| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 101 | 클린 이송 로봇 | KR1020107025620 | 2009-04-15 | KR1020100135293A | 2010-12-24 | 바커,데이비드; 로비안코,로버트; 아민,바베쉬 |
| 클린 환경용 향상된 세정도를 가진 로봇이 개시되고, 로봇 하우징의 내부와 클린 환경 사이의 개방 인터페이스를 통한 균일한 유동을 가지며, 배출 포트로 입자 생성 구역을 통과시키며, 클린 환경으로부터 입자를 지킨다. 균일한 유동은 되돌림 유동을 감소시키거나 또는 제거하고, 개방 인터페이스의 스케일링가능성(scalability)으로 하여금 로봇 하우징 내 이동 메커니즘으로부터 생성된 입자가 클린 환경을 오염시키는 것을 방지하는 것을 허용한다. 균일한 유동은 유동을 동적으로 설계하고, 배출 포트를 중심화함에 의해, 또는 세장형 슬롯을 따라 유동을 제한함에 의해, 예를 들어 세장형 슬롯을 따라 유동을 균일하게 제한함에 의해, 또는 세장형 슬롯을 따라 제한기를 구현함에 의해 확립될 수 있다.
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| 102 | 웨이퍼 뒷면의 오염 방지를 위한 웨이퍼 이송시스템 | KR1020080134469 | 2008-12-26 | KR1020100076434A | 2010-07-06 | 정성희 |
| PURPOSE: A wafer transfer system is provided to prevent discolor and scratch on the rear side of a wafer by changing the material of a blade from metal into insulating material. CONSTITUTION: A wafer transfer system is formed between a cassette and an ashing process chamber to transfer wafers. A blade(54) is formed at the front end of a wafer transfer robot arm to place the wafer and is made of insulating materials. Therefore, the contamination of the rear side of the wafer is prevented during contacting the wafer. The blade is formed of ceramic material. | ||||||
| 103 | 피처리체의 이동 적재 기구 및 피처리체의 처리 시스템 | KR1020090052109 | 2009-06-12 | KR1020090129955A | 2009-12-17 | 스가와라유우도 |
| PURPOSE: A transfer mechanism and a processing system for object to be processed are provided to remove static electricity by installing an ion generation unit in a fork unit loading and moving the article to be processed. CONSTITUTION: In a device, a box accepts a plurality of processed articles. A transfer loading tool(52) of the processed article transfers and loads the processed articles between processed article holding and supporting unites. The processed article holding and supporting unit holds and support an object to be processed. A platform(56) is perpendicularly ascended and descended by an elevating unit(54). A fork unit(58) is installed in the platform. The object to be processed is loaded the fork unit. An ion generation unit(60) is installed in the fork unit to generate the ion removing static electricity,. | ||||||
| 104 | 가이드 홈 실을 포함하는 그리핑 장치 | KR1020167015809 | 2014-11-15 | KR1020160086400A | 2016-07-19 | 짐머군터; 짐머마르틴 |
| 본발명은그리퍼부재들을지지하는가동적캐리지들을포함하는평행그리퍼장치에관한것으로, 캐리지들은그리퍼부재들의그립방향으로잇달아배치되되, 기본몸체내에배치되며그리퍼부재들쪽으로적어도국부적으로개방된공통적인가이드홈 내에서그립방향에대해평행하게 -개구위치와폐쇄위치사이에서- 구동가능한방식으로배치되며, 그립방향을가로지르는방향으로모든측면에서지지되면서위치한다. 중앙영역에서가이드홈은하우징커버를포함하고, 그립방향으로측정되는하우징커버의길이는그리퍼부재들의최대그립스트로크에적어도상응한다. 각각의캐리지는실링몸체를지지한다. 실링몸체는가이드홈의저부및 측벽에서밀봉적으로그리고적어도국부적으로오염물질을제거하는방식으로인접한다. 본발명에의해, 파지력은크면서공간수요는낮고고유질량은낮으면서긴 유효수명을갖는평행그리퍼장치가개발된다. 장치의내부공간은주변에대하여밀폐되어야한다. | ||||||
| 105 | 로봇 관절 실링 구조 | KR1020157016396 | 2013-11-28 | KR1020150088832A | 2015-08-03 | 나카니시,테츠야 |
| 로봇(R) 관절실링구조가제2 부재(2)의단부에설치되고제1 부재(1)의통형단부(11)에삽입설치된감입단부(22)와, 통형단부(11)의내주면에전체둘레에걸쳐연장하도록형성된원주홈(14)과, 원주홈(14) 내에수용되고감입단부(22)의외주면에밀착하는고리형실링부재(35)를구비한다. 감입단부(22)는제2 부재(2)의본체부(21)보다작은직경으로형성되고, 본체부(21)와감입단부(22) 사이의단차면(23)은통형단부(11)의단면(13)과축선방향으로근접대향하고, 단차면(23)과통형단부(11)의단면(13) 사이에, 전체둘레에걸쳐연장되고, 제1 부재(1) 및제2 부재(2)의외부로개방되는한편외주측으로갈수록넓어지는간극(41)이형성된다. | ||||||
| 106 | 반송 로봇, 기판 처리 장치, 그리고 파티클 배출 방법 | KR1020130143987 | 2013-11-25 | KR1020150061103A | 2015-06-04 | 한상복; 이성진 |
| 본발명은반송로봇을제공한다. 반송로봇은기판이놓이는아암, 상기아암을지지하는베이스, 그리고상기베이스를이동시키는구동유닛을포함하되, 상기구동유닛은, 일측면에상기베이스의일단이삽입되도록상하방향으로제공되는슬릿형상의홀이형성되는수직프레임, 상기수직프레임의내부에위치되고, 상기베이스의일단이결합된브라켓, 상기브라켓을상하방향으로이동시키는구동부재, 상기수직프레임의내부에위치되고, 상기수직프레임의내부의파티클을외부로배출시키는팬, 상기수직프레임의내부에위치되고, 상기파티클의양을측정하는센서, 그리고상기센서로부터측정값을입력받고, 상기측정값에따라상기팬의회전속도를제어하는제어기를포함할수 있다. | ||||||
| 107 | 커버결합장치 및 이를 포함하는 기판 이송장치 | KR1020130082293 | 2013-07-12 | KR1020150008302A | 2015-01-22 | 윤대규; 김태현; 김동혁; 김상현 |
