| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 作为NMDA受体拮抗剂的多环生物碱衍生物 | CN96196727.7 | 1996-07-12 | CN1195344A | 1998-10-07 | J·迪迈奥; D·M·迪克斯特 |
| 结构式(Ⅰ)所示的多环生物碱,其中R1是H,C1－6烷基,或非强制性地由极性基团取代的C6－12芳基;R2和R3分别是H,OH,C1－6烷基,－C(NH)－NH2,正电性基团,或非强制性被NH2,OH,C1－6烷基,或卤素取代的C7－13芳烷基;或R2和R3共同形成一个5—6元环,该环可非强制性地带有杂原子;R4是H,C1－6烷基,OR6,SR6或N(R6)2,其中各R6分别是H或C1－3烷基;X是O,S,SO,SO2,N－R5,或C－(R5)2,其中的各R5分别是H,C1－6烷基,或C7－13芳烷基,其中C7－13芳烷基非强制性地带有一个或更多的环杂原子;n表示0—2的整数;m表示0—3的整数;条件是当X为CH2,R1不是CH3,R2和R3不同时为H,R4不是OH,m不是3及n不是0。该化合物可作为离子性NMDA(N－甲基－(D)－天冬氨酸)受体拮抗剂。 | ||||||
| 2 | 治疗疼痛用的新杂环化合物及其用途 | CN96196893.1 | 1996-07-12 | CN1196053A | 1998-10-14 | J·迪迈奥; D·M·迪克斯特 |
| 式(Ⅰ)的多环生物碱,其中:R1是H、C1－6烷基或C6－12芳基,任选地取代有极性基团;R2和R3独立地是H、OH、C1－6烷基、－C(NH)－NH2、带正电的基团,或任选地取代有NH2、OH、C1－6烷基或卤素的C7－13芳烷基;或者R2和R3合在一起形成一个任选地包含有1个杂原子的5—6元环;R4是H、C1－6烷基、OR6、SR6或N(R6)2,其中各个R6独立地是H、C1－3烷基或卤素;X是O、S、SO、SO2、N－R5,或C－(R5)2,其中各个R5独立地是H、C1－6烷基,或任选地被1个或多个杂原子隔开的C7－13芳烷基;n是0—2的整数;m是0—3的整数;其条件是当X是CH2是R1不得为CH3,R2和R3不能同时都是H,R4不得为OH,m不能是3,n不能是0。用于治疗疼痛,和含有这类化合物的药物上可接受的组合物。本发明的化合物对鸦片制剂受体起着激动剂的作用。 | ||||||
| 3 | Polymerisable monomers and polymers | US09208761 | 1998-12-10 | US06344556B1 | 2002-02-05 | Richard Alexander Evans; Ezio Rizzardo; Graeme Moad |
| The invention relates to compounds of the formulae: processes for their preparation, polymers, co-polymers or block co-polymers containing them or their use as monomers or co-monomers in free radical polymerisation and in the manufacture of adhesives, dental composites or optical lenses. | ||||||
| 4 | Polycyclic alcaloid-derivatives as NMDA-receptor antagonists | US981935 | 1998-03-25 | US5990104A | 1999-11-23 | John Dimaio; Dilip M. Dixit |
| Polycyclic alkaloids of formula (I), wherein R.sub.1 is H, C.sub.1-6 alkyl, or C.sub.6-12 aryl optionally substituted with polar groups; R.sub.2 and R.sub.3 are independently H, OH, C.sub.1-6 alkyl, --C(NH)--NH.sub.2, a positively charged group, or C.sub.7-13 aralkyl optionally substituted with NH.sub.2, OH, C.sub.1-6 alkyl, or halogen; or R.sub.2 and R.sub.3 together form a 5 to 6 member ring optionally incorporating a heteroatom; R.sub.4 is H, C.sub.1-6 alkyl, OR.sub.6, SR.sub.6, or N(R.sub.6).sub.2, wherein each R.sub.6 is independently H, C.sub.1-3 alkyl; X ix O, S, SO, SO.sub.2, or N--R.sub.5, wherein each R.sub.5 is independently H, C.sub.1-6 alkyl, or C.sub.7-13 aralkyl optionally interrupted with one or more heteroatom; n is an integer from 0 to 2; and m is an integer from 0 to 3. These compounds act as antagonists at the ionotropic NMDA (N-methyl-(D)-aspartic acid) receptor. ##STR1## | ||||||
| 5 | Anti diabetically active sulfonyl ureas and sulfonyl semicarbazides | US3752851D | 1971-09-21 | US3752851A | 1973-08-14 | STACH K; SCHMIDT F; WINTER W; FAULAND E; AUMUELLER W |
| NOVEL SULFONYL UREAS HAVING THE FORMULA:
