| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 141 | High cleanliness article transport system | US12507959 | 2009-07-23 | US07775363B2 | 2010-08-17 | Joseph A. Durben; Gavin Charles Rider; Robert K. Lindsley |
| A semiconductor reticle transportation container includes a box and a base, the box having an opening and the base including a reticle support. The reticle is placed on the support and the box is placed on the base so that the reticle passes through the opening while being lifted off of the support by plungers contacting the lower edge of the reticle. After the box is closed, the reticle is compliantly constrained horizontally and vertically and is held away from the support. | ||||||
| 142 | Reticle Pod | US12339132 | 2008-12-19 | US20100140126A1 | 2010-06-10 | Pao-Yi Lu; Chin-Ming Lin |
| A reticle pod, comprising an upper cover having a first accommodating space and a lower cover having a second accommodating space, a third accommodating space being formed after the upper cover and the lower cover close together, wherein the characteristic of the reticle pad is in that: the reticle pod includes a plurality of supporting pieces respectively and suspendingly disposed at each corner of the inner surfaces of the upper cover and of the lower cover, and two ends of each of the plurality of supporting pieces are respectively connected to two neighboring sides of corner of the inner surface to form a closed sheet body and a gap is formed at the bend of the closed sheet body. | ||||||
| 143 | CONTAINER FOR HOUSING A MASK BLANK, METHOD OF HOUSING A MASK BLANK, AND A MASK BLANK PACKAGE | US12566297 | 2009-09-24 | US20100078433A1 | 2010-04-01 | Yasuhiro MIZUKOSHI; Osamu HANAOKA |
| A mask blank container is adapted to house a mask blank with a resist film. The container comprises a container body 5 for receiving the mask blank; a cap member 6 to be put on the container body; and a fixing member 9 adapted to fix the container body and the cap member to each other when the cap member is put on the container body. The container body and the cap member have fitting portions 51 and 61 made of a resin material and fitted to each other, respectively. The fixing member comprises a first member 91 having an engaging portion 91 a to be engaged with the fitting portion of the cap member, and a second member 92 having an engaging portion 93 to be engaged with the fitting portion of the container body. A distance between the engaging portions of the first and the second members is desired to be variable. | ||||||
| 144 | Fastening structure of clean container | US12000398 | 2007-12-12 | US07641071B2 | 2010-01-05 | Tzong-Ming Wu |
| A fastening structure of a clean container is combined on a cover of the clean container with a dismountable fastener member, such that the cover is closed or opened on a base of the clean container. The fastener member includes a body, a positioning portion, and an elastic fastening arm, that are one-piece formed. The positioning portion extends from one side of the body to form a flat spring. A flange is formed on the flat spring to fasten the fastener member on the cover. The elastic fastening arm has an elastic arm, and a lateral flange is formed on one end of the elastic arm, and extends into the base to be buckled. The fastener member further includes an elastic auxiliary arm formed between the elastic arm and the body, so as to increase an elastic strength of the elastic fastening arm. | ||||||
| 145 | RETICLE POD | US12088120 | 2006-09-27 | US20090301917A1 | 2009-12-10 | Steven Kolbow; Kevin McMullen; Anthony M. Tieben; Matthew Kusz; Christian Andersen; Huaping Wang; Michael Cisewski; Michael L. Johnson; David L. Halbmaier; John Lystad |
| A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection. | ||||||
| 146 | HIGH CLEANLINESS ARTICLE TRANSPORT SYSTEM | US12507959 | 2009-07-23 | US20090277810A1 | 2009-11-12 | Joseph A. Durben; Gavin C. Rider; Robert K. Lindsley |
| A semiconductor reticle transportation container includes a box and a base, the box having an opening and the base including a reticle support. The reticle is placed on the support and the box is placed on the base so that the reticle passes through the opening while being lifted off of the support by plungers contacting the lower edge of the reticle. After the box is closed, the reticle is compliantly constrained horizontally and vertically and is held away from the support. | ||||||
| 147 | Reticle pod with isolation system | US11364562 | 2006-02-26 | US07607543B2 | 2009-10-27 | Barry Gregerson; David Halbmaier; Stephen Sumner; Brian Wiseman; Anthony Mathius Tieben; Justin Strike |
| The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated. | ||||||
| 148 | PHOTOMASK STORAGE APPARATUS | US12053859 | 2008-03-24 | US20090239010A1 | 2009-09-24 | Hsin-Yuan Chen; Chih-Fu Li; Chi-Chung Hsu; Hsing-Fu Lee |
| A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component. | ||||||
| 149 | MASK AND CONTAINER AND MANUFACTURING | US12362461 | 2009-01-29 | US20090170227A1 | 2009-07-02 | Shunpei YAMAZAKI; Junichiro SAKATA; Hideaki KUWABARA |
| The present invention provides a large mask with a high mask accuracy for conducting selective deposition on a substrate with a large surface area. In accordance with the present invention, the mask body is fixed in a fixing position disposed on a line passing through a thermal expansion center in the width of the mask frame. Further, in accordance with the present invention, the substrate and mask body are fixed and deposition is carried out by moving the deposition source in the X direction or Y direction. A method comprising moving the deposition source in the X direction or Y direction is suitable for deposition on large substrates. | ||||||
| 150 | CONTAINER FOR HOUSING A MASK BLANK, METHOD OF HOUSING A MASK BLANK, AND MASK BLANK PACKAGE | US12242116 | 2008-09-30 | US20090035666A1 | 2009-02-05 | Akinori KURIKAWA |
| A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container. | ||||||
