子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 81 | NOVEL POLYGODIAL ANALOGS FOR THE TREATMENT OF CANCER AND OTHER PROLIFERATIVE DISEASES | US15752960 | 2016-08-17 | US20180237362A1 | 2018-08-23 | Cara B. GONZALES; Alexander KORNIENKO; Ramesh DASARI |
| The present disclosure relates generally to derivatives of polygodial and methods of use thereof. In some aspects, the present disclosure relates to using polygodial derivatives to treat cancer or other hyperproliferative diseases. | ||||||
| 82 | METAL ORGANIC FRAMEWORK ABSORBENT PLATFORMS FOR REMOVAL OF CO2 AND H2S FROM NATURAL GAS | US15564935 | 2016-04-07 | US20180093218A1 | 2018-04-05 | Mohamed EDDAOUDI; Amandine CADIAU; Prashant M. BHATT; Karim ADIL; Youssef BELMABKHOUT |
| Provided herein are metal organic frameworks comprising metal nodes and N-donor organic ligands which have high selectivity and stability in the present of gases and vapors including H2S, H2O, and CO2. Methods include capturing one or more of H2S, H2O, and CO2 from fluid compositions, such as natural gas. | ||||||
| 83 | TANTALUM COMPOUND AND METHODS OF FORMING THIN FILM AND FABRICATING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | US15298275 | 2016-10-20 | US20170178961A1 | 2017-06-22 | Seung-min RYU; Takanori KOIDE; Naoki YAMADA; Jae-soon LIM; Tsubasa SHIRATORI; Youn-joung CHO |
| A tantalum compound, a method of forming a thin film, and a method of fabricating an integrated circuit device, the tantalum compound being represented by the following General Formula (I): | ||||||
| 84 | GROUP 5 METAL OXO-ALKOXO COMPLEX, METHOD FOR PRODUCING SAME, AND METHOD FOR MANUFACTURING GROUP 5 METAL OXIDE FILM | US14758142 | 2013-12-27 | US20150353588A1 | 2015-12-10 | Sachio ASANO; Tomoyuki KINOSHITA; Yasushi HARA; Daiji HARA; Ryoji TANAKA; Ken-ichi TADA |
| A compound useful for the manufacture of a Group 5 metal oxide film is provided. The compound is a Group 5 metal oxo-alkoxo complex represented by the following formula (A), and after preparing a film-forming material solution containing the compound and an organic solvent, a Group 5 metal oxide film can be manufactured using the film-forming material solution: Mα(μ4-O)β(μ3-O)γ(μ-O)δ(μ-ORA)∈(ORA)ζ(RAOH)ηXθYι (A) (wherein M represents a niobium atom, etc.; RA represents an alkyl group; X represents an alkylenedioxy group; Y represents a carboxy group, etc.; α represents an integer of 3 to 10; β represents 0 or 1; γ represents an integer of 0 to 8; δ represents an integer of 2 to 9; ∈ represents an integer of 0 to 6; ζ represents an integer of 6 to 16; η represents an integer of 0 to 4; θ represents an integer of 0 to 2; and ι represents an integer of 0 to 6). | ||||||
| 85 | Niobium and vanadium organometallic precursors for thin film deposition | US13888970 | 2013-05-07 | US09040372B2 | 2015-05-26 | Nicolas Blasco; Antony Correia-Anacleto; Audrey Pinchart; Andreas Zauner |
| Disclosed are methods for forming a metal-containing layer on a substrate. The methods include providing a vapor and at least one reaction gas and reacting the vapor and the reaction gas with the substrate by a deposition process. The vapor may be selected from the group consisting of (Cp)V(═NtBu)(NEt2)2; (Cp)V(═NtBu)(NMe2)2; (Cp)V(═NtBu)(NEtMe)2; (Cp)V(═NiPr)(NEt2)2; (Cp)V(═NiPr)(NMe2)2; (Cp)V(═NiPr)(NEtMe)2; (Cp)V(═NC5H11)(NEt2)2; (Cp)V(═NC5H11)(NMe2)2; (Cp)V(═NC5H11)(NEtMe)2; (Cp)Nb(═NtBu)(NEt2)2; (Cp)Nb(═NtBu)(NMe2)2; (Cp)Nb(═NtBu)(NEtMe)2; (Cp)Nb(═NiPr)(NEt2)2; (Cp)Nb(═NiPr)(NMe2)2; (Cp)Nb(═NiPr)(NEtMe)2; (Cp)Nb(═NC5H11)(NEt2)2; (Cp)Nb(═NC5H11)(NMe2)2; and (Cp)Nb(═NC5H11)(NEtMe)2. The reaction gas may be selected from the group consisting of hydrogen, hydrogen sulfide, hydrogen selenide, hydrogen telluride, carbon monoxide, ammonia, organic amine, silane, disilane, higher silanes, silylamines, diborane, hydrazine, methylhydrazine, chlorosilane, chloropolysilane, metal alkyl, arsine, phosphine, trialkylboron, oxygen, hydrogen peroxide, nitrous oxide, nitrogen monoxide, nitrogen dioxide, alcohols, plasma comprising fragments of those species, and combinations thereof. | ||||||
| 86 | METHODS FOR PREPARING VANADIUM DIOXIDE COMPOSITE POWDERS, VANADIUM DIOXIDE POWDER SLURRY, AND VANADIUM DIOXIDE COATING FOR INTELLIGENT TEMPERATURE CONTROL | US14373302 | 2012-03-07 | US20150132494A1 | 2015-05-14 | Hongjie Luo; Yiliao Liu; Yanfeng Gao; Zhaohui Cai; Yuwei Lin; Chuanxiang Cao; Shaobo Wang; Minoru Kanehira |
| A vanadium dioxide coating for intelligent temperature control is formed by mixing a vanadium dioxide powder slurry, a polymer emulsion, and coating additives, and then coating the mixture onto a substrate. The vanadium dioxide powdery slurry comprises vanadium dioxide composite powders and a dispersion medium, the composite powders comprising vanadium dioxide nanopowders having a chemical composition of V1−xMxO2, and the surface of the vanadium dioxide nanopowders being attached to organic modified long-chain molecules, wherein M is a doped element, and 0≦x≦0.5. Through using the vanadium dioxide powders and the slurry thereof having an organic modified surface, the coating has higher visible light transmittance, can almost completely screen ultraviolet rays, and simultaneously intelligently adjust infrared rays. | ||||||
| 87 | NOVEL ARYLALCOHOLS AND METAL COMPLEXES THEREOF | US13753732 | 2013-01-30 | US20140213805A1 | 2014-07-31 | Daniel J. Mindiola; Ba L. Tran |
| Provided herein is a compound of Formula 1: or an isomer thereof, or a salt of the compound or of an isomer thereof, wherein R1 and R2 are each independently selected from the group consisting of hydrogen, halogen, alkyl, haloalkyl, alkoxy, haloalkoxy, dialkylamino, halodialkylamino, hydroxyalkyl, and cyano, and R is selected from the group consisting of alkyl, haloalkyl, cyanoalkyl, alkoxy, dialkylamino, and cyano. | ||||||
| 88 | METHOD FOR PREPARING POROUS ORGANIC-INORGANIC HYBRID MATERIALS | US14123161 | 2012-06-01 | US20140200361A1 | 2014-07-17 | U-Hwang Lee; Jong-San Chang; Young Kyu Hwang; You-Kyong Seo; Christian Serre; Patricia Horcajada; Hubert Chevreau; Florence Ragon; Thomas Devic |
| The present invention relates to a method for preparing a porous organic-inorganic hybrid, which comprises gelling a reaction mixture containing a metal precursor, a water-soluble additive and water or water-containing organic solvent at a gelling temperature of 30° C.˜100° C. to obtain an organogel-containing solution having a viscosity of 2 to 50,000 (cps), subsequently ageing the solution at said gelling temperature under stirring; and subsequently heating the organogel-containing solution at a temperature between said gelling temperature and 250° C. to crystallize the solution.According to the method for preparation of the present invention, it is possible to commercially practice the present invention since the reaction can be carried out in water or a water-containing organic solvent at an ambient pressure or a slightly raised pressure under a reflux condition, as well as it is possible to mass-produce a porous organic-inorganic hybrid having a high crystallinity and a large surface even in a high mol ratio of 1:1˜1:30 of solvent to metal. | ||||||