X<(-(1,2-PHENYLENE)-Y(-CO-NH-Z-(1,4-PHENYLENE)-SO2-NH-CO- NH-R2)-(R1-1,2-PHENYLENE)-) WHEREIN X REPRESENTS OXYGEN, SULFUR, SATURATED, UNSATURATED, STRAIGHT OR BRANCHED CHAIN ALKYLENE CONTAINING UP TO 3 CARBON ATOMS, OXYMETHYLENE, THIAMETHYLENE, THIAETHYLENE, IMINOMETHYLENE, ALKYLATED IMINOMETHYLENE, ACYLATED IMINOMETHYLENE, CARBOXIMIDO, ALKYLATED CARBOXIMIDO, OR A VALENCY BOND, R1 IS HYDROGEN, HALOGEN, ALKYL, ALKOXY OR TRIFLUOROMETHYL, Y IS SATURATED, UNSATURATED, STRAIGHT OR BRANCHED CHAIN ALKYLENE CONTAINING UP TO 6 CARBON ATOMS OR SUCH ALKYLENE GROUP CONTAINING A NITROGEN OR OXYGEN ATOM, Z IS STRAIGHT OR BRANCHED CHAIN ALKYLENE CONTAINING UP TO 4 CARBON ATOMS AND R2 IS STRAIGHT OR BRANCHED CHAIN, SATURATED OR UNSATURATED ALKYL OR CYCLOALKYL, AND SUCH GROUPS INTERRUPTED BY OXYGEN OR SULFUR ATOMS OR CONTAINING AN ENDO-ALKYLENE GROUP AND SUBSTITUTED OR UBSUBSTITUTED ARYL OR ARALKYL. THE AFORESAID SULFONYL UREAS CONSTITUTE EXTREMELY EFFECTIVE ANTI-DIABETIC AGENTS. |
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| 6 | Anti-diabetically active sulfonyl-semicarbazides | US3646009D | 1968-03-11 | US3646009A | 1972-02-29 | WINTER WERNER; FAULAND ERICH; STACH KURT; SCHINIDT FELIX HELMUT; AUMULLER WALTER |
| NOVEL SULFONYL UREAS AND SULFONYL-SEMICARBAZIDES HAVING THE FORMULA:
1-((-1,2-PHENYLENE-X-(R1-1,2-PHENYLENE)-)>Y-CO-NH-Z-), 4-(R2-NH-CO-NH-SO2-)BENZENE WHEREIN X REPRESENTS OXYGEN, SULFUR SATURATED, UNSTAURATED, STRAIGHT OR BRANCHED CHAIN ALKYLENE CONTAINING UP TO 3 CARBON ATOMS, OXYMETHYLENE, THIAMETHYLENE, THIAETHYLENE, IMINOMETHYLENE, ALKYLATED IMINOMETHYLENE, ACYLATED MINOMETHYLENE, CARBOXIMIDO, ALKYLATED CARBOXIMIDO, OR A VALENCY BOND, R1 IS HYDROGEN, HALOGEN ALKYL, ALKOXY OR TRIFLUOROMETHYL, Y IS SATURATED, UNSATURATED, STRAIGHT OR BRANCHED CHAIN ALKYLENE CONTAINING UP TO 6 CARBON ATOMS OR SUCH ALKYLENE GROUP CONTAINING A NITROGEN OR OXYGEN ATOM, Z IS STRAIGHT OR BRANCHED CHAIN ALKLYENE CONTAINING UP TO 4 CARBON ATOMS AND R2 IS STRAIGHT OR BRANCHED CHAIN, SATURATED OR UNSTAURATED ALKYL OR CYCLOALKYL, AND SUCH GROUPS INTERRUPTED BY OXYGEN OR SULFUR ATOMS OR CONTAINNG AN ENDO-ALKYLENE GROUP, SUBSTITUTED OR UNSUBSTITUTED ARYL OR ARALKYL OR SUBSTTITUTED, UNSUBSTITUTED, SATUATED OR UNSATURATED ALKYLENE-IMINO CONTAINING 3 TO 7 CARBON ATOMS OR SUCH ALKYLENE-IMINOI CONTAINING AN ENDO-ALKYLENE GROUP. THE AFORESAID SULFONYL UREAS AND SULFONYL-SEMICARAZIDES CONSTITUTE EXTREMELY EFFECTIVE ANTI-DIABETIC AGENTS. |
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| 7 | Extreme Ultraviolet Photoresist and Method | US15412856 | 2017-01-23 | US20180149971A1 | 2018-05-31 | Yen-Hao Chen; Wei-Han Lai; Chien-Wei Wang; Chin-Hsiang Lin |
| The present disclosure provides a method for lithography patterning in accordance with some embodiments. The method includes forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer, a sensitizer, and a photo-acid generator (PAG), wherein the PAG includes a first phenyl ring and a second phenyl ring both chemically bonded to a sulfur, the first and second phenyl rings being further chemically bonded with enhanced sensitivity; performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer. | ||||||
| 8 | Tricyclic amine derivatives | US320340 | 1989-03-08 | US4904688A | 1990-02-27 | Duncan R. Rae; James Cairns |
