| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 21 | 芳香族氟化合物的生产装置 | CN200620101515.1 | 2006-03-09 | CN2898019Y | 2007-05-09 | 解卫宇 |
| 本实用新型公开了一种芳香族氟化合物的生产装置，其特征在于其具有用于重氮化反应的反应釜，反应釜底部的出料口与物料输送泵相连接，输送泵的出口则与用于热分解反应的管式反应器相连接，管式反应器的出口连接有接收装置，管式反应器具有管道主体，管道主体上设有加热装置和相应的温控装置。具有易于控制热分解过程、不会发生爆炸危险以及能耗低的特点，且生产效率大为提高。 | ||||||
| 22 | BENZOCYCLOBUTANE(THIO) CARBOXAMIDES | PCT/EP2014/073121 | 2014-10-28 | WO2015063086A1 | 2015-05-07 | BUBOST, Christophe; WACHENDORFF-NEUMANN, Ulrike; WINTER, Philipp; BRUNET, Stephane; VORS, Jean-Pierre; MONTAGNE, Cyril |
The present invention relates to novel benzocyclobutane(thio) carboxamides, to processes for preparing these compounds, to compositions comprising these compounds, and to the use thereof as biologically active compounds, especially for control of harmful microorganisms in crop protection and in the protection of materials. |
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| 23 | 化合物、感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、フォトマスク及びパターン形成方法、並びに、電子デバイスの製造方法及び電子デバイス | PCT/JP2014/065498 | 2014-06-11 | WO2015005051A1 | 2015-01-15 | 土村 智孝 |
（Ａ）下記一般式（Ｉ）又は（ＩＩ）で表される化合物を含有する感活性光線性又は感放射線性樹脂組成物により、極微細（例えば、線幅５０ｎｍ以下）のパターンを、高感度及び高解像性（例えば、高い解像力）、優れたパターン形状及び小さいラインエッジラフネス（ＬＥＲ）を同時に満足した状態で形成できる化合物及び感活性光線性又は感放射線性樹脂組成物を提供する。（式中、Ｙ１及びＹ２は一価の有機基を表す。Ｍ１ ＋及びＭ２ ＋は有機オニウムイオンを表す。Ｘ１及びＸ２は－Ｓ－、－ＮＨ－又は－ＮＲ１－で表される基を表す。Ｒ１は一価の有機基を表す。ｎ１及びｎ２は１以上の整数を表す。Ｒ１とＹ１又はＹ２が互いに結合して環を形成してもよい。） |
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| 24 | PHOTOACTIVE COMPOUNDS | PCT/IB2007003989 | 2007-12-03 | WO2008068617A8 | 2009-12-10 | RAHMAN M DALIL; RENTKIEWICZ DAVID L |
| The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula - O3S-CF2CF2OCF2CFa-SO3 -. The compounds are useful as photoactive materials where each of Ai and Bi are selected from Formula (I) and Y-Ar where Ar is selected from Forumla (II), naphthyl, or anthryl; Y is selected from Formula (III), Formula (IV), Formula (V). | ||||||
| 25 | THERAPEUTIC COMPOUNDS FOR BLOCKING DNA SYNTHESIS OF POX VIRUSES | PCT/US2008001553 | 2008-02-06 | WO2009008906A3 | 2009-05-28 | RICCIARDI ROBERT P; YOUNG JANICE ELAINE P; CIUSTEA MIHAI |
| This invention provides methods of inhibiting replication of a poxvirus by contacting a poxvirus with a compound having formula I, formula XXI, formula XXXII, or formula XLI which in turn reduce, inhibit, or abrogate poxvirus DNA polymerase activity and/or its interaction with its processivity factor. Formula I, formula XXI, formula XXXII, or formula XLI can be utilized to treat humans and animals suffering from a poxvirus infection. Pharmaceutical compositions for treating poxvirus infected subjects are also provided. | ||||||
| 26 | PHOTOACTIVE COMPOUNDS | PCT/IB2007/003989 | 2007-12-03 | WO2008068617A3 | 2008-06-12 | RAHMAN, Dalil, M.; RENTKIEWICZ, David, L. |
The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula - O3S-CF2CF2OCF2CFa-SO3 -. The compounds are useful as photoactive materials where each of Ai and Bi are selected from Formula (I) and Y-Ar where Ar is selected from Forumla (II), naphthyl, or anthryl; Y is selected from Formula (III), Formula (IV), Formula (V). |
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| 27 | PHOTOACTIVE COMPOUNDS | PCT/IB2007003989 | 2007-12-03 | WO2008068617A2 | 2008-06-12 | RAHMAN DALIL M; RENTKIEWICZ DAVID L |
| The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula - O3S-CF2CF2OCF2CFa-SO3 -. The compounds are useful as photoactive materials. | ||||||
| 28 | 연속적 촉매 순환에 의한 방향족 요오드화 화합물 및 모노 요오드화 벤젠 제조방법 및 장치 | KR1020120087750 | 2012-08-10 | KR1020140021769A | 2014-02-20 | 문영환; 안재용; 김진홍 |