| 89 | Metal Hydrazide Materials | US14026838 | 2013-09-13 | US20140007974A1 | 2014-01-09 | David Michael Antonelli |
| The present invention provides the following new polymers which are useful for hydrogen storage: (i) a polymer comprising -[MN2]— as a repeating unit, wherein M is selected from the group consisting Sc, Ti, V, Cr, Mn, Fe, Co, Zr, Nb, Mo, and mixtures thereof; and (ii) a polymer comprising -[M2N3]— as a repeating unit, wherein M is selected from the group consisting Sc, Ti, V, Cr, Mn, Fe, Co, Zr, Nb, Mo, and mixtures thereof. | ||||||
| 90 | Catalyst compositions containing transition metal complexes with thiolate ligands | US13042807 | 2011-03-08 | US08618229B2 | 2013-12-31 | Mark L. Hlavinka |
| The present invention discloses catalyst compositions employing transition metal complexes with a thiolate ligand. Methods for making these transition metal complexes and for using such compounds in catalyst compositions for the polymerization of olefins also are provided. | ||||||
| 91 | Niobium and vanadium organometallic precursors for thin film deposition | US13123013 | 2009-10-06 | US08460989B2 | 2013-06-11 | Nicolas Blasco; Anthony Correia-Anacleto; Audrey Pinchart; Andreas Zauner |
| Disclosed are methods for forming a metal-containing layer on a substrate. A vapor comprising at least one precursor compound selected from the group consisting of (Cp)V(=NtBu)(NEt2)2; (Cp)V(=NtBu)(NMe2)2; (Cp)V(=NtBu)(NEtMe)2; (Cp)V(═NiPr)(NEt2)2; (Cp)V(═NiPr)(NMe2)2; (Cp)V(═NiPr)(NEtMe)2; (Cp)V(═NC5H11)(NEt2)2; (Cp)V(═NC5H11)(NMe2)2; (Cp)V(═NC5H11)(NEtMe)2; (Cp)Nb(=NtBu)(NEt2)2; (Cp)Nb(=NtBu)(NMe2)2; (Cp)Nb(=NtBu)(NEtMe)2; (Cp)Nb(═NiPr)(NEt2)2; (Cp)Nb(═NiPr)(NMe2)2; (Cp)Nb(═NiPr)(NEtMe)2; (Cp)Nb(═NC5H11)(NEt2)2; (Cp)Nb(═NC5H11)(NMe2)2; and (Cp)Nb(═NC5H11)(NEtMe)2 is provided. At least one reaction gas selected from the group consisting of ozone and water is provided. The vapor and the reaction gas react with the substrate according to a deposition process to form the metal-containing layer on at least one surface of the substrate. | ||||||
| 92 | 1′-substituted-carba-nucleoside prodrugs for antiviral treatment | US13117060 | 2011-05-26 | US08415308B2 | 2013-04-09 | Aesop Cho; Choung U. Kim; Adrian S. Ray; Lijun Zhang |
| Provided are prodrugs of pyrrolo[1,2-f][1,2,4]triazin-7-yl nucleoside phosphates wherein the 1′ position of the nucleoside sugar is substituted with CN. The compounds, compositions, and methods provided are useful for the treatment Hepatitis C infections. | ||||||
| 93 | 1'-SUBSTITUTED-CARBA-NUCLEOSIDE PRODRUGS FOR ANTIVIRAL TREATMENT | US13117060 | 2011-05-26 | US20120020921A1 | 2012-01-26 | Aesop CHO; Choung U. Kim; Adrian S. Ray; Lijun Zhang |
| Provided are prodrugs of pyrrolo[1,2-f][1,2,4]triazin-7-yl nucleoside phosphates wherein the 1′ position of the nucleoside sugar is substituted with CN. The compounds, compositions, and methods provided are useful for the treatment Hepatitis C infections. | ||||||
| 94 | METAL HYDRAZIDE MATERIALS | US12998984 | 2009-12-22 | US20110308971A1 | 2011-12-22 | David Michael Antonelli |
| The present invention provides the following new polymers which are useful for hydrogen storage: (i) a polymer comprising -[MN2]— as a repeating unit, wherein M is selected from the group consisting Sc, Ti, V, Cr, Mn, Fe, Co, Zr, Nb, Mo, and mixtures thereof; and (ii) a polymer comprising -[M2N3]— as a repeating unit, wherein M is selected from the group consisting Sc, Ti, V, Cr, Mn, Fe, Co, Zr, Nb, Mo, and mixtures thereof. | ||||||
