序号 专利名 申请号 申请日 公开(公告)号 公开(公告)日 发明人
181 Silicon nitride circuit board EP00100038.9 1996-03-19 EP0999589B2 2013-11-13 Ikeda, Kazuo; Komorita, Hiroshi; Sato, Yoshitoshi; Komatsu, Nichiyasu; Mizunoya, Nobuyuki
182 Ceramic sheet and producing method thereof EP08019481.4 2008-11-07 EP2058119A3 2012-02-29 Kawai, Hideharu; Matsuzaki, Toru

A ceramic sheet has at least one ceramic layer. The at least one ceramic layer includes a plurality of ceramic pieces, at least a part of the plurality of ceramic pieces is formed by cracking a sintered ceramic plate, which at least partially has a flat part, at the flat part of the sintered ceramic plate.

183 Ceramic sheet and producing method thereof EP08019481.4 2008-11-07 EP2058119A2 2009-05-13 Kawai, Hideharu; Matsuzaki, Toru

A ceramic sheet has at least one ceramic layer. The at least one ceramic layer includes a plurality of ceramic pieces, at least a part of the plurality of ceramic pieces is formed by cracking a sintered ceramic plate, which at least partially has a flat part, at the flat part of the sintered ceramic plate.

184 Bremsscheibe mit Zwischenschicht und Verfahren zur Herstellung derselbe EP06017215.2 2006-08-18 EP1783395A3 2008-06-11 Kienzle, Andreas, Dr.; Krätschmer, Ingrid

Carbon-Keramik-Bremsscheiben, die mehrere Schichten umfassen, wobei mindestens eine Schicht als Tragkörper dient und mindestens eine Schicht als Reibschicht fungiert, wobei der Tragkörper und mindestens eine Reibschicht durch eine Zwischenschicht getrennt sind, dadurch gekennzeichnet, daß die Zwischenschicht Verstärkungsfasern in Form von Faserbündeln aufweist, wobei die Faserbündel von einer Schicht aus einer Mischung von Siliciumcarbid, Silicium und Kohlenstoff umgeben sind, die durch thermische Behandlung einer Mischung aus Silicium-Pulver und einem carbonisierten Harz oder carbonisierten Pech bei einer Temperatur von 900 °C bis 1700 °C unter Ausschluß von Oxydationsmitteln erhältlich ist, Verfahren zu deren Herstellung, und Verwendung insbesondere in Bremssystemen von Automobilen

185 METHOD FOR MANUFACTURING CERAMIC MULTILAYERED BOARD EP02771763 2002-05-21 EP1392093A4 2004-12-15 HASHIMOTO AKIRA; NAKAO KEIICHI; KATSUMATA MASAAKI
A manufacturing method including the step of forming an adhesive layer (12) over the surface of a ceramic substrate (11) enables the manufacture of a ceramic multilayered circuit board of a high dimensional precision comprising a monolithic block of the ceramic substrate (11) and a ceramic green sheet (14) with almost no in−plane shrinkage after baking.
186 Semiconductor substrate of high reliability EP04012282.2 1997-08-27 EP1453089A3 2004-09-08 Sakuraba, Masami, c/o Dowa Mining co., Ltd.; Kimura, Masami, c/o Dowa Mining Co., Ltd.; Nakamura, Junji, c/o Dowa Mining Co., Ltd.; Takahara, Masaya, c/o Dowa Mining Co., Ltd.

A paste of active metallic brazing material (2) is applied to the entire surface of each side of aluminum nitride or alumina ceramic substrate (1); circuit forming copper plate (3) having a thickness of 0.3 mm is placed in contact with one surface of the substrate and a heat dissipating copper plate (4) having a thickness of 0.25 mm placed in contact with the other surface; the individual members are compressed together and heated at 850°C in a vacuum furnace to form a joint; an etching resist is applied to the circuit forming copper plate and etching is performed with an iron chloride solution to form a circuit pattern and the unwanted brazing material (2) is removed from the marginal portions; a second resist layer is applied and etched with an iron chloride solution to form a second marginal step; a third resist layer is similarly applied and etched to form a third marginal step; the completed circuit board having three marginal steps of which the lowest one is solely or partly made of the brazing material (2) can withstand 1,500 heat cycles, which is the result that has been unattainable by the prior art. Having such high heat cycle characteristics, the circuit board is suitable for use as semiconductor substrate in automobiles, electric trains and other applications that require high output power.

