| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 121 | Rotation, acceleration, and gravity sensors using quantum-mechanical matter-wave interferometry with neutral atoms and molecules | US113620 | 1987-10-26 | US4874942A | 1989-10-17 | John F. Clauser |
| The invention is a neutral atom (and/or molecule) matter-wave interferometer (and/or set of interferometers) that can be used as an inertial sensor with a sensitivity exceeding that of conventional mechanical sensors and multiple circuit optical interferometers (including ring lasers) by many powers of ten. An interferometer in which matter-wave propagation beam paths enclose a finite area will sense rotations via the Sagnac effect. One with the paths displaced from each other will sense acceleration plus gravity. The matter-wave energy and mass dependence of the phase shifts that are due to rotation and acceleration are different. Thus a pair of interferometers with different energies and/or masses can perform simultaneous independent measurements of rotation and acceleration. Interferometers with paths that follow a figure-eight pattern yield a gravitational gradiometer. Laser cooling and slowing of a beam of neutral atoms provides a low energy nearly monochromatic source. One form of the invention comprises a sequence of slits and/or diffraction gratings operation in high order. Gratings consist of slits in a solid material or near-resonant standing-wave laser beams. Path curvature due to acceleration and rotation is canceled by magnetic and/or electric field gradients that produce an effective levitation of slow atoms. A feedback system that maintains an interferometer phase null is employed with its error signal yielding the inertial effect signals. Magnetic fields are used for producing matter-wave phase shifts. One form of detector images the Moire pattern formed in the light emitted from the resonance fluorescence of a standing matter-wave fringe pattern and a standing-wave laser beam. | ||||||
| 122 | Heat pipe oven molecular beam source | US636769 | 1984-08-01 | US4558218A | 1985-12-10 | Robert E. Drullinger |
| A heat pipe oven molecular beam source wherein a hollow porous metal, metalloid or ceramic body with at least one opening is nearly saturated with the working material and heated to just above the melting point of the working material, generating a thin liquid layer of the working material on the internal surface of the body. Material passing the length of the bore of the body without striking a wall will escape and form the beam. Material striking the liquid layer covering the inside of the body will condense and be conveyed by capillary action back to the closed end of the body. | ||||||
| 123 | Ionization of organic substances on conveyor means in mass spectrometer | US855579 | 1977-11-29 | US4178507A | 1979-12-11 | Curt Brunnee; Jochen Franzen; Stefan Meier |
| Organic samples 10 coming from a liquid chromatograph 11 are deposited on a conveyor belt 13 which transports them into a vacuum chamber at the entry end of a mass spectrometer. The samples are ionized directly on the belt by ion bombardment or using a gaseous charge carrier. Ionization is enhanced by applying an oxide layer to the belt, by neutralizing the image force, and by vaporizing alkali atoms on the belt to reduce the ionization potential. | ||||||
| 124 | Device for generating an atomic cloud | US877657 | 1978-02-14 | US4164654A | 1979-08-14 | Louis R. P. Butler; Hendrik G. C. Human |
| This invention relates to a device for generating an atomic cloud, the device having a housing in which is housed a cathode and an anode, and with suitable passages or flow directing members to direct flow of a gas outwardly away from or past the cathode discharge surface, so that when a suitable potential is applied across the anode and the cathode a glow discharge occurs between the anode and the cathode. The flow of gas preferably draws atoms that are ejected from the cathode discharge surface away from the cathode to a region beyond the cathode glow region, thereby to generate an atomic cloud having a low value of inherent radiation. The device is further incorporated with an apparatus for spectro-scopically analyzing a substance by fluorescent techniques. | ||||||
| 125 | High brightness ion source | US37445773 | 1973-06-28 | US3914655A | 1975-10-21 | DREYFUS RUSSELL WARREN; HODGSON RODNEY TREVOR |
| A high brightness ion beam is obtainable by using lasers to excite atoms or molecules from the ground state to an ionized state in increments, rather than in one step. The spectroscopic resonances of the atom or molecule are used so that relatively long wavelength, low power lasers can be used to obtain such ion beam.
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| 126 | Demountable sputtering cathode for atomic absorption spectroscopy | US38908873 | 1973-08-17 | US3876305A | 1975-04-08 | GOUGH DAVID SAMUEL; HANNAFORD PETER; WALSH ALAN |
| Techniques and apparatus for measuring the concentration of elements in a solid metal sample by atomic absorption and fluorescence are described. A silica disc with an annular discharge-suppressing gap surrounding the sample area and an Oring seal are used to locate a surface of the sample for sputtering, and gas passages in the disc allow sputtered atoms to be swept into the body of a vacuum chamber for convenient analysis.