| 95 | VANADIUM PHTHALOCYANINE COMPOUNDS AND NEAR-INFRARED ABSORPTION FILTER USING THE SAME | US13142722 | 2009-11-05 | US20110275847A1 | 2011-11-10 | Yu-Mi Chang; Ju-Sik Kang; Jeong-Ho Park |
| A novel vanadium phthalocyanine compound with low absorptivity in the visible light region and high absorptivity in the near-infrared light region, and a near-infrared absorption filter using the same are disclosed. The near-infrared absorption vanadium phthalocyanine compound is represented by Formula 1 of claim 1. In Formula 1, A2, A3, A6, A7, A10, A11, A14 and A15 are independently OR1, SR2 or a halogen atom, wherein at least four thereof are OR1; A1, A4, A5, A8, A9, A12, A13 and A16 are independently OR1, SR2, NR3R4 or a halogen atom, wherein at least one thereof is NR3R4, and at least four thereof are OR1; R1, R2, R3 and R4 are independently an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, or an aralkyl group of 7 to 15 carbon atoms. | ||||||
| 96 | Polymerization of olefins | US10791242 | 2004-03-02 | US20040171481A1 | 2004-09-02 | Ying Wang; Steven Dale Ittel |
| Olefins, such as ethylene, are polymerized using as a polymerization catalyst a complex of a selected transition metal with an anionic ligand that has at least three atoms that may coordinate to the transition metal. Also disclosed are the above selected transition metal complexes, and intermediates thereto. | ||||||
| 97 | Catalyst compounds with beta-diiminate anionic ligands and processes for polymerizing olefins | US10319818 | 2002-12-16 | US20040063574A1 | 2004-04-01 | Klaus H. Theopold; Woo-Kyu Kim; Leonard A. MacAdams; John M. Power; Javier M. Mora; Albert P. Masino |
| The present invention relates to catalyst systems, processes for making such catalysts, intermediates for such catalysts, and olefin polymerization processes using such catalysts wherein such catalyst includes a component represented by the following formula IA: 1 wherein R and Rnull independently represent a hydrogen atom, or a substituted or unsubstituted, branched or unbranched hydrocarbyl or organosilyl radical; R1, R2, and R3 independently represent a hydrogen atom, or a substituted or unsubstituted, branched or unbranched hydrocarbyl radical; M is a group IIIB, IVB, VB, VIB, VIIB or VIII transition metal; T independently represents a univalent anionic ligand such as a hydrogen atom, or a substituted or unsubstituted hydrocarbyl, halogeno, aryloxido, arylorganosilyl, alkylorganosilyl, amido, arylamido, phosphido, or arylphosphido group, or two T groups taken together represent an alkylidene or a cyclometallated hydrocarbyl bidentate ligand; L independently represents a sigma donor stabilizing ligand; X, which is optional, represents a relatively weakly coordinated anion; and anull0 to 4 inclusive, bnull0 to 4 inclusive, provided anullbnull4. | ||||||
| 98 | Method for producing silasequioxane metal complexes, novel silasesquioxane metal complexes and use thereof | US403260 | 1999-10-18 | US6127557A | 2000-10-03 | Rutger Anthony Van Santen; Hendrikus Cornesis Louis Abbenhuis; Martinus Lambertus Wilhelmus Vorstenbosch |
