| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 181 | Reduced particle contamination manufacturing and packaging for reticles | US09737139 | 2000-12-13 | US20010005944A1 | 2001-07-05 | Giang T. Dao; Ronald J. Kuse |
| A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material. | ||||||
| 182 | Removable cover for protecting a reticle, system including and method of using the same | US09473710 | 1999-12-29 | US06239863B1 | 2001-05-29 | Eric B. Catey; David Hult; Santiago del Puerto; Stephen Roux |
| A removable cover for protecting a reticle used in a lithography system is described. The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspected with the removable cover in place. This removable cover protects the reticle when the removable cover is in place and is removable for lithographic exposure. The removable cover can further include at least one reticle fastener that applies force to the reticle thereby preventing movement of the removable cover relative to the reticle when the removable cover is in place. A plurality of fasteners are used to position and secure the removable cover and reticle. A method of performing lithography and a lithographic system are also described. | ||||||
| 183 | SMIF container including a reticle support structure | US09272132 | 1999-03-19 | US06216873B1 | 2001-04-17 | William J. Fosnight; Raymond S. Martin; Joshua W. Shenk; Robert P. Wartenbergh |
| A reticle support mechanism is disclosed in which a reticle may be quickly and easily located and removed, and which is capable of securely supporting a reticle for storage and/or transport. A preferred embodiment of the present invention includes a pair of reticle supports mounted to a door of a container, and a pair of reticle retainers mounted to a shell of the container. When the container shell is coupled with the container door, sections of the reticle support and reticle retainer engage chamfered edges of the reticle and sandwich the reticle in a secure position within the container. As a result of engaging the reticle at its chamfered edges, potentially harmful contact with the upper and lower surfaces and vertical edges of the reticle is avoided. | ||||||
| 184 | Case for housing a substrate | US605835 | 1996-02-22 | US5743409A | 1998-04-28 | Kanefumi Nakahara; Tsuneaki Orikasa |
| A case for housing a substrate which limits the accumulation of dust, due to static electricity, while allowing visual access to the substrate. A box-like case portion has an open front end and a front lid pivotally provided on the case portion to close the front end and in which a predetermined substrate is housed in the case portion. A predetermined portion of the box-like case portion and the front lid are made of synthetic resin formed with electrically conductive copolymer. A predetermined position of the box-like case is formed of transparent electrically conductive material. | ||||||
| 185 | Casing for frame-supported pellicles | US533784 | 1995-09-26 | US5577610A | 1996-11-26 | Kazuya Okuda; Satoshi Kawakami |
| Proposed is a novel casing for frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning process for the manufacture of fine electronic devices. Different from conventional casings made from a plastic resin, the casing of the invention is characterized by the use of a unique permanently antistatic resin composition which is a resin blend consisting of 80-95% by weight of an ABS or acrylic resin and 20-5% by weight of a specific hydrophilic polymer. By virtue of the excellent antistatic behavior of the resin composition, the frame-supported pellicle encased in the casing is safe from the troubles due to deposition of dust particles during transportation and from contamination by the vaporized matter from the casing. | ||||||
| 186 | Sealable transportable container having improved liner | US865297 | 1992-04-08 | US5469963A | 1995-11-28 | Anthony C. Bonora; Frederick T. Rosenquist; Sudhir Jain; Mark R. Davis |
| A transportable, sealable container, which has an improved pod liner. The container includes a box, a box door, and a gasket which forms a seal between the box and the box door. The box door has a conductive liner and a conductive path from the conductive liner to ground potential for electrostatic discharge protection. A membrane for isolating the gasket from the interior region of the container is bonded to the gasket and the conductive liner. The membrane may be impervious to gasses to prevent outgassing of the gasket or impervious to particles but not gasses to prevent particulate matter generated by the gasket from entering the interior region of the container. | ||||||
| 187 | Apparatus for optically forming pattern | US966479 | 1992-10-26 | US5396312A | 1995-03-07 | Kazuhiro Kobushi; Hironao Iwai |
