| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 101 | Nanoimprint resist | JP2003584817 | 2003-04-09 | JP2005527110A | 2005-09-08 | オリベイラ，ペーター・ベエー; ギアー，アンドレアス; シユミツト，ヘルムート; スピエス，バルター; マイアー，ミヒヤエル; メンニヒ，マルテイン; 文雄 北 |
| The invention relates to a method for microstructuring electronic components, which yields high resolutions (<=200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a). The method for producing a microstructured semiconductor material comprises the following additional steps: vi) the remaining layer of the nanocomposite sol film is plasma etched, preferably with CHF<SUB>3</SUB>/O<SUB>2 </SUB>plasma; vii) the bottom coat is plasma etched, preferably with O<SUB>2 </SUB>plasma; viii) the semiconductor material is etched or the semiconductor material is doped in the etched areas. | ||||||
| 102 | Lithographic template | JP2002577647 | 2002-02-27 | JP2005508075A | 2005-03-24 | ジェイ． ノードキスト、ケビン; ジェイ． レズニック、ダグ |
| 本発明は、半導体装置、超小型電子装置、超小型電子機械装置、超小型流体装置に関し、特にリソグラフィックテンプレート、リソグラフィックテンプレートを形成する方法、及びリソグラフィックテンプレートでこれらの装置を形成する方法に関するものである。 リソグラフィックテンプレート（２０，３０，４２）は、基板（２２，３２）と、最上層表面にエッチングパターンまたはレリーフ画像（２６，３６，４８）が形成されたテンプレート台（２４，３４）を設けることにより形成される。 テンプレート（２０，３０，４２）は、半導体装置（４４）の製造に、装置（４４）のパターンに影響を与える形で使用される。 すなわち、装置（４４）のパターンは、光照射反応材料（５０）をその上に有する半導体装置（４４）に極めて近接してテンプレート（２０，３０，４２）を位置させ、圧力（５２）を加えて光照射反応材料（５０）をテンプレート（４２）上に在るレリーフ画像（４８）に流れ込ませることにより変形する。 次に、テンプレート（４２）を通して光照射（５３）が行なわれ、光照射反応材料（５０）の一部をさらに硬化させ、光照射反応材料（５０）にさらにパターンを画定させる。 次に、テンプレート（２０，３０，４２）が取り外されて半導体装置（４４）の製造が完了する。 | ||||||
| 103 | Stamp having a non-adhesive layer, forming method and repair process of the stamp | JP2003511035 | 2002-07-04 | JP2004534663A | 2004-11-18 | ヘイダリ，ババック; リング，トルビョールン |
| ナノスケールのパターンを転写するのに使用するためのスタンプが、非付着性単分子層を有している。 非付着性層は、スタンプの表面に共有結合された分子鎖を含み、これらの分子鎖はそれぞれ１以上のフッ素含有基を含む。 それぞれの分子鎖は基Ｑを含有しており、基Ｑは、分子鎖内のその他の結合並びにスタンプ表面に分子鎖を結合する共有結合よりも弱い結合を含む。 基Ｑ内の前記結合の分断が基Ｑ１を形成し、このＱ１は、スタンプ表面上に残されている分子鎖部分に結合され、フッ素含有化合物と反応することにより、非付着性層を修復することができる。 ナノスケールのパターンを転写するのに使用するためのスタンプの製造方法において、スタンプに上記分子鎖を設ける。 上記スタンプの損傷された非付着性単分子層の修復方法において、スタンプが、基Ｑ１と反応することができるカップリング末端と、修復用試薬の他方の末端に配置されたフッ素含有基とを有する修復用試薬で処理される。 | ||||||
| 104 | Stamper and transfer device | JP2003093091 | 2003-03-31 | JP2004299153A | 2004-10-28 | KUWABARA KOSUKE; MIYAUCHI AKIHIRO; OGINO MASAHIKO; MOTOWAKI NARIHISA |
| PROBLEM TO BE SOLVED: To provide a stamper capable of precisely transferring the shape of the stamper to an article having to receive transfer without being affected by the distribution of the protrusions on the surface of the stamper or the undulation of a substrate, and a transfer device using the stamper. SOLUTION: Precise transfer not affected by the protrusions on the surface of the stamper or the undulation of the substrate can be performed using the stamper having a cushioning material, which has an elastic modulus distribution, formed on the back surface thereof. In the stamper, which has fine unevenness formed to the surface thereof, for forming a fine structure on the substrate using a press, the stamper has flexibility and the cushioning material having an in-plane distribution in elastic modulus is formed on the back surface of the unevenness formed surface of the stamper. COPYRIGHT: (C)2005,JPO&NCIPI | ||||||
