| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 121 | FUSED QUARTZ TUBING FOR PHARMACEUTICAL PACKAGING AND METHODS FOR MAKING THE SAME | US14174439 | 2014-02-06 | US20150218047A1 | 2015-08-06 | Guangjun Xu; Robert Koch |
| A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom. | ||||||
| 122 | β-quartz glass-ceramics with a controlled transmission curve and a high iron oxide content; articles comprising said glass-ceramics, and precursor glasses | US14084826 | 2013-11-20 | US09051209B2 | 2015-06-09 | Isabelle Marie Melscoët-Chauvel; Marie Jacqueline Monique Comte; Emmanuel Raymond André Lecomte |
| β-quartz lithium aluminosilicate (LAS) glass-ceramics contain neither arsenic oxide nor antimony oxide, are fined with tin oxide and include vanadium oxide, chromium oxide and a high iron oxide content (>950 ppm), and have a controlled transmission curve. Articles such as cook-tops can be made from such glass-ceramics. | ||||||
| 123 | Black synthetic quartz glass with transparent layer and method for producing the same | US13614398 | 2012-09-13 | US09051203B2 | 2015-06-09 | Hiroyuki Watanabe; Takayuki Imaizumi; Tatsuhiro Sato |
| Provided in a facile manner are a black synthetic quartz glass with a transparent layer, which meets demands for various shapes, has a black portion satisfying required light shield property and emissivity in an infrared region, keeps a purity equivalent to that of a synthetic quartz glass in terms of metal impurities, has a high-temperature viscosity characteristic comparable to that of a natural quartz glass, can be subjected to high-temperature processing such as welding, does not release carbon from its surface, and is free of bubbles and foreign matter in the transparent layer and the black quartz glass, and at an interface between the transparent layer and the black quartz glass, and a production method therefor. | ||||||
| 124 | Atomizing method for producing synthetic quartz glass | US13684394 | 2012-11-23 | US08984911B2 | 2015-03-24 | Heinz Fabian; Juergen Roeper |
| The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: providing a liquid SiO2 feedstock material (105), which comprises more than 70% by wt. of the octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material (105) into a gaseous SiO2 feedstock vapor (107), converting the SiO2 feedstock vapor (107) into SiO2 particles, depositing the SiO2 particles on a deposition surface (160) while forming a SiO2 soot body (200), vitrifying the SiO2 soot body (200) while forming the synthetic quartz glass. According to the invention it is provided that vaporizing the heated SiO2 feedstock material (105) comprises an injection phase in an expansion chamber (125) in which the heated SiO2 feedstock material (105) is atomized into droplets, the droplets having a mean diameter of less than 5 pm, preferably less than 2 μm. | ||||||
| 125 | METHOD AND DEVICE FOR BONDING WORKPIECES EACH PRODUCED FROM GLASS SUBSTRATE OR QUARTZ SUBSTRATE | US14380746 | 2013-02-15 | US20150013388A1 | 2015-01-15 | Akira Kato; Kinichi Morita; Shinji Suzuki |
| Vacuum ultraviolet light with a wavelength of 200 nm or less is applied on the joining surfaces of first and second workpieces made from a crystal substrate and a glass substrate, or a glass substrate and a glass substrate from a light irradiation unit. The workpieces are conveyed to a workpiece cleaning and laminating mechanism by a conveyance mechanism, the joining surfaces are subjected to mega-sonic cleaning as needed, and the workpieces are aligned with the joining surfaces thereof facing each other, and laminated such that the joining surfaces are in contact with each other. After being laminated, the laminated workpieces are conveyed to a workpiece heating mechanism and heated to increase the workpiece temperature to a predetermined temperature, and this temperature is maintained until joining is completed. The laminated workpieces are brought into a thermally expanded state upon heating, and are joined in this state. | ||||||
