| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 121 | STORAGE CONTAINER | US14901956 | 2014-06-05 | US20160202604A1 | 2016-07-14 | Masahiko GAMBE |
| A storage container in which a uniform flow velocity of the purge gas can be achieved is provided with a plurality of stages of storage units each having an accommodating region to accommodate an article. A supply portion supplies a purge gas; a duct portion communicates with other duct portions of other storage units and serves as a flow path for the purge gas supplied from the supply portion; and an introducing portion communicably connects the duct portion with the accommodating region and introduces the purge gas to the accommodating region. In the flow path for the purge gas in the duct portion, a diffusion member is arranged. | ||||||
| 122 | CONTAINER FOR STORING A PELLICLE FOR LITHOGRAPHY | US14969226 | 2015-12-15 | US20160178998A1 | 2016-06-23 | Toru Shirasaki |
| There is provided a pellicle container for storing a pellicle used in lithography, having a tray and a cover between which the pellicle is stored, and the tray has a pellicle mount section on which the pellicle is used to be mounted, but the tray of this container further has a plane plate, preferably a quartz plane plate, having a flatness of 10 micrometers or smaller provided on top of the pellicle mount so as to stabilize the flatness of the pellicle, especially its agglutinant layer. | ||||||
| 123 | EXTREME ULTRAVIOLET (EUV) POD HAVING MARKS | US14862334 | 2015-09-23 | US20160085144A1 | 2016-03-24 | WEI-YEN CHEN; CHENG-JU LEE; LONG-MING LU; CHENG-HSIN CHEN; TIEN-JUI LIN |
| The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed. | ||||||
| 124 | Transmission box for reticle POD | US13250395 | 2011-09-30 | US09097980B2 | 2015-08-04 | Chen-Wei Ku; Pao-Yi Lu; Kun-Hong Liao; Jain-Ping Sheng |
| A transmission box using AMHS for transferring reticle pod is provided, wherein an OHT (Overhead Hoist Transfer) system is disposed on the transmission box to perform mechanical transferring of the reticle pod for greatly reducing risks of damaging reticles caused by operators when transferring, streamlining the allocation of operators, and thus decreasing the time needed for process to complete. | ||||||
| 125 | Support structure, lithographic apparatus and method | US12466119 | 2009-05-14 | US09052612B2 | 2015-06-09 | Marcus Martinus Petrus Adrianus Vermeulen; Johannes Henricus Wilhelmus Jacobs; Joost Jeroen Ottens |
| A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure. | ||||||
| 126 | MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE | US14405042 | 2012-06-15 | US20150131069A1 | 2015-05-14 | Kazuya Ota |
| A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coming into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle. | ||||||
| 127 | APPARATUS WITH SURFACE PROTECTOR TO INHIBIT CONTAMINATION | US14537106 | 2014-11-10 | US20150062546A1 | 2015-03-05 | Abbas RASTEGAR |
| An apparatus is provided for protecting a surface of interest from particle contamination, and particularly, during transitioning of the surface between atmospheric pressure and vacuum. The apparatus includes a chamber configured to receive the surface, and a protector plate configured to reside within the chamber with the surface, and inhibit particle contamination of the surface. A support mechanism is also provided suspending the protector plate away from an inner surface of the chamber. The support mechanism holds the protector plate within the chamber in spaced, opposing relation to the surface to provide a gap between the protector plate and the surface which presents a diffusion barrier to particle migration into the gap and onto the surface, thereby inhibiting particle contamination of the surface. | ||||||
| 128 | MASK BOX HAVING A BUCKLING STRUCTURE | US13492418 | 2012-06-08 | US20130248399A1 | 2013-09-26 | Chih-Ming LIN; Kuan-Lun Pan |
| A mask box having a buckling structure includes a base, a cover and a plurality of buckling elements. The base is configured to support a mask and has a plurality of troughs. The cover covers the base and has a plurality of pivotal portions. The buckling elements are positioned to correspond to the troughs. Each buckling element includes an engaging block and an elastic arm connected to the pivotal portion. The engaging block moves away from the periphery of the cover when the engaging block is subjected to an external force. The engaging block is buckled into the trough via an elastic restoring force of the at least one elastic arm when the external force is removed. By this arrangement, the assembly of the buckling elements is simplified and its product cost is reduced. Further, the present invention conforms to the requirements for environmental protection. | ||||||
| 129 | Container for housing a mask blank, method of housing a mask blank, and a mask blank package | US12566297 | 2009-09-24 | US08496133B2 | 2013-07-30 | Yasuhiro Mizukoshi; Osamu Hanaoka |