| 105 | Method for manufacturing molded product | JP2001299059 | 2001-09-28 | JP2004291234A | 2004-10-21 | NISHI TAIJI; KAWAHARA SHIGERU; YANAGAWA YUKIHIRO |
| <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a molded product precisely and inexpensively. <P>SOLUTION: This molded product is manufactured by performing a process wherein a process (a) for applying first resist coating to a substrate, a process (b) for exposing the resist layer on the substrate, a process (c) for performing second resist coating, a mask aligning process (d) and a process (e) for exposing the second resist layer are repeated at least a plurality of times untile a desired resist thickness is obtained and a resist pattern is subsequently formed using a lithography method and a process for depositing a metal structure on the substrate according to the resist pattern by electroplating. Further, the molded product is manufactured by a process for forming a plastic mold by injection molding using the metal structure as a mold. <P>COPYRIGHT: (C)2005,JPO&NCIPI | ||||||
| 106 | Manufacturing method of photoresist master disk, manufacturing method of stamper for producing optical recording medium, stamper, photoresist master disk, stamper intermediate body and optical recording medium | JP2002164019 | 2002-06-05 | JP2004013973A | 2004-01-15 | KOYAKE HISASHI; TAKAHATA HIROAKI; SHIRASAGO KENJI |
| <P>PROBLEM TO BE SOLVED: To manufacture a stamper for producing an optical recording medium by forming a projecting and recessing pattern without a developing process of a photoresist layer. <P>SOLUTION: The manufacturing method of the stamper for producing the optical recording medium includes: a process in which a light absorbing layer 14 and a photoresist layer 16 are formed on a glass substrate 10 in this order; a process in which the layer 16 is irradiated with laser light beams from the opposite side of the layer 14 to remove a portion of the layer 16 by the laser energy and a photoresist master disk 26 is manufactured by forming a projecting and recessing pattern 22 made of undeveloped photoresist; a process in which a metallic thin film 28 is formed on the pattern 22 of the disk 26; a process in which a metallic film 30 is formed on the film 28 by electric field plating; and a process in which the films 28 and 30 are pealed off from the disk 26 to form the stamper 36. <P>COPYRIGHT: (C)2004,JPO | ||||||
| 107 | Template fabricated in the process and method relates to the fabrication of template | JP2001586524 | 2001-04-10 | JP2003534651A | 2003-11-18 | ヘイダリ，ババク |
| (57)【要約】 好ましくは、ナノインプリントリソグラフィのためのテンプレートの製作に関する方法であり、そのテンプレートは、第１材料の平らなプレート（１）と、そのプレートに配置される第２材料の三次元構造物（６、８）とを備え、該第２材料の予備は、該構造物を形成するため、その方法において該プレートに塗布される。 本発明によれば、該第２材料は、その後は、該テンプレートの製作のために少なくとも１５０℃の熱処理（Ｑ）によって該第１材料のプレートに固定される。 本発明は、さらに、その方法を使用して製作されたテンプレートにも関する。 | ||||||
| 108 | Production by liquid embossing devices involving fine fixtures | JP2001523922 | 2000-09-13 | JP2003509228A | 2003-03-11 | ウィルヘルム，エリック，ジェイ; ジャコブソン，ジョセフ，エム; ハバート，ブライアン，エヌ; ブルサアップ，コリン，エイ |
| (57)【要約】 エラストマースタンプが、電気材料、生物材料、化学材料、及び機械材料の直接的なパターン形成を容易にする。 材料の薄いフィルムが基体上に堆積される。 堆積された材料は、当初から液体として存在し、或いは後に液化され、隆起したパターンを有するエラストマースタンプを用いて、低圧でエンボス加工することによってパターン形成される。 パターン形成された液体は次いで硬化されて機能層を形成する。 堆積、エンボス加工、及び硬化のステップは、同じ液体又は異なる液体について、また二次元又は三次元で多数回繰り返される。 堆積される種々の層は、例えば、集積された電子部品を生成するよう相互作用する種々の電気的特性を有することができる。 | ||||||