187 Metal ceramic substrates for semiconductors of high reliability EP97810603.7 1997-08-27 EP0827198B1 2004-08-25 Sakuraba, Masami; Kimura, Masami; Nakamura, Junji; Takahara, Masaya
188 MATERIALVERBUND SOWIE HERSTELLUNG UND VERWENDUNG DES MATERIALVERBUNDS EP01953783.6 2001-05-28 EP1292549B1 2004-08-04 JACOBITZ, Jochen; HÜGGING, Elisabeth; KIESEWETTER, Hellmuth; BAUER, Wolfgang; MATHES, Wieland
The invention relates to a material composite (1) that is vacuum-tight and resistant to thermal shocks, to a method for the production thereof and to its use. A permanent connection between an aluminum oxide sapphire (2) and an aluminum oxide ceramic (5) is attained by a first connecting layer (3) comprised of a manganese-silicate glass, in which at least one of the metals molybdenum, tungsten, palladium or platinum is incorporated, and by a second connecting layer (4) comprised of a manganese-silicate glass. To this end, the individual materials are fused by sintering. The material composite (1) is used for inserting a window comprised of aluminum oxide sapphire (2) into a housing (16) for a light-ignitable thyristor (24).
189 Silicon nitride circuit board EP00100038.9 1996-03-19 EP0999589B1 2004-05-19 Ikeda, Kazuo; Komorita, Hiroshi; Sato, Yoshitoshi; Komatsu, Nichiyasu; Mizunoya, Nobuyuki
190 MATERIALVERBUND SOWIE HERSTELLUNG UND VERWENDUNG DES MATERIALVERBUNDS EP01953783.6 2001-05-28 EP1292549A1 2003-03-19 JACOBITZ, Jochen; HÜGGING, Elisabeth; KIESEWETTER, Hellmuth; BAUER, Wolfgang; MATHES, Wieland
The invention relates to a material composite (1) that is vacuum-tight and resistant to thermal shocks, to a method for the production thereof and to its use. A permanent connection between an aluminum oxide sapphire (2) and an aluminum oxide ceramic (5) is attained by a first connecting layer (3) comprised of a manganese-silicate glass, in which at least one of the metals molybdenum, tungsten, palladium or platinum is incorporated, and by a second connecting layer (4) comprised of a manganese-silicate glass. To this end, the individual materials are fused by sintering. The material composite (1) is used for inserting a window comprised of aluminum oxide sapphire (2) into a housing (16) for a light-ignitable thyristor (24).
191 Silicon nitride circuit board EP00100038.9 1996-03-19 EP0999589A3 2000-06-14 Ikeda, Kazuo; Komorita, Hiroshi; Sato, Yoshitoshi; Komatsu, Nichiyasu; Mizunoya, Nobuyuki

This invention provides a silicon nitride circuit board in which a metal circuit plate is bonded to a high thermal conductive silicon nitride substrate having a thermal conductivity of not less than 60 W/m K, wherein a thickness DS of the high thermal conductive silicon nitride substrate and a thickness DM of the metal circuit plate satisfy a relational formula DS ≦ 2DM. The silicon nitride circuit board is characterized in that, when a load acts on the central portion of the circuit board which is held at a support interval of 50 mm, a maximum deflection is not less than 0.6 mm until the silicon nitride substrate is broken. The silicon nitride circuit board is characterized in that, when an anti-breaking test is performed to the circuit board which is held at a support interval of 50 mm, an anti-breaking strength is not less than 500 MPa. The metal circuit plate or a circuit layer are integrally bonded on the silicon nitride substrate by a direct bonding method, an active metal brazing method, or an metalize method. According to the silicon nitride circuit board with the above arrangement, high thermal conductivity and excellent heat radiation characteristics can be obtained, and heat cycle resistance characteristics can be considerably improved.

192 Silicon nitride circuit board EP00100038.9 1996-03-19 EP0999589A2 2000-05-10 Ikeda, Kazuo; Komorita, Hiroshi; Sato, Yoshitoshi; Komatsu, Nichiyasu; Mizunoya, Nobuyuki

This invention provides a silicon nitride circuit board in which a metal circuit plate is bonded to a high thermal conductive silicon nitride substrate having a thermal conductivity of not less than 60 W/m K, wherein a thickness DS of the high thermal conductive silicon nitride substrate and a thickness DM of the metal circuit plate satisfy a relational formula DS ≦ 2DM. The silicon nitride circuit board is characterized in that, when a load acts on the central portion of the circuit board which is held at a support interval of 50 mm, a maximum deflection is not less than 0.6 mm until the silicon nitride substrate is broken. The silicon nitride circuit board is characterized in that, when an anti-breaking test is performed to the circuit board which is held at a support interval of 50 mm, an anti-breaking strength is not less than 500 MPa. The metal circuit plate or a circuit layer are integrally bonded on the silicon nitride substrate by a direct bonding method, an active metal brazing method, or an metalize method. According to the silicon nitride circuit board with the above arrangement, high thermal conductivity and excellent heat radiation characteristics can be obtained, and heat cycle resistance characteristics can be considerably improved.

