Device for washing exposure mask
专利汇可以提供Device for washing exposure mask专利检索，专利查询，专利分析的服务。并且PURPOSE:To enhance an inspection passing yield of semiconductor elements by managing defects due to dust and foreign matters remaining on an exposure mask after washing, with a pattern comparison inspection mechanism. CONSTITUTION:An exposure mask 6 conveyed to a washing station 2, subjected to various kinds of washing treatments, and returned to an automatic defect detection station is placed on a scan stage, exposed to laser beams emitted from a laser head 7 and past a half mirror 11 and an objective lens 10, and the transmitted light is detected with a photodetector 8. The whole surface of the mask 6 is scanned by scanning it in the direction 12, and at the same time, moving the stage in the direction rectangular to this, and sizes and amts. of defects of a pattern due to dust, stains, etc. are detected. These results are produced from a defect detection data output station 5 and compared with the predetermined test passing standard. When the mask does not pass the test, the washing and the defect detection are repeated, and when it passes the test in a predetermined limit times, the mask 6 is automatically placed in an exposure mask protection case 4, thus finishing washing in this device.，下面是Device for washing exposure mask专利的具体信息内容。
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