| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 181 | Synthetic amorphous silica powder and method for producing same | US14004551 | 2012-02-29 | US09446959B2 | 2016-09-20 | Toshiaki Ueda |
| The synthetic amorphous silica powder of the present invention is obtained by applying a spheroidizing treatment to a granulated silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of greater than 1.35 and not more than 1.75 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.50 to 0.75; and an unmolten ratio of greater than 0.25 and not more than 0.60. | ||||||
| 182 | Method for producing synthetic quartz glass granules | US14390991 | 2013-03-20 | US09409810B2 | 2016-08-09 | Walter Lehmann; Thomas Kayser |
| The production of quartz glass granules comprises the granulation of pyrogenically produced silicic acid and the formation of a SiO2 granulate (9), the drying and cleaning of the SiO2 granulate (9) by heating in an atmosphere containing halogen, and the vitrification of the SiO2 granulate (9) under a treatment gas which contains at least 30% by volume of helium and/or hydrogen. This process is time-consuming and expensive. In order to provide a method which, starting from a porous SiO2 granulate (9), allows the cost-effective production of dense, synthetic quartz glass granules suitable for melting bubble-free components of quartz glass, the invention proposes that the cleaning and vitrification of the SiO2 granulate (9) and a post-treatment of the vitrified quartz glass granules are carried out in each case in a rotary tube (6) of a rotary kiln (1), said rotary tube rotating about a central axis (7), wherein the rotary tube (6) comprises an inner wall made of a ceramic material during vitrification, and wherein the vitrified quartz glass granules are subjected to a post-treatment during a treatment period of at least 10 minutes in an atmosphere which contains less than 20% of helium or hydrogen at a treatment temperature of 300° C. or more. | ||||||
| 183 | Quartz glass crucible, method for producing the same, and method for producing silicon single crystal | US13824874 | 2011-09-26 | US09376336B2 | 2016-06-28 | Akihiro Kimura; Suguru Matsumoto; Izumi Fusegawa; Katsuhiko Miki |
| Described herein is a method for producing a quartz glass crucible, including the steps of: preparing a crucible base material that is made of quartz glass and has a crucible shape; producing a synthetic quartz glass material by the direct process or the soot process; processing the synthetic quartz glass material into a crucible shape without pulverizing the synthetic quartz glass material; and welding the synthetic quartz glass material processed into the crucible shape to the inner surface of the crucible base material. As a result, there are provided a quartz glass crucible that avoids generation of dislocation in a silicon single crystal, the generation of dislocation caused by the crucible itself, at the time of production of a silicon single crystal and has high heat resistance, a method for producing the quartz glass crucible, and a method for producing a silicon single crystal, the method using such a quartz glass crucible. | ||||||
| 184 | EUV lithography member, making method, and titania-doped quartz glass | US14146182 | 2014-01-02 | US09278881B2 | 2016-03-08 | Shigeru Maida; Hisatoshi Otsuka; Tetsuji Ueda; Masanobu Ezaki |
| A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography. | ||||||
| 185 | COLORED AND OPAQUE GLASS CERAMIC(S), ASSOCIATED COLORABLE AND CERAMABLE GLASS(ES), AND ASSOCIATED PROCESS(ES) | US14801278 | 2015-07-16 | US20150321947A1 | 2015-11-12 | George Halsey Beall; Matthew John Dejneka; Sinue Gomez; Charlene Marie Smith; Steven Alvin Tietje |
| Disclosed herein are glass-ceramics having crystalline phases including β-spodumene ss and either (i) pseudobrookite or (ii) vanadium or vanadium containing compounds so as to be colored and opaque glass-ceramics having coordinates, determined from total reflectance—specular included—measurements, in the CIELAB color space of the following ranges: L*=from about 20 to about 45; a*=from about −2 to about +2; and b*=from about −12 to about +1. Such CIELAB color space coordinates can be substantially uniform throughout the glass-ceramics. In each of the proceeding, β-quartz ss can be substantially absent from the crystalline phases. If present, β-quartz ss can be less than about 20 wt % or, alternatively, less than about 15 wt % of the crystalline phases. Also Further crystalline phases might include spinel ss (e.g., hercynite and/or gahnite-hercynite ss), rutile, magnesium zinc phosphate, or spinel ss (e.g., hercynite and/or gahnite-hercynite ss) and rutile. | ||||||
