| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | METHOD AND APPARATUS FOR DIRECTING A NEUTRAL BEAM | EP14745537.2 | 2014-02-04 | EP2952070B1 | 2018-05-30 | KIRKPATRICK, Sean, R.; CHAU, Son |
| An apparatus and method for producing a deflection of a Neutral Beam derived from a gas-cluster ion-beam deflects the gas-cluster ion-beam prior to dissociation of gas clusters and removal of tons. | ||||||
| 2 | BEAM SOURCE | EP00946335 | 2000-07-14 | EP1220272A4 | 2007-04-11 | HATAKEYAMA MASAHIRO; ICHIKI KATSUNORI; WATANABE KENJI; SATAKE TOHRU |
| The invention provides an efficient beam source that produces a directional, high-density energy beam having a relatively large size. The beam source comprises three electrodes, i.e., an upstream electrode (23) located downstream from a gas entrance port (12) in a discharge tube (11) and having a large number of holes through gas passes, a meshed intermediate electrode (24), and a downstream electrode (14) having a large number of holes through which beams pass. Plasma means (20) for producing plasma is provided outside the discharge tube between the upstream and intermediate electrodes. | ||||||
| 3 | Processing method using fast atom beam | EP94110367.3 | 1994-07-04 | EP0637901B1 | 2002-11-13 | Hatakeyama, Masahiro |
| 4 | Plasma processing system and method | EP92109655.8 | 1992-06-09 | EP0522296A3 | 1993-03-10 | Kinoshita, Osamu; Murakawa, Shigemi; Kubota, Naoki |
An etching system comprises a plasma chamber (20), a charge exchange chamber (22) and a processing chamber (24), and the charge exchange chamber and the processing chamber are partitioned with a porous plate (34) provided with a number of fine linear microchannel holes (34A). Positive ions generated by the plasma chamber are accelerated by an accelerating electrode (26) in the charge exchange chamber, charge-exchanged and introduced as neutral particles into the processing chamber through the microchannel holes. Neutral particles are vertically entered into an object (S) to be processed as neutral particle beams of which directions are completely aligned by the microchannel holes. Even an object with a large area can be etched with high accuracy by making the porous plate in a size which meets the object. Thus, the plasma processing only with neutral particles is carried out with high accuracy even when the area of the object is large. |
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| 5 | Nuclear spin polarized manufacturing of noble gas equipment and nuclear magnetic resonance spectroscopy and nuclear magnetic resonance imaging apparatus | JP2006316485 | 2006-11-24 | JP4817317B2 | 2011-11-16 | 典孝 山本; 隆 平賀; 峰之 服部 |
| An apparatus for producing a nuclear spin-polarized noble gas by spin-polarizing a noble gas in the presence of an optical pumping catalyst under application of magnetic field and laser light, including a cell having a thin reaction chamber, a gas introduction conduit connected in fluid communication with the reaction chamber for feeding the noble gas, a gas discharge conduit connected in fluid communication with the reaction chamber, a first gate valve having an outlet port connected to the gas introduction conduit and an inlet port adapted to be in fluid communication with a noble gas introduction line, a second gate valve having an inlet port connected to the gas discharge conduit and an outlet port, and a capillary tube removably connected to the outlet port of the second valve for recovering a nuclear spin-polarized noble gas produced in the reaction chamber. The apparatus may be directly connected to NMR or MRI. | ||||||
| 6 | Apparatus for producing nuclear-spin polarized rare gas, nuclear magnetic resonance spectrometer, and nuclear magnetic resonance imaging device | JP2006316485 | 2006-11-24 | JP2008125930A | 2008-06-05 | HATTORI MINEYUKI; HIRAGA TAKASHI; YAMAMOTO NORITAKA |
| <P>PROBLEM TO BE SOLVED: To provide a system which makes use of both characteristics of a batch system and flow cell system and is also excellent in generation efficiency of polarized rare gas and its utility efficiency. <P>SOLUTION: The apparatus for producing a nuclear-spin polarized rare gas is provided with: a flat cell part for circulating a mixed air of rare gas and optical pumping catalyst in a gap; a laser light irradiation part for irradiating a laser light and irradiating an excitation light into the flat type cell; a magnetic field application part; and a temperature adjustment part for the plane cell part. In the flat cell part, one of flat plate surfaces can transmit the laser light and the cell part has a derivation part of the nuclear-spin polarized rare gas. In the air introducing part, derivation and stop are freely performed by a valve of a structure capable of viewing through a downstream side to be the flat cell part from the upstream side for introducing air when opening the valve in the air introducing part and by a valve of a structure capable of seeing through the downstream side to be the derivation part of the nuclear-spin polarized rare gas generated from the upstream side in the derivation part of the nuclear-spin polarized rare gas. The derivation part is provided with an extra-fine capillary pipe so that they can be connected and removed. <P>COPYRIGHT: (C)2008,JPO&INPIT | ||||||
