序号 专利名 申请号 申请日 公开(公告)号 公开(公告)日 发明人
81 Arc resistant high voltage micromachined electrostatic switch US345300 1999-06-30 US6057520A 2000-05-02 Scott Halden Goodwin-Johansson
A MEMS (Micro Electro Mechanical System) electrostatically operated device is provided that can switch high voltages while providing improved arcing tolerance. The MEMS device comprises a microelectronic substrate, a substrate electrode, first and second contact sets, an insulator, and a moveable composite. The moveable composite overlies the substrate and substrate electrode. In cross section, the moveable composite comprises an electrode layer and a biasing layer. In length, the moveable composite comprises a fixed portion attached to the underlying substrate, a medial portion, and a distal portion moveable with respect to the substrate electrode. Each contact set has at least one composite contact attached to the moveable composite, and preferably at least one substrate contact attached to the substrate. One of the contact sets is closer to the composite distal portion. The distal and/or medial portions of the moveable composite are biased in position when no electrostatic force is applied. Applying a voltage between the substrate electrode and moveable composite electrode creates an electrostatic force that attracts the moveable composite to the underlying substrate. The first and second contact sets are electrically connected when the distal portion of the moveable composite is attracted to the substrate. Once electrostatic force is removed, the moveable composite reassumes the biased position such that the first and second contact sets are disconnected in a sequence to minimize arcing. Various embodiments and methods of using the electrostatic MEMS device are provided.
82 Spatial light modulator US31487 1998-02-26 US5959763A 1999-09-28 Carl O. Bozler; Steven Rabe
A spatial light modulator formed of a moveable electrode which is disposed opposite a fixed electrode and is biased to roll in a preferred direction upon application of an electric field across the electrodes to produce a light valve or light shutter. In one embodiment, the moveable electrode is restrained at one end and coils about the fixed end in a preferential roll direction. The bias is achieved by inducing anisotropic stress or anisotropic stiffness.
83 Electrical switch device with an integral semiconductor contact element US352410 1982-02-26 US4480162A 1984-10-30 John C. Greenwood
An electrical contact element includes a support component of an effectively electrically insulating material, especially silicon, the support component including a supporting body and an armature integral with and hingedly connected to the supporting body, the armature carrying at least one electrical contact. The electrical contact element is accommodated in a housing which is hermetically sealed and either filled with an inert gas or evacuated. The housing includes at least one fixed contact, and the supporting body is shaped as a frame which has a recess in which the armature is received when electrical contact is established between the electrical contact carried by the armature and the fixed electrical contacts carried by the housing. The electrical contact element is made by material-removing techniques from a single substantially plate-shaped member and then the electrical contact is vapor-deposited thereon.
84 Micro electromechanical switch and a manufacturing method thereof, and an apparatus using the micro electromechanical switch JP2006016973 2006-01-25 JP4792994B2 2011-10-12 貴弘 増田; 知範 積
85 Micromachine electrostatic actuator having an air gap JP2004129835 2004-04-26 JP4465219B2 2010-05-19 グッドウィン‐ヨハンソン,スコット・ホールデン
86 Switch, a method for switching the state of the signal paths, and the system JP2008551227 2007-01-19 JP2009524191A 2009-06-25 ヨアキム オーバーハンマー,
