| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 61 | Controlled Atom Source | US15128731 | 2015-03-24 | US20170105276A1 | 2017-04-13 | Ole KOCK; Yeshpal SINGH; Kai BONGS; Wei HE |
| A method of generating at least one trapped atom of a specific species, the method comprising the steps of : positioning a sample material (18) comprising a specific species in a vacuum (14); generate an atomic vapour (20) of the specific species by irradiating the sample material with a first laser (12); trapping one or more atoms from the generated atomic vapour. | ||||||
| 62 | SUBSTRATE BONDING APPARATUS AND SUBSTRATE BONDING METHOD | US15306303 | 2015-04-24 | US20170047225A1 | 2017-02-16 | Tadatomo SUGA; Akira YAMAUCHI |
| A substrate bonding apparatus (100) includes a vacuum chamber (200), a surface activation part (610) for activating respective bonding surfaces of a first substrate (301) and a second substrate (302), and stage moving mechanisms (403, 404) for bringing the two bonding surfaces into contact with each other, to thereby bond the substrates (301, 302). In order to activate the bonding surfaces in the vacuum chamber (200), the bonding surfaces are irradiated with a particle beam for activating the bonding surfaces, and concurrently the bonding surfaces are also irradiated with silicon particles. It is thereby possible to increase the bonding strength of the substrates (301, 302). | ||||||
| 63 | Atom interferometer with adaptive launch direction and/or position | US13758309 | 2013-02-04 | US09470707B2 | 2016-10-18 | Robert Compton; Kenneth Salit |
| Embodiments described herein provide for a method of launching atoms in an atom interferometer. The method includes determining a direction of the total effective acceleration force on the atoms, controlling a direction of launch of the atoms for measurement in the atom interferometer based on the direction of the total effective acceleration force, and obtaining measurements from the atoms. | ||||||
| 64 | MICRO-STRUCTURED ATOMIC SOURCE SYSTEM | US14682810 | 2015-04-09 | US20160302296A1 | 2016-10-13 | James Goeders; Matthew S. Marcus; Thomas Ohnstein; Terry Dean Stark |
| A micro-structured atomic source system is described herein. One system includes a silicon substrate, a dielectric diaphragm, wherein the dielectric diaphragm includes a heater configured to heat an atomic source substance, an intermediary material comprising a chamber configured to receive the atomic source substance, and a guide material configured to direct a flux of atoms from the atomic source substance. | ||||||
| 65 | PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAM | US15133619 | 2016-04-20 | US20160233047A1 | 2016-08-11 | Daniel TANG; Tienyu SHENG |
| Systems and processes for plasma-based material modification of a work piece are provided. In an example process, a first plasma in a plasma source chamber is generated. A magnetic field is generated using a plurality of magnets. The magnetic field confines electrons of the first plasma having energy greater than 10 eV within the plasma source chamber. A second plasma is generated in a process chamber coupled to the plasma source chamber. An ion beam is generated in the process chamber by extracting ions from the first plasma through the plurality of magnets. The ion beam travels through the second plasma and is neutralized by the second plasma to generate a neutral beam. The work piece is positioned in the process chamber such that the neutral beam treats a surface of the work piece. | ||||||
| 66 | MATERIAL MODIFICATION BY NEUTRAL BEAM SOURCE WITH SELECTED COLLISION ANGLE | US14549829 | 2014-11-21 | US20160148713A1 | 2016-05-26 | Sang Ki Nam; Ludovic Godet |
| A neutral beam is scanned across a workpiece surface and the beam angle is controlled in a manner that avoids variation in the beam source-to-workpiece distance during scanning. | ||||||
| 67 | Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma | US14530349 | 2014-10-31 | US09288890B1 | 2016-03-15 | Lee Chen; Merritt Funk; Zhiying Chen |
| Embodiments include a chemical processing apparatus and method of using the chemical processing apparatus to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process which is comprised of a substantially anisotropic beam of neutral particles. The chemical processing apparatus comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential greater than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Further, the chemical processing apparatus comprises an ungrounded dielectric (insulator) neutralizer grid configured to expose a substrate in the second plasma chamber to the substantially anisotropic beam of neutral particles traveling from the neutralizer grid. | ||||||
