| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 181 | Polymerizable monomer and polymer | JP51936096 | 1995-12-18 | JPH10511937A | 1998-11-17 | エバンス，リチャード・アレキサンダー; モード，グレアム; リザード，エジオ |
| (57)【要約】 本発明は、式： | ||||||
| 182 | Sensitive photographic element containing a cyclic ether compound | JP14185088 | 1988-06-10 | JP2606883B2 | 1997-05-07 | ハーマン ハーツ アーサー; パリ クリスチャン; フリウール ジェラール; リベシエ マルセル |
| 183 | Photographic elements containing ether compound - a cyclic thioether | JP22393386 | 1986-09-24 | JPH0743516B2 | 1995-05-15 | フリウール ジェラール; リベシー マルセル; ベナール リジェーン |
| 184 | Method of purifying crown compound | JP2931393 | 1993-02-18 | JPH06239854A | 1994-08-30 | TANAKA MARI; KAWASHIMA YASUHIKO |
| PURPOSE: To inexpensively purify a crown compound simply and efficiently. CONSTITUTION: A crown compound is made into a complex, dissolved in an organic solvent, purified, mixed with water and recovered to purify the crown compound. The crown compound is preferably a crown ether and an alcohol is preferable as the solvent used. COPYRIGHT: (C)1994,JPO&Japio | ||||||
| 185 | Kanshikikafuruoroshibozokunosanmusuibutsu | JP1318382 | 1982-01-29 | JPH0245630B2 | 1990-10-11 | FURETSUDO ERITSUKU BEEA; ROBAATO JEEMUSU KOSHAA |
| 186 | Photosensitive photographic element containing cyclic ether compound | JP14185088 | 1988-06-10 | JPH01138552A | 1989-05-31 | JIERAARU FURIUURU; AASAA HAAMAN HAATSU; KURISUCHIYAN PARI; MARUSERU RIBESHIE |
| PURPOSE: To eliminate fogging by adding a cyclic ether compd. contg. a specific compd. to the above element. CONSTITUTION: The cyclic ether compd. having one of the compds. expressed by formula I or formula II is added by about 10 -6 to about 10 -1 mol/1mole silver halide to the element during the prepn. of particles or coating of a base. In the formulas, A is-(1) p-DR; L is nitrogen, oxygen, sulfur or hydrocarbon group which may be interrupted or substd. by a carbonyl-contg. group; D is an acid functional group; R is hydrogen, inorg. cation or org. cation, etc. B is independently hydrogen or A; X is group VI atom which is independently sulfur, selenium or oxygen; m is 1 or 2; n is 3 to 6; o is 1 or 2; p is independently 0, 1 or 2; Z is the atom necessary for perfecting an arom. carbon ring or arom. heterocyclic ring. As a result, the fogging is eliminated. COPYRIGHT: (C)1989,JPO | ||||||
| 187 | Photographic element containing cyclic thio ether compound | JP22393386 | 1986-09-24 | JPS6285239A | 1987-04-18 | RIJIEEN BENAARU; JIERAARU FURIUURU; MARUSERU RIBESHII |
| 188 | Acid anhydride of cyclic perfluoro aliphatic group and amide derivative thereof | JP1318382 | 1982-01-29 | JPS57150654A | 1982-09-17 | FURETSUDO ERITSUKU BEEA; ROBAATO JIEEMUSU KOSHIYAA |
| 189 | JPS49116232A - | JP1636574 | 1974-02-12 | JPS49116232A | 1974-11-06 | |
| 190 | 新規化合物、電解液及び二次電池 | JP2015536495 | 2014-08-12 | JP6398984B2 | 2018-10-03 | 島貫 伊紀子; 石川 仁志; 吉田 登; 川崎 大輔 |
| 191 | モノマー、ポリマー、及びフォトレジスト組成物 | JP2017251852 | 2017-12-27 | JP2018109167A | 2018-07-12 | ユイ・ヒュン・リュ; ミュン−ヨル・キム; ウー−ヒュン・リー; ヘミ・チョン; クァン−フィ・イム |
| 【課題】パターン化フォトレジスト画像の解像度を高めるフォトレジスト組成物の提供。 【解決手段】1)1つ以上の酸不安定環置換基と、2)1つ以上のエーテルまたはチオエーテル環置換基とを含む、炭素脂環式基またはヘテロ脂環式基を含むモノマー及びポリマー、更に、そのようなポリマーを含むフォトレジスト組成物。 【選択図】なし |
||||||
| 192 | 光酸発生剤およびこれを含むフォトレジスト | JP2017241990 | 2017-12-18 | JP2018065855A | 2018-04-26 | イマッド・アカド; ミンチー・リー; チェン−バイ・スー |
| 【課題】光酸発生剤化合物(PAG)の合成のための新規の方法、新規の光酸発生剤化合物およびこのPAGを含むフォトレジスト組成物の提供。 【解決手段】下記式で表される化合物であって、1)SO3−部分;2)1個以上のフッ素化炭素;および3)エステルケト基によって直接的にまたは非直接的に置換されている1個以上のフッ素化炭素を含む光酸発生剤。 【選択図】なし |
||||||