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| 127 | Molecular frequency standard | US3668293D | 1970-03-17 | US3668293A | 1972-06-06 | HELLWIG HELMUT W |
| A molecular beam source for a molecular beam tube frequency standard using a barium oxide molecule of the form Ba138016 having spinless atoms and using electrostatic state selection, which source includes a thin-walled refractory electrically conductive oven tube containing Ba138016. The oven tube, which is chemically inert to barium oxide, is surrounded by a thermionic electron emitter which is made negative with respect to the oven tube. Electrons emitted from the electron emitter bombard the oven tube and heat the barium oxide to a temperature at which Ba138016 molecules are evaporated.
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| 128 | Method and apparatus for generating a continuous beam of neutral atoms | US3569706D | 1965-10-22 | US3569706A | 1971-03-09 | MECKEL BENJAMIN B; RICHELMANN BERND H |
| Method and apparatus for generating a continuous beam of sputtered neutral atoms that are sputtered from metallic members, condensed layers of gases, single crystals and condensed layers of gases on single crystals, and which continuous beam passes through an aperture providing a directed beam that may be restricted to neutral atoms having a monovelocity by a velocity selector means.
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| 129 | Oven source for atomic beam tubes having a non-wettably coated gas passageway between the reservoir and the beam | US3450876D | 1966-07-11 | US3450876A | 1969-06-17 | KERN ROBERT H; HOLLOWAY JOSEPH H |
| 130 | Method of and apparatus for producing particles in a metastable state | US3446959D | 1966-03-22 | US3446959A | 1969-05-27 | BAKER FRANKLIN ALBERT |
| 131 | Cesium ovens | US78728559 | 1959-01-16 | US2991389A | 1961-07-04 | GRANT EUGENE F; SIMPSON GORDON E; MCCOUBREY ARTHUR O; BURITZ ROBERT S |
| 132 | METHOD AND APPARATUS FOR DIRECTING A NEUTRAL BEAM | PCT/US2014014720 | 2014-02-04 | WO2014121285A3 | 2015-02-19 | KIRKPATRICK SEAN R; CHAU SON |
| An apparatus and method for producing a deflection of a Neutral Beam derived from a gas-cluster ion-beam deflects the gas-cluster ion-beam prior to dissociation of gas clusters and removal of tons. | ||||||
| 133 | NEUTRAL PARTICLE BEAM PROCESSING APPARATUS | PCT/JP0202750 | 2002-03-22 | WO02078041A2 | 2002-10-03 | ICHIKI KATSUNORI; YAMAUCHI KAZUO; HIYAMA HIROKUNI; SAMUKAWA SEIJI |
| A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), an orifice electrode (5) disposed between the workpiece holder (20) and the plasma generator, and a grid electrode (4) disposed upstream of the orifice electrode (5) in the vacuum chamber (3). The orifice electrode (5) has orifices (5a) defined therein. The neutral particle beam processing apparatus further comprises a voltage applying unit for applying a voltage between the orifice electrode (5) and the grid electrode (4) via a dielectric (5b) to extract positive ions from the plasma generated by the plasma generator and pass the extracted positive ions through the orifices (5a) in the orifice electrode (5). | ||||||
| 134 | NEUTRAL PARTICLE BEAM PROCESSING APPARATUS | PCT/JP0202748 | 2002-03-22 | WO02078040A2 | 2002-10-03 | ICHIKI KATSUNORI; YAMAUCHI KAZUO; HIYAMA HIROKUNI; SAMUKAWA SEIJI |
| A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes (5, 6) involving the plasma generated by the plasma generator therebetween, and a power supply (102) for applying a voltage between the pair of electrodes (5, 6). The pair of electrodes (5, 6) accelerate the positive ions and/or the negative ions generated by the plasma generator. The positive ions and/or the negative ions are neutralized and converted into neutral particles while being drifted in the plasma between the pair of electrodes (5, 6) toward a workpiece (X). The accelerated neutral particles pass through one of the electrodes (6) and are applied to the workpiece (X). | ||||||
| 135 | ADIABATIC RAPID PASSAGE ATOMIC BEAMSPLITTER USING FREQUENCY-SWEPT COHERENT LASER BEAM PAIRS | PCT/US2012066973 | 2012-11-29 | WO2013082233A8 | 2013-07-25 | STONER RICHARD E; KINAST JOSEPH M; TIMMONS BRIAN P |
| Methods and apparatus for providing coherent atom population transfer using coherent laser beam pairs in which the frequency difference between the beams of a pair is swept over time. Certain examples include a Raman pulse adiabatic rapid passage sweep regimen configured to be used as a beamsplitter and combiner in conjunction with an adiabatic rapid passage mirror sweep or a standard Raman mirror pulse in a 3-pulse interferometer sequence. | ||||||