| 126 | Sintering of fused silica to produce shaped bodies comprising crystalline SiO2 | US12014618 | 2008-01-15 | US08863552B2 | 2014-10-21 | Manfred Borens; Karsten von Westernhagen; Stefano Merolla; Gerald Wasem; Stefan Postrach |
| A process is disclosed for simple and rapid production of a shaped body comprising fused silica and a shaped body which leads to virtually no contamination of a melt in contact with the shaped body even at high temperatures. The disclosed process comprises the steps of: a) provision of fused silica in the form of essentially amorphous SiO2 grains of which not more than 5% have a diameter greater than 15 mm, b) addition of water to the fused silica grains to produce a slip, c) casting of the slip into a mold which comprises a hollow body having the inverse shape of the shaped body to be produced, and d) drying of the slip to give an intermediate body, which is then sintered and cooled. A shaped body producible in accordance with the aforementioned process is also disclosed, which comprises at least 99.0 mol % of SiO2. | ||||||
| 127 | EUV LITHOGRAPHY MEMBER, MAKING METHOD, AND TITANIA-DOPED QUARTZ GLASS | US14146182 | 2014-01-02 | US20140206524A1 | 2014-07-24 | Shigeru Maida; Hisatoshi Otsuka; Tetsuji Ueda; Masanobu Ezaki |
| A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography. | ||||||
| 128 | FREE-FORMED QUARTZ GLASS INGOTS AND METHOD FOR MAKING SAME | US14155460 | 2014-01-15 | US20140123705A1 | 2014-05-08 | Michael Peter Winnen; Todd R. Springer |
| A method to form quartz glass ingots of ultra low contamination and defect levels by firing a high-purity quartz form as the feedstock, wherein the quartz glass ingot is free-formed on a platen rotating concentrically with the feedstock quartz article. | ||||||
| 129 | WHITE, OPAQUE, ß-SPODUMENE/RUTILE GLASS-CERAMIC ARTICLES AND METHODS FOR MAKING THE SAME | US14068558 | 2013-10-31 | US20140057092A1 | 2014-02-27 | George Halsey Beall; Marie Jacqueline Monique Comte; George Owen Dale; Linda Ruth Pinckney; Charlene Marie Smith; Ronald Leroy Stewart; Steven Alvin Tietje |
| Crystallizable glasses, glass-ceramics, IXable glass-ceramics, and IX glass-ceramics are disclosed. The glass-ceramics exhibit β-spodumene ss as the predominant crystalline phase. These glasses and glass-ceramics, in mole %, include: 62-75 SiO2; 10.5-17 Al2O3; 5-13 Li2O; 0-4 ZnO; 0-8 MgO; 2-5 TiO2; 0-4 B2O3; 0-5 Na2O; 0-4 K2O; 0-2 ZrO2; 0-7 P2O5; 0-0.3 Fe2O3; 0-2 MnOx; and 0.05-0.2 SnO2. Additionally, these glasses and glass-ceramics exhibit the following criteria: a. a ratio: [ Li 2 O + Na 2 O + K 2 O + MgO + ZnO ] [ Al 2 O 3 + B 2 O 3 ] between 0.7 to 1.5; b. a ratio : [ TiO 2 + SnO 2 ] [ SiO 2 + B 2 O 3 ] greater than 0.04. Furthermore, the glass-ceramics exhibit an opacity ≧about 85% over the wavelength range of 400-700 nm for an about 0.8 mm thickness and colors an observer angle of 10° and a CIE illuminant F02 determined with specular reflectance included of a* between −3 and +3, b* between −6 and +6, and L* between 88 and 97. | ||||||
| 130 | WHITE, OPAQUE, ß-SPODUMENE/RUTILE GLASS-CERAMICS; ARTICLES COMPRISING THE SAME; AND METHODS FOR MAKING THE SAME | US13933600 | 2013-07-02 | US20130296155A1 | 2013-11-07 | George Halsey Beall; Marie Jacqueline Monique Comte; George Owen Dale; Linda Ruth Pinckney; Charlene Marie Smith; Ronald Leroy Stewart; Steven Alvin Tietje |
| Crystallizable glasses, glass-ceramics, IXable glass-ceramics, and IX glass-ceramics are disclosed. The glass-ceramics exhibit β-spodumene ss as the predominant crystalline phase. These glasses and glass-ceramics, in mole %, include: 62-75 SiO2; 10.5-17 Al2O3; 5-13 Li2O; 0-4 ZnO; 0-8 MgO; 2-5 TiO2; 0-4 B2O3; 0-5 Na2O; 0-4 K2O; 0-2 ZrO2; 0-7 P2O5; 0-0.3 Fe2O3; 0-2 MnOx; and 0.05-0.2 SnO2. Additionally, these glasses and glass-ceramics exhibit the following criteria: a. a ratio: [ Li 2 O + Na 2 O + K 2 O + MgO + ZnO _ ] [ Al 2 O 3 + B 2 O 3 ] between 0.7 to 1.5; b. a ratio: [ TiO 2 + SnO 2 _ ] [ SiO 2 + B 2 O 3 ] greater than 0.04. Furthermore, the glass-ceramics exhibit an opacity≧about 85% over the wavelength range of 400-700 nm for an about 0.8 mm thickness and colors an observer angle of 10° and a CIE illuminant F02 determined with specular reflectance included of a* between −3 and +3, b* between −6 and +6, and L* between 88 and 97. | ||||||