| 68 | Neutral beam source with plasma sheath-shaping neutralization grid | US14549854 | 2014-11-21 | US09253868B1 | 2016-02-02 | Sang Ki Nam; Ludovic Godet |
| A neutral beam source has a plasma sheath-shaping neutralization grid that shapes a plasma sheath near a beam-forming slit of the neutralization grid in accordance with a desired entry angle of incoming ions in the slit. | ||||||
| 69 | TREATMENT METHOD FOR INHIBITING PLATELET ATTACHMENT AND ARTICLES TREATED THEREBY | US14655361 | 2013-12-24 | US20150351892A1 | 2015-12-10 | Joseph KHOURY; Sean R. KIRKPATRICK; Michael J WALSH; James G. BACHAND |
| A device such as a medical device and a method for making same provides a surface modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets. | ||||||
| 70 | High data-rate atom interferometers through high recapture efficiency | US13592029 | 2012-08-22 | US08941053B1 | 2015-01-27 | Grant Biedermann; Akash Vrijal Rakholia; Hayden McGuinness |
| An inertial sensing system includes a magneto-optical trap (MOT) that traps atoms within a specified trapping region. The system also includes a cooling laser that cools the trapped atoms so that the atoms remain within the specified region for a specified amount of time. The system further includes a light-pulse atom interferometer (LPAI) that performs an interferometric interrogation of the atoms to determine phase changes in the atoms. The system includes a controller that controls the timing of MOT and cooling laser operations, and controls the timing of interferometric operations to substantially recapture the atoms in the specified trapping region. The system includes a processor that determines the amount inertial movement of the inertial sensing system based on the determined phase changes in the atoms. Also, a method of inertial sensing using this inertial sensing system includes recapture of atoms within the MOT following interferometric interrogation by the LPAI. | ||||||
| 71 | METHOD FOR MODIFYING BIOCOMPATIBILITY CHARACTERISTICS OF A SURFACE OF A BIOLOGICAL MATERIAL WITH GAS CLUSTER ION BEAM | US14238752 | 2012-08-21 | US20140236295A1 | 2014-08-21 | Joseph Khoury; Laurence B. Tarrant; Sean R. Kirkpatrick; Richard C. Svrluga |
| A method for preparing a biological material for implanting provides irradiating at least a portion of the surface of the material with an accelerated Neutral Beam. | ||||||
| 72 | Isotopic abundance in atom trap trace analysis | US13398657 | 2012-02-16 | US08674289B2 | 2014-03-18 | Zheng-Tian Lu; Shiu-Ming Hu; Wei Jiang; Peter Mueller |
| A method and system for detecting ratios and amounts of isotopes of noble gases. The method and system is constructed to be able to measure noble gas isotopes in water and ice, which helps reveal the geological age of the samples and understand their movements. The method and system uses a combination of a cooled discharge source, a beam collimator, a beam slower and magneto-optic trap with a laser to apply resonance frequency energy to the noble gas to be quenched and detected. | ||||||
| 73 | METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUSTER ION BEAM TECHNOLOGY | US13834484 | 2013-03-15 | US20140021343A1 | 2014-01-23 | Sean R. Kirkpatrick; Allen R. Kirkpatrick |
| An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials. | ||||||
| 74 | ALIGNMENT OF AN ATOM BEAM WITH AN ELECTRIC FIELD IN THE PRODUCTION OF A CHARGED PARTICLE SOURCE | US13962346 | 2013-08-08 | US20130320202A1 | 2013-12-05 | Jabez McClelland; Brenton Knuffman; Adam Steele |
| A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in creating a charged particle source by photoionizing a cold atom beam. The method includes providing an atom beam in the enclosure, providing a plurality of electrically conductive devices in said enclosure, evacuating the enclosure to a pressure below about 10−6 millibar, and aligning the axis of the atom beam with the orientation of the electric field, relative to each other, within less than about two degrees. Alignment may be facilitated by applying at least one voltage to the electrically conductive devices, mechanically tilting the atom beam's axis orientation of the electric field relative to each other and/or causing a deflection of the atom beam. | ||||||
| 75 | ATOM INTERFEROMETER WITH ADAPTIVE LAUNCH DIRECTION AND/OR POSITION | US13758309 | 2013-02-04 | US20130213135A1 | 2013-08-22 | Robert Compton; Kenneth Salit |
| Embodiments described herein provide for a method of launching atoms in an atom interferometer. The method includes determining a direction of the total effective acceleration force on the atoms, controlling a direction of launch of the atoms for measurement in the atom interferometer based on the direction of the total effective acceleration force, and obtaining measurements from the atoms. | ||||||
