| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 181 | Glass substrate assembly, semiconductor device and method of heat-treating glass substrate | US462773 | 1995-06-05 | US5929487A | 1999-07-27 | Takeshi Fukada; Mitsunori Sakama; Satoshi Teramoto |
| Improved method of heat-treating a glass substrate, especially where the substrate is thermally treated (such as formation of films, growth of films, and oxidation) around or above its strain point. If devices generating heat are formed on the substrate, it dissipates the heat well. An aluminum nitride film is formed on at least one surface of the substrate. This aluminum nitride film acts as a heat sink and prevents local concentration of heat produced by the devices such as TFTs formed on the glass substrate surface. | ||||||
| 182 | Method of heat-treating a glass substrate | US311275 | 1994-09-23 | US5674304A | 1997-10-07 | Takeshi Fukada; Mitsunori Sakama; Satoshi Teramoto |
| A method of heat-treating a glass substrate where the substrate is thermally treated (such as the formation of films, growth of films, and oxidation) around or above its strain point. After thermally treating the substrate around or above its strain point the glass substrate may be slowly cooled at a rate of 0.01.degree. to 0.5.degree. C./min to achieve maximum shrinkage of the substrate. Following further thermal treatments the substrate may be quickly cooled at a rate of 10.degree. C./min to 300.degree. C./sec to suppress shrinkage of the glass substrate. The substrate can have films such as aluminum nitrate films, silicon oxide films, silicon films, insulating films, semiconductor films, etc. Film formation can occur either before or after thermal treatment of the substrate around or above its strain point and before further thermal treatments. | ||||||
| 183 | Doped silica-titania glass having low expansivity and methods of making the same | US14950374 | 2015-11-24 | US10017413B2 | 2018-07-10 | Sezhian Annamalai; Carlos Alberto Duran; Kenneth Edward Hrdina; Lisa Anne Moore |
| A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article. | ||||||
| 184 | HEATING DEVICE | US15793268 | 2017-10-25 | US20180122658A1 | 2018-05-03 | Noriaki TOKUSHO |
| A heating device includes a base body that has a placement surface for placing a wafer thereon and a back surface that is on an opposite side of the placement surface; a heating resistor that is embedded in the base body; a cylindrical supporting body that has one end surface and the other end surface, the one end surface being connected to the back surface of the base body, the other end surface being on an opposite side of the one end surface; and a supporting-body channel that includes a portion extending in a direction from the other end surface to the one end surface of the cylindrical supporting body, and that is formed within a peripheral wall of the cylindrical supporting body. The supporting-body channel includes an opening portion that opens inwardly from an outer peripheral surface of the cylindrical supporting body. | ||||||
| 185 | Method for producing sheets of glass phosphor | US15164319 | 2016-05-25 | US09850158B2 | 2017-12-26 | Chih-Feng Wang; Yung-Peng Chang; Kuo-Yin Huang; Hsin-An Chen; Wei-Chih Cheng |
| A method for producing sheets of glass phosphor, including following steps of: taking glass powder, phosphor powder and a bonding agent to mix to form a mixture, wherein the glass powder and the phosphor powder are mixed first, and then the glass powder and the phosphor powder are mixed with the bonding agent; compressing the mixture to form a tablet; sintering the tablet to form a glass phosphor body; cutting the glass phosphor body to form at least one sheet body. | ||||||
| 186 | ULTRALOW EXPANSION TITANIA-SILICA GLASS | US15686313 | 2017-08-25 | US20170349478A1 | 2017-12-07 | Sezhian Annamalai; Carlos Alberto Duran; Kenneth Edward Hrdina; William Rogers Rosch |
| Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier. | ||||||
| 187 | ULTRALOW EXPANSION GLASS | US15661303 | 2017-07-27 | US20170349475A1 | 2017-12-07 | Carlos Alberto Duran |
| Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition. | ||||||
| 188 | Ultralow expansion titania-silica glass | US15003115 | 2016-01-21 | US09822030B2 | 2017-11-21 | Sezhian Annamalai; Carlos Alberto Duran; Kenneth Edward Hrdina; William Rogers Rosch |
| Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier. | ||||||
| 189 | GLASS MELT PRODUCTION DEVICE, GLASS MELT PRODUCTION METHOD, GLASS ARTICLE PRODUCTION DEVICE, AND GLASS ARTICLE PRODUCTION METHOD | US15449552 | 2017-03-03 | US20170174546A1 | 2017-06-22 | Hiroaki HAMAMOTO; Suguru KOBAYASHI; Michito SASAKI; Takashi KUBO; Wataru MIYOSHI; Kazuo NINOMIYA |
| A glass melt production apparatus, which comprises a melting vessel, a vacuum degassing apparatus, a first conducting pipe structure connecting the melting vessel and the vacuum degassing apparatus, and a second conducting pipe structure to introduce a glass melt to a forming means, provided downstream the vacuum degassing apparatus; the vacuum degassing apparatus having an uprising pipe through which the glass melt from the melting vessel ascends, a vacuum degassing vessel, and a downfalling pipe through which the glass melt from the vacuum degassing vessel descends; the flow path of the glass melt in the uprising pipe, the vacuum degassing vessel and the downfalling pipe being made of a refractory material; the first conducting pipe structure having an upstream pit to supply the glass melt to the uprising pipe; and the second conducting pipe structure having a downstream pit containing the glass melt from the downfalling pipe; the glass melt production apparatus further comprising a third conducting pipe structure connecting the upstream pit and the downstream pit; and the third conducting pipe structure having a closing means to shut off a flow of the glass melt in the third conducting pipe structure; the third conducting pipe structure or the closing means having a glass melt flow path for emergencies, which allows the glass melt to pass therethrough, depending on the height of a liquid level of the glass melt in the third conducting pipe structure in the vicinity of the closing means. | ||||||
