子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 121 | Process for preparing spherical, monodispersed organopolysiloxanes or silicon oxycarbides | US526088 | 1990-05-21 | US5130400A | 1992-07-14 | Bernd Pachaly |
| The invention relates to a process for preparing spherical, monodispersed organopolysiloxanes, which comprises reacting an alkoxysilane of the general formula ##STR1## in which the R's are selected from the group consisting of methyl, ethyl, n-propyl, iso-propyl, n-butyl, sec-butyl or tert-butyl radicals, with water at a molar ratio of water to alkoxysilane of 40 moles:1 mole to 80 moles:1 mole, and a process for preparing spherical, monodispersed silicon oxycarbides from these organopolysiloxanes. | ||||||
| 122 | Hybrid sol-gel optical materials | US479136 | 1990-02-13 | US5130397A | 1992-07-14 | John M. Zeigler |
| Hybrid sol-gel materials comprise silicate sols cross-linked with linear polysilane, polygermane, or poly(silane-germane). The sol-gel materials are useful as optical identifiers in tagging and verification applications and, in a different aspect, as stable, visible light transparent non-linear optical materials. Methyl or phenyl silicones, polyaryl sulfides, polyaryl ethers, and rubbery polysilanes may be used in addition to the linear polysilane. The linear polymers cross-link with the sol to form a matrix having high optical transparency, resistance to thermooxidative aging, adherence to a variety of substrates, brittleness, and a resistance to cracking during thermal cycling. | ||||||
| 123 | Light-sensitive polymer, method for preparing the same andmethod for forming patterns | US622152 | 1990-12-03 | US5126419A | 1992-06-30 | Yoshiyuki Tani; Masayuki Endou; Kazufumi Ogawa; Yasuhisa Tanaka; Toshinobu Ishihara; Tohru Kubota |
| A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system. | ||||||
| 124 | Process for preparing organosilicon polymers | US461560 | 1990-01-05 | US5124423A | 1992-06-23 | Raymond T. Leibfried |
| Novel thermoset and thermoplastic organosilicon polymers, comprised substantially of alternating polycyclic hydrocarbon residues and cyclic polysiloxane or tetrahedral siloxysilane residues linked through carbon-silicon bonds, are disclosed. | ||||||
| 125 | Novel polydiorganosiloxylated thiuram disulfides and radical polymerization of vinyl monomers therewith | US591824 | 1990-10-02 | US5089581A | 1992-02-18 | Gilbert Clouet |
| Novel polydiorganosiloxane substituted thiuram disulfides have the formula: ##STR1## and are useful for the radical polymerization of vinyl monomers to produce polydiorganosiloxane/polyvinyl/polydiorganosiloxane block copolymers having improved physical properties. | ||||||
| 126 | Naphthalocyanine based compound and optical recording medium containing the same | US466545 | 1990-01-17 | US5009986A | 1991-04-23 | Takayuki Kawaguchi; Takashi Shiro; Kaoru Iwata; Takahiro Daido |
| A novel naphthalocyanine based compound having Si atom as a central metal and groups selected from ##STR1## CN, and --CH.dbd.CH.sub.2 which is bonded to said Si atom via a specific hydrocarbon group, by which solubility in an organic solvent, compatibility with a polymeric substance and durability against an infrared ray are improved. The compound may be incorporated into a polymeric substance layer to form a recording layer of an optical recording medium. | ||||||
| 127 | Photoresponsive imaging members with hole transporting polysilylene ceramers | US288197 | 1988-12-22 | US4917980A | 1990-04-17 | Santokh S. Badesha; Milan Stolka; Richard L. Schank |
| A charge transporting polysilylene-ceramer for use in layered imaging members comprised of ##STR1## wherein R.sub.1 l and R.sub.2 are independently selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, and alkoxy; and n represents the number of repeating units. | ||||||
| 128 | Polysilane-siloxane oligomers and copolymers and methods of making the same | US754093 | 1985-07-11 | US4626583A | 1986-12-02 | Barry C. Arkles |
