| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 161 | Apparatus for manufacturing stria-free, bubble-free and homogeneous quartz-glass plates | US848352 | 1986-04-04 | US4666495A | 1987-05-19 | Karl Kreutzer; Fritz Simmat |
| A method of manufacturing practically stria-free, bubble-free, and homogeneous quartz-glass plates of any desired configuration and with a surface area that exceeds the cross-section of the full circular quartz-glass cylinder that is employed as a starting material. The cylinder is continuously lowered into a furnace shell flooded with an inert gas, in which it is heated to a flowing temperature in the range of 1700.degree. to 1900.degree. C. until some of the quartz-glass flows off into a graphite crucible. The crucible is preferably clad with zirconium-oxide. | ||||||
| 162 | Method for producing articles of high-purity synthetic quartz glass | US567086 | 1983-12-30 | US4572729A | 1986-02-25 | Winfried Lang; Rudolf Griesshammer; Michael Schwab; Werner Zulehner |
| A method is described according to which articles of quartz glass, particrly quartz crucibles for use in crucible pulling according to Czochralski of high-purity synthetic quartz glass can be produced. High-purity silicon tetrachloride is hydrolized with water. The hydrolysis product is separated, dried, shaped, sintered and superficially fused. | ||||||
| 163 | Composite tubular body | US403398 | 1982-07-30 | US4530378A | 1985-07-23 | Manfred Boog; Werner Jakob |
| Tubular body of fused quartz and quartz glass with a seamless transition from the fused-quartz zone to the quartz-glass zone. The body is manufactured continuously in a hollow rotating metal cylinder by disposing silica against the rotating mold and adding thereto, such as in an annular zone therein, rock crystal or synthetic silicon dioxide and fusing the rock crystal or synthetic silicon dioxide to the fused silica whereby no seam is formed. | ||||||
| 164 | Bell of translucent fused silica for the precipitation of polysilicon | US331938 | 1981-12-17 | US4397897A | 1983-08-09 | Karl A. Schulke |
| Bell of translucent fused silica having an inner layer of transparent fused silica for the precipitation of polysilicon. The thickness of the transparent fused silica layer increases continuously towards the open end of the bell while the total wall thickness of the bell is kept constant. The thickness increase of the transparent fused silica layer begins preferably beyond the center of the total length of the bell. The thickness of the transparent fused silica layer increases by at least half of the thickness which it has in the top part of the bell. | ||||||
| 165 | Precision silica cones for sand casting of steel and iron alloys | US186415 | 1980-09-12 | US4352390A | 1982-10-05 | David L. Larson |
| Partially devitrified silica cores with exceptional high temperature strength are disclosed for foundry use in sand casting of ferrous alloys. Precision cored holes of small size and long length, which heretofore could not be cast accurately or had to be machined because of limitations in existing core technology, are formed using accurately machined extruded porous silica cores fired to eliminate combustibles and partially devitrified (e.g., 15 to 30%) to develop a strong crystalline phase bond that resists viscous flow at a temperature of 1500.degree. C. and to increase the refractoriness of the vitreous silica grains, whereby the permeability and thermal shock resistance are such that the core can be heated very rapidly by molten steel to above 1500.degree. C. without spalling, cracking, sagging, breaking, or loss of integrity and without gas holes, scabs, fissures or other serious casting defects. The cores are made from an extrudable composition containing vitreous silica, a mineralizer, an organic binder, and a plasticizer and/or tempering fluid. High-purity vitreous silica grains are mixed with a mineralizer and large amounts of finer vitreous silica particles (e.g., below 10 microns) which bond the silica grains together to provide extremely high strength after firing. The extruded cores are fired to form cristobalite in major amounts in the bond region between grains and in minor amounts in surface portions of the silica grains. The sand casting process of the invention can employ hollow porous thin-wall cores having small diameters, such as 0.4 to 2 centimeters or less, and length-to-diameter ratios, such as 20:1 or more. The problem of casting defects due to gassing is solved by causing the expanding gases to move radially inwardly to the central passage of the hollow core. | ||||||