| 186 | METHOD FOR PRODUCING A COATED COMPONENT OF TRANSPARENT OR OPAQUE FUSED SILICA | US14543718 | 2014-11-17 | US20150143848A1 | 2015-05-28 | Christian Schenk; Gerrit Scheich; Nils-Christian Nielsen |
| A method for producing a coated component consisting of transparent or opaque fused silica comprises a method step in which a SiO2 granulation layer is applied to a coating surface of a substrate, which in the area of the free surface has a relatively great granulation fine fraction. Starting from this, in order to achieve a smooth, preferably also dense surface layer, it is suggested according to the invention that the application of the SiO2 granulation layer comprises (i) providing a dispersion containing a dispersion liquid and amorphous SiO2 particles which form a coarse fraction with particle sizes ranging between 1 μm and 50 μm and a fine fraction of SiO2 nanoparticles having particle sizes of less than 100 nm, wherein the solids content of the dispersion is between 70 and 80 wt.-%, and of which between 2 wt.-% and 15 wt.-% are the SiO2 nanoparticles, (ii) applying the dispersion to the coating surface by casting or spraying it thereonto so as to form a slurry layer having a layer thickness of at least 0.3 mm; and (iii) drying the slurry layer by removing the dispersion liquid at a rate and in a direction such that under the action of the dispersion liquid being removed the fine fraction is enriched in the outer portion of the granulation layer, thereby forming a casting skin. | ||||||
| 187 | METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS GRANULES | US14390991 | 2013-03-20 | US20150059407A1 | 2015-03-05 | Walter Lehmann; Thomas Kayser |
| The production of quartz glass granules comprises the granulation of pyrogenically produced silicic acid and the formation of a SiO2 granulate (9), the drying and cleaning of the SiO2 granulate (9) by heating in an atmosphere containing halogen, and the vitrification of the SiO2 granulate (9) under a treatment gas which contains at least 30% by volume of helium and/or hydrogen. This process is time-consuming and expensive. In order to provide a method which, starting from a porous SiO2 granulate (9), allows the cost-effective production of dense, synthetic quartz glass granules suitable for melting bubble-free components of quartz glass, the invention proposes that the cleaning and vitrification of the SiO2 granulate (9) and a post-treatment of the vitrified quartz glass granules are carried out in each case in a rotary tube (6) of a rotary kiln (1), said rotary tube rotating about a central axis (7), wherein the rotary tube (6) comprises an inner wall made of a ceramic material during vitrification, and wherein the vitrified quartz glass granules are subjected to a post-treatment during a treatment period of at least 10 minutes in an atmosphere which contains less than 20% of helium or hydrogen at a treatment temperature of 300° C. or more. | ||||||
| 188 | METHOD FOR PRODUCING A MOLDED BODY FROM AN ELECTRICALLY MELTED SYNTHETIC QUARTZ GLASS | US14391005 | 2013-03-26 | US20150052948A1 | 2015-02-26 | Walter Lehmann; Thomas Kayser; Martin Arndt; Achim Hofmann |
| In a known method for producing a mold body from synthetic quartz glass, quartz glass granules (15) are heated in an electrically heated melt container (31) to form a softened quartz glass mass (57), and the softened quartz glass mass (57) is formed to the mold body. In order to achieve an advantageous melting behavior also in continuous melting processes, it is proposed according to the invention that synthetically produced quartz glass granules (15) of granular particles are used in which helium is enclosed, wherein said quartz glass granules (15) are produced by granulating pyrogenically produced silicic acid with the formation of a SiO2 granulate (9) and subsequent vitrification of the SiO2 granulate in a rotary kiln (1), which has a rotary tube (6) which is at least partially made of a ceramic material, and under a treatment gas that contains at least 30% by volume of helium. | ||||||
| 189 | BETA-QUARTZ GLASS-CERAMICS WITH A CONTROLLED TRANSMISSION CURVE AND A HIGH IRON OXIDE CONTENT; ARTICLES COMPRISING SAID GLASS-CERAMICS, AND PRECURSOR GLASSES | US14084826 | 2013-11-20 | US20140141959A1 | 2014-05-22 | Isabelle Marie Melscoët-Chauvel; Marie Jacqueline Monique Comte; Emmanuel Raymond André Lecomte |
| β-quartz lithium aluminosilicate (LAS) glass-ceramics contain neither arsenic oxide nor antimony oxide, are fined with tin oxide and include vanadium oxide, chromium oxide and a high iron oxide content (>950 ppm), and have a controlled transmission curve. Articles such as cook-tops can be made from such glass-ceramics. | ||||||
| 190 | BLACK SYNTHETIC QUARTZ GLASS WITH TRANSPARENT LAYER AND METHOD FOR PRODUCING THE SAME | US13614398 | 2012-09-13 | US20140072811A1 | 2014-03-13 | Hiroyuki WATANABE; Takayuki Imaizumi; Tatsuhiro Sato |