| Linear polysilane-siloxane copolymers having remarkable sensitivity to radiation have the general formula[(SiMe.sub.2).sub.m ].sub.a [(OSiMeR).sub.n ].sub.bwherein Me is a methyl group, R is lower alkyl or phenyl, m=4 to about 30 inclusive, n=1 to about 100 inclusive, a and b may each be 1 to about 10 inclusive, and a units alternate with b units. The copolymers of the invention may be in the form of oligomers, random copolymers where n=1 to 9, block copolymers where n=10 to 100, and mixed (random and block) copolymers. These copolymers may also be in the form of modified copolymers having reactive functional groups such as acrylate, methacrylate, vinyl or other unsaturated substitutions. The copolymers may be produced by formation of a halogen terminated oligomer of a polysilane or polysilane-siloxane copolymer, followed by coupling the oligomers with themselves or with distinct higher molecular weight silanol terminated siloxane species. Depending upon their specific structures, the copolymers respond to electron beam or ultraviolet radiation by depolymerizing, behaving as photoinitiators for acrylate polymerization or cross-linking. | ||||||
| 129 | Disilane/organosilicon resin having enhanced thermomechanical properties | US735994 | 1985-05-20 | US4618666A | 1986-10-21 | Hugues Porte |
| Novel high performance disilane/organosilicon resins useful, e.g., as molding powders and textile and building waterproofing agents (either in the form of aqueous dispersions or organic solutions thereof), comprise cohydrolysis/condensation reaction products in heterogeneous solvent medium of admixture of organochlorosilanes and organochlorodisilanes, said admixture comprising:(i) from about 10 to 70 molar % of at least one diorganochlorosilane having the formula R.sub.2 SiCl.sub.2, in which the radicals R, which may be identical or different, are each hydrogen, methyl or phenyl;(ii) from about 30 to 70 molar % of at least one methylchlorodisilane which comprises at least about 30 moles % of tetrachloro-1,2-dimethyldisilane; and(iii) from 0 to about 60 molar % of at least one organotrichlorosilane having the formula R'SiCl.sub.3, in which R' is defined as is R above;and said resins having an average functionality of from about 2.2 to 3. | ||||||
| 130 | Polyquaternary polysiloxane polymers | US718428 | 1985-04-01 | US4587321A | 1986-05-06 | Henri Sebag; Alexandre Zysman |
| Quaternary siloxane polymers of the formula: ##STR1## in which A denotes an .alpha.,.beta.-bis-alkylpolysiloxane or a C.sub.1-6 hydrocarbon chain which can contain OH groups and can be interrupted by one or more oxygen atoms and/or aromatic rings; R.sub.1, R.sub.2, R.sub.3 and R.sub.4, which are identical or different, denote a C.sub.1 -C.sub.6 alkyl or phenyl; R.sub.5 =methyl, ethyl or --CH.sub.2 --; R.sub.6 =C.sub.1 -C.sub.18 alkyl or --CH.sub.2 --; if R.sub.5 and/or R.sub.6 denote --CH.sub.2 --, they form a methylpiperazinium radical or ethylpiperazinium radical, a diethylenediamine radical or a heterocycle with --N--A--N--; Y denotes one of the anions Cl.sup.-, Br.sup.-, CH.sub.3 SO.sub.3.sup.-, ##STR2## m=1-6; and p=1-50 are disclosed for use, in particular, for treating the hair, nails and skin. They are resistant to several rinses on these substrates. | ||||||
| 131 | Elastomeric organopolysiloxane block copolymers and non-elastomeric organosilicic copolymer blocks therefor | US3885 | 1979-01-16 | US4233427A | 1980-11-11 | Michel Bargain; Christian Prud'Homme |
| Thermoplastic, crystalline block copolymers are disclosed, each comprising a plurality of recurring units selected from the group consisting of those of the structural formulae F.sub.1 and F'.sub.1, and combinations thereof:F.sub.1 : --A [SiR.sub.2 (GSiR.sub.2).sub.a ASiR.sub.2 G'SiR.sub.2 A].sub.p SiR.sub.2 (GSiR.sub.2).sub.a ASiR.sub.2 (OSiR.sub.2).sub.n ]andF'.sub.1 : --A [SiR.sub.2 G'SiR.sub.2 ASiR.sub.2 (GSiR.sub.2).sub.a A].sub.p SiR.sub.2 G'SiR.sub.2 ASiR.sub.2 (OSiR.sub.2).sub.n ]in whichthe symbols A, which are identical, represent linear or branched chain alkylene radicals having from 2 to 6 carbon atoms, or cyclohexylene radicals;the symbols R, which are identical or different, represent alkyl and halogenoalkyl radicals having from 1 to 5 carbon atoms, cycloalkyl and halogenocycloalkyl radicals having from 3 to 8 carbon atoms, aryl and halogenoaryl radicals having from 6 to 8 carbon atoms or cyanoalkyl radicals having from 3 to 4 carbon atoms;the symbols G, which are identical, represent linear or branched chain alkylene radicals having from 1 to 8 carbon atoms, divalent organic radicals corresponding to the formula F.sub.2 : --CH.sub.2).sub.x QTQ(CH.sub.2 --.sub.x, in which the symbols Q, which are identical, represent one of the groups --O-- and --OCO--, the --OCO-- being bonded to T by the --CO-- radical, the symbol T represents