| The present invention relates to a method and an apparatus for manufacturing an iodinated aromatic compound and mono-iodinated benzene through sequential catalyst circulation through sequential catalyst circulation using zeolite-based catalysts, alumina-based catalysts and silicon-based catalysts by mixing or ion-exchanging the catalysts in a weight ratio, by adding oxygen or ozone to the inside of a combustion chamber and oxidizing and generating catalytic materials from room temperature to 700°C to prepare mono-iodinated benzene, wherein the mono-iodinated benzene is isolated and selected from di-iodinated benzene and tri-iodinated benzene by transiodination using a difference of melting points. [Reference numerals] (23) Continuous solid-liquid separator; (28) Mixer; (AA) First direction; (BB) Second direction | ||||||
| 29 | 방향족 요오드화 화합물의 제조 방법 | KR1020070132303 | 2007-12-17 | KR101123148B1 | 2012-03-19 | 김한석; 차일훈; 임재봉 |
| 본 발명은 방향족 요오드화 화합물의 제조 방법에 관한 것으로서, 보다 상세하게는 산소 분위기 및 제올라이트 촉매 존재하에, 방향족 화합물, 방향족 화합물의 디-요오드 화합물 또는 물, 및 요오드를 요오드화 반응시키는 단계를 포함하는 방향족 요오드화 화합물의 제조 방법에 관한 것이다. 본 발명의 제조 방법에 따르면, 원하는 반응 물질로서 방향족 화합물 및 이의 디-요오드 화합물 또는 물을 사용하여 요오드화 반응시킴으로써 안정적으로 반응기 온도를 제어할 수 있으며 이에 따라 단위 촉매당 생산성을 향상시킴과 동시에 부반응에 의한 불순물의 생성을 억제할 수 있는 효과가 있다. 요오드화 반응, 방향족 화합물, 제올라이트 촉매, 디-요오드 화합물, 이성질체 | ||||||
| 30 | 광학활성을 갖는 부탄아마이드 유도체의 제조방법 | KR1020000064693 | 2000-11-01 | KR100379755B1 | 2003-04-11 | 정찬성; 이소하 |
| PURPOSE: A process for producing butanamides having optical activity is provided, thereby easily producing butanamides useful as an intermediate in manufacturing antimicrobial agents, herbicides or medicines, in higher yield. CONSTITUTION: The process for producing butanamides having optical activity comprises the steps of: resolving racemic 4-phenyl-3-(4-phenoxyphenyl) butanoic acid of formula(2) into (3R)-(+)-4-phenyl-3-(4-phenoxyphenyl) butanoic acid of formula(2a) and (3S)-(-)-4-phenyl-3-(4-phenoxyphenyl) butanoic acid of formula(2b) using R-(+)-methylbenzylamine of formula(3); and reacting each divided compound of formula(2a) or formula(2b) with aniline derivative of formula(5) to produce butanamide derivative of formula(1). | ||||||
| 31 | 광학활성을 갖는 부탄아마이드 유도체의 제조방법 | KR1020000064693 | 2000-11-01 | KR1020020034017A | 2002-05-08 | 정찬성; 이소하 |
| PURPOSE: A process for producing butanamides having optical activity is provided, thereby easily producing butanamides useful as an intermediate in manufacturing antimicrobial agents, herbicides or medicines, in higher yield. CONSTITUTION: The process for producing butanamides having optical activity comprises the steps of: resolving racemic 4-phenyl-3-(4-phenoxyphenyl) butanoic acid of formula(2) into (3R)-(+)-4-phenyl-3-(4-phenoxyphenyl) butanoic acid of formula(2a) and (3S)-(-)-4-phenyl-3-(4-phenoxyphenyl) butanoic acid of formula(2b) using R-(+)-methylbenzylamine of formula(3); and reacting each divided compound of formula(2a) or formula(2b) with aniline derivative of formula(5) to produce butanamide derivative of formula(1). | ||||||
| 32 | (폴리할로알케닐)아렌 유도체의 제조방법 | KR1019790003325 | 1979-09-25 | KR1019820001656B1 | 1982-09-15 | 로웰딘마클리; 춘-산왕; 스탠리데인백크레거; 테리죤네스트릭 |
| Dehydrohalogenation of II (Ar = allen; R = halo, nitro,or inactive org. radical; X = halogen; Y = C2-3 haloalkyl, or substituted haloalkyl; n = 0-1) is cataoyzed by Lewis acids, e. g.,SbCl5, TiCl4, AlCl3. Thus, II in CCl4 contg. SbCl5 gave 95% I. | ||||||
| 33 | オニウム塩化合物、化学増幅レジスト組成物及びパターン形成方法 | JP2020194996 | 2020-11-25 | JP2021091666A | 2021-06-17 | 藤原 敬之; 及川 健一; 小林 知洋; 福島 将大 |
| 【課題】KrFエキシマレーザー光、ArFエキシマレーザー光、電子線、極端紫外線等の高エネルギー線を光源とするフォトリソグラフィーにおいて、高感度であり、かつCDU、LWR等のリソグラフィー性能に優れる化学増幅レジスト組成物、これに使用される酸拡散抑制剤、及び該化学増幅レジスト組成物を用いるパターン形成方法を提供する。 【解決手段】下記式(1)で表されるオニウム塩化合物、該オニウム塩化合物からなる酸拡散抑制剤、及び該酸拡散抑制剤を含む化学増幅レジスト組成物。 【選択図】なし |
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| 34 | オニウム塩化合物、化学増幅レジスト組成物及びパターン形成方法 | JP2020180100 | 2020-10-28 | JP2021080245A | 2021-05-27 | 藤原 敬之; 及川 健一; 小林 知洋; 福島 将大 |