| 136 | ELECTRON CYCLOTRON RESONANCE ION GENERATOR | PCT/FR2009051104 | 2009-06-11 | WO2010001036A2 | 2010-01-07 | PACQUET JEAN-YVES; GAUBERT GABRIEL |
| The invention relates to an ECR ion generator (1) comprising a vacuum-tight chamber (2) of axial symmetry along a longitudinal axis (AA'), means (3, 4, 5, 6) for generating a magnetic field having a symmetry of revolution with respect to the axis (AA') and means for propagating a high-frequency wave. The chamber (2) has an ionization first stage (7) at one end of the chamber (2) having an ionization zone (10) in which ions are generated, the magnetic field being approximately parallel to the axis (AA') in the zone (10), and a second stage (8) for magnetically confining the ions generated that uses a first high-frequency wave coming from the propagation means. The magnetic field is approximately parallel to the axis (AA') between the zone (10) and the second stage (8) so that the ions generated in the zone (10) migrate towards the second stage (8), and the first and second stages (7, 8) contain the same DC plasma. | ||||||
| 137 | ATOMIC BEAM TO PROTECT A RETICLE | PCT/US2005012129 | 2005-04-08 | WO2005109971A3 | 2006-08-03 | SILVERMAN PETER |
| Embodiments of the invention provide a beam generator to produce an atomic beam that travels across a patterned surface of a reticle. The beam may interact with particles to prevent the particles from contaminating the reticle. | ||||||
| 138 | PHOTON NEUTRALIZERS FOR NEUTRAL BEAM INJECTORS | EP15860465 | 2015-11-18 | EP3221865A4 | 2018-07-11 | BURDAKOV ALEXANDER V; IVANOV ALEXANDR A; POPOV SERGEY S |
| A non-resonance photo-neutralizer for negative ion-based neutral beam injectors. The non-resonance photo-neutralizer utilizes a nonresonant photon accumulation, wherein the path of a photon becomes tangled and trapped in a certain space region, i.e., the photon trap. The trap is preferably formed by two smooth mirror surfaces facing each other with at least one of the mirrors being concave. In its simplest form, the trap is elliptical. A confinement region is a region near a family of normals, which are common to both mirror surfaces. The photons with a sufficiently small angle of deviation from the nearest common normal are confined. Depending on specific conditions, the shape of the mirror surface may be one of spherical, elliptical, cylindrical, or toroidal geometry, or a combination thereof. | ||||||
| 139 | ATOMIC CLOCK SYSTEM | EP17195497.7 | 2017-10-09 | EP3309629A1 | 2018-04-18 | LARSEN, Michael; WALKER, Thad |
An atomic clock system includes a magneto-optical trap (MOT) system that traps alkali metal atoms in a cell during a trapping stage of each of sequential coherent population trapping (CPT) cycles. The system also includes an interrogation system that generates an optical difference beam comprising a first optical beam having a first frequency and a second optical beam having a second frequency different from the first frequency. The interrogation system includes a direction controller that periodically alternates a direction of the optical difference beam through the cell during a CPT interrogation stage of each of the sequential clock measurement cycles to drive CPT interrogation of the trapped alkali metal atoms. The system also includes an oscillator system that adjusts a frequency of a local oscillator based on an optical response of the CPT interrogated alkali metal atoms during a state readout stage in each of the sequential clock measurement cycles.
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| 140 | SUBSTRATE-BONDING DEVICE AND METHOD FOR BONDING SUBSTRATE | EP15783636 | 2015-04-24 | EP3136422A4 | 2017-12-27 | YAMAUCHI AKIRA; SUGA TADATOMO |
| A substrate bonding apparatus (100) includes a vacuum chamber (200), a surface activation part (610) for activating respective bonding surfaces of a first substrate (301) and a second substrate (302), and stage moving mechanisms (403, 404) for bringing the two bonding surfaces into contact with each other, to thereby bond the substrates (301, 302). In order to activate the bonding surfaces in the vacuum chamber (200), the bonding surfaces are irradiated with a particle beam for activating the bonding surfaces, and concurrently the bonding surfaces are also irradiated with silicon particles. It is thereby possible to increase the bonding strength of the substrates (301, 302). | ||||||
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