| 본 발명은 제1암기구에 기판이 이송되는 이송방향으로 제2암기구를 이동시키기 위한 구동장치로부터 발생하는 이물질을 차단하는 커버장치가 결합되기 위해, 상기 제1암기구에 결합되는 결합본체, 상기 결합본체에 형성되고, 상기 커버장치를 결합시키기 위한 결합부재가 체결되는 체결공, 및 상기 체결공에 연결되게 상기 결합본체를 관통하여 형성되는 관통홀을 포함하는 기판 이송장치용 커버결합장치에 관한 것으로,
본 발명에 따르면, 본 발명은 제1암기구와 별도로 제작됨으로써 제작이 용이하다. 또한, 본 발명은 커버장치가 제1암기구에 용이하게 체결되도록 하고, 결합력을 강화시킬 수 있다. |
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| 108 | 반송로봇 | KR1020110122502 | 2011-11-22 | KR1020130056752A | 2013-05-30 | 한기원; 유인철 |
| PURPOSE: A transfer robot is provided to prevent particles from being leaked to the outside by cleaning the particles using a cleaning member. CONSTITUTION: A support frame(924) supports an arm. A first vertical guide(930) is combined with one end of the support frame to vertically move the support frame. The first vertical guide includes a vertical frame(932), a driving member(934) to vertically move one end of the support frame, and a sealing belt(940). The sealing belt seals a hole(933) of the vertical frame and is arranged between a rotary belt(936) and an inner sidewall of the vertical frame. A cleaning member(945) cleans the inside of the first vertical guide. | ||||||
| 109 | 웨이퍼 이송장치 및 웨이퍼 이송방법 | KR1020110033749 | 2011-04-12 | KR1020120116163A | 2012-10-22 | 서윤교; 조희돈; 정은도 |
| PURPOSE: An apparatus and method for transferring a wafer are provided to easily eliminate a washing solution remaining on the wafer by including an injection part injecting gas on a robot chuck. CONSTITUTION: A robot chuck grips a wafer. The robot chuck moves with the wafer. An injection part is formed in the robot chuck. The injection part injects gas on the wafer. A first robot arm(130) and a second robot arm(140) grip the wafer. | ||||||
| 110 | 더스트커버가 구비된 수평 수직 이동 로봇용 레일장치 | KR1020100103118 | 2010-10-21 | KR1020120041599A | 2012-05-02 | 한석 |
| PURPOSE: A rail system for a horizontal-vertical mobile robot is provided to control various types of dust created in a working room to flow to the inside of a rail and to prevent a magnet from being separated from a dust cover. CONSTITUTION: Each magnet(200) is installed in an open front and back part of a rail(100). A magnet is inserted into an installation groove(120) in the rail. The guide plate(121) is formed on the top of the installation groove in order to be projected to the central part of the installation groove by 0.1mm-0.2mm. The dust cover controls various kinds of dust and dust created in a classroom to flow into the inside of the rail. The dust cover is installed at the upper part of the opening of rail. | ||||||
| 111 | 웨이퍼 핸들링 완드 | KR1020100090959 | 2010-09-16 | KR1020120029099A | 2012-03-26 | 서병수 |
| PURPOSE: A wafer handling wand is provided to directly supply heat to a wafer edge part, thereby relieving a curling phenomenon which is generated when a wafer is loaded into a reaction chamber. CONSTITUTION: A plate(110) is combined with one end of a wafer transfer arm(925). A gas supply line(115) supplies nitrogen gas supplied from the outside to the plate. The gas supply line sprays the gas to the lower surface of the plate through a spray hole opened to the lower side of the plate. A heat transfer hole(130) is formed adjacent to the edge of the plate. The heat transfer holes are arranged by being separated from each other in order to form one or more rings along the edge of the plate. | ||||||
| 112 | 반송 암의 세정 방법, 기판 처리 장치의 세정 방법 및 기판 처리 장치 | KR1020100109723 | 2010-11-05 | KR1020110051146A | 2011-05-17 | 이시자와시게루; 곤도마사키 |
| PURPOSE: A method for cleaning a transfer arm, a substrate cleaning device, and a cleaning method thereof are provided to remove the contaminant attached to the surface of the transfer arm by using the flow of nitrogen gas supplied from a nitrogen supply nozzle. CONSTITUTION: A nitrogen supply nozzle(27) sprays nitrogen gas to a transfer arm(80A). A voltage with the same polarity as a negatively charged contaminant is applied to an electrode(82). A voltage with the same polarity as a positively charged contaminant(92) is applied to an electrode(83). The contaminant attached to the surface of an insulation layer(84) is separated from the surface of the transfer arm by an electric force. The contaminant separated from the surface of the insulation layer is removed by the flow of nitrogen gas from a nitrogen supply nozzle. | ||||||