| A method for producing silasesquioxane metal complexes of the formula (II)((R.sup.1 SiO.sub.1,5).sub.n (R.sup.2a SiO.sub.1,5).sub.m ((B).sub.q (O).sub.r)).sub.u (M).sub.v (Y).sub.win which R.sup.1 represents C.sub.5 -C.sub.10 -cycloalkyl, norbornyl or adamantyl; R.sup.2a represents oxygen; B represents H, OH, halogen, alkoxy, SiR.sup.3.sub.y in which R.sup.3 can be C.sub.1 -C.sub.4 alkyl, aryl or substituted silyl groups, and y represents 2 or 3, and R.sup.1 and R.sup.3 can be functionalized; M represents metals of the 4.sup.th to 7.sup.th subgroups of the periodic system of elements; Y represents C.sub.1 -C.sub.20 alkyl or aryl groups devoid of beta-hydrogen, silyl, alkoxy, OH, halogen, oxo, imido, fluorenyl, indenyl, cyclopentadienyl, in which the individual ligands can be substituted; n=6 or 7; m=0 or 1; q=0-2; r=0-2; u=1-4; v=1-4; w=0-12, in which a metal compound of the 4.sup.th to 7.sup.th subgroups of the periodic system of elements and at least one silasesquioxane compound of the formula (I)(R.sup.1 SiO.sub.1,5).sub.n (R.sup.2 SiO.sub.1,5).sub.m ((H).sub.p (B).sub.q (O).sub.r))in which R.sup.1, B, n, m, q and r have the above meanings; R.sup.2 represents OH, and p equals 0-4, are suspended in an alkylated aromatic hydrocarbon, optionally in the presence of a basic compound, with stirring at -80 to +110.degree. C., and a reaction product is separated at room temperature. The invention also relates to metal complexes which include an oxidic metal cluster containing titanium atoms, in which each titanium atom has been coordinated .times.6, and to the use of such metal complexes as catalysts for oxidation or epoxidation of unsaturated hydrocarbons or alcohols in an aqueous medium. | ||||||
| 99 | Tantalum compound, process of producing the same, and material for forming tantalum oxide films | US346009 | 1994-11-29 | US5508063A | 1996-04-16 | Toshiyuki Suzuki; Hideyuki Mori; Kouichi Nakamura |
| A novel tantalum compound represented by the formula (1): Ta(CH.sub.3).sub.3 (OR).sub.2, wherein R is an alkyl group having from 2 to 7 carbon atoms. The novel tantalum compound is produced by reacting a haloalkoxytantalum compound represented by the formula (2): TaX.sub.n (OR).sub.5-n, wherein X is halogen, R is an alkyl group having from 2 to 7 carbon atoms, and n is an integer of from 0 to 4, with a methylmetal compound; and recovering the tantalum compound represented by the above formula (1) by reduced pressure distillation. The tantalum compound has a high vapor pressure and permits effective formation of a uniform film of tantalum oxide with good properties by a CVD method. Therefore, the tantalum compound is very useful for manufacturing semiconductor devices. | ||||||
| 100 | Halogenated alkoxyphthalocyanines | US723589 | 1991-07-01 | US5270463A | 1993-12-14 | Hisato Itoh; Katashi Enomoto; Takahisa Oguchi; Tutomu Nishizawa |
| A method for preparing a halogenated alkoxyphthalocyanine represented by the formula (7) ##STR1## wherein R.sup.3 to R.sup.6 may be different and each of them is a secondary alkyl group, X is a halogen atom, n is the number of X and in the range of from 1 to 4, and Met is two hydrogen atoms, a divalent metal atom, or a trivalent or a tetravalent metallic derivative, which comprises the step of reacting a metal or a metallic compound with one to four kinds of raw materials selected from the group consisting of phthalonitriles represented by the following formula (1) and diiminoisoindolines represented by the following formula (2) ##STR2## wherein R.sup.1 is a secondary alkyl group, X is a halogen atom, and each of p and q is 0 or 1, but in at least one raw material, p or q is 1, and halogenated alkoxyphthalocyanine prepared by said method. | ||||||
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