| 166 | Wound and sintered vitreous silica article and method of making | US182155 | 1980-08-28 | US4340627A | 1982-07-20 | Heinz Herzog; Heinrich Mohn; Karl-Albert Schulke; Holger Grzybowski |
| A method is described for the production of porous bodies from vitreous silica without the use of tools. Vitreous silica wool and/or threads are wound in layers on a form. After the coil has attained a certain minimum thickness, the threads of each succeeding layer are permanently bonded by heating the threads of the preceding layer at the points where the threads cross. The form is removed, and then the threads on the inside of the body are bonded together.The bodies are used for the production of high-purity blocks of silicon for solar cells. | ||||||
| 167 | Vacuum process for avoiding devitrification damage to transparent slip-cast silica crucibles | US684730 | 1976-05-10 | US4072489A | 1978-02-07 | Ted A. Loxley; Walter G. Barber; Walter W. Combs; John M. Webb |
| A process is disclosed for making vitreous silica crucibles of exceptional high quality for use in the growing of a silicon crystal from molten silicon. The crucibles are formed from fine particles of high purity fused silica by slip casting or other suitable process, are dried and fired to provide a rigid porous body, and are thereafter sintered to a high density, preferably to the transparent state. The invention solves the problem of spalling, blistering and cracking during crystal growing and the resulting contamination of the molten silicon, which has long plagued the industry, by eliminating water from the fused silica particles before the porous body is sintered to the transparent state. Said body is thoroughly dried in a vacuum furnace at a high temperature and at a sub-atmospheric pressure low enough to remove the chemically bound water which cannot be removed by heat alone. The crucibles of this invention retain their transparency and high quality without spalling or introducing microscopic particles of silica into the silicon, thereby making it possible to grow a silicon crystal of highest quality without dislocations and imperfections due to contamination by said particles. | ||||||
| 168 | Manufacture of vitreous silica bodies | US3775077D | 1971-06-28 | US3775077A | 1973-11-27 | NICASTRO C; VANDER NOORDAA R; WARD W |
| A green body formed of substantially -60 mesh particles of crystalline silica and/or glass having a SiO2 content of at least 90 wt. percent is initially fired in ambient atmosphere of helium to temperature of about 1,600*-1,725* C. so as to leave about 520 percent helium-filled porosity with pore diameters of about 0.05-0.5 micron and communicating with the ambient atmosphere at the surface of the body. Then, the helium is substantially replaced with argon and firing is continued to temperature of about 1,730*-2,200* C. at a rate to concurrently effect escape of the helium from the pores substantially via the communication thereof with the ambient argon atmosphere and the virtual collapse and elimination of the pores. Resultant product is virtually free of occluded bubbles.
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| 169 | Firing vitreous silica articles while supported on a perforated thin walled graphite mandrel | US3763294D | 1971-06-28 | US3763294A | 1973-10-02 | NICASTRO C; NOORDAA R; WARD W |
| IMPROVEMENT IN THE STEP OF FIRING A HIGH PURITY, CLOSE TOLERANCE, VITREOUS SILICA ARTICLE CAPABLE OF BEING INSIDESUPPORTED, WHEREBY THE ARTICLE IS SUPPORTED ON ITS INNER SURFACE ONLY, IN A BOTTOM-END-UP POSITION ON A PERFORATED, THIN-WALL GRAPHITE SUPPORT HAVING AN OUTER SURFACE SUBSTANTIALLY COMPLEMENTARY IN SHAPE TO THE INNER SURFACE OF THE ARTICLE AND SINTERED IN THE PRESENCE OF AT LEAST ONE PROTECTIVE GAS ATMOSPHERE FOR A TIME SUFFICIENT TO COMPLETELY FUSE THE ARTICLE.