| 113 | 웨이퍼 이송용 핸들러 | KR1020090037042 | 2009-04-28 | KR1020100118290A | 2010-11-05 | 하경수; 정인수; 안수범 |
| PURPOSE: A handler for transferring wafers is provided to prevent the contamination of wafers due to particles by eliminating the particles on the lower side of the wafer through a hole on one side of the handler. CONSTITUTION: A combining unit(110) includes a plurality of screw holes(112) in order to screw-bond a handler body(120) and a robot arm. The corner of the handler body is curved. A U-shape hole(122) is formed in the handler body. A groove(124) with a preset width and a depth is formed on the upper side of the handler body in order to fix wafers(30). A through hole(126) in connection with the groove is formed on the lateral side of the handler body. | ||||||
| 114 | 발광 다이오드 제조를 위한 리프트-오프 장치의 웨이퍼 이송수단 | KR1020090075220 | 2009-08-14 | KR100973469B1 | 2010-08-02 | 민병롱 |
| PURPOSE: A wafer transferring device of a lift-off device for manufacturing a light emitting diode is provided to suppress mutual contamination and recontamination by separately arranging a robot arm for transferring a wafer from a settling chamber, a robot arm for moving the wafer between spin process chambers, and a robot arm for discharging the completely processed wafer. CONSTITUTION: A first robot arm(211) discharges a wafer which is chemically processed from a settling chamber. A second robot arm(212) transfers the wafer between spin process chambers. A third robot arm(213) discharges the wafer in which a lift-off process is completed. A leakage preventing cover(220) is arranged on the lower side of the body connected to the first to third robot arms and receives the chemical and contamination source from the first to third robot arms and the discharges the received chemical and contamination source to the outside. | ||||||
| 115 | 반송 아암 세정 장치, 반송 아암 세정 방법 및 프로그램을 저장한 컴퓨터 판독 가능한 기억 매체 | KR1020090018428 | 2009-03-04 | KR1020090095501A | 2009-09-09 | 츠츠미켄지; 쿄우다히데하루; 야마우치타카시; 키타노쥰이치 |
| A transfer arm cleaning device, a transfer arm cleaning method, a program and a computer-readable recording medium are provided to allow a user to clean a maintenance unit of the transfer arm efficiently by preventing a foreign material and a washing solution from being leaked. In a transfer arm cleaning device, a transfer arm cleaning method, a program and a computer-readable recording medium, a cleaning device(1) washes a maintenance unit of a transfer arm(10) having a plurality of the substrate maintenance units. An opening part is formed at one side of a treatment basin(20) so that it allows the access of the transfer arm, and a cleaning gas or the washing solution is discharged to the cleaning nozzle(40). A gas jet part(30) is installed at the opening of the treatment basin and discharges the gas. | ||||||
| 116 | 산업용 로봇의 로봇손 | KR1019810002849 | 1981-08-05 | KR1019840001126B1 | 1984-08-09 | 이나바하지무; 니헤이료 |
| The robot hand is for an industrial robot used with a machine tool. It carries out a manipulating operation of attaching a workpiece to and detaching it from a workpiece holder of the machine tool. The hand comprises two sets of grasper fingers arranged side-by-side. Nozzles attached to the grasper remove chips and other foreign materials attached to the workpiece holder of the machine tool while manipulating operation of the robot hand is carried out. | ||||||
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