子分类：
- G03F7/0002： .{应用除那些涉及放射线曝光方法外的背景重叠方法的平版印刷加工;例如压印}
- G03F7/0005： .{就以平版印刷加工或因此所使用的材料来区分的光学设备或元件的产品}
- G03F7/0012： .{制造过程中黏性平版印刷材料的用途,例如:用于安装;平版印刷材料的包装;通过加工照相平版印刷材料获得的包装}
- G03F7/0015： .{光圈装置的生产,多微孔系统或印记}
- G03F7/0017： .{用于压纹,切割或或类似装置的生产;用于铸造装置的生产}
- G03F7/002： .{应用包括微囊的材料;准备或加工此类材料,例如:通过加压;因此专门设计的装置或设备}
- G03F7/0035： .{多次加工,例如:对在前一步骤中已有保护层的加更深的保护层,加工有图案或纹路的表面}
- G03F7/0037： .{三维立体图像产品}
- G03F7/004： .感光材料(G03F7/12,G03F7/14优先)
- G03F7/12： .网屏印刷模或类似印刷模的制作,例如,镂花模版的制作
- G03F7/14： .珂罗版印刷模的制作
- G03F7/16： .涂层处理及其设备(用于基底材料涂层一般入B05;用于摄影目的而施加到基底上的感光成分入G03C1/74)
- G03F7/20： .曝光及其设备(复制用照相印制设备入G03B27/00)
- G03F7/26： .感光材料的处理及其设备(G03F7/12至G03F7/24优先)
- G03F7/70： .{用于显微光刻的曝光装置}
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 161 | 平版印刷原版及用其制版的方法 | CN94190214.5 | 1994-04-19 | CN1077048C | 2002-01-02 | 高桥源昭; 栗原正明 |
| 本发明涉及一种热敏性平版印刷原版，它包括：基底，含亲水性纛剂聚合物的亲水性层和通过加热能形成图像区的微胶囊包裹的亲油性物质；该亲水性粘结剂聚合物具有三维文联和能够在微胶囊分解时与微胶囊中亲油性物质进行化学结合的官能团，而该微胶囊包裹的亲油性物质具有能够在微胶囊分解时与亲水性粘结剂聚合物进行化学结合的官能团。本发明的热敏性平版印刷原版表现出优异的印刷耐久性和贮存稳定性，并提供具有清晰图像的印刷品，因为该版不会积存污物。此外，在制版方法中不需要进行显影，因而不存在废液处理等问题。因此，该原版不仅这用于轻印刷如办公室印刷，但也适用于报纸凸版轻转印刷、表格印刷等。 | ||||||
| 162 | 变色组合物及由其制造的有色聚合物产品 | CN99810390.X | 1999-07-23 | CN1316067A | 2001-10-03 | D·B·施尔利; I·M·施尔利; A·H·波帕特; M·R·爱德华兹; K·T·麦卡隆; H·B·舍尔 |
| 提供生产其上有所希望图像的聚合物层、或由多个所述聚合物层组成的三维物件的方法,其中含有可光染色颗粒的液态可光固化组合物的层用光固化,并且选择某些区域用不同剂量的光照射,由此形成所需图像。所述组合物含有分散于其中的颗粒,颗粒是含有处于阻隔层中的感光变色组合物的微胶囊,所述阻隔层基本上不透过变色组合物的各成分。或者所述颗粒是含不流动感光变色组合物的固体颗粒。该方法允许树脂固化和颗粒颜色改变使用相同的引发机理。 | ||||||
| 163 | 制造蚀刻高尔夫球棒零件的方法 | CN98804902.3 | 1998-03-18 | CN1255071A | 2000-05-31 | J·K·托纳; C·E·波普拉斯基 |
| 一种包括一个初步成形后要求有后续精整阶段的金属部分的高尔夫球棒零件(9),此零件的表面具有在精整阶段结束后用光化学方法蚀刻的艺术图案(S);蚀刻和制造金属零件的方法包括:在金属表面(20)上敷照相感光材料;使用印刷制版胶片(22);利用后续的光化学蚀刻(27)对准备形成艺术图案的表面区域进行加工;然后将照相感光胶从金属表面(28)上撕去和用编程计算机在印刷制版胶片上制成定制的图样。 | ||||||
| 164 | 抗蚀剂图案,形成抗蚀剂图案的工艺以及形成布线图案的工艺 | CN99124871.6 | 1999-11-18 | CN1254944A | 2000-05-31 | 丰田祐二; 越户义弘; 长谷川正幸 |
| 本发明提供了一种形成布线图案的工艺,包含步骤:通过光掩膜使抗蚀剂曝光,所述光掩膜具有线宽等于或小于分辨极限的图案;并使曝光后的抗蚀剂显像,以形成抗蚀剂图案,它的表面上具有槽凹陷,凹陷未达到抗蚀剂图案的背面。抗蚀剂可以是正抗蚀剂,其中抗蚀剂图案形成在底板馈送薄膜上;电镀金属沉淀在馈送薄膜未由抗蚀剂图案覆盖的区域中;在沉淀后将抗蚀剂去掉;在未由电镀金属覆盖的区域中将馈送薄膜选择性地去掉。 | ||||||
| 165 | 制造微结构体的方法 | CN98119503.2 | 1998-09-18 | CN1212382A | 1999-03-31 | H·雷内克; N·卡皮茨; U·斯皮茨纳; R·-U·巴尔霍恩; B·谢菲梅尔 |
| 本发明涉及按照LIGA－法制造微结构,它是将塑料层用X－射线按图形深入照射。塑料层中形成的可溶性的或保持可溶性的部分用一种显影剂选择性地溶解。已知的塑料需要很大的照射耗费。本发明的制造方法采用光照硬化的环氧胶,与已知的塑料对比,只需比较短的照射时间。该微结构可以具有很大的纵横比,并且在较大的结构深度下也可进行无异议的显影。制成的结构的精密度达到亚微米的范围。本方法可制成高质量的深度微结构,同时降低照射耗费,因而具有较大的经济性。 | ||||||
| 166 | 孔片的制造方法 | CN96190029.6 | 1996-03-23 | CN1149907A | 1997-05-14 | 斯特凡·阿恩特; 迪特马尔·亨; 海因茨·富克斯; 格特弗里德·弗利克; 京特·丹特斯; 吉尔贝特·默尔施; 德特勒夫·诺瓦克; 约尔格·海泽; 贝亚特·沃尔兹; 弗朗克·舍茨 |