| 【課題】KrFエキシマレーザー光、ArFエキシマレーザー光、電子線、極端紫外線等の高エネルギー線を光源としたフォトリソグラフィーにおいて、溶解コントラスト、酸拡散抑制能に優れ、CDUや、LWR、感度等のリソグラフィー性能に優れる化学増幅レジスト組成物、これに使用される酸拡散抑制剤、及び該化学増幅レジスト組成物を用いるパターン形成方法を提供する。 【解決手段】下記式(1)で表されるオニウム塩化合物、該オニウム塩化合物からなる酸拡散抑制剤、及び該酸拡散抑制剤を含む化学増幅レジスト組成物。 【選択図】なし |
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| 35 | Perfluorinated amide salt and method for use thereof as ionic conducting material | JP2013033109 | 2013-02-22 | JP2013173740A | 2013-09-05 | MICHOT CHRISTOPHE; ARMAND MICHEL; GAUTHIER MICHEL; CHOQUETTE YVES |
| PROBLEM TO BE SOLVED: To provide ionic compounds in which an anionic charge is delocalized and which is useful for ionic conducting materials, electronic conducting materials, colorants, and the catalyst for various chemical reactions.SOLUTION: This invention relates to an amide or its salts, including an anionic portion which is shown by composition formula: R-SO-N-Z and is included in sufficient numbers to ensure overall electronic neutrality, and at least one cationic portion Mm (wherein Mm is a hydroxonium, nitrosonium NO, ammonium -NH4, metallic cation with valence m, organic cation with valence m, or organometallic cation with valence m; Rf is a perfluorinated group; x is an integer of 1 or 2; and Z is an electroattractive substituent). | ||||||
| 36 | Resist composition, method for forming resist pattern, novel compound, and acid generator | JP2011233962 | 2011-10-25 | JP2013092618A | 2013-05-16 | UTSUMI YOSHIYUKI |
| PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithographic characteristics, a method for forming a resist pattern, a novel compound, and an acid generator.SOLUTION: The resist composition comprises a base component (A) the solubility of which with a developing solution changes by an action of an acid, and an acid generator component (B) that generates an acid by exposure. The acid generator component (B) includes an acid generator (B1) comprising a compound expressed by formula (b1-1). In the formula, Zrepresents an organic cation; Qand Qrepresent a fluorine atom or a straight-chain or branched-chain 1-6C fluorinated alkyl group; X represents -(CH)-; Y represents a single bond, -O-(CH)- or -C(=O)-O-(CH)-; L1 and m1 represent an integer of 1 to 6; Rx represents a 2-36C divalent aliphatic hydrocarbon group having a C=C unsaturated bond and optionally having a substituent; and Ry represents an acid dissociable group. | ||||||
| 37 | A process for the preparation of amines | JP2008543746 | 2006-12-11 | JP5144533B2 | 2013-02-13 | トブラー，ハンス; バルター，ハラルト; コルシ，カミラ; エーレンフロイント，ヨーゼフ; ジョルダノ，ファニ; ツェラー，マルティン |
| 38 | Fluorine condensed aromatic compounds and their use in liquid-crystal mixtures | JP2005128125 | 2005-04-26 | JP5014585B2 | 2012-08-29 | ボルフガング、シュミット; ライナー、ビンゲン; バルバラ、ホルヌンク |
| 39 | The resist material and patterning process using novel sulfonates and derivatives thereof, photoacid generator and this | JP2006093303 | 2006-03-30 | JP4816921B2 | 2011-11-16 | 洋一 大澤; 克浩 小林; 武 渡辺; 剛 金生 |
| 40 | Resist composition | JP2010242478 | 2010-10-28 | JP2011121938A | 2011-06-23 | ICHIKAWA KOJI; SUGIHARA MASAKO; MASUYAMA TATSURO |
| <P>PROBLEM TO BE SOLVED: To form a resist pattern of excellent resolution and an excellent shape. <P>SOLUTION: There is disclosed a salt represented by formula (I). In formula (I), Q<SP>1</SP>and Q<SP>2</SP>each independently represent a fluorine atom, or a 1C-6C perfluoroalkyl group; L<SP>1</SP>represents a divalent 1C-17C saturated hydrocarbon group that may contain a substituent, provided that -CH<SB>2</SB>- contained therein may be substituted with -O-, or -CO-; R<SP>1</SP>represents a 1-6C alkyl group comprising a fluorine atom; and Z<SP>+</SP>represents an organic cation. <P>COPYRIGHT: (C)2011,JPO&INPIT | ||||||
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