子分类：
- G03F7/0002： .{应用除那些涉及放射线曝光方法外的背景重叠方法的平版印刷加工;例如压印}
- G03F7/0005： .{就以平版印刷加工或因此所使用的材料来区分的光学设备或元件的产品}
- G03F7/0012： .{制造过程中黏性平版印刷材料的用途,例如:用于安装;平版印刷材料的包装;通过加工照相平版印刷材料获得的包装}
- G03F7/0015： .{光圈装置的生产,多微孔系统或印记}
- G03F7/0017： .{用于压纹,切割或或类似装置的生产;用于铸造装置的生产}
- G03F7/002： .{应用包括微囊的材料;准备或加工此类材料,例如:通过加压;因此专门设计的装置或设备}
- G03F7/0035： .{多次加工,例如:对在前一步骤中已有保护层的加更深的保护层,加工有图案或纹路的表面}
- G03F7/0037： .{三维立体图像产品}
- G03F7/004： .感光材料(G03F7/12,G03F7/14优先)
- G03F7/12： .网屏印刷模或类似印刷模的制作,例如,镂花模版的制作
- G03F7/14： .珂罗版印刷模的制作
- G03F7/16： .涂层处理及其设备(用于基底材料涂层一般入B05;用于摄影目的而施加到基底上的感光成分入G03C1/74)
- G03F7/20： .曝光及其设备(复制用照相印制设备入G03B27/00)
- G03F7/26： .感光材料的处理及其设备(G03F7/12至G03F7/24优先)
- G03F7/70： .{用于显微光刻的曝光装置}
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 201 | RESIN COMPOSITION AND OPTICAL FILM USING SAME | US15766262 | 2016-10-14 | US20180305537A1 | 2018-10-25 | Kenji HARA; Masatomi IRISAWA |
| Provided are: a resin composition which has excellent transparency and coating properties and exhibits low liquid crystal-contaminating properties; and an optical film using the same. The resin composition contains a polyvinyl alcohol and a polyester, and the polyester has a carboxyl group and/or a carboxyl group salt as a substituent(s). The polyvinyl alcohol is preferably a homopolymer or a copolymer that contains vinyl alcohol as an essential monomer, and it is preferred that the polyvinyl alcohol has an acetoacetate group. | ||||||
| 202 | Systems and Methods for Optimizing Focus for Imaging-Based Overlay Metrology | US15574294 | 2017-09-14 | US20180292198A1 | 2018-10-11 | Amnon Manassen; Andrew Hill |
| Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves. | ||||||
| 203 | HEAT EXCHANGER | US15478399 | 2017-04-04 | US20180283810A1 | 2018-10-04 | Sergey Mironets; Vijay Narayan Jagdale; Colette O. Fennessy |
| A method of manufacturing a component susceptible to multiple failure modes includes generating a stereolithography file including a geometry of the component. The geometry of the stereolithography file is divided into a plurality of layers. Each of the layers includes a first portion and a second portion of the component. Energy from an energy source is applied to a powdered material such that the powdered material fuses to form the first portion and the second portion of each of the plurality of layers. Applying energy from the energy source to form the first portion of the plurality of layers includes operating the energy source with a first set of parameters and applying energy from the energy source to form the second portion of the plurality of layers includes operating the energy source with a second set of parameters. The first set and second set of parameters are different. | ||||||
| 204 | METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANCE SPECTRA MATCHING AND SURFACE KINETIC MODEL OPTIMIZATION | US15972063 | 2018-05-04 | US20180260509A1 | 2018-09-13 | Mehmet Derya Tetiker; Saravanapriyan Sriraman; Andrew D. Bailey, III; Alex Paterson; Richard A. Gottscho |
| Disclosed are methods of optimizing a computer model which relates the etch profile of a feature on a semiconductor substrate to a set of independent input parameters (A), via the use of a plurality of model parameters (B). In some embodiments, the methods may include modifying one or more values of B so as to reduce a metric indicative of the differences between computed reflectance spectra generated from the model and corresponding experimental reflectance spectra with respect to one or more sets of values of A. In some embodiments, calculating the metric may include an operation of projecting the computed and corresponding experimental reflectance spectra onto a reduced-dimensional subspace and calculating the difference between the reflectance spectra as projected onto the subspace. Also disclosed are etch systems implementing such optimized computer models. | ||||||
| 205 | Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element | US14960121 | 2015-12-04 | US10072921B2 | 2018-09-11 | Jiyou Fu; Noam Sapiens; Kevin A. Peterlinz; Stilian Ivanov Pandev |
| A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles. | ||||||
| 206 | SURFACE TREATMENT METHOD AND SURFACE TREATMENT LIQUID | US15909183 | 2018-03-01 | US20180254182A1 | 2018-09-06 | Yuriko SHIRAI; Daijiro MORI; Akira KUMAZAWA |