a monocyclic, divalent hydrocarbon radical having from 6 to 8 carbon atoms, or a divalent organic radical which has from 10 to 22 carbon atoms and consists of 2 hydrocarbon rings which are fused to one another or bonded together by a valence bond or by one of the groups of the formulae --O--, --CH.sub.2 --, --C(CH.sub.3).sub.2 -- and -Si(R'--.sub.2, wherein R' is an alkyl radical having from 1 to 3 carbon atoms, and the symbols x, which are identical represent 1, 2 or 3, or divalent hydrocarbon radicals corresponding to the formula F.sub.3 : --CH.sub.2).sub.b T(CH.sub.2).sub.b, in which the symbol T has the measuring given for the formula F.sub.2 and the symbols b, which are identical, represent 0 or 1; sthe symbols G', which are identical, have the meaning given above for G, except that they do not correspond to the formula F.sub.2 ;the symbols a, which are identical, represent 0 or 1;the symbols p represents any number ranging from 1 to 120; andthe symbol n represents any number ranging from 1 to 1,500. | ||||||
| 132 | Process for the production of an aqueous dispersion of poly(organic-poly-sulfide-silicate) copolymer | US19178 | 1979-03-09 | US4197229A | 1980-04-08 | David H. Blount |
| An alkali metal hydroxide, sulfur, and an oxidated silicon compound are mixed, then heated to just above the melting point of sulfur while agitating for 10 to 30 minutes, thereby producing an alkali metal polysulfide silicate; then it is added to an aqueous solution containing an emulsifying or dispersing agent and is reacted with a polysubstituted organic compound, thereby producing a poly(organic-polysulfide-silicate) copolymer. | ||||||
| 133 | Polysiloxane thermoplastic elastomers | US817342 | 1977-07-20 | US4145508A | 1979-03-20 | Michel Bargain; Marcel Lefort |
| Novel polysiloxane thermoplastic elastomers and processes for their preparation are disclosed. The elastomers are obtained by reaction of .alpha.,.omega.-dihydrogenpolysiloxane with a diethylene silicon compound. | ||||||
| 134 | New polyepoxide-polysiloxane compounds | US556073 | 1975-03-06 | US4038338A | 1977-07-26 | Dieter Baumann; Heinz Rembold; Rolf Schmid; Friedrich Lohse |
| New polyepoxide-polysiloxanes, which are obtained by mixing in appropriately stoichiometric amounts, an adduct manufactured from a polyepoxide and an acid polyester or a polycarboxylic acid with a polysiloxane and esterifying the mixture, are described.The new compounds can be cured with conventional epoxide resin curing agents, especially cycloaliphatic polycarboxylic acid anhydrides, to give flexible to rubbery-elastic mouldings, which show very low water absorption coupled with excellent dielectric properties and high tracking resistance and arcing resistance. | ||||||
| 135 | Product and process | US409067 | 1973-10-24 | US3932339A | 1976-01-13 | Gordon D. McLeod |
| Protective coating compositions are prepared comprising aliphatic polyol-derived silicates and zinc dust as a filler. The compositions provide long-life protection for ferrous substrates against rusting in moist and salty atmospheres. The zinc filler and silicate components may be compounded in one package or as two packages to be mixed prior to application as a film. Compositions comprising zinc filler and the aliphatic polyol-derived silicates with solvents, and with or without other fillers or organic polymeric materials are especially useful as coatings. A range of aliphatic polyol to total alkyl-type or alkoxyalkyl-type silicate reacted in making the polyol-derived silicates is about 0.15 to 1.8 moles of reactive OH grouping supplied by the polyol per mole of ester-exchangeable group in the silicates, the larger ratios being especially useful for the silicate reactants having up to, for instance, an average of 5 to 6 SiO.sub.2 groups per molecule and decreasing progressively as the ##EQU1## CONTENT INCREASES. The preferred range of reactants provides about 0.35 to 1.5 moles of reactive OH grouping from the polyol per mole of ester-exchangeable groups of the silicate. The preferred silicate reactants have from 1 up to about 6 to 8 SiO groups per average molecule which corresponds to an extent of hydrolysis from 0% up to about 50%. Such hydrolysis may occur before or during the ester-exchange reaction which forms the aliphatic polyol-derived silicates of this invention. The polyol-derived silicates can also have other uses, e.g., as a binder for ceramic molding compositions using non-zinc fillers. | ||||||