193 Verfahren zur Herstellung von Reflektoren EP93102390.7 1993-02-16 EP0558991B1 1999-01-07 Goedtke, Peter; Blenninger, Ernst; Papenburg, Ulrich
194 Metal ceramic substrates for semiconductors of high reliability EP97810603.7 1997-08-27 EP0827198A3 1998-07-15 Sakuraba, Masami; Kimura, Masami; Nakamura, Junji; Takahara, Masaya

A paste of active metallic brazing material is applied to the entire surface of each side of aluminum nitride or alumina ceramic substrate 1; circuit forming copper plate 3 having a thickness of 0.3 mm is placed in contact with one surface of the substrate and a heat dissipating copper plate 4 having a thickness of 0.25 mm placed in contact with the other surface; the individual members are compressed together and heated at 850°C in a vacuum furnace to form a joint; an etching resist is applied to the circuit forming copper plate and etching is performed with an iron chloride solution to form a circuit pattern and the unwanted brazing material is removed from the marginal portions; a second resist layer is applied and etched with an iron chloride solution to form a second marginal step; a third resist layer is similarly applied and etched to form a third marginal step; the completed circuit board having three marginal steps of which the lowest one is solely or partly made of the brazing material can withstand 1,500 heat cycles, which is the result that has ben unattainable by the prior art. Having such high heat cycle characteristics, the circuit board is suitable for use as semiconductor substrate in automobiles, electric trains and other applications that require high output power.

195 Gewölbtes Metall-Keramik-Substrat EP97104225 1997-03-13 EP0805492A3 1998-05-20 SCHULZ-HARDER JUERGEN; MAIER PETER H
Ein gewölbtes Metall-Keramik-Substrat mit einer Keramikschicht und mit einer an der Oberseite und an der Unterseite der Keramikschicht vorgesehenen Metallisierung ist um wenigstens eine Achse parallel zur Ebene des Substrates derart gekrümmt ist, daß es an der Unterseite eine konvex gekrümmte Fläche bildet. Die Dicke der Metallisierungen an der Oberseite und Unterseite der gewölbten Keramikschicht ist gleich.
196 METHOD OF PRODUCING FIRED PATTERN EP90909362.7 1990-06-15 EP0429670B1 1994-06-08 SAKURAMOTO, Takafumi Nitto Denko Corporation; TOMINAGA, Takashi Nitto Denko Corporation; ASHIDA, Megumi Nitto Denko Corporation
A method of producing a fired pattern by firing a firing pattern bonded to an object via an inorganic powder sheet formed by binding inorganic powders of glass, ceramic, etc., with the use of a resin binder, wherein said sheet is bonded to said object by applying heat and/or pressure thereto or with the use of a pressure-sensitive adhesive.
197 METHOD OF PRODUCING FIRED PATTERN EP90909362.7 1990-06-15 EP0429670A1 1991-06-05 SAKURAMOTO, Takafumi Nitto Denko Corporation; TOMINAGA, Takashi Nitto Denko Corporation; ASHIDA, Megumi Nitto Denko Corporation

A method of producing a fired pattern by firing a firing pattern bonded to an object via an inorganic powder sheet formed by binding inorganic powders of glass, ceramic, etc., with the use of a resin binder, wherein said sheet is bonded to said object by applying heat and/or pressure thereto or with the use of a pressure-sensitive adhesive.

198 파장 변환 부재 및 발광 디바이스 KR20177035813 2016-09-02 KR20180052560A 2018-05-18 FURUYAMA TADAHITO; FUJITA SHUNSUKE
형광체층과기판의계면에발생하는응력변형을저감시키고, 사용시에잘 파손되지않는파장변환부재를제공한다. 기판 (10) 과, 유리매트릭스 (21) 중에무기형광체분말 (22) 이분산되어이루어지는형광체층 (20) 이접합되어이루어지는파장변환부재 (1). 30 ℃∼ 형광체층 (20) 의고착점의온도범위에있어서, 기판 (10) 의열팽창계수를α1, 형광체층 (20) 의열팽창계수를α2 로한 경우, -10 × 10≤α- α≤ 10 × 10(/℃) 의관계를만족시키는것을특징으로한다. 단, 고착점 = Tf - (Tf - Tg)/3 (Tg:유리전이점, Tf:굴복점)
199 탄소 세라믹 브레이크 디스크 및 이를 제조하는 방법 KR1020150065685 2015-05-12 KR1020160133580A 2016-11-23 임동원; 최연호; 유강; 이남철
본발명에따른탄소세라믹브레이크디스크는, 냉각채널이중심부에형성된지지층; 및상기지지층의상하면에접착층없이직접결합되며, 상기지지층과다른성분을가진마찰층;을포함하며, 상기지지층은상기냉각채널을중심으로상기마찰층으로향해갈수록, 단계적으로상기마찰층의성분과비슷한성분을가지는복수개의층으로구성된것을특징으로한다.
200 핸들 기판, 반도체용 복합 기판, 반도체 회로 기판 및 그 제조 방법 KR1020157021527 2014-12-16 KR1020150097812A 2015-08-26 미야자와스기오; 이와사키야스노리; 다카가키다츠로; 이데아키요시; 나카니시히로카즈
반도체용 복합 기판의 핸들 기판(2A)이 다결정 투광성 알루미나로 이루어지고, 다결정 투광성 알루미나의 알루미나 순도가 99.9% 이상이며, 다결정 투광성 알루미나의 200 ㎚∼400 ㎚의 파장 범위에 있어서의 전방 전체 광선 투과율의 평균값이 60% 이상이고, 다결정 투광성 알루미나의 200 ㎚∼400 ㎚의 파장 범위에 있어서의 직선 투과율의 평균값이 15% 이하이다.
QQ群二维码
意见反馈