| 本发明涉及到一种孔片的制造方法。孔片呈多层结构，突出之处在于，其中制造有一条轴向完全贯通的液体通路，尤其是供燃油流过的通路。此通路由入口(36)、出口(38)和至少一条介于二者之间的连通通道(42)构成。孔片(23)的片层或功能层(35、37、40)通过电镀金属沉积依次逐层得到(多层电镀技术)。由此制得的孔片特别适用于燃料喷入装置中的入喷阀门上、涂漆喷嘴、吸入器、喷墨打印机或冷冻干燥过程中，以完成如饮料等液体的喷出、喷入。 | ||||||
| 167 | 用于喷油嘴的孔片 | CN96190044.X | 1996-03-23 | CN1145656A | 1997-03-19 | 斯特凡·阿恩特; 迪特马尔·亨; 海因茨·富克斯; 格特弗里德·弗利克; 京特·丹特斯; 吉尔贝特·默尔施; 德特勒夫·诺瓦克; 约尔格·海泽; 贝亚特·沃尔兹; 弗朗克·舍茨 |
| 一种孔片，包含一用于液体流动的完全贯通的通道，该通道由进口(36)，出口(38)和至少一位于其间的通道(42)组成。具有独特的孔结构(36、38、42)的孔片(23)的至少三个功能级层(35、37、40)通过电镀金属沉积技术制成(多层覆金属电镀技术)。孔片(23)的一个电镀沉积镀层可具有一个或多个功能级层(35、37、40)。该孔片23尤其适用于燃料喷射装置的喷油嘴、喷漆嘴、医用吸入器、喷墨打印机或冷冻干燥过程中，以完成液体例如饮料的喷入或喷射，药物的喷撒。 | ||||||
| 168 | 无需母片为媒介的制造光盘的型片的方法 | CN95102747.6 | 1995-02-14 | CN1121240A | 1996-04-24 | M·E·鲁曼-休斯肯; A·T·范德普拉特 |
| 本发明涉及一种制造光盘型片的方法，将光刻胶膜施加到一个未定型的型模板上，对该膜进行选择性地曝光和显影，构成光刻胶膜。可采用负性光刻胶或正性的光刻胶以不同的工艺来进行。 | ||||||
| 169 | 为微型机械装置提供牺牲分隔层的方法 | CN95107256.0 | 1995-06-19 | CN1117148A | 1996-02-21 | 詹姆斯·C·贝克; 斯科特·H·普伦格 |
| 一制作微型机械装置的方法，其采用从一基底高起的支承件支承可运动件。首先，制作有反射性顶面的支承件。然后在支承件上沉积一层光刻胶，使其厚度基本上覆盖反射性顶面。将光刻胶层曝光，产生出在支承件之上的曝光强的区域和在各支承件之间的曝光弱的区域。这样使得可对后续的显影工序进行控制，使在各支承件之间的光刻胶材料被除去一些之后的高度与支承件的反射性顶面在同一平面内，同时保证将支承件之上的光刻胶材料除去。 | ||||||
| 170 | 显示装置 | CN201721172053.7 | 2017-09-13 | CN207381400U | 2018-05-18 | 铃村功; 渡壁创; 花田明纮; 渡边裕一 |
| 本实用新型涉及显示装置。本实用新型要解决的课题为能够在同一基板内形成LTPSTFT和氧化物半导体TFT。解决手段为一种显示装置，其为在基板(100)上形成有具有氧化物半导体层(102)的第一TFT、和具有Poly‑Si层(106)的第二TFT的显示装置，显示装置的特征在于，在基板(100)上形成基膜(101)，在基膜(101)上方形成氧化物半导体层(102)，在氧化物半导体层(102)上方形成第一层间绝缘膜(105)，在所述第一层间绝缘膜(105)上方形成所述Poly‑Si层(106)。 | ||||||
| 171 | PROCEDURE OF 2D AND 3D OPTICALLY ASSISTED FOUNTAIN PEN NANOLITHOGRAPHY AND APERTURE PEN NANOLITHOGRAPHY | PCT/RO2012000012 | 2012-06-12 | WO2012173506A8 | 2013-05-10 | MOAGAR-POLADIAN GABRIEL |
| The invention refers to a procedure of 2D and 3D optically assisted fountain pen and aperture pen nanolithography that deposits ink (1) through a cantilever (2) having a perforated tip onto a substrate (4), the cantilever (2) having a channel inside it and being fed with ink (1) by the microfluidic chip (6), the deposition of ink (1) being made under illumination with light from beam (5). The light beam (5) has the role of either photopolymerize ink (1) when ink (1) is a photopolymerizable monomer or to accelerate the evaporation of the solvent that enters into composition of ink (1). | ||||||
| 172 | METHOD FOR MANUFACTURING MICRO STRUCTURE USING X-RAY EXPOSURE | PCT/KR2009006385 | 2009-11-02 | WO2010053277A3 | 2010-08-05 | KWON TAI-HUN; LEE BONG-KEE |
| The present invention comprises: a photoresist exposure step of exposing a photoresist by a lateral exposure technique by installing an X-ray mask and irradiating an X-ray; a photoresist etching step of etching the exposed photoresist; a mold formation step of fabricating a mold having a micro pattern by filling a metal into the etched photoresist; a mold module formation step of combining a plurality of molds; and a micro structure formation step of forming a micro structure. | ||||||