| 7 | Processing apparatus using a fast atom beam | JP19207393 | 1993-07-05 | JP3432545B2 | 2003-08-04 | 雅規 畠山 |
| 8 | Machining method using high speed atomic beam | JP15681194 | 1994-06-14 | JPH0768389A | 1995-03-14 | HATAKEYAMA MASAKI |
| PURPOSE:To provide a machining method using the high speed atomic beam which can efficiently execute the machining of various patterns. CONSTITUTION:The surface of a substrate 1 to be machined is covered by a covering body 5 with pattern holes formed therein which is closely attached to its surface or kept at the prescribed distance from its surface, and the covering body 5 is irradiated with the high speed atomic beam 7 consisting of the atoms and molecules moving with large kinetic energy to machine the substrate 1 to be machined by the high speed atomic beam 7 irradiated on the surface of the substrate 1 to be machined through the pattern holes 5a. | ||||||
| 9 | JPS5232720B1 - | JP4253872 | 1972-04-26 | JPS5232720B1 | 1977-08-23 | |
| 10 | JPS504439B1 - | JP5684670 | 1970-06-29 | JPS504439B1 | 1975-02-19 | |
| 11 | COMPOSITE BEAM APPARATUS | EP17190734.8 | 2017-09-13 | EP3293752A1 | 2018-03-14 | ASAHATA, Tatsuya |
Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. |
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| 12 | BEAM SOURCE | EP00946335.7 | 2000-07-14 | EP1220272A1 | 2002-07-03 | Hatakeyama, Masahiro, Ebara Corporation; Ichiki, Katsunori, Ebara Research Co., Ltd.; Watanabe, Kenji, Ebara Corporation; Satake, Tohru, Ebara Corporation |
An object of the present invention is to provide a beam source capable of efficiently generating a high-density energy beam having good directivity and a relatively large beam diameter. The beam source of the present invention comprises a discharge tube; a gas inlet for introducing gas into the discharge tube; three electrodes mounted in the discharge tube downstream from the gas inlet, wherein the electrode on the upstream end has a plurality of openings through which the gas can pass, the middle electrode is a mesh-shaped electrode, and the electrode on the downstream end is a beam-emitting electrode having a plurality of beam-emitting holes and is disposed in a plane parallel to the middle electrode; plasma-generating means disposed between the two upstream electrodes on the outside of the discharge tube for transforming gas introduced into the discharge tube into plasma; and voltage-applying means for accelerating the beam between the two downstream electrodes and emitting the accelerated beam from the downstream beam-emitting electrode. |
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| 13 | Processing apparatus using fast atom beam | EP94110368.1 | 1994-07-04 | EP0633714A1 | 1995-01-11 | Hatakeyama, Masahiro |
A processing apparatus using a fast atom beam which has at least one source selected from among a light energy source, a laser beam source, a radical source, an electron beam source, an X-ray or radiation (alpha rays, beta rays, or gamma rays) source, and an ion source, in addition to the fast atom beam source, so that an object to be processed which is disposed in a vacuum container or outside a vacuum is irradiated with a fast atom beam in combination with at least one selected from among the light energy, laser beam, electron beam, X-rays or radiation, radical particles and ion beam, to thereby increase processing speed. |
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| 14 | Plasma processing system and method | EP92109655.8 | 1992-06-09 | EP0522296A2 | 1993-01-13 | Kinoshita, Osamu; Murakawa, Shigemi; Kubota, Naoki |
An etching system comprises a plasma chamber (20), a charge exchange chamber (22) and a processing chamber (24), and the charge exchange chamber and the processing chamber are partitioned with a porous plate (34) provided with a number of fine linear microchannel holes (34A). Positive ions generated by the plasma chamber are accelerated by an accelerating electrode (26) in the charge exchange chamber, charge-exchanged and introduced as neutral particles into the processing chamber through the microchannel holes. Neutral particles are vertically entered into an object (S) to be processed as neutral particle beams of which directions are completely aligned by the microchannel holes. Even an object with a large area can be etched with high accuracy by making the porous plate in a size which meets the object. Thus, the plasma processing only with neutral particles is carried out with high accuracy even when the area of the object is large. |
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| 15 | Laser cooling via stimulated photon emissions | US14546537 | 2014-11-18 | US09788406B2 | 2017-10-10 | Wade L. Klennert |
