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Vapor-deposition apparatus by reduced-chemical method

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专利汇可以提供Vapor-deposition apparatus by reduced-chemical method专利检索,专利查询,专利分析的服务。并且PURPOSE:To enable detection without drawing out a quartz tube, by installing light emitting unit irradiating light to the quartz tube and light-receiving unit receiving the light transmitted through or reflected from the quartz tube and by detecting the amount of adhered oxide film on the quartz tube by the magnitude of the light signals receive. CONSTITUTION:T beam of light from a light emitting unit 3 such as laser diode, etc. passes through au outer tube 1 made of a quartz tube and an inner tube 2 of a quartz tube and later, reaches a light-emitting unit, such as photo- transistor, etc.installed opposedly in the unit 3 and the intensity of light is detected as an electric signal. In case when oxide film is not found sticking on the inside wall of the inner tube 2, the intensity of light is stronger and as the film deposits on the inside surface of the inner tube 2, passage of the light becomes difficult and the intensity of light that can be detected in the light emitting unit 4 becomes reduced. Thus, when the relation between the amount of adhesion of the oxide film on the quartz tube and the intensity of the light received is measured beforehand, then the time of washing of the quartz tube can be determined by the intensity of light received.,下面是Vapor-deposition apparatus by reduced-chemical method专利的具体信息内容。

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