专利汇可以提供Forming method of ion injection region专利检索,专利查询,专利分析的服务。并且PURPOSE: To reduce the lateral expansion of the ion by forming the opening part of the oxide film mask used for ion injection into the semiconductor into such shape that has the side wall oblique and parallel to the surface of the substrate.
CONSTITUTION: SiO
2 film 2 is coated on Si substrate 1 with opening part 2
a provided, and then the ion is injected into substrate 1 to form source or drain region 3. Usually, the upper surface of part 2
a is sloped gently with angle θ, but in this case the side wall is provided obliquely and in parallel to the surface of substrate 1 with same angle θ for part 2
a . Then ion I.I is injected vertically from the upper surface of the mask to form ion injection region 3 at the area of width W
1 at the exposed part of part 2
a as well as the areas of width W
2 at taper part 2
b and hangover part 2
c respectively. As a result, a coincidence is obtained between the edge part of start point W
2 of the lateral expansion of ion I.I and the position of edge 2
c of the mask, thus reducing the lateral expansion of the ion.
COPYRIGHT: (C)1979,JPO&Japio,下面是Forming method of ion injection region专利的具体信息内容。
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