子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 生产光学活性、外消旋薄荷醇的方法 | CN201410347367.0 | 2008-11-13 | CN104211566A | 2014-12-17 | G·海德里希; G·格拉拉; M·劳尔斯; J·施密特-来托夫; K·埃贝尔; W·克劳斯; S·奥兰施拉格; C·耶克尔; M·弗里德里克; E·J·伯格纳; N·卡沙尼-设拉子; R·帕切洛 |
| 本发明涉及一种由商业上廉价易得的原料柠檬醛开始生产薄荷醇，具体是生产光学活性的基本对映体和非对映体纯L-薄荷醇以及外消旋薄荷醇的特别经济完全的方法。该方法包括如下步骤：a.1)催化氢化橙花醛和/或香叶醛而得到香茅醛，b.1)在酸性催化剂存在下将香茅醛环化成异胡薄荷醇，c.1)通过结晶提纯异胡薄荷醇和d.1)催化氢化异胡薄荷醇而形成薄荷醇。 | ||||||
| 2 | 包含疏水性介孔物质的有机药物用吸附剂 | CN201110420991.5 | 2011-12-15 | CN102580681A | 2012-07-18 | 崔喜喆; 春松裴 |
| 本发明涉及一种包含经过三甲基硅烷基化的介孔二氧化硅SBA-15的吸附剂，更详细地涉及去除90％以上的在高浓缩状态下用作药物的卡巴西平、双氯芬酸、雌素酮、二甲苯胺庚酸、布洛芬、酮洛芬及三甲氧苄氨嘧啶等7种药物的包含经过三甲基硅烷基化的介孔二氧化硅SBA-15的吸附剂。 | ||||||
| 3 | BLOCK COPOLYMER | US15515818 | 2015-09-30 | US20170306139A1 | 2017-10-26 | Jung Keun Kim; Je Gwon Lee; Jeong Kyu Lee; Se Jin Ku; No Jin Park; Mi Sook Lee; Eun Young Choi; Sung Soo Yoon; Hyung Ju Ryu |
| The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof. | ||||||
| 4 | BLOCK COPOLYMER | US15515290 | 2015-09-30 | US20170226235A1 | 2017-08-10 | No Jin Park; Jung Keun Kim; Je Gwon Lee; Sung Soo Yoon; Se Jin Ku; Mi Sook Lee; Eun Young Choi; Hyung Ju Ryu |
| The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint. | ||||||
| 5 | Absorbent comprising hydrophobic mesoporous material for removal of harmful pharmaceuticals from aqueous environment | US13325529 | 2011-12-14 | US09006135B2 | 2015-04-14 | Heechul Choi; Tung Xuan Bui |
| This invention relates to an absorbent including trimethylsilylated mesoporous silica SBA-15, and more particularly to an absorbent including trimethylsilylated mesoporous silica SBA-15, which can effectively remove 90% or more of the seven pharmaceuticals of carbamazepine, diclofenac, estrone, gemfibrozil, ibuprofen, ketoprofen, and trimethoprim which are present in high concentration. | ||||||
| 6 | BLOCK COPOLYMER | US15515821 | 2015-09-30 | US20170313869A1 | 2017-11-02 | Jeong Kyu Lee; Sung Joon Oh; Yeon Joo Kang; Jung Keun Kim; In Young Song; Sung Soo Yoon |
| The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use. | ||||||
| 7 | BLOCK COPOLYMER | US15515812 | 2015-09-30 | US20170306074A1 | 2017-10-26 | Jeong Kyu Lee; Je Gwon Lee; In Young Song; Sung Joon Oh; Yeon Joo Kang; Sung Soo Yoon; Jung Keun Kim |
| The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use. | ||||||
| 8 | BLOCK COPOLYMER | US15514939 | 2015-09-30 | US20170247492A1 | 2017-08-31 | Eun Young CHOI; No Jin PARK; Jung Keun KIM; Je Gwon LEE; Se Jin KU; Mi Sook LEE; Hyung Ju RYU; Sung Soo YOON |
| The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof. | ||||||
| 9 | BLOCK COPOLYMER | US15514959 | 2015-09-30 | US20170226258A1 | 2017-08-10 | Mi Sook Lee; Jung Keun Kim; Se Jin Ku; No Jin Park; Je Gwon Lee; Eun Young Choi; Sung Soo Yoon; Hyung Ju Ryu |
| The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint. | ||||||
| 10 | METHOD OF MANUFACTURING PATTERNED SUBSTRATE | US15515432 | 2015-09-30 | US20170219922A1 | 2017-08-03 | Se Jin Ku; Mi Sook Lee; Hyung Ju Ryu; Jung Keun Kim; Sung Soo Yoon; No Jin Park; Je Gwon Lee; Eun Young Choi |
| Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive. | ||||||
