. Rosenflanz; Ahmet Celikkaya; Thomas J. Anderson |
| Abrasive particles and methods of making the same. Embodiments of the invention can be used to make abrasive particles. The abrasive particles can be incorporated into a variety of abrasive articles, including bonded abrasives, coated abrasives, nonwoven abrasives, and abrasive brushes. | ||||||
| 151 | Abrasive particles, abrasive articles, and methods of making and using the same | US10211598 | 2002-08-02 | US07501000B2 | 2009-03-10 | Anatoly Z. Rosenflanz; Ahmet Celikkaya; Thomas J. Anderson |
| Abrasive particles comprising alpha alumina particles and methods of making the same. The abrasive particles can be incorporated into a variety of abrasive articles, including bonded abrasives, coated abrasives, nonwoven abrasives, and abrasive brushes. | ||||||
| 152 | HEADLIGHT LENS FOR A MOTOR VEHICLE | US12281094 | 2007-01-25 | US20090034281A1 | 2009-02-05 | Jan Heiko Hamkens |
| The invention relates to a headlight lens for a vehicle headlight comprising a light source, particularly for a motor vehicle headlight, wherein the headlight lens comprises a transparent lens body made of glass comprising a surface arranged to face the light source and a surface arranged to face away from the light source, and wherein the headlight lens comprises at least with respect to said surface arranged to face away from the light source a layer comprising an aluminum concentration which is higher than an aluminum concentration inside the lens body and/or a sodium concentration which is lower than a sodium concentration inside the lens body. | ||||||
| 153 | Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component | US12148338 | 2008-04-18 | US20090004088A1 | 2009-01-01 | Bodo Kuehn; Steffen Kaiser; Denis Kassube; Kerstin Merget |
| To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b). | ||||||
| 154 | Method for the Regeneration of a Worn Quartz Glass Jig | US11919457 | 2006-04-27 | US20080216513A1 | 2008-09-11 | Tatsuhiro Sato; Akira Fujinoki; Itsuo Araki |
| To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature. | ||||||
| 155 | Heating/cooling method, manufacturing method of image displaying apparatus, heating/cooling apparatus, and heating/cooling processing apparatus | US10885683 | 2004-07-08 | US07383875B2 | 2008-06-10 | Masanao Yoshimura; Takeshi Yakou; Akihiko Komura; Akihiro Kimura; Shigeto Kamata |
| A heating/cooling method, a manufacturing method of an image displaying apparatus, a heating/cooling apparatus, and a heating/cooling processing apparatus, in which the heating and cooling of a substrate can be executed at a high speed are provided. | ||||||
| 156 | Holder Made From Quartz Glass for the Processing of Semiconductor Wafers and Method for Production of the Holder | US11630405 | 2006-03-30 | US20080066497A1 | 2008-03-20 | Juergen Weber; Tobias Pogge; Martin Trommer; Bodo Kuehn; Ulrich Kirst; Waltraud Werdecker |
| An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig. | ||||||
| 157 | METHOD OF INCREASING FLUORESCENCE INTENSITY OF OXIDE GLASS | US11740938 | 2007-04-27 | US20070290170A1 | 2007-12-20 | Tuan-Jye DING |
| The present invention provides a method performing a glass split phase technique to make an oxide glass with a strong structure phase and a weak structure phase. The strong structure phase has a three-dimensional continuous web-like distribution, and the weak structure phase has a continuous web-like distribution or an independent drop-like distribution. The weak structure phase receives rare earth elements therein more than the strong structure phase. Therefore, the rare earth elements are concentrated in the weak structure phase to increase the fluorescence intensity of the oxide glass by an increase of a concentration and a fluorescence efficiency of the rare earth elements. | ||||||
| 158 | Quartz Glass Component For A Uv Radiation Source And Method For Producing And Testing The Aptitude Of Such A Quartz Glass Component | US11578393 | 2005-04-05 | US20070272685A1 | 2007-11-29 | Andreas Schreiber; Bodo Kuehn; Franz-Josef Schilling; Erich Arnold; Hans-Dieter Witzke |
| In a known method, a quartz glass component is produced for a UV radiation source by melting SiO2-containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5×1017 molecules/cm3. | ||||||
| 159 | Forehearth Concentrate And Method For Opalization Of Glass | US11758273 | 2007-06-05 | US20070234759A1 | 2007-10-11 | George Sakoske; Kenneth Ackerman; John Bauer |
| The invention provides an opalescent forehearth color concentrate comprising a non-smelted agglomerated interspersion of particles for use in coloring glass, said concentrate comprising by weight from about 10% to about 70% of a glass component and from about 30% to about 90% of one or more opalescent pigments, the glass component comprising by weight from about 10% to about 50% ZnO and about 15 to about 60% SiO2. The invention also provides a method of using the color concentrate. | ||||||
| 160 | Transparent, super-hydrophobic, disordered composite material | US11347139 | 2006-02-03 | US20070184247A1 | 2007-08-09 | John T. Simpson; Brian R. D'Urso |
| A super-hydrophobic disordered composite material having a protrusive surface feature includes a recessive phase and a protrusive phase, the recessive phase having a higher susceptibility to a preselected etchant than the protrusive phase, the composite material having an etched surface wherein the protrusive phase protrudes from the surface to form a protrusive surface feature, the protrusive feature being super-hydrophobic, the super-hydrophobic disordered composite material being transparent. | ||||||
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