| 190 | GLASS WITH IMPROVED TOTAL PITCH STABILITY | US15425214 | 2017-02-06 | US20170144918A1 | 2017-05-25 | Douglas Clippinger Allan; Bradley Frederick Bowden; Adam James Ellison; Timothy James Kiczenski; Marcel Potuzak |
| Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties. | ||||||
| 191 | ULTRALOW EXPANSION GLASS | US15291379 | 2016-10-12 | US20170029313A1 | 2017-02-02 | Carlos Alberto Duran |
| Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650°C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition. | ||||||
| 192 | Soda-Lime Glass from 100% Recycled Glass-Forming Materials | US15278511 | 2016-09-28 | US20170015582A1 | 2017-01-19 | Robert Brouwer |
| A glass food and beverage container constructed of 100 wt. % recycled glass-forming materials selected from the group consisting of post-industrial cullet, post-consumer cullet, and a combination thereof. | ||||||
| 193 | METHOD TO INCREASE THE STRENGTH OF A FORM BODY OF A LITHIUM SILICATE GLASS CERAMIC | US15160529 | 2016-05-20 | US20160340238A1 | 2016-11-24 | Lothar VÖLKL; Stefan FECHER |
| The invention relates to a method to increase the strength of a form body of lithium silicate glass ceramic, which after it has a desired end geometry and after the application of a material which influences its surface to form a coating, is subject to a heat treatment. To create a surface compressive stress through the replacement of lithium ions by alkali ions of greater diameter at least that region not covered by the application layer is covered by a melt or paste consisting of or containing a salt of an alkali metal with ions of greater diameter and the form body is in contact with the melt or paste for a period of time t at a temperature T and the melt or paste is subsequently removed from the form body. | ||||||
| 194 | METHOD TO INCREASE THE STRENGTH OF A FORM BODY OF A LITHIUM SILICATE GLASS CERAMIC | US15160432 | 2016-05-20 | US20160340237A1 | 2016-11-24 | Stefan FECHER; Lothar VÖLKL |
| The invention relates to a method to derive a medical form body of lithium silicate glass ceramic. To increase its strength it is proposed that in the form body comprising lithium silicate glass or containing lithium silicate glass the lithium ions are replaced by alkali ions of greater diameter to generate a surface compressive stress. To this end the form body is covered with a melt containing an alkali metal for which an aliquoted quantity of salt containing the alkali metal is used. | ||||||
| 195 | Heat treatment method for synthetic quartz glass | US13945631 | 2013-07-18 | US09409812B2 | 2016-08-09 | Shigeo Harada |
| [Problem]The provision of a synthetic quartz glass heat treatment method that can, by a single heat treatment, and without particular limitations on the OH group concentration distribution of the starting material, regulate the birefringence fast axis direction in the synthetic quartz glass after it has been heat-treated.[Means of overcoming the problem]A heat treatment method for synthetic quartz glass whereby columnar synthetic quartz glass having two opposing end faces and a lateral face is heat-treated covered with thermal insulator; wherein said heat treatment is performed using as end face thermal insulator which covers said two end faces, and as lateral face thermal insulator which covers said lateral face, thermal insulators that differ in at least either type or thickness to afford different thermal insulation effects such that the birefringence fast axis direction of said synthetic quartz glass is regulated. | ||||||
| 196 | DOPED SILICA-TITANIA GLASS HAVING LOW EXPANSIVITY AND METHODS OF MAKING THE SAME | US14950374 | 2015-11-24 | US20160145147A1 | 2016-05-26 | Sezhian Annamalai; Carlos Alberto Duran; Kenneth Edward Hrdina; Lisa Anne Moore |
| A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article. | ||||||
| 197 | Optical apparatus and method of forming a gradient index device | US14172175 | 2014-02-04 | US09340446B1 | 2016-05-17 | Clara Rivero Baleine; Theresa S. Mayer; Jonathan David Musgraves; Kathleen Richardson; Peter Wachtel |
| A refractive index device and method of making it include obtaining a glass structure comprising a plurality of nucleation sites. The glass structure is formed from a glass composition that comprises a first chemical component and a second chemical component. A crystal of the second chemical component has a different second refractive index from a first refractive index of the first chemical component. Each nucleation site defines where a crystal of the second chemical component can be grown. The method includes causing crystals of the second chemical component to grow in situ at a set of the plurality of nucleation sites in order to produce a spatial gradient of a refractive index in the glass structure. | ||||||
| 198 | Soda-Lime Glass from 100% Recycled Glass-Forming Materials | US14089066 | 2013-11-25 | US20150147497A1 | 2015-05-28 | Robert Brouwer |
| A method of making soda-lime glass using 100 wt % cullet as the glass forming materials is disclosed. Also disclosed is a soda-lime glass container made according to this method. | ||||||
| 199 | GLASS WITH IMPROVED TOTAL PITCH STABILITY | US14134292 | 2013-12-19 | US20140179510A1 | 2014-06-26 | Douglas Clippinger Allan; Bradley Frederick Bowden; Adam James Ellison; Timothy James Kiczenski; Marcel Potuzak |
| Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties. | ||||||
| 200 | GLASS SUBSTRATE FOR FLAT PANEL DISPLAY AND METHOD FOR MANUFACTURING SAME | US13537906 | 2012-06-29 | US20130059718A1 | 2013-03-07 | Akihiro KOYAMA; Satoshi AMI; Manabu ICHIKAWA |
| A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass. | ||||||
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