| Provided in a facile manner are a black synthetic quartz glass with a transparent layer, which meets demands for various shapes, has a black portion satisfying required light shield property and emissivity in an infrared region, keeps a purity equivalent to that of a synthetic quartz glass in terms of metal impurities, has a high-temperature viscosity characteristic comparable to that of a natural quartz glass, can be subjected to high-temperature processing such as welding, does not release carbon from its surface, and is free of bubbles and foreign matter in the transparent layer and the black quartz glass, and at an interface between the transparent layer and the black quartz glass, and a production method therefor. | ||||||
| 191 | White, opaque, β-spodumene/rutile glass-ceramics; articles comprising the same; and methods for making the same | US13933600 | 2013-07-02 | US08664131B2 | 2014-03-04 | George Halsey Beall; Marie Jacqueline Monique Comte; George Owen Dale; Linda Ruth Pinckney; Charlene Marie Smith; Ronald Leroy Stewart; Steven Alvin Tietje |
| Crystallizable glasses, glass-ceramics, IXable glass-ceramics, and IX glass-ceramics are disclosed. The glass-ceramics exhibit β-spodumene ss as the predominant crystalline phase. These glasses and glass-ceramics, in mole %, include: 62-75 SiO2; 10.5-17 Al2O3; 5-13 Li3O; 0-4 ZnO; 0-8 MgO; 2-5 TiO2; 0-4 B2O3; 0-5 Na2O; 0-4 K2O; 0-2 ZrO2; 0-7 P2O5; 0-0.3 Fe2O3; 0-2 MnOx; and 0.05-0.2 SnO2. Additionally, these glasses and glass-ceramics exhibit the following criteria: a. a ratio: [ Li 2 O + Na 2 O + K 2 O + MgO + ZnO _ ] [ Al 2 O 3 + B 2 O 3 ] between 0.7 to 1.5; b. a ratio: [ TiO 2 + SnO 2 _ ] [ SiO 2 + B 2 O 3 ] greater than 0.04. Furthermore, the glass-ceramics exhibit an opacity ≧about 85% over the wavelength range of 400-700 nm for an about 0.8 mm thickness and colors an observer angle of 10° and a CIE illuminant F02 determined with specular reflectance included of a* between −3 and +3, b* between −6 and +6, and L* between 88 and 97. | ||||||
| 192 | NANOIMPRINT MOLD-FORMING SYNTHETIC QUARTZ GLASS AND MAKING METHOD | US13932685 | 2013-07-01 | US20140018229A1 | 2014-01-16 | Shigeru Maida; Hisatoshi Otsuka |
| Synthetic quartz glass is prepared by subjecting a silicon-providing feedstock to flame hydrolysis in oxyhydrogen flame, depositing silica fine particles on a rotating quartz glass target while concurrently melting and vitrifying them, thereby forming a synthetic quartz glass ingot, shaping, annealing, and effecting dehydrogenation treatment at a temperature of at least 600° C. and a pressure of up to 5 Pa for a holding time of at least 12 hours. The synthetic quartz glass has a high helium gas permeability and is suited for forming nanoimprint molds. | ||||||
| 193 | Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates | US13923920 | 2013-06-21 | US08624210B2 | 2014-01-07 | Yen-Kun Victor Wang; Shang-I Chou; Jason Autustino |
| A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber. | ||||||
| 194 | OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICONDUCTOR SUBSTRATES | US13923920 | 2013-06-21 | US20130288488A1 | 2013-10-31 | Yen-Kun Victor Wang; Shang-I Chou; Jason Augustino |
| A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber. | ||||||
| 195 | WHITE, OPAQUE BETA-SPODUMENE/RUTILE GLASS-CERAMIC ARTICLES AND METHODS FOR MAKING THE SAME | US13837863 | 2013-03-15 | US20130274085A1 | 2013-10-17 | George Halsey Beall; Marie Jacqueline Monique Comte; George Owen Dale; Linda Ruth Pinckney; Charlene Marie Smith; Ronald Leroy Stewart; Steven Alvin Tietje |
| Crystallizable glasses, glass-ceramics, IXable glass-ceramics, and IX glass-ceramics are disclosed. The glass-ceramics exhibit β-spodumene ss as the predominant crystalline phase. These glasses and glass-ceramics, in mole %, include: 62-75 SiO2; 10.5-17 Al2O3; 5-13 Li2O; 0-4 ZnO; 0-8 MgO; 2-5 TiO2; 0-4 B2O3; 0-5 Na2O; 0-4 K2O; 0-2 ZrO2; 0-7 P2O5; 0-0.3 Fe2O3; 0-2 MnOx; and 0.05-0.2 SnO2. Additionally, these glasses and glass-ceramics exhibit the following criteria: a. a ratio: [ Li 2 O + Na 2 O + K 2 O + MgO + ZnO ] [ Al 2 O 3 + B 2 O 3 ] between 0.7 to 1.5; b. a ratio: [ TiO 2 + SnO 2 ] [ SiO 2 + B 2 O 3 ] greater than 0.04. Furthermore, the glass-ceramics exhibit an opacity ≧about 85% over the wavelength range of 400-700 nm for an about 0.8 mm thickness and colors an observer angle of 10° and a CIE illuminant F02 determined with specular reflectance included of a* between −3 and +3, b* between −6 and +6, and L* between 88 and 97. | ||||||
| 196 | METHOD FOR PRODUCING DOPED QUARTZ GLASS | US13761657 | 2013-02-07 | US20130205832A1 | 2013-08-15 | Junko MIYASAKA; Tomonori Ogawa |