| 173 | PATTERNED NANOSUBSTRATES MADE BY DIRECTED SELF ASSEMBLY OF AMPHIPHILIC MOLECULES | PCT/US2008012977 | 2008-11-21 | WO2009075720A9 | 2009-08-06 | BUSNAINA AHMED; MEAD JOEY L; BARRY CAROL M F; WEI MING |
| Nanoscale patterns prepared by lithography are used to direct the self-assembly of amphiphilic molecules to form patterned nanosubstrates having a desired distribution of chemical functional moieties. These patterns can be fabricated over a large area and require no special limitations on the chemistry the assembled amphiphiles. Hydrophilic/hydrophobic patterns can be created and used to direct the deposition of a single functional component to specific regions of the surface or to selectively assemble polymer blends to desired sites in a one step fashion with high specificity and selectivity. The selective deposition of functional moieties on a patterned surface can be based on electrostatic forces, hydrogen bonding, or hydrophobic interactions. The methods and patterned nanosubstrates of the invention can be used in the assembly of functional polymer systems, polyelectrolytes, biomolecules, conducting polymers, colloids and nanoparticles, and find wide technological applications in biosensors, biochips, photonics and electronics. | ||||||
| 174 | ETCH-ENHANCED TECHNIQUE FOR LIFT-OFF PATTERNING | PCT/US2007020234 | 2007-09-18 | WO2008097278A3 | 2008-11-20 | SCHMID GERARD; RESNICK DOUGLAS J |
| An enhanced process forming a material pattern on a substrate deposits the material anisotropically on resist material patterned to correspond to an image of the material pattern. The material is etched isotropically to remove a thickness of the material on sidewalls of the resist pattern while leaving the material on a top surface of the resist pattern and portions of the surface of the substrate. The resist pattern is removed by dissolution thereby lifting-off the material on the top surface of the resist pattern while leaving the material on the substrate surface as the material pattern. Alternately, a first material layer is deposited on the resist pattern and a second material layer is deposited and planarized. The second material layer is etched exposing the first material while leaving the second material in features of the resist pattern. The first material and the resist are removed leaving the first material pattern. | ||||||