| An example laser cooling system may include a first laser to induce a transition of a plurality of electrons in a medium to an excited energy state via absorption of photons. The laser cooling system may also include a second laser to stimulate emission from the medium of emitted photons having a higher energy than an energy of the absorbed photons. | ||||||
| 16 | PROCESS FOR CONTROLLING, UNDER VOID, A JET OF PARTICLES WITH AN AERODYNAMIC LENS AND ASSOCIATED AERODYNAMIC LENS | US15381542 | 2016-12-16 | US20170181262A1 | 2017-06-22 | Olivier Sublemontier; Youri Rousseau |
| The invention relates to a method for controlling the divergence of a jet of particles in vacuo with an aerodynamic lens, the aerodynamic lens including at least one chamber; a diaphragm, a so-called inlet diaphragm, intended to form an inlet of the aerodynamic lens for a jet of particles, the inlet diaphragm having a given diameter (d1); and another diaphragm, a so-called outlet diaphragm, intended to form an outlet of the aerodynamic lens for this jet of particles; the method including: a step for generating the jet of particles from the inlet to the outlet, in vacuo, of the aerodynamic lens; and a step for adjusting the diameter (ds) of the outlet diaphragm for controlling the divergence of the jet of particles. | ||||||
| 17 | Method and Apparatus to Identify Functional Issues of a Neutron Radiation Generator | US14543806 | 2014-11-17 | US20160143123A1 | 2016-05-19 | Joel L. Groves; Peter Wraight |
| Systems, methods, and apparatuses to identify functional issues of a neutron radiation generator are described. In certain aspects, a method includes receiving an operation extractor signal from an extractor electrode of a radiation generator, determining a calculated extractor signal of the radiation generator, and comparing the operation extractor signal to the calculated extractor signal. The calculated extractor signal may be determined from an operation acceleration signal from an acceleration member of the radiation generator, an operation electron beam signal from electrons backstreaming in the radiation generator, an ion signal of an ion beam of the radiation generator, or a combination thereof. | ||||||
| 18 | METHOD AND SYSTEM FOR PLASMA-ASSISTED ION BEAM PROCESSING | US13771428 | 2013-02-20 | US20140234554A1 | 2014-08-21 | Svetlana B. Radovanov; Ludovic Godet; Bon-Woong Koo |
| A system for processing a substrate may include a first chamber operative to define a first plasma and a second chamber adjacent the first chamber, where the second chamber is electrically isolated from the first chamber, and configured to define a second plasma. The system may also include an extraction assembly disposed between the first chamber and second chamber to provide at least plasma isolation between the first plasma and the second plasma, a substrate assembly configured to support the substrate in the second chamber; and a biasing system configured to supply a plurality of first voltage pulses to direct first ions from the first plasma through the second chamber towards the substrate during one time period, and to supply a plurality of second voltage pulses to generate the second plasma and to attract second ions from the second plasma during another time period. | ||||||
| 19 | ISOTOPIC ABUNDANCE IN ATOM TRAP TRACE ANALYSIS | US13398657 | 2012-02-16 | US20130214143A1 | 2013-08-22 | Zheng-Tian LU; Shiu-Ming Hu; Wei Jiang; Peter Mueller |
| A method and system for detecting ratios and amounts of isotopes of noble gases. The method and system is constructed to be able to measure noble gas isotopes in water and ice, which helps reveal the geological age of the samples and understand their movements. The method and system uses a combination of a cooled discharge source, a beam collimator, a beam slower and magneto-optic trap with a laser to apply resonance frequency energy to the noble gas to be quenched and detected. | ||||||
| 20 | Apparatus for producing nuclear spin-polarized noble gas, nuclear magnetic resonance spectrometer, and nuclear magnetic resonance imager | US11984869 | 2007-11-23 | US07710114B2 | 2010-05-04 | Mineyuki Hattori; Takashi Hiraga; Noritaka Yamamoto |
| An apparatus for producing a nuclear spin-polarized noble gas by spin-polarizing a noble gas in the presence of an optical pumping catalyst under application of magnetic field and laser light, including a cell having a thin reaction chamber, a gas introduction conduit connected in fluid communication with the reaction chamber for feeding the noble gas, a gas discharge conduit connected in fluid communication with the reaction chamber, a first gate valve having an outlet port connected to the gas introduction conduit and an inlet port adapted to be in fluid communication with a noble gas introduction line, a second gate valve having an inlet port connected to the gas discharge conduit and an outlet port, and a capillary tube removably connected to the outlet port of the second valve for recovering a nuclear spin-polarized noble gas produced in the reaction chamber. The apparatus may be directly connected to NMR or MRI. | ||||||