| 193 | 環状オリゴマーを用いたポリ(エーテルスルホン−イミドまたは−アミド)共重合体の製造方法 | JP2016071707 | 2016-03-31 | JP6224154B2 | 2017-11-01 | キム ヨン ソク; ジュン ヒュン ミン; ウォン ジョン チャン; リ ジェ フン |
| 194 | 光酸発生剤およびこれを含むフォトレジスト | JP2016045668 | 2016-03-09 | JP2016147879A | 2016-08-18 | イマッド・アカド; ミンチー・リー; チェン−バイ・スー |
| 【課題】サブミクロン寸法の高解像の像を提供できる新規のフォトレジスト使用する光酸発生剤化合物の提供。 【解決手段】下式の1)SO3−部分;2)1個以上のフッ素化炭素;および3)エステルケト基によって直接的にまたは非直接的に置換されている1個以上のフッ素化炭素を含む化合物。 【選択図】なし |
||||||
| 195 | 光酸発生剤およびこれを含むフォトレジスト | JP2011076477 | 2011-03-30 | JP5969171B2 | 2016-08-17 | イマッド・アカド; ミンチー・リー; チェン−バイ・スー |
| 196 | メチレンジスルホネート化合物の製造方法 | JP2012530595 | 2011-07-27 | JP5721720B2 | 2015-05-20 | 坂東 誠二; 藤原 健志; 白石 浩之; 檜山 武寛 |
| 197 | 重合可能な大環状ポリエーテルおよび大環状ヘテロ類縁ポリエーテルの歯科材料における使用 | JP2010186692 | 2010-08-23 | JP5622488B2 | 2014-11-12 | |
| 198 | Manufacturing method of disulfonic acid ester | JP2010278808 | 2010-12-15 | JP5293729B2 | 2013-09-18 | 訓明 岡本; 勉 綿引; 元重 角野; 貴雄 柴崎 |
| The present invention provides a method for producing a sulfonate ester efficiently and in high yield. The present invention is an invention of a method for producing a sulfonate ester compound, which comprising reacting: (a) a compound having a sulfo group (-SO 3 H); and (b) a compound having a group represented by the general formula [1]: €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-OR 1 €ƒ€ƒ€ƒ€ƒ€ƒ[1] [wherein, R 1 represents a sulfonyl group represented by the general formula [2]: €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-SO-R 2 €ƒ€ƒ€ƒ€ƒ€ƒ[2] (wherein, R 2 represents a halogen atom, a haloalkyl group, an alkoxy group, or an optionally substituted alkyl group or an optionally substituted aryl group) or an acyl group represented by the general formula [3]: (wherein, R 3 represents an optionally substituted alkyl group or an optionally substituted aryl group)]; in the presence of an organic base which is capable of forming a salt with said sulfo group. | ||||||
| 199 | Photoacid generator, and photoresist containing the same | JP2011076477 | 2011-03-30 | JP2011231104A | 2011-11-17 | AQAD EMAD; LI MINGQI; XU CHENG-BAI |
| PROBLEM TO BE SOLVED: To provide a new method for synthesizing a photoacid generator compound (PAG), to provide the new photoacid generator compound, and to provide a photoresist composition containing the PAG.SOLUTION: The new photoacid generator compound having (1) SOmoiety; (2) one or more fluorinated carbons; and (3) one or more fluorinated carbons wherein an ester-keto group is directly or indirectly substituted, is provided, preferably containing a structure of formula (I) (wherein, R is H or a non-hydrogen substituent; X and Y are each independently H or a non-hydrogen substituent; p is 0 or a positive integer; m is a positive integer; and Mis a counterion). | ||||||
| 200 | Method of producing disulfonic acid ester | JP2010278808 | 2010-12-15 | JP2011088914A | 2011-05-06 | OKAMOTO NORIAKI; WATABIKI TSUTOMU; SUMINO MOTOSHIGE; SHIBAZAKI TAKAO |
| <P>PROBLEM TO BE SOLVED: To provide a method of producing a sulfonic acid ester. <P>SOLUTION: The method of producing a disulfonic acid ester compound shown by formula [15] is produced by reacting (a) a compound shown by general formula [4] with (b) a compound shown by general formula [7], äwherein, two of R<SP>1</SP>denote a sulfonyl group shown by formula [2], (wherein R<SP>2</SP>denotes a halogen atom, 1-12 haloalkyl groups, a 1-12C alkoxy group, a 1-12C alkyl group, or an aryl group which may have a 1-12C alkyl group as a substituent), and T<SB>2</SB>denotes a methylene group}. <P>COPYRIGHT: (C)2011,JPO&INPIT | ||||||
QQ群二维码
意见反馈
意见反馈