本発明は、電気信号のための信号経路の形態を切り換える方法、システムおよび多重安定スイッチであって、第1の移動要素12と第2の移動要素14とを備え、第1および第2の要素が、少なくとも2つの機械的に安定な状態(第1の移動要素が第2の移動要素と機械的に結合され、スイッチにおける信号経路が閉形態に配置される機械的結合状態;第1の移動要素が上記第2の移動要素から分離され、スイッチにおける上記信号経路が開形態に配置される非結合状態)へと配置され得る方法、システムおよび多重安定スイッチに関する。 スイッチは第1の固定電極部を伴って構成される固定静電電極10を備え、第1の固定電極部は、第1の固定電極と移動要素のうちの少なくとも一つとの間に電位差が加えられるときにその移動要素を作動させて移動させることにより移動要素を一方の状態から他方の状態へと移行させる。
【選択図】図20
87 Microswitching element, and its manufacturing method JP2006330975 2006-12-07 JP2008146940A 2008-06-26 NAKATANI TADASHI; ANH TUAN NGUYEN; UEDA TOMOSHI; YONEZAWA YU; MISHIMA NAOYUKI
<P>PROBLEM TO BE SOLVED: To provide a microswitching element suitable for reducing a driving voltage. <P>SOLUTION: This microswitching element X1 is equipped with a base substrate S1, a stationary part 11, a movable part 12 extending along the base substrate S1 while having a stationary end 12a fixed to the stationary part 11, a movable contact electrode 13 provided on the movable part 12, a pair of stationary contact electrodes 14 each bonded to the stationary part 11 while each having potions facing the movable contact electrode 13, a movable driving electrode 15 provided between the movable contact electrode 13 and the stationary end 12a on the movable part 12, and a stationary driving electrode 16 bonded to the stationary part 11 while having an elevated part 16A including a portion facing the movable driving electrode 15. The elevated part 16A has a stair-stepped shape 16a consisting of a plurality of steps 16a', and the further each step 16a' of the stair-stepped shape 16a is from the movable contact electrode 13, the closer the step 16a' is to the base substrate S1. <P>COPYRIGHT: (C)2008,JPO&INPIT
88 Arc resistance high-voltage electrostatic switch JP2001508469 2000-05-04 JP4030760B2 2008-01-09 グッドウィン‐ヨハンソン,スコット・ホールデン
89 Of low-voltage micro-switching element JP2002339261 2002-11-22 JP3942532B2 2007-07-11 鎭 佑 趙
90 Micro-electro-mechanical system valve and a method of manufacturing the same JP2002526693 2001-09-14 JP2004508952A 2004-03-25 グッドウィン‐ヨハンソン,スコット・エイチ; マグワイア,ゲイリー・イー
【課題】消費電が最小でありながら早い動作、大きなバルブ力及び大きな変位利点があるマイクロ電気機械システム(MEMS)のバルブ装置を提供する。
【解決手段】開口70が形成された基板20と基板電極40と開口70の上に位置して電極素子層62及びバイアス素子層64、66を有する可動膜60とを含む。 少なくとも1つの弾性的に圧縮可能な誘電体層50を設け、基板電極40と可動膜60の電極素子層62との間の電気的絶縁を確実にする。 動作に当たっては、開口70に対して可動膜60を動かすように電圧差を基板電極40と可動膜60の電極素子層62との間に設け、これにより、可動膜60によってカバーされる開口70の部分を制御可能に調整する。
【選択図】図1
91 Switch JP2002170613 2002-06-11 JP2004014471A 2004-01-15 NAKANISHI YOSHITO; NAKAMURA KUNIHIKO
PROBLEM TO BE SOLVED: To provide a switch of high isolation which can quickly respond at a much lower DC potential. SOLUTION: With the use of micro structure group 3 composed of micro structures 2, slightly moving the structures 2 provides a large amount of move as a group. So, the DC potential applied to control electrodes 4 and 5 of respective micro structures 2 can be lower. Thus, a switch 1 quickly responds with high isolation, and operates on a low DC voltage. COPYRIGHT: (C)2004,JPO
92 Arc resistance high-voltage electrostatic switch JP2001508469 2000-05-04 JP2003504800A 2003-02-04 グッドウィン‐ヨハンソン,スコット・ホールデン
(57)【要約】 高電圧を切換えることが可能である一方で、改善された耐アーク性を提供するMEMS(マイクロエレクトロメカニカルシステム)静電作動式装置が提供される。 MEMS装置は、超小形電子基板、基板電極、第1の接点組および第2の接点組、絶縁体、および可動複合体を含む。 可動複合体は、基板および基板電極に上重ねされる。 横断面で見て、可動複合体は、電極層および偏倚層を含んでいる。 長さで見て、可動複合体は、下に位置する基板に取付けられている固定部分と、中間部分と、基板電極に対して可動の遠位部分とを含んでいる。 各接点組は、可動複合体に取付けられている少なくとも1つの複合体接点と、基板に取付けられている好ましくは少なくとも1つの基板接点とを有する。 複数の接点組のうちの1つの接点組は、複合体遠位部分により近く位置する。 可動複合体の遠位部分および/または中間部分は、静電気が印加されない場合、偏倚されて適所に位置する。 基板電極と可動複合体電極との間に電圧を印加すると、静電気力が発生され、この静電気力により、可動複合体は下に位置する基板に吸引される。 第1および第2の接点組は、可動複合体の遠位部分が基板に吸引されると電気的に接続される。 いったん静電気力が除去されると、可動複合体は偏倚位置を再びとり、このようにして、第1および第2の接点組がシーケンシャルに接続解除されて、アーク形成を最小化する。 静電式MEMS装置を使用する様々な実施例および方法が提供される。