| 109 | Manufacture of stamper for optical information recording medium | JP9577998 | 1998-04-08 | JPH11296918A | 1999-10-29 | SHIMIZU AKIHIKO |
| PROBLEM TO BE SOLVED: To manufacture a stamper for an optical information recording medium which forms grooves that are shorter than the beam diameter of an exposure spot uniformly. SOLUTION: In a manufacturing method for a stamper for an optical information recording medium which exposes and develops a photo resist layer 3 on a glass base (master disk) 1, a water soluble resin layer 2 whose film thickness is equal to the depth of grooves formed on a stamper surface is provided between the base (master disk) 1 and the layer 3, fine patterns are formed on the layer 3 by master disk exposure, the layer 2 that is a lower layer is etched with the photo resist layer as a mask, fine patterns are formed on the lower layer (the layer 2) and after that, a glass master disk having fine patterns is produced by eliminating the layer 3. COPYRIGHT: (C)1999,JPO | ||||||
| 110 | Surface treatment for metal mold | JP11641988 | 1988-05-13 | JPH01287282A | 1989-11-17 | SHIGESADA MASAAKI |
| PURPOSE: To allow the feeling of natural leather to appear at the surface of a molding by forming an urethane coating and a photosensitive resin film on the surface of the main body of a metal mold on which patterns are formed, exposing peak parts and removing the above coating and film from the valley parts by means of dissolution, and then glazing the valley parts. CONSTITUTION: The surface of the main body 1 of a mold on which the prescribed pattern is formed by means of etching treatment is subjected to dull finish treatment and coated with urethane 2, and then, a photosensitive resin film 3 is formed on the above urethane 2. After the transparent parts of a film 4 are put upon the parts corresponding to the peak parts 1a of the pattern to undergo exposure, the film 4 is removed and then development in which the resin film 3 and the coating layer of urethane 2 unexposed to light are removed by means of dissolution is carried out. Subsequently, the valley parts 1b of the pattern are glazed. When the resin film 3 and the coating layer of urethane 2 on the peak parts 1a are peeled off, a pattern in which the peak parts 1a are dull-finished and the valley parts 1b are glazed can be obtained. By molding a resin molding by using the above main body 1 of metal mold, a surface pattern having the feeling of natural leather can be obtained. COPYRIGHT: (C)1989,JPO&Japio | ||||||
| 111 | Method and device for working seal | JP19351085 | 1985-09-02 | JPS6252553A | 1987-03-07 | TAKANO HIROTSUGU |
| PURPOSE: To obtain a seal formed of line art of a body such as a person's face and equipment by generating a line art signal showing the contour of an image from a variable density video signal, and exposing a photosensitive material on the basis of the line art signal and working the seal. CONSTITUTION: An object 1 (person's face) is photographed by a TV camera 2. A video signal outputted by the TV camera is an original image 13 of a black-and-white gradational image and an image processor 3 inputs and converts the original image into a line drawing 14 and outputs it. The contour of this image is