| 136 | Galvanic coating compositions comprising polyol silcates and zinc dust | US28396472 | 1972-08-28 | US3917648A | 1975-11-04 | MCLEOD GORDON DONALD |
| Galvanically-protective coating compositions are prepared comprising polyol silicates and zinc dust. The compositions provide long-life protection for steel against rusting in moist and salty atmospheres. The zinc and silicate components may be compounded in one package or as two packages to be mixed prior to application as a film. Compositions comprising zinc and the polyol silicates with solvents, and with or without fillers or organic polymeric materials are especially useful as coatings. The range of polyol to organic silicate employed in making the polyol silicates is about 0.05 to 1.8 moles of reactive OH grouping supplied by the polyol per mole of ester-exchangeable group in the silicates the larger ratios being especially useful for the monomer type silicates and decreasing as the
CONTENT INCREASES. |
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| 137 | Polysiloxane compounds having an adamantane base, and methods of production thereof | US47288574 | 1974-05-23 | US3897390A | 1975-07-29 | GROULT ALAIN MAURICE; BELLMANN GUNTER G |
| D R A W I N G
Polysiloxane compounds constituted by recurrent units forming macromolecular chains and having the following general formula WHERE A is an adamantyl group, R3 and R4 each is an alkyl, alkenyl or aryl group, R1 and R2 each is hydrogen, or an alkyl or aryl group, and x is 0 or a whole number, the chain having end groups given by the formulas WHERE R5 and R6 each is hydrogen or an alkyl or aryl group. The polysiloxane compounds have excellent thermal stability and the physical properties of a thermoplastic material. They are easily cured by hot or cold vulcanization either in their initial state or after a suitable preparatory treatment to obtain elastomeric properties. |
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| 138 | Process of removing sulfate groups from organopolysiloxanes | US47235974 | 1974-05-22 | US3872146A | 1975-03-18 | ROSSMY GERD |
| In the disclosed process, sulfate groups are removed from organopolysiloxanes which contain groups in which the sulfate groups to be removed are intramolecularly and/or terminally linked to silicon atoms. According to the inventive process, the organopolysiloxanes are reacted with peralkylated amides of carboxylic acids, phosphonic acids and/or phosphoric acids, whereby a SO3-containing peralkylated acid amide phase is obtained. This phase is then separated from the system. According to a preferred embodiment of the invention, the reaction with the peralkylated amide of the indicated acids is repeated one or several times.
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| 139 | Polymerization catalyst | US35917873 | 1973-05-11 | US3852247A | 1974-12-03 | VIZURRAGA L |
| There is provided an improved polymerization catalyst which is the product of the process of reacting a first compound of the formula
WITH A SECOND COMPOUND OF THE FORMULA WHEREIN: 1. M is selected from the group consisting of titanium, zirconium, germanium, silicon, antimony, lead, and tin; 2. R2 and R4 are selected from the group consisting of chlorine and hydroxy; 3. THE REMAINING R substituents are selected from the group consisting of alkyl of 1 to about 18 carbon atoms, acyl of 1 to about 18 carbon atoms, alkoxy of 1 to about 18 carbon atoms, aryl of 6 to about 18 carbon atoms, aryloxy of 6 to about 18 carbon atoms, and hydrogen, provided that at least one of R5, R6, R7, and R8 is not hydrogen; and 4. IN SAID REACTION FROM ABOUT 1.1 TO ABOUT 20 MOLES OF SAID SECOND COMPOUND PER MOLE OF SAID FIRST COMPOUND ARE REACTED FOR FROM ABOUT TWO TO ABOUT 6 HOURS. This catalyst is especially useful for the preparation of polyesters particularly linear fiber-forming polyesters. |
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| 140 | Siloxane polymers for soil-repellent and soil-release textile finishes | US23251372 | 1972-03-07 | US3828087A | 1974-08-06 | PITTMAN ALLEN G; WASLEY WILLIAM L |
| FLUOROCARBON SILANES ARE COPOLYMERIZED WITH SILANES WHICH CONTAIN TWO OR MORE ALKYLENEOXY GROUPS. THE COPOLYMERS ARE USEFUL FOR APPLICATION TO FIBROUS MATERIALS TO PROVIDE BOTH SOIL REPELLENCY AND SOIL RELEASABILITY
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