| 131 | Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device | US13016645 | 2011-01-28 | US08455158B2 | 2013-06-04 | Masaru Tanabe |
| In a simulation step, based on information of a main surface shape of a transparent substrate and shape information of a mask stage of an exposure apparatus and using a deflection differential equation taking into account a twist deformation, height information at a plurality of measurement points is obtained by simulating a state where the transparent substrate is set in the exposure apparatus. Based on the height information obtained through the simulation, a flatness of the transparent substrate when it is set in the exposure apparatus is calculated in a flatness calculation step. Then, by judging in a selection step whether or not the calculated flatness satisfies a specification, the transparent substrate whose flatness satisfies the specification is used as a substrate for a mask blank. | ||||||
| 132 | Method of making silica-glass granule from pyrogenic silica powder | US12667696 | 2008-06-04 | US08209999B2 | 2012-07-03 | Kai Schumacher; Christian Schulze-Isfort; Paul Brandl; Mitsuru Ochiai |
| Silica glass granule having the following features: Area:100 to 5000 μm2, ECD:5 to 100μm, Circumference:20 to 400μm, Maximum diameter:10 to 140μm, Minimum diameter:5 to 80μm, where all values are medium values, Specific BET surface area:<1m2/g Impurities:<50ppm It is prepared by a) compacting pyrogenic silicon dioxide powder with a tamped density of 15 to 190 g/l to slugs, b) subsequently crushing them and removing slug fragments with a diameter of <100 μm and >800 μm, c) the slug fragments having a tamped density of 300 to 600 g/l, and d) subsequently treating them at 600 to 1100° C. in an atmosphere which comprises one or more compounds which are suitable for removing hydroxyl groups, and e) then sintering them at 1200° C. to 1400° C. | ||||||
| 133 | COMPOSITE SHAPED BODY AND SILICA GLASS, AND METHOD FOR PRODUCING THE SAME | US13382005 | 2010-07-07 | US20120107589A1 | 2012-05-03 | Shigeru Fujino; Hiroshi Ikeda; Seiji Inaba; Toshihisa Kajiwara |
| The present invention provides a composite shaped body comprising silica nanoparticles and an organic polymer, wherein the silica nanoparticles and the organic polymer form a three-dimensional network; thereby provides: a composite shaped body which exhibits excellent formability and fabricability and which is also suited for use, for example, in producing a silica glass provided with an electrical conductivity; and a silica glass (especially, an electrically conductive silica glass) obtained by firing the composite shaped body. | ||||||
| 134 | OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICONDUCTOR SUBSTRATES | US12797196 | 2010-06-09 | US20110306213A1 | 2011-12-15 | Yen-Kun Victor Wang; Shang-I Chou; Jason Augustino |
| A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber. | ||||||
| 135 | Component of quartz glass for use in semiconductor manufacture and method for producing the same | US12226861 | 2007-09-04 | US08017536B2 | 2011-09-13 | Juergen Weber; Tatsuhiro Sato; Ralf Schneider; Achim Hofmann; Christian Gebauer |
| The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm. | ||||||
| 136 | METHOD OF MANUFACTURING A SUBSTRATE FOR A MASK BLANK, METHOD OF MANUFACTURING A MASK BLANK, METHOD OF MANUFACTURING A TRANSFER MASK , AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | US13016645 | 2011-01-28 | US20110189595A1 | 2011-08-04 | Masaru TANABE |