| To provide a surface treatment method capable of highly hydrophobizing (silylating) a surface of a treatment target while deterioration of polyvinyl chloride is suppressed when surface treatment of the treatment target such as an inorganic pattern and a resin pattern is carried out using a device having a liquid contact portion provided with a member made of polyvinyl chloride, and also provide a surface treatment liquid suitably used for the surface treatment method. A surface treatment liquid used for the surface treatment method includes a silylating agent (A) and a solvent (S), the silylating agent (A) does not have an alkoxy group bonded to a silicon atom, and the solvent (S) does not have a hydroxyl group bonded to a carbon atom. A value of dH in Hansen solubility parameters (HSP) in the solvent (S) is 3.2 MPa1/2 or less or 10.5 MPa1/2 or more. Relative Energy Difference represented by Ra/R0 is 1.2 or more, where the interaction radius of polyvinyl chloride in the Hansen space is defined as R0 and a distance between the HSP of the polyvinyl chloride and HSP of the solvent (S) is defined as Ra. | ||||||
| 207 | PHOTOSENSITIVE RESIN COMPOSITION FOR RELIEF PRINTING ORIGINAL PLATE AND RELIEF PRINTING ORIGINAL PLATE OBTAINED THEREFROM | US15754398 | 2016-08-02 | US20180236804A1 | 2018-08-23 | Kazuya Yoshimoto; Atsushi Tatsuyama; Jun Hasuike |
| The present invention provides a photosensitive resin composition for a relief printing original plate which can achieve both of a printing reproducibility of gradation of a highlight part and a printing durability, and can further achieve a low plate surface tackiness. A photosensitive resin composition for a relief printing original plate containing water-soluble or water-dispersible polyamide, a photopolymerizable unsaturated compound and a photopolymerization initiator as essential ingredients, characterized in that a total of a content of an alicyclic structural unit obtained from diamine and a content of an alicyclic structural unit obtained from dicarboxylic acid in the polyamide is 30 to 90 molar %, and the content of the alicyclic structural unit obtained from dicarboxylic acid in the polyamide is 20 molar % or more. | ||||||
| 208 | Porosity measurement of semiconductor structures | US15582331 | 2017-04-28 | US10041873B2 | 2018-08-07 | Shankar Krishnan |
| Methods and systems for performing optical measurements of the porosity of geometric structures filled with a fill material by a capillary condensation process are presented herein. Measurements are performed while the structure under measurement is treated with a flow of purge gas that includes a controlled amount of vaporized fill material. A portion of the fill material condenses and fills openings in the structural features such as pores of a planar film, spaces between structural features, small volumes such as notches, trenches, slits, contact holes, etc. In one aspect, the desired degree of saturation of vaporized material in the gaseous flow is determined based on the maximum feature size to be filled. In another aspect, measurement data is collected when a structure is unfilled and when the structure is filled. The collected data is combined in a multi-target model based measurement to estimate values of porosity and critical dimensions. | ||||||
| 209 | PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME | US15312883 | 2016-10-05 | US20180215850A1 | 2018-08-02 | Hyung-Jong LEE; Nam Seob BAEK; Jonghwi LEE; Yun Jung SEO; Hyun Jin YOO |
| The present invention relates to a photocurable resin composition usable in a nanoimprint process which is capable of overcoming low productivity of conventional semiconductor processes for optical devices and electronic devices, and a method of forming patterns using the same. Specifically, the present invention relates to a photocurable resin composition including a specific perfluorinated acrylic compound for improving release property between a nanoimprint mold and the photocurable resin composition, and a method of forming patterns using the same. | ||||||
| 210 | Guide pattern data correcting method, pattern forming method, and computer readable record medium | US15377472 | 2016-12-13 | US10019547B2 | 2018-07-10 | Hiroki Yonemitsu |