| 175 | METHOD AND SYSTEM FOR REPLICATING FILM DATA TO A METAL SUBSTRATE AND ARTICLE OF MANUFACTURE | PCT/US2004001401 | 2004-01-15 | WO2004066276A3 | 2006-11-09 | BISHOP JOHN L; WHEELER MICHAEL A; HARRINGTON KENNETH M JR |
| A method and system for recording or replicating data in a film media to a metal substrate, such as a nickel substrate. An ultraviolet light source is directed to a sheet of microfiche. The resulting microfiche image is collimated and reduced with an optics system. The reduced image is directed to a wafer of silicon. The silicon wafer is developed, resulting in a mask representative of the documents or data in the film media. A metal seed or base layer is developed on the mask. One or more metal layers are deposited onto the seed layer to form a metal substrate having the film media data or documents formed therein. | ||||||
| 176 | FABRICATION OF POLYMERIC STRUCTURES | PCT/GB2005002024 | 2005-05-23 | WO2005114329A3 | 2006-08-24 | PILETSKY SERGEY ANATOLIYOVICH; CULLEN DAVID CHARLES; HENRY OLIVIER YVES FREDERIC |
| A substrate in contact with a solution of polymerisable monomer(s) is subjected to patterned localised heating by means of a scannable laser, causing local polymerisation with generation of a pattern of polymer. The resulting patterned polymer array can be used e.g. in assay devices. | ||||||
| 177 | METHOD OF LIFT-OFF MICROSTRUCTURING DEPOSITION MATERIAL ON A SUBSTRATE, SUBSTRATES OBTAINABLE BY THE METHOD, AND USE THEREOF | PCT/DK0200274 | 2002-04-25 | WO02095497A2 | 2002-11-28 | BOUAIDAT SALIM; JONSMANN JACQUES; WINTHER-JENSEN BJOERN; CHRISTENSEN SOEREN FLYGENRING |
| Methods and apparatus for lift-off microstructuring deposition material, here alternate hydrophilic (601) and hydrophobic (602) letters, on a substrate; a method comprising deposition of polymeric material by plasma polymerisation deposition of monomers of substituted benzenes, (halo)aliphatic compounds, or a combination thereof; another method comprising deposition of polymeric material by plasma polymerisation deposition of monomers of vinyls, substituted vinyls, acrylics, silanes, and phosphites, or a combination thereof; still another method comprising deposition of polymeric material by plasma polymerisation deposition of monomers wherein said plasma is generated by a multiple phase AC supply, or DC supply; and substrates and devices prepared by lift-off microstructuring using plasma polymerisation deposition of monomers according to such methods. Scale A indicates about 100 mu . | ||||||
| 178 | FUNCTIONALISING POLYMERIC MATERIALS | PCT/GB0202186 | 2002-05-10 | WO02091081A2 | 2002-11-14 | FISH DEBORAH JANE; WATSON SUSAN; SOM AMIT KUMAR; WHITE MATTHEW CHARLES; LAITENBERGER PETER GEORG; CHAMBERS STEPHEN HENRY |