extracted by differentiating gradation information on the original image. A film 8 for exposure is placed on a glass plate 11 in contact, liquid photosensitive resin 10 is applied over the film, and a reverse plate 9 is pressed against it flatly to secure constant thickness size of the photosensitive resin. Light from a light source 12 passes through the film 8 for exposure to illuminate the photosensitive resin 10, so that an irradiated part cures and an unirradiated part is still liquid. The photosensitive resin 10 is taken out together with the reverse plate 9 after the resin cures as specified, and the uncured part is washed away to obtain a seal having an uneven surface. COPYRIGHT: (C)1987,JPO&Japio | ||||||
| 112 | JPS5759662B2 - | JP1213580 | 1980-02-05 | JPS5759662B2 | 1982-12-15 | ARETSUKU NIGERU BUROASU; JEROOMU JON KUOMO; ROBAATO BENJAMIN RAIBOOITSUTSU; UORUTAA UIRIAMU MOOZEN JUNIA |
| In formation of patterns by electron beam irradiation of resist, the resist is a surface migratable resist provided in thickness less than thickness required for pattern formation. Pref. the resist is formed on a thin film substrate supported by a non-electron backscattering substrate. The resist is exposed to a focussed electron beam to convert and fix the resist until the required pattern thickness is reached. Exposure duration control is esp. achieved by monitoring electron scattering by the converted and fixed resist. The nonelectron backscattering substrate is pref. Si, Si3N4, SiO2, Al2O3, polyimide, collodion or C. The resist is organic material, esp. silicone oil or tetraphenyl-tegramethyl-trisiloxane. Pattern line widths 100A can be formed as method avoids raggedness at the edges and provides control of pattern thickness and width. The resist pattern is useful in electrical contact control and light modulation, and may be used in situ, or may be used to transfer the pattern to another substrate for device formation using 20-50A X-ray irradiation. | ||||||
| 113 | Manufacture of visual sensation model, said model, its use as mold part and said mold | JP11546481 | 1981-07-24 | JPS5753317A | 1982-03-30 | SAMIYUERU PATORITSUKU RANDAASU; SUTEFUAN RATSUSHIYU; CHIYAARUZU UEZURII ROBAATSU |
| 114 | JPS5643845B1 - | JP4997372 | 1972-05-22 | JPS5643845B1 | 1981-10-15 | |
| 115 | JPS516564B2 - | JP4522372 | 1972-05-08 | JPS516564B2 | 1976-02-28 | |
| 116 | JPS497002A - | JP4522372 | 1972-05-08 | JPS497002A | 1974-01-22 | |
| 117 | 熱反応型レジスト材料、モールドの製造方法 | JP2013545904 | 2012-11-16 | JP6097223B2 | 2017-03-15 | 三田村 哲理; 中田 卓人 |
| 118 | 表面レリーフ微細構造、関連するデバイスおよびそれらを作製する方法 | JP2014266440 | 2014-12-26 | JP2015092268A | 2015-05-14 | イブン−エラージ,モハメド; マルツ,ジュリアン; ザイベルレ,フーベルト; ヴァルネット,ヴォルフガング |
| 【課題】パターン化された表面レリーフ微細構造を複製するための方法を提供する。 【解決手段】パターン化された表面レリーフ微細構造を持つ第一の層を生成する工程と、第一の層の微細構造を第二の層に複写し、それにより、少なくとも一つのドライまたはウェットエッチング工程を伴うことにより、マスタを生成する工程と、マスタの微細構造をレプリカ材料に接触させ、マスタの微細構造をレプリカに再現する、追加的な工程を含む、方法。 【選択図】なし |
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| 119 | ナノインプリント用樹脂スタンパ及びこれを使用したナノインプリント装置 | JP2010170379 | 2010-07-29 | JP5687857B2 | 2015-03-25 | 聡之 石井; 雅彦 荻野; 礼健 志澤; 恭一 森; 宮内 昭浩; 昭浩 宮内 |
| 120 | 射出成形用スタンパの製造方法 | JP2012528742 | 2010-09-06 | JP5667194B2 | 2015-02-12 | ヨン キュ キム; ソク ジェ ジョン |
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