| According to one embodiment, a guide pattern data correcting method is for correcting guide pattern data of a physical guide for formation of a polymer material to be microphase-separated. The physical guide has a plurality of concave portions in the guide pattern data, and at least two concave portions out of the plurality of concave portions are connected to each other. The guide pattern data is subjected to correction by shifting or rotation of at least either of the two connected concave portions. | ||||||
| 211 | FLEXOGRAPHIC PRINTING PLATE | US15904894 | 2018-02-26 | US20180186161A1 | 2018-07-05 | Seiichiro MORIKAWA; Yusuke NAMBA |
| An object of the present invention is to provide a flexographic printing plate having excellent ink transferability in a solid portion and the like and having good printing quality in a halftone portion. The flexographic printing plate of the present invention is a flexographic printing plate having a relief layer including a non-image area and an image area, in which the image area has a halftone dot portion having a halftone dot area ratio of more than 0% and less than 100%, and a solid portion having a halftone dot area ratio of 100%, small dots in the halftone dot portion and the solid portion or small dots in the halftone dot portion have two or more recessed portions having different depths according to a halftone dot area ratio, and the two or more recessed portions having different depths are recessed portions whose depth becomes deeper as the halftone dot area ratio increases. | ||||||
| 212 | MEMBRANE BONDING WITH PHOTORESIST | US15902570 | 2018-02-22 | US20180179053A1 | 2018-06-28 | Andrew Joyce; Sean Taffler; Paul Reynolds; Nicholas Lavada Nemeth; Adam Stephen Elhadad; Boozarjomehr Faraji |
| Systems and techniques are provided for membrane bonding. A photoresist may be applied to an ultrasonic device. A portion of the photoresist may be removed. A bonding agent may be applied a portion of the photoresist that is not removed. A membrane may be placed on the ultrasonic device such that the membrane is in contact with the ultrasonic device through the bonding agent and the photoresist. The membrane and the ultrasonic device may be placed in between a first flat plate and a second flat plate, such that the second flat plate rests on top of the membrane. Light pressure may be applied to the membrane. The light pressure may be applied by one or more of the weight of the second flat plate and a pressure providing device applying pressure to either or both of the first flat plate and the second flat plate. | ||||||
| 213 | Resist Having Tuned Interface Hardmask Layer For EUV Exposure | US15825250 | 2017-11-29 | US20180166277A1 | 2018-06-14 | Michael P. Belyansky; Ravi K. Bonam; Anuja Desilva; Scott Halle |
| A method is disclosed to prepare a substrate for photolithography. The method includes forming an underlayer over a surface of the substrate; depositing an interface hardmask layer on the underlayer using one of a vapor phase deposition process or an atomic layer deposition process; and forming a layer of extreme UV (EUV) resist on the interface hardmask layer, where the interface hardmask layer is comprised of material having a composition and properties tuned to achieve a certain secondary electron yield from the interface hardmask layer. Also disclosed is a structure configured for photolithography. The structure includes a substrate; an underlayer over a surface of the substrate; an interface hardmask layer disposed on the underlayer; and a layer of EUV resist disposed on the interface hardmask layer. The interface hardmask layer contains material having a composition and properties tuned to achieve a certain secondary electron yield from the interface hardmask layer. | ||||||
| 214 | INTEGRATED CASTING CORE-SHELL STRUCTURE WITH PRINTED TUBES FOR MAKING CAST COMPONENT | US15377673 | 2016-12-13 | US20180161852A1 | 2018-06-14 | Michael John MCCARREN; James Herbert DEINES; Xi YANG; Brian David PRZESLAWSKI |