| The invention provides a method for functionalising all or part of a surface of a structure fabricated from a crosslinkable polymeric material comprising the steps of; defining a structure in a material that is crosslinkable by undergoing a curing process; the curing process involving cross-linking of reactive functional groups in the polymeric material; performing the curing process under conditions where at least part of the surface of the defined structure is in contact with a polymeric material that is non-crosslinkable under the conditions of the curing process; removing the non-crosslinkable polymeric material from the surface of the defined structure after curing, whereby said surface comprises unreacted functional groups. The structure may be a shaped, coded, microparticle and may have attached thereto chemical moieties and/or biomolecules. | ||||||
| 179 | METHOD FOR SURFACE PATTERNING USING A FOCUSED LASER | PCT/IL0000773 | 2000-11-20 | WO0138940A3 | 2002-01-10 | ELBAUM MICHAEL; ZBAIDA DAVID; KLEIN EUGENIA; LACHISH-ZALAIT AURELIE |
| A method for direct micropatterning of a surface by laser irradiation comprises: (i) covering a surface with a sample comprises either a homogeneous solution of one or more soluble metal salts, or a solution or suspension of a metal-ion containing compound of type A; (ii) irradiating the surface locally by applying a focused laser beam, thus resulting in local deposition of either (a) a metal(s) or metal oxide(s) obtained from the decomposition of the metal salt(s) from said homogeneous solution, or (b) a metal-ion containing compound of type B obtained from the decomposition of the initial type A compound from said solution or suspension; and (iii) repeating step (ii) by moving either the laser or the sample thus creating spots or lines of the deposited metal(s) or metal oxide(s), or compound of type B. By this method patterned lines of silver and modified or capped silver, gold, copper oxide and molybdenum disulfide were obtained. | ||||||
| 180 | ARRAYS OF ORGANIC COMPOUNDS ATTACHED TO SURFACES | PCT/US9928021 | 1999-11-23 | WO0033084A3 | 2000-08-10 | ZEBALA JOHN A |
| Compositions and methods are provided for performing regionally selective solid-phase chemical synthesis of organic compounds. Such methods may employ solvent-resistant photoresist compositions to prepare arrays of organic compounds, such as ligands, for use within a variety of diagnostic and drug discovery assays. Ligand-arrays may comprise, for example, nucleobase polymers that are resistant to degradative enzymes. | ||||||
QQ群二维码
意见反馈
意见反馈