| An apparatus for optically forming a pattern on an object using a reticle having an original pattern to be optically projected. The apparatus is equipped with a storage circuit for storing information indicative of an exposure condition for the reticle, the storage circuit being attached to the reticle. An exposure apparatus reads out the information from the storage circuit so as to project the original pattern of the reticle on the object in accordance with the read information so that a pattern corresponding to the original pattern is formed on the object. This arrangement can automatically and accurately set the exposure condition in the exposure apparatus. | ||||||
| 188 | Apparatus and method for securely carrying a substrate | US52950 | 1993-04-23 | US5320225A | 1994-06-14 | John Kirkpatrick |
| A container or carrier for securely carrying a substrate such as a reticle, mask, wafer, or the like during a semiconductor manufacturing process or during the transport of the substrate. The container includes a housing having an opening through which the substrate may be inserted and removed. The housing includes an open box and a lid, the lid securely held in place by a unique latching mechanism. A door that is hinged upon the lid and held in place by biasing springs substantially seals the housing opening. Within the housing are a plurality of suction cups upon which the substrate rests and which apply suction to firmly engage the substrate on only one side when the substrate is in a contained position. The suction cups hold the substrate in the contained position thereby preventing relative motion between the container and the substrate. The invention further provides for increasing the suction applied by the suction cups to the substrate by applying additional suction to modified suction cups from a vacuum pump. The invention also provides a method for securely containing a substrate within a container. The method including the step of fixing the substrate in a contained position within the substrate using suction. | ||||||
| 189 | Processing, shipping and/or storage container for photomasks and/or wafers | US771871 | 1985-09-03 | US4679689A | 1987-07-14 | Eugene R. Blome |
| This invention pertains to a system for holding Photomasks and/or wafers in a clean environment during processing, shipment and/or storage. The apparatus of the invention comprises a processing holder that may be used for the internal processing of photomasks and/or wafers, as well as being used as the inner portion of a photomask and/or wafer shipping and storage container. | ||||||
| 190 | Container for holding substrate | US445030 | 1982-11-29 | US4422547A | 1983-12-27 | Nobutoshi Abe; Yukio Kakizaki; Jiro Kobayashi |
| A container for a piece of substrate such as reticle, mask or wafer is disclosed. The container comprises a housing body having an opening for receiving a substrate, a door for closing and opening said opening of the housing body and means for fixing the received substrate to the container. Said fixing means includes a contact member movable to fix the substrate in the position and a member for moving the contact member in link with the motion of the door. | ||||||
| 191 | Mask Assembly and Associated Methods | US15545390 | 2016-02-01 | US20180314150A1 | 2018-11-01 | Derk Servatius Gertruda BROUNS; Dennis DE GRAAF; Robertus Cornelis Martinus DE KRUIF; Paul JANSSEN; Matthias KRUIZINGA; Arnoud Willem NOTENBOOM; Daniel Andrew SMITH; Beatrijs Louise Marie-Joseph Katrien VERBRUGGE; James Norman WILEY |
| A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame. | ||||||
| 192 | RETICLE POD | US15651399 | 2017-07-17 | US20180210334A1 | 2018-07-26 | Hsin-Min HSUEH; Chia-Ho CHUANG; Cheng-Ju LEE; Jeng-Jie HUANG |
| A reticle pod for accommodating a reticle is provided. The reticle pod comprises a base; a cover; and at least one supporting member. When the reticle is accommodated on the reticle pod, the supporting member abuts against the reticle through a protrusion part; wherein the maximum static friction is constantly greater than a horizontal force applied to the support module from the reticle. | ||||||
| 193 | Pellicle assembly in photolithography process and method for using the same | US15491795 | 2017-04-19 | US10031412B1 | 2018-07-24 | Yu-Ching Lee; Yu-Piao Fang |
| A pellicle assembly is provided. The pellicle assembly includes a frame and a membrane connected to the frame. The pellicle assembly also includes housing connected to the frame. The pellicle assembly further includes capping member passing through an upper opening of the housing and movable along a longitudinal axis of the housing. In addition, the pellicle assembly includes fastening member connected to the capping member and movable along a direction that is perpendicular to the longitudinal axis. When the capping member is in a released position, the fastening member is located within the housing, and when the capping member is in a fastening position, a portion of the fastening member is moved to the outside of the housing for fixing a mask. | ||||||