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| 170 | Fused quartz product and process of producing same | US68326223 | 1923-12-28 | US1610182A | 1926-12-07 | ELIHU THOMSON |
| 171 | Precision cut high energy crystals | US15804941 | 2017-11-06 | US10094046B2 | 2018-10-09 | Nassim Haramein |
| Crystals having a modified regular tetrahedron shape are provided. Crystals preferably have four substantially identical triangular faces that define four truncated vertices and six chamfered edges. The six chamfered edges can have an average length of l, and an average width of w, and 8≤l/w≤9.5. | ||||||
| 172 | SYNTHETIC QUARTZ GLASS LID PRECURSOR, SYNTHETIC QUARTZ GLASS LID, AND PREPARATION METHODS THEREOF | US15883575 | 2018-01-30 | US20180215662A1 | 2018-08-02 | Harunobu MATSUI; Daijitsu HARADA; Masaki TAKEUCHI |
| A synthetic quartz glass lid for use in optical device packages is prepared by furnishing a synthetic quartz glass lid precursor comprising a synthetic quartz glass substrate (1) and a metal or metal compound film (2), and forming a metal base adhesive layer (3) on the metal or metal compound film (2). The metal or metal compound film contains Ag, Bi, and at least one element selected from P, Sb, Sn and In. | ||||||
| 173 | METHOD FOR PRODUCING AN OPTICAL BLANK FROM SYNTHETIC QUARTZ GLASS | US15712741 | 2017-09-22 | US20180079674A1 | 2018-03-22 | Andreas Kaske; Klaus Becker; Stefan Ochs |
| One aspect relates to a method for producing an optical blank from synthetic quartz glass by vitrifying and shaping a porous, cylindrical SiO2 soot body having a longitudinal axis, in a heating zone including a melt mold with bottom plate. The SiO2 soot body vitrified in the heating zone at a vitrification temperature so as to form a fully cylindrical, completely vitrified, transparent quartz glass body. Subsequently, the vitrified quartz glass body is shaped by softening in the melt mold at a softening temperature so as to form a viscous quartz glass mass which partly fills the volume of the melt mold, and cooling the quartz glass mass and removal from the melt mold so as to form the optical blank. During shaping in the melt mold, the fully cylindrical quartz glass body is brought into contact by way of controlled supply with a centering means of the bottom plate. | ||||||
| 174 | SILICA GLASS PRECURSOR PRODUCTION METHOD, SILICA GLASS PRECURSOR, SILICA GLASS PRODUCTION METHOD, AND SILICA GLASS | US15555391 | 2016-03-03 | US20180037463A1 | 2018-02-08 | Shigeru Fujino |
| Provided is a method for producing, at low cost, a dense and porous silica glass precursor from which silica glass can be easily formed in a complex shape at low cost, and which can also be utilized in an absorbent or the like utilizing porousness thereof as another use. A silica glass precursor production method includes: a stirring step of stirring a silica solution containing silica particles and a pH adjuster to produce a dispersion solution; a mixing step of mixing, into the dispersion solution, an initiator solution containing a photopolymerization initiator and an acrylic monomer having a hydroxyl group at one end of an alkyl chain optionally substituted by a substituent, and an acryloyl group optionally substituted by an alkyl group at the other end of the alkyl chain, to produce a mixed solution; an irradiation step of irradiating the mixed solution with light to form a silica-containing molded body; and a solidification step of producing a mesoporous silica glass precursor formed by solidifying the silica-containing molded body by annealing and/or drying. | ||||||
| 175 | Precision cut high energy crystals | US14640146 | 2015-03-06 | US09834862B2 | 2017-12-05 | Nassim Haramein |
| Crystals having a modified regular tetrahedron shape are provided. Crystals preferably have four substantially identical triangular faces that define four truncated vertices and six chamfered edges. The six chamfered edges can have an average length of l, and an average width of w, and 8≦l/w≦9.5. | ||||||
| 176 | METHOD FOR PRODUCING A PORE-CONTAINING OPAQUE QUARTZ GLASS | US15602919 | 2017-05-23 | US20170341968A1 | 2017-11-30 | Christian SCHENK; Gerrit SCHEICH; Nadine TSCHOLITSCH |
| A method for producing a pore-containing opaque quartz glass includes: (a) producing porous SiO2 granulate particles from synthetically produced SiO2, (b) thermally densifying the SiO2 granulate particles to form partly densified SiO2 granulate particles, (c) forming a dispersion from the partly densified SiO2 granulate particles, (d) comminuting the partly densified SiO2 granulate particles to form a slip containing comminuted SiO2 granulate particles, (e) shaping the slip into a shaped body and forming a porous SiO2 green body with a green density rG, and (f) sintering the SiO2 green body into opaque quartz glass. To produce opaque quartz glass that is also suited for the use of spray granulate, during step (b), partly densified SiO2 granulate particles are produced with a specific surface BET-(A) between 0.025 and 2.5 m2/g, and during step (d), comminuted SiO2 granulate particles are produced with a specific surface BET-(B) between 4 and 10 m2/g. | ||||||