| The present invention relates to a method for producing a doped quartz glass, containing: a raw material gas-forming step of vaporizing a liquid raw material containing a silicon compound and a sublimable organic metal compound to form a raw material gas, and a glass fine particle-forming step of feeding the raw material gas to oxyhydrogen flame and reacting the gas in the flame to form a glass fine particle. | ||||||
| 197 | QUARTZ GLASS CRUCIBLE, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING SILICON SINGLE CRYSTAL | US13824874 | 2011-09-26 | US20130174777A1 | 2013-07-11 | Akihiro Kimura; Suguru Matsumoto; Izumi Fusegawa; Katsuhiko Miki |
| Described herein is a method for producing a quartz glass crucible, including the steps of: preparing a crucible base material that is made of quartz glass and has a crucible shape; producing a synthetic quartz glass material by the direct process or the soot process; processing the synthetic quartz glass material into a crucible shape without pulverizing the synthetic quartz glass material; and welding the synthetic quartz glass material processed into the crucible shape to the inner surface of the crucible base material. As a result, there are provided a quartz glass crucible that avoids generation of dislocation in a silicon single crystal, the generation of dislocation caused by the crucible itself, at the time of production of a silicon single crystal and has high heat resistance, a method for producing the quartz glass crucible, and a method for producing a silicon single crystal, the method using such a quartz glass crucible. | ||||||
| 198 | ATOMIZING METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS | US13684394 | 2012-11-23 | US20130133376A1 | 2013-05-30 | Heinz Fabian; Juergen Roeper |
| The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: (A) providing a liquid SiO2 feedstock material (105), which comprises more than 70% by wt. of the polyalkylsiloxane D4, (B) vaporizing the SiO2 feedstock material (105) into a gaseous SiO2 feedstock vapor (107), (C) converting the SiO2 feedstock vapor (107) into SiO2 particles, (D) depositing the SiO2 particles on a deposition surface (160) while forming a SiO2 soot body (200), (E) vitrifying the SiO2 soot body (200) while forming the synthetic quartz glass, According to the invention it is provided that vaporizing the heated SiO2 feedstock material (105) comprises an injection phase in an expansion chamber (125) in which the SiO2 feedstock material (105) is atomized into fine droplets, the droplets having a mean diameter of less than 5 μm, preferably less than 2 μm. | ||||||
| 199 | QUARTZ GLASS BODY AND A METHOD AND GEL BODY FOR PRODUCING A QUARTZ GLASS BODY | US13687337 | 2012-11-28 | US20130085056A1 | 2013-04-04 | Thomas KREUZBERGER |
| A method for producing a quartz glass body from a get body is provided, wherein the gel body generated from a colloidal suspension is at least formed and compressed into the quartz glass body Displacement bodies are added to the colloidal suspension prior to gelating into the gel body, and are completely removed from the gel body after gelating, wherein hollow spaces are generated at the positions of the removed displacement bodies, so that a translucent or opaque quartz glass body is generated. Further, a gel body for producing a quartz glass body is provided, wherein displacement bodies are introduced into the gel body that can be completely removed from the gel body, so that hollow spaces arise at the positions of the displacement bodies. A quartz glass body is also provided that includes vacuoles or hollow spaces filled with gas. | ||||||
| 200 | Method for the production of a composite body from a basic body of opaque quartz glass and a tight sealing layer | US12452413 | 2008-06-18 | US08408027B2 | 2013-04-02 | Waltraud Werdecker; Johann Leist |
| To optimize a known method for producing a composite body from a basic body of opaque quartz glass and a dense sealing layer, in such a way that the basic body can be provided with the dense sealing layer without any significant changes and deformations in the opaque material being noticed, the invention suggests a method comprising the following steps: (a) producing the basic body by using a first slip which contains larger amorphous SiO2 particles; (b) providing a second slip which contains smaller amorphous SiO2 particles and the composition of which differs from that of the first slip at least in that it contains SiO2 nanoparticles in the range between 0.2% by wt. to 15% by wt. and which is distinguished by a relatively low vitrification temperature; (d) producing a slip layer from the second slip on a surface of the basic body, drying the slip layer, and (e) subsequently vitrifying the slip layer with formation of the dense sealing layer. | ||||||
QQ群二维码
意见反馈
意见反馈