| A mask blank container adapted to house a mask blank with a resist film. The container comprises a container body 5 for receiving the mask blank; a cap member 6 to be put on the container body; and a fixing member 9 adapted to fix the container body and the cap member to each other when the cap member is put on the container body. The container body and the cap member have fitting portions 51 and 61 made of a resin material and fitted to each other, respectively. The fixing member comprises a first member 91 having an engaging portion 91 a to be engaged with the fitting portion of the cap member, and a second member 92 having an engaging portion 93 to be engaged with the fitting portion of the container body. A distance between the engaging portions of the first and the second members is desired to be variable. | ||||||
| 130 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD | US13651274 | 2012-10-12 | US20130100430A1 | 2013-04-25 | Robert Gabriël Maria LANSBERGEN; Peter C. KOCHERSPERGER; David RAMIREZ; Xugang XIONG; Hilary HARROLD; Arindam SINHAROY |
| An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. | ||||||
| 131 | RETICLE POD | US13562087 | 2012-07-30 | US20130020220A1 | 2013-01-24 | Steven P. Kolbow; Kevin McMullen; Anthony Mathius Tieben; Matthew Kusz; Christian Andersen; Huaping Wang; Michael Cisewski; Michael L. Johnson; David L. Halbmaier; John Lystad |
| A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint. | ||||||
| 132 | METHOD FOR STORING A PELLICLE | US13430110 | 2012-03-26 | US20120247069A1 | 2012-10-04 | Yoshihiko NAGATA |
| There is provided a method for packing a pellicle container in plastic resin bags, which is meant to prevent foreign particles from reaching the pellicle container and eventually the product pellicle; the points of the invention lie in that bags are either antistatic or of special cleanroom-use grade prepared and preserved in a cleanroom environment. | ||||||
| 133 | EUV POD WITH FASTENING STRUCTURE | US13094911 | 2011-04-27 | US20120175279A1 | 2012-07-12 | Chen-Wei Ku; Pao-Yi Lu; Chin-Ming Lin; Jain-Ping Sheng |
| An EUV pod with fastening structure comprises an outer pod and an inner pod, wherein the upper cover of the inner pod is disposed with a plurality of retainers, and a plurality of supporters disposed on the outer pod of the EUV pod are used to press the plurality of retainers for the plurality of retainers to fasten and stabilize the reticle in the inner pod and thus ensure safety and stability of the reticle in the pod; by utilizing such design, risks of collisions of reticle in the pod due to vacillation of EUV pod during transportation can be reduced, and cost incurred by cracks and damages of reticles can also be greatly decreased. | ||||||
| 134 | Photomask storage apparatus | US12053859 | 2008-03-24 | US08215510B2 | 2012-07-10 | Hsin-Yuan Chen; Chih-Fu Li; Chi-Chung Hsu; Hsing-Fu Lee |
| A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component. | ||||||
| 135 | Reticle protection member, reticle carrying device, exposure device and method for carrying reticle | US12234913 | 2008-09-22 | US08168959B2 | 2012-05-01 | Motoko Suzuki; Yukiharu Okubo |
| A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device. | ||||||
| 136 | Method for hermetically closing an air-tight bag for pellicle | US13067165 | 2011-05-13 | US20110280503A1 | 2011-11-17 | Yoshihiko Nagata |
| There is provided a method for air-tightly enclosing a pellicle case in a filmy bag which protects the pellicle case against dust without the use of a plurality of bags or without modifying the filmy bag except for folding it like origami and eventually consolidating with an adhesive material: in short the opening of the bag is folded a number of times compactly. | ||||||
| 137 | Reticle POD and supporting components therebetween | US12726170 | 2010-03-17 | US20110155598A1 | 2011-06-30 | Pao-Yi LU; Sheng-Hung Wang |
| A reticle POD, comprising a top cover, a bottom cover, and a plurality of supporting components deployed in the four corners of the bottom cover, the supporting component comprising: a base body perpendicularly assembled, on two sides of which being disposed with mounting blocks; a pair of elastic elements respectively placed on the base body; a pair of leading elements connecting respectively to the horizontal extension of the elastic elements and then extending lengthwise to form a tip, a first bevel and a second bevel being formed on the side of the tip located on the inner side of the base body; a supporting base plate, the first and the second ends of which being connected to the second bevel of the leading element and a supporting pillar being disposed on the third end of the supporting base plate. | ||||||
| 138 | Method of cleaning storage case | US11839626 | 2007-08-16 | US07967917B2 | 2011-06-28 | Shu Shimada; Noriyuki Takahashi; Hiroyuki Nakajima; Hiroko Tanaka; Nobuyuki Kanda |
| The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case. | ||||||
| 139 | SYSTEM FOR PURGING RETICLE STORAGE | US12305895 | 2007-06-19 | US20100294397A1 | 2010-11-25 | Oleg P. Kishkovich; Xavier Gabarre; William M. Goodwin; James Lo; Troy Scoggins |
| The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be “recharged” during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles. | ||||||
| 140 | System and method for using a two part cover and a box for protecting a reticle | US11785548 | 2007-04-18 | US07830497B2 | 2010-11-09 | Santiago del Puerto; Erik R. Loopstra; Andrew Massar; Duane P. Kish; Abdullah Alikhan; Woodrow J. Olsen; Jonathan H. Feroce |
| Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer. | ||||||
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