| 177 | PROCESS FOR PRODUCING SYNTHETIC QUARTZ GLASS USING A CLEANING DEVICE | US15536426 | 2015-12-15 | US20170341967A1 | 2017-11-30 | Hilmar LAUDAHN; Klaus-Uwe BADEKE; Martin TROMMER |
| A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m2/g. A device for carrying out the method is also provided. | ||||||
| 178 | QUARTZ GLASS CRUCIBLE FOR PULLING SINGLE CRYSTAL SILICON AND METHOD FOR PRODUCING THE SAME | US15327206 | 2015-06-01 | US20170175291A1 | 2017-06-22 | Yuji BABA |
| The present invention is a method for producing a quartz glass crucible for pulling a single crystal silicon from a silicon melt held therein, including the steps of: producing a quartz glass crucible having an outer layer including an opaque quartz glass containing bubbles therein and an inner layer including a transparent quartz glass containing substantially no bubbles; roughening a region of an inner surface of the produced quartz glass crucible, the region being in contact with the silicon melt when holding the silicon melt; and heating the quartz glass crucible having the roughened inner surface to crystallize a surface of the roughened region. This can produce a quartz glass crucible for pulling a single crystal silicon which can suppress generation of a brown ring on the inner surface of the crucible during pulling the single crystal silicon and can suppress crystallinity disorder of the single crystal silicon. | ||||||
| 179 | Method for producing a coated component of transparent or opaque fused silica | US14543718 | 2014-11-17 | US09680360B2 | 2017-06-13 | Christian Schenk; Gerrit Scheich; Nils-Christian Nielsen |
| A method for producing a coated component consisting of transparent or opaque fused silica comprises a method step in which a SiO2 granulation layer is applied to a coating surface of a substrate, which in the area of the free surface has a relatively great granulation fine fraction. Starting from this, in order to achieve a smooth, preferably also dense surface layer, it is suggested according to the invention that the application of the SiO2 granulation layer comprises (i) providing a dispersion containing a dispersion liquid and amorphous SiO2 particles which form a coarse fraction with particle sizes ranging between 1 μm and 50 μm and a fine fraction of SiO2 nanoparticles having particle sizes of less than 100 nm, wherein the solids content of the dispersion is between 70 and 80 wt.-%, and of which between 2 wt.-% and 15 wt.-% are the SiO2 nanoparticles, (ii) applying the dispersion to the coating surface by casting or spraying it thereonto so as to form a slurry layer having a layer thickness of at least 0.3 mm; and (iii) drying the slurry layer by removing the dispersion liquid at a rate and in a direction such that under the action of the dispersion liquid being removed the fine fraction is enriched in the outer portion of the granulation layer, thereby forming a casting skin. | ||||||
| 180 | Method for producing synthetic quartz glass granules | US14398124 | 2013-04-17 | US09580348B2 | 2017-02-28 | Walter Lehmann; Achim Hofmann; Thomas Kayser; Martin Arndt |
| The production of a quartz glass grit comprises the granulation of pyrogenetically produced silicic acid, and the formation of a SiO2 granulate and the vitrification of the SiO2 granulate using a treatment gas, which contains at least 30% by volume of helium and/or hydrogen. Said process is time consuming and cost intensive. In order to provide a method which makes it possible, starting from a porous SiO2 granulate, to manufacture, in a cost effective manner, a dense, synthetic quartz glass grit, which is suitable for melting bubble-free components made of quartz glass, according to the invention the vitrification of the SiO2 granulate occurs in a rotary kiln having a mullite-containing ceramic rotary kiln, for the manufacture of which a starting powder, which contains a molar proportion of at least 45% SiO2 and Al2O3 is applied by means of a thermal powder spraying method, forming a mullite-containing layer on a mold core, and the mold core is subsequently removed, and wherein the ceramic rotary kiln is flooded with a treatment gas or rinsed with a treatment gas, and wherein the ceramic rotary kiln is flooded with a treatment gas or rinsed with a treatment gas, which contains at least 30% by volume of helium and/or hydrogen. | ||||||
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