| 11 | BLOCK COPOLYMER | US15515293 | 2015-09-30 | US20170226261A1 | 2017-08-10 | Je Gwon Lee; No Jin Park; Jung Keun Kim; Se Jin Ku; Mi Sook Lee; Eun Young Choi; Sung Soo Yoon; Hyung Ju Ryu |
| The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation. | ||||||
| 12 | BLOCK COPOLYMER | US15514967 | 2015-09-30 | US20170226260A1 | 2017-08-10 | Mi Sook Lee; Jung Keun Kim; Se Jin Ku; No Jin Park; Je Gwon Lee; Eun Young Choi; Sung Soo Yoon; Hyung Ju Ryu |
| The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation. | ||||||
| 13 | METHOD OF MANUFACTURING PATTERNED SUBSTRATE | US15514929 | 2015-09-30 | US20170210938A1 | 2017-07-27 | Se Jin Ku; Mi Sook Lee; Hyung Ju Ryu; Jung Keun Kim; Sung Soo Yoon; No Jin Park; Je Gwon Lee; Eun Young Choi |
| Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive. | ||||||
| 14 | Filter Media Treated with Cationic Fluorinated Ether Silane Compositions | US13881895 | 2011-12-20 | US20130264276A1 | 2013-10-10 | Stewart H. Corn; Chetan P. Jariwala; Suresh S. Iyer |
| Filter media is treated with a composition comprising cationic fluorinated ether silanes to provide durable water- and/or oil-repellency properties. | ||||||
| 15 | ABSORBENT COMPRISING HYDROPHOBIC MESOPOROUS MATERIAL FOR REMOVAL OF HARMFUL PHARMACEUTICALS FROM AQUEOUS ENVIRONMENT | US13325529 | 2011-12-14 | US20120172213A1 | 2012-07-05 | Heechul CHOI; Tung Xuan Bui |
| This invention relates to an absorbent including trimethylsilylated mesoporous silica SBA-15, and more particularly to an absorbent including trimethylsilylated mesoporous silica SBA-15, which can effectively remove 90% or more of the seven pharmaceuticals of carbamazepine, diclofenac, estrone, gemfibrozil, ibuprofen, ketoprofen, and trimethoprim which are present in high concentration. | ||||||
| 16 | ブロック共重合体 | JP2017517277 | 2015-09-30 | JP2017533302A | 2017-11-09 | ジョン・キュ・イ; ジェ・クォン・イ; イン・ヨン・ソン; スン・ジュン・オー; ヨン・ジュ・カン; スン・ス・ユン; ジュン・クン・キム |
| 本出願はブロック共重合体およびその用途に関するものである。本出願は、自己組織化特性が優秀で多様な用途で効果的に使われ得るブロック共重合体およびその用途を提供することができる。 | ||||||
| 17 | ブロック共重合体 | JP2017517288 | 2015-09-30 | JP2017530238A | 2017-10-12 | ジョン・キュ・イ; スン・ジュン・オー; ヨン・ジュ・カン; ジュン・クン・キム; イン・ヨン・ソン; スン・ス・ユン |
| 本出願はブロック共重合体およびその用途に関するものである。本出願は、自己組織化特性が優秀で多様な用途で効果的に使われ得るブロック共重合体およびその用途を提供することができる。 | ||||||
| 18 | ブロック共重合体 | JP2017517260 | 2015-09-30 | JP2017530235A | 2017-10-12 | ノ・ジン・パク; ジュン・クン・キム; ジェ・クォン・イ; スン・ソ・ユン; セ・ジン・ク; ミ・ソク・イ; ウン・ヨン・チェ; ヒョン・ジュ・リュ |
| 本出願は単量体、ブロック共重合体の製造方法、ブロック共重合体およびその用途に関するものである。本出願の単量体は、優秀な自己組織化特性を有し、必要に応じて要求される多様な機能も自由に付与されたブロック共重合体を形成することができる。 | ||||||
| 19 | パターン化基板の製造方法 | JP2017517282 | 2015-09-30 | JP2017537458A | 2017-12-14 | セ・ジン・ク; ミ・ソク・イ; ヒョン・ジュ・リュ; ジュン・クン・キム; スン・ス・ユン; ノ・ジン・パク; ジェ・クォン・イ; ウン・ヨン・チェ |
| 本出願は、パターン化基板の製造方法に関するものである。前記方法は、例えば、電子デバイスおよび集積回路のような装置の製造工程または他の用途、例えば集積光学システム、磁気ドメインメモリーのガイダンスおよび検出パターン、平板ディスプレイ、液晶ディスプレイ(LCD)、薄膜磁気ヘッドまたは有機光放出ダイオードなどの製造に適用され得、集積回路、ビット−パターン化された媒体および/またはハードドライブのような磁気保存デバイスなどの個別トラック媒体(discrete track medium)の製造に使うために表面上にパターンを構築することに用いられ得る。 | ||||||
| 20 | ブロック共重合体 | JP2017517272 | 2015-09-30 | JP2017533301A | 2017-11-09 | ミ・ソク・イ; ジュン・クン・キム; セ・ジン・ク; ノ・ジン・パク; ジェ・クォン・イ; ウン・ヨン・チェ; スン・ス・ユン; ヒュン・ジュ・リュ |
| 本出願は、ブロック共重合体およびその用途が提供され得る。本出願のブロック共重合体は、優秀な自己組織化特性ないしは相分離特性を有し、要求される多様な機能も自由に付与することができる。 | ||||||
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