| 194 | METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY | US15743275 | 2016-07-04 | US20180203345A1 | 2018-07-19 | Johan Hendrik KLOOTWIJK; Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN |
| A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate. | ||||||
| 195 | Gas purge device and gas purge method | US14906946 | 2014-06-02 | US09972518B2 | 2018-05-15 | Masanao Murata; Takashi Yamaji |
| A gas inlet made of an elastic material is prevented from getting scratched by contact with a nozzle, and adhesion between the gas inlet and the nozzle is prevented. A container is positioned, and a purge gas is introduced from the nozzle into a gas inlet hole in the center of a circular bottom surface of the gas inlet provided on the bottom of the container. The nozzle has a planar top end surface having a size equal to or greater than that of the bottom surface of the gas inlet, and a nozzle hole in the center of the top end surface, and has a size equal to or smaller than that of the gas inlet hole. The top end surface is roughened or includes a lubricant so that the top end surface and the gas inlet are mutually slidable. | ||||||
| 196 | Reticle rack system | US15355289 | 2016-11-18 | US09786536B2 | 2017-10-10 | Sean Kudel; Andy Escandon; Spencer Read; Gilbert Hernandez; Ryan Irish; Joanne Valestin |
| The present disclosure relates to semiconductor manufacturing, in particular to reticle rack systems. The teachings of the present disclosure may be embodied in a reticle rack unit including a frame with four uprights and multiple crossbars and four turnstiles. The frame may have a longest dimension defining a front side and a back side. The four turnstiles may be mounted to the frame to pivot around a respective rotational axis parallel to the four uprights. Each turnstile may define a plurality of reticle nests sized to hold reticles. | ||||||
| 197 | MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE | US15626475 | 2017-06-19 | US20170285484A1 | 2017-10-05 | Kazuya OTA |
| A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coining into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle. | ||||||
| 198 | PELLICLE FILM, PELLICLE FRAME, PELLICLE, AND METHOD FOR PRODUCING SAME | US15629085 | 2017-06-21 | US20170285461A1 | 2017-10-05 | Atsushi OKUBO; Tsuneaki BIYAJIMA; Yosuke ONO; Kazuo KOHMURA; Yasuhisa FUJII; Nobuko MATSUMOTO |
| A pellicle is contaminated with dust or the like for various reasons during the production thereof. Especially, there is a problem that the risk that the dust or the like is attached is high during trimming or various other processes performed on a pellicle film. The present invention provides a method for producing a pellicle for EUV that decreases the attachment of dust or the like. A method for producing a pellicle includes forming a pellicle film on a substrate; trimming the substrate; and removing at least a part of the substrate after trimming the substrate. Before the part of the substrate is removed, at least particles attached to a surface of the pellicle film are removed. | ||||||
| 199 | Lithographic apparatus and device manufacturing method | US13651274 | 2012-10-12 | US09457947B2 | 2016-10-04 | Robert Gabriël Maria Lansbergen; Peter C. Kochersperger; David Ramirez; Xugang Xiong; George Hilary Harrold; Arindam Sinharoy |
| An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. | ||||||
| 200 | CONTAINER FOR STORING PHOTOMASK BLANKS | US14917748 | 2014-07-24 | US20160216603A1 | 2016-07-28 | Tsutomu SUZUKI; Shinichi OHORI; Ryuji KOITABASHI; Hideo NAKAGAWA; Takuro KOSAKA; Takahiro KISHITA; Hiroshi FUKUDA |
| The purpose of the present invention is to further reliably reduce the contamination of photomask blanks due to the adherence of the dust and particles generated during the storage, transportation, or operation of the container while suppressing the effect on a resist pattern, thereby improving the quality and yield of the photomask blanks. The present invention pertains to a container (1) for storing photomask blanks that stores, transports, or safeguards photomask blanks (2), wherein at least one of the components is constituted by a thermoplastic resin where the amount of caprolactam measured by the dynamic head space method when kept for 60 minutes at 40° C. is 0.01 ppm or less n-decane conversion amount per resin weight, and the surface resistance value is no more than 1.0E+13 ohms. | ||||||
QQ群二维码
意见反馈
意见反馈