| The present disclosure generally relates to integrated core-shell investment casting molds that provide filament structures corresponding to cooling hole patterns on the surface of the turbine blade or stator vane, which provide a leaching pathway for the core portion after metal casting. The invention also relates to core filaments that can be used to supplement the leaching pathway, for example in a core tip portion of the mold. | ||||||
| 215 | PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE-MAKING METHOD | US15882019 | 2018-01-29 | US20180154671A1 | 2018-06-07 | Takeshi INASAKI; Hiroaki IDEI; Atsuyasu NOZAKI |
| A planographic printing plate precursor includes: a support; and an image recording layer on the support, and the image recording layer contains a polymer having any group selected from a sulfonamide group, an amide group, an imide group and a carbonate group in a main chain and having a group represented by the following Formula (1): X—Ran (1) wherein X represents a single bond or an oxygen atom, Ra represents an alkylene group having 6 to 40 carbon atoms in a case where X represents a single bond and Ra represents an alkylene group having 2 to 20 carbon atoms in a case where X represents an oxygen atom, and n represents an integer of 1 to 90 | ||||||
| 216 | Post exposure processing apparatus | US15435007 | 2017-02-16 | US09964863B1 | 2018-05-08 | Viachslav Babayan; Ludovic Godet; Kyle M. Hanson; Robert B. Moore |
| Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module. | ||||||
| 217 | WALLET-SIZED COMB | US15822277 | 2017-11-27 | US20180070697A1 | 2018-03-15 | Heather Burkman |
| A wallet-sized comb is produced by a method of processing a metal substrate having a thickness similar to a credit card. The method includes receiving a comb design including a top portion and a teeth portion, the teeth portion including a plurality of spaced-apart teeth for combing hair and cutting the metal substrate based on the comb design, the cutting performed using a chemical etching technique, where the metal substrate has a thickness at or below 1.2 millimeter. The method further includes extracting a metal comb from the metal substrate generated from the chemical etching technique and de-burring the metal comb, as well as applying a powder coat finish to the metal comb to generate the wallet comb. The comb design may include a design and/or letters in the top portion, such top portion elements cut also using the chemical etching process. | ||||||
| 218 | FLEXO PRINTING PLATE | US15789606 | 2017-10-20 | US20180056699A1 | 2018-03-01 | Hiroshi TASHIRO |
| Provided is a flexo printing plate which makes it possible to perform printing in which the discontinuity of density is not visually recognized by inhibiting the enlargement of halftone dots in the boundary between an image area having a low halftone dot rate and a non-image area. The flexo printing plate has a constitution in which the image area has a highlight halftone dot area having a halftone dot rate higher than 0% and equal to or lower than 10%, and within the highlight halftone dot area, among small dots constituting the highlight halftone dot area, at least one of the small dots adjacent to the non-image area that continues 10 mm or further from the edge of the highlight halftone dot area in a direction orthogonal to the edge has a distal end diameter smaller than the average of distal end diameters of the small dots in the highlight halftone dot area. | ||||||
| 219 | Reference Image Contour Generation | US15285925 | 2016-10-05 | US20180053291A1 | 2018-02-22 | Weimin Ma; Zongqiang Yu |
| A method for reference image contour generation includes generating a mask pattern based on design target information, generating a reference image based on a simulation of photolithographic effects on the mask pattern, generating a reference image contour pattern based on edge detection in the reference image, and generating a scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit. | ||||||
| 220 | RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE | US15185899 | 2016-06-17 | US20170362460A1 | 2017-12-21 | Akiya KAWAUE; Takehiro SESHIMO; Takaya MAEHASHI; Tasuku MATSUMIYA; Ken MIYAGI; Hitoshi YAMANO; Xuanxuan CHEN; Paul Franklin NEALEY |
| A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being −4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3. | ||||||
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