| In a simulation step, based on information of a main surface shape of a transparent substrate and shape information of a mask stage of an exposure apparatus and using a deflection differential equation taking into account a twist deformation, height information at a plurality of measurement points is obtained by simulating a state where the transparent substrate is set in the exposure apparatus. Based on the height information obtained through the simulation, a flatness of the transparent substrate when it is set in the exposure apparatus is calculated in a flatness calculation step. Then, by judging in a selection step whether or not the calculated flatness satisfies a specification, the transparent substrate whose flatness satisfies the specification is used as a substrate for a mask blank. | ||||||
| 137 | Silica microspheres, method for making and assembling same and possible uses of silica microspheres | US11662656 | 2005-09-19 | US07927670B2 | 2011-04-19 | Sylvain Rakotoarison |
| The invention concerns silica microspheres (M) having an outer diameter between 50 and 125 μm, preferably between 60 and 90 μm, a wall thickness not less than 1 μm, preferably between 1 and 3 μm and a density between 0.3 and 0.7/cm3, a manufacturing method by injecting silica microsphere precursors (MS, PR1, PR1′, PR2′) into an inductive plasma (P), assembly methods and possible uses of silica microspheres. | ||||||
| 138 | Process for producing silica glass product | US11795567 | 2006-02-09 | US07790078B2 | 2010-09-07 | Hiroyuki Watanabe; Akira Fujinoki; Takayuki Imaizumi; Kazuhisa Hayakawa; Shingo Niinobe |
| A process for producing a transparent or opaque silica glass product including mixing a silica fine powder and a cellulose derivative and injection molding the mixture, followed by degreasing treatment and baking treatment, which is characterized in that the cellulose derivative is a cellulose derivative which causes reversible thermal gelation in an aqueous solution of at least one member selected from methyl cellulose, hydroxypropylmethyl cellulose and hydroxyethylmethyl cellulose; in producing a transparent silica glass product, the cellulose derivative is added in water heated at a gelation temperature thereof or higher, and after cooling, the formed aqueous solution is kneaded with the silica fine powder; and in producing an opaque silica glass product, the cellulose derivative is added in a silica slurry containing a silica powder and heated at a gelation temperature of the cellulose derivative or higher. | ||||||
| 139 | METHOD FOR THE PRODUCTION OF A COMPOSITE BODY FROM A BASIC BODY OF OPAQUE QUARTZ GLASS AND A TIGHT SEALING LAYER | US12452413 | 2008-06-18 | US20100115996A1 | 2010-05-13 | Waltraud Werdecker; Johann Leist |
| To optimize a known method for producing a composite body from a basic body of opaque quartz glass and a dense sealing layer, in such a way that the basic body can be provided with the dense sealing layer without any significant changes and deformations in the opaque material being noticed, the invention suggests a method comprising the following steps: (a) producing the basic body by using a first slip which contains larger amorphous SiO2 particles; (b) providing a second slip which contains smaller amorphous SiO2 particles and the composition of which differs from that of the first slip at least in that it contains SiO2 nanoparticles in the range between 0.2% by wt. to 15% by wt. and which is distinguished by a relatively low vitrification temperature; (d) producing a slip layer from the second slip on a surface of the basic body, drying the slip layer, and (e) subsequently vitrifying the slip layer with formation of the dense sealing layer. | ||||||
| 140 | Quartz glass having excellent resistance against plasma corrosion and method for producing the same | US12003353 | 2007-12-21 | US07661277B2 | 2010-02-16 | Tatsuhiro Sato; Nobumasa Yoshida; Mamoru Endo |
| As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less. | ||||||
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