93 Electrostatic switch, which is a high-pressure micro-machining for JP2001506565 2000-06-23 JP2003503816A 2003-01-28 グッドウィン‐ヨハンソン,スコット・ホールデン
(57)【要約】 【課題】 比較的低い静電気の動作電圧を使用して、高圧を切り換えることができる、MEMS式の静電気的に動作する高圧用スイッチ又はリレーディバイスを提供する。 【解決手段】 マイクロ電子基板、基板電極、および、1つ以上の基板接点、を備えるとともに、基板の上側にある可動の複合体、1つ以上の複合接点、および、少なくとも1つの絶縁体、も備え、その断面において可動の複合体は、電極層とバイアス層とからなるMEMSディバイス。
94 Micromechanical relay JP26870895 1995-10-17 JPH08227646A 1996-09-03 HERUMUUTO SHIYURAAKU; YOAHIMU SHIMUKAATO
PROBLEM TO BE SOLVED: To accomplish complete tight contact with a base electrode while requiring a slight surface in a tongue shaped part of a contact element by coaxially installing a contact spring section to a original tongue type part by means of spring webs arranged in a ring shape. SOLUTION: A contact spring section 21 formed of slits 23 is held by means of spring webs 22, which are arranged in a ring shape and curved circularly. The slits 23 serving as spiral sections are arranged in a ring shape while being overlapped to each other. In this way, overlap sufficient for generating torsion of the webs 22 can be obtained when an armature contact piece 7 is moved in the axial direction, so that contact force can be regulated when the webs 22 are softened/hardened according to the length or the interval of the slits 23. COPYRIGHT: (C)1996,JPO
95 정전 마이크로 접점 개폐기 및 그 제조 방법, 및 정전 마이크로 접점 개폐기를 이용한 전자 장치 KR1020060016569 2006-02-21 KR100799454B1 2008-01-30 마스다타카히로; 세키토모노리
본 발명은 종래와 동등한 복귀력을 확보하면서, 접촉력의 향상, 인가 전압의 저감, 및/또는, 전극의 치수의 축소를 실현하기 위한 것으로서, 상기 목적을 달성하기 위한 해결 수단에 있어서, 정전 마이크로 릴레이(10)는, 베이스(11)에 마련한 고정 전극(12)과, 액추에이터(21)의 가동 전극(24) 사이에 전압을 인가하여 생기는 정전 인력으로 가동 전극(24)을 구동하고, 베이스(11)에 마련한 고정 접점(13a·14a)에 액추에이터(21)에 마련한 가동 접점(26)을 접리시켜서 전기 회로를 개폐한다. 액추에이터(21)는, 베이스(11)에 마련한 지지부(22)와, 지지부(22)로부터 측방으로 연재되고, 가동 전극(24) 및 가동 접점(26)을 탄성 지지하는 들보부(23)를 구비한다. 들보부(23)는, 지지부(22)의 측으로부터 가동 전극(24) 및 가동 접점(26)의 순번으로 탄성 지지하고 있다. 들보부(23)와 가동 전극(24)을 접속하는 접속부(28)는, 지지부(22)의 측으로부터 슬릿(27)이 형성되어 있다. 정전 마이크로 접점 개폐기
96 스위치 KR1020047007111 2003-06-05 KR1020040062626A 2004-07-07 나카니시요시토; 나카무라구니히코
한층 더 낮은 직류 전위로 고속으로 응답할 수 있고, 또, 아이솔레이션이 우수한 스위치. 본 스위치에 있어서, 미소한 구조체(102a, 102b, 102c)로 구성되는 미소 구조체군(103)을 이용하여, 각 구조체(102a, 102b, 102c)를 약간 이동시키는 것에 의해, 군(群)으로서는 큰 이동량을 얻을 수 있다. 또한, 이에 따라, 각각의 미소 구조체(102a, 102b, 102c)의 제어 전극(106a, 106b, 107a, 107b, 108a, 108b, 109a, 109b)에 인가하는 직류 전위를 작게 할 수 있다. 이렇게 하여, 고속으로 응답할 수 있고, 또한 아이솔레이션이 우수한 스위치(100)로서, 작은 직류 전압으로 동작하는 스위치(100)를 실현할 수 있다.
97 저전압 구동의 마이크로 스위칭 소자 KR1020010073574 2001-11-24 KR1020030042795A 2003-06-02 조진우
PURPOSE: A micro switching device is provided to reduce an applied voltage, to obtain a desired variation amount by a weak electrostatic force, and to prevent an adhesion phenomenon. CONSTITUTION: A spring(54) elastically operates, and a membrane(55) is formed at one end of the spring so as to be supported. A lower electrode(52) is formed at a lower part of the membrane and generates an electrostatic force according to an applied voltage. The membrane is a non-flat board type. The spring is formed at an anchor part(53) fixed at a substrate(51). The membrane is supported by the spring and operates at a noncontact state with the substrate. A signal line(56) is formed on the substrate and is contact with the membrane by driving of the membrane.
98 With a curved switching device high frequency mems switch and a manufacturing method of this switch JP2007500039 2005-02-25 JP4927701B2 2012-05-09 ウルリヒ・プレヒテル; フォルカー・ツィーグラー
99 Micro-switching element and a micro-switching device manufacturing method JP2006330975 2006-12-07 JP4855233B2 2012-01-18 トエン アン グエン; 直之 三島; 知史 上田; 忠司 中谷; 遊 米澤
100 Micromachine electrostatic actuator having an air gap JP2001500902 2000-05-19 JP4068346B2 2008-03-26 グッドウィン‐ヨハンソン,スコット・ホールデン
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