| 76 | COUPLING STRUCTURE FOR AIRFRAME COMPONENTS | US13418865 | 2012-03-13 | US20120234977A1 | 2012-09-20 | Koji KAWAHARA; Hideo YAMAKOSHI; Yuichiro KAMINO; Atsuhiro IYOMASA; Toru HASHIGAMI |
| Provided is a coupling structure for airframe components that is capable of ensuring sufficient lightning protection capability. A conductive pattern part 40 made of a conductive material is formed around each fastener member 24 between wing surface panels 21A and 21B. The conductive pattern part 40 is formed, for example, around each of holes 21c and 21d on the plane on which the wing surface panel 21A and the wing surface panel 21B abut against each other. Then, the conductive pattern part 40 is pushed against both the wing surface panel 21A and the wing surface panel 21B by the fastening power of the fastener members 24, whereby electrical conduction between the wing surface panel 21A and the wing surface panel 21B can be achieved. | ||||||
| 77 | Magneto-optical trap for cold atom beam source | US13020432 | 2011-02-03 | US08237105B1 | 2012-08-07 | Michael D. Bulatowicz; Michael S. Larsen |
| One embodiment of the invention includes a magneto-optical trap (MOT) housing substantially surrounding atoms in an atom trapping region. The housing includes a first end that is substantially open to receive light that is substantially collimated and a second end opposite the first end that includes an aperture that emits a cold atom beam from the atom trapping region. The housing also includes a housing section surrounding and extending along a substantially central axis having a substantially reflective interior peripheral surface that reflects the light to generate an optical force on the atoms. The housing further includes an optical mask located substantially at the first end and along the substantially central axis that is configured to occlude the atom trapping region from the light to substantially prevent direct illumination of the atoms by unreflected light. | ||||||
| 78 | CHARGED PARTICLE SOURCE FROM A PHOTOIONIZED COLD ATOM BEAM | US13369008 | 2012-02-08 | US20120145919A1 | 2012-06-14 | Adam V. Steele; Brenton J. Knuffman; Jabez J. McClelland |
| A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity distributions controlled by the application of laser light is produced. The produced atom beam is spatially compressed along each transverse axis, thus reducing the cross-sectional area of the produced beam and reducing a velocity spread of the produced beam along directions transverse to the beam's direction of propagation. Laser light is directed onto at least a portion of the neutral atoms in the atom beam, thereby producing ions and electrons. An electric field is generated at the location of the produced ions and electrons, thereby producing a beam of ions traveling in a first direction and electrons traveling in substantially the opposite direction. A vacuum chamber contains the atom beam, the ion beam and the electron beam. | ||||||
| 79 | METHOD AND APPARATUS FOR PRODUCING HYPERTHERMAL BEAMS | US12501315 | 2009-07-10 | US20110006227A1 | 2011-01-13 | Mark Yi-Shuen WU |
| An exemplary apparatus and method for producing a hyperthermal beam is provided. An apparatus may comprise a plasma discharge source, an emission system, and a magnetic source. The plasma discharge source may be configured to receive an elemental source, generate plasma based on the elemental source, and generate one or more neutral atoms of the elemental source. The emission system may be configured to emit a hyperthermal beam, comprising the one or more neutral atoms of the elemental source, from the plasma discharge source through an aperture of the plasma discharge source. The magnetic source may be configured to provide a magnetic field and to collimate the hyperthermal beam in a first direction and control a size of the hyperthermal beam. | ||||||
| 80 | Multi-plasma neutral beam source and method of operating | US12126456 | 2008-05-23 | US07732759B2 | 2010-06-08 | Lee Chen; Merritt Funk |
| Method and system for producing a neutral beam source is described. The neutral beam source comprises a plasma generation system for forming a first plasma in a first plasma region, a plasma heating system for heating electrons from the first plasma region in a second plasma region to form a second plasma, and a neutralizer grid for neutralizing ion species from the second plasma in the second plasma region. Furthermore, the neutral beam source comprises an electron acceleration member configured to accelerate the electrons from the first plasma region into the second plasma region. Further yet, the neutral beam source comprises a pumping system that enables use of the neutral beam source for semiconductor processing applications, such as etching processes. | ||||||
QQ群二维码
意见反馈
意见反馈