| 151 | METHOD OF CLEANING STORAGE CASE | US11839626 | 2007-08-16 | US20090007939A1 | 2009-01-08 | Shu SHIMADA; Noriyuki TAKAHASHI; Hiroyuki NAKAJIMA; Hiroko TANAKA; Nobuyuki KANDA |
| The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case. | ||||||
| 152 | Reticle-carrying container | US11293084 | 2005-12-05 | US07420655B2 | 2008-09-02 | Chiaki Matsutori; Koichi Yanagihara |
| The present invention allows a reticle-carrying container 11 to be fastened in a reticle stocker 2 even if the reticle-carrying container 11 is wrongly oriented. The reticle-carrying container 11 includes an interior with an opening at one end for storing a reticle 12, a door 14 for covering and blocking the opening, and a seal material 15 for sealing the interior hermetically when the door 14 closes the pod 13. The reticle-carrying container 11 is provided with two sets of kinematic pin grooves 61 for positioning and fastening the reticle-carrying container 11, which are turned 180 degrees from each other on the outer surface of the door 14. Receiving parts 22 for receiving and holding the kinematic pin grooves 61 are arranged in the positions corresponding to the kinematic pin grooves 61 on the outer surface of the pod 13 so that the two sets of kinematic pin grooves 61 can be engaged with the pins in both orientations. | ||||||
| 153 | In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles | US10789670 | 2004-02-27 | US07413586B2 | 2008-08-19 | Arun Ramamoorthy; Robert Bristol |
| A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle. | ||||||
| 154 | In-tool and Out-of-Tool Protection of Extreme Ultraviolet (EUV) Reticles | US12055250 | 2008-03-25 | US20080174749A1 | 2008-07-24 | Arun Ramamoorthy; Robert Bristol |
| A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle. | ||||||
| 155 | Clean container having elastic positioning structure | US12005401 | 2007-12-27 | US20080160235A1 | 2008-07-03 | Tzong-Ming Wu |
| A clean container having an elastic positioning structure includes a support element and a back positioning element on a base. A cover is disposed for covering the base, and a positioning part is disposed between the cover and the base, which has two elastic arms extended laterally, and each elastic arm extends with a pushing surface respectively. When a plate of brittle material is placed on the base, and the cover is closed, the pushing surfaces are elastically pressed against and push the plate respectively, so that the plate moves backwards and presses against the back positioning element. Therefore, the plate is prevented from being damaged. Additionally, the base, the cover, and the positioning part are made of a conductive material, so that the electrostatic charges for the plate is conducted out of the clean container, and has a protective function of an electrostatic discharge. | ||||||
| 156 | Device container assembly with adjustable retainers for a reticle | US11634786 | 2006-12-05 | US20080128303A1 | 2008-06-05 | Alton H. Phillips; Douglas C. Watson; Michael Binnard |
| A device container assembly (30) for storing a reticle (26) includes a first container (246) and a device retainer assembly (248). The first container (246) encircles and encloses the reticle (26). The device retainer assembly (248) selectively couples the reticle to the first container (246). The device retainer assembly (248) can include an adjustable first device retainer (256) having a retainer section (280A) that is movable relative to the first container (246) between an engaged position (281A) in which the retainer section (280A) engages the reticle (26) and a disengaged position (281B) in which the retainer section (280A) does not engage the reticle (26). With this design, the device container assembly (30) can retain the reticle (26) in a secure fashion and the integrity of the reticle (26) is maintained by the device container assembly (30). | ||||||
| 157 | High cleanliness article transport system | US11893901 | 2007-08-17 | US20080041760A1 | 2008-02-21 | Joseph A. Durben; Gavin C. Rider; Robert K. Lindsley |
| A semiconductor reticle transportation container includes a box and a base, the box having an opening and the base including a reticle support. The reticle is placed on the support and the box is placed on the base so that the reticle passes through the opening while being lifted off of the support by plungers contacting the lower edge of the reticle. After the box is closed, the reticle is compliantly constrained horizontally and vertically and is held away from the support. | ||||||
| 158 | System and method for using a two part cover and a box for protecting a reticle | US11785548 | 2007-04-18 | US20070258061A1 | 2007-11-08 | Santiago Puerto; Erik Loopstra; Andrew Massar; Duane Kish; Abdullah Alikhan; Woodrow Olson; Jonathan Feroce |
| Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer. | ||||||
| 159 | Reticle protection member, reticle carrying device, exposure device and method for carrying reticle | US11235198 | 2005-09-27 | US20070206173A1 | 2007-09-06 | Motoko Suzuki; Yukiharu Okubo |
| A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device. | ||||||
| 160 | PROCESS FOR REMOVING PARTICLES FROM RETICLE | US11747231 | 2007-05-11 | US20070204882A1 | 2007-09-06 | Po-Ching Lin; Yu-Cheng Yang |
| A tool and a process for removing particles from a reticle are described. The tool is disposed in front of a pellicle particle detector, including at least a gas spray member toward a surface of the reticle for removing particles and a supporting member supporting the gas spray member in front of the pellicle particle detector. The supporting member can further fix the tool onto the pellicle particle detector. In the particle removing process, when particles are detected on the reticle, the tool is turned on and the reticle is loaded into the pellicle particle detector through the gas spray member in order to remove the particles from the reticle before the pellicle particle detector detects the particles. | ||||||
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