| The present invention deals with dibenzo-oxocin-, dibenzo-thiocin-, dibenzo-azocin- and dibenzocyclo-octenamine derivatives suitable for use as antipsychotic compounds without extra-pyrimidal side-effects. | ||||||
| 9 | 1-Polyfluoroalkoxyphenyl-4-substituted-5-halopyridazones-6 and herbicidal uses thereof | US690266 | 1976-05-26 | US4077797A | 1978-03-07 | Adolf Fischer, deceased; Hanspeter Hansen; Wolfgang Rohr |
| 1-Polyfluoroalkoxyphenyl-4-substituted-5-halopyridazones-6 in which the 4-substituent is amino, monoalkylamino, dialkylamino (1 to 3 carbon atoms per alkyl) or lower alkoxy, chloroacetamido, CH.sub.3 COOCH.sub.2 --CO--NH-- or trimethylenimino and herbicidal uses thereof to control growth of unwanted plants among crop plants, especially cotton. | ||||||
| 10 | Tricyclic aminoalkyl derivatives | US291426 | 1972-09-22 | US4070373A | 1978-01-24 | Werner Winter; Max Thiel; Kurt Stach, deceased; by Werner Plattner, administrator; Wolfgang Schaumann; Karl Dietmann |
| Novel tricyclic aminoalkyl derivatives are disclosed which are characterized by valuable pharmacological activities and namely by cardiac and circulatory activities. The tricyclic aminoalkyl derivatives are compounds of the formula: ##STR1## wherein X is an oxygen or a sulfur atom, a saturated or unsaturated, straight chain or branched alkylene group containing up to 3 carbon atoms, an oxymethylene, thiamethylene or thiaethylene group or a valency bond, R.sub.1 is hydrogen, halogen, alkyl, alkoxy or trifluoromethyl, R.sub.2 is hydrogen or hydroxyl, R.sub.3 is hydrogen or together with R.sub.2 represents a further valency bond, R.sub.4 and R.sub.5 which may be the same or different are each hydrogen or lower alkyl, A is alkylene which is substituted by an optionally acylated hydroxyl group, Y is an oxygen or sulfur atom or an optionally alkylated imino group and Z is aryl, aralkyl, cycloalkyl or cycloalkyl-alkyl which may be substituted by halogen, hydroxyl, nitro, amino, alkoxy, aralkoxy, alkyl, trifluoromethyl, alkylamino or alkylsulfonyl group, and the acid addition salts thereof with pharmacologically acceptable acids. | ||||||
| 11 | Extreme Ultraviolet Photoresist and Method | US16055340 | 2018-08-06 | US20180341175A1 | 2018-11-29 | Yen-Hao Chen; Wei-Han Lai; Chien-Wei Wang; Chin-Hsiang Lin |
| Resist materials having enhanced sensitivity to radiation are disclosed herein, along with methods for lithography patterning that implement such resist materials. An exemplary resist material includes a polymer, a sensitizer, and a photo-acid generator (PAG). The sensitizer is configured to generate a secondary radiation in response to the radiation. The PAG is configured to generate acid in response to the radiation and the secondary radiation. The PAG includes a sulfonium cation having a first phenyl ring and a second phenyl ring, where the first phenyl ring is chemically bonded to the second phenyl ring. | ||||||
| 12 | Extreme ultraviolet photoresist and method | US15412856 | 2017-01-23 | US10042252B2 | 2018-08-07 | Yen-Hao Chen; Wei-Han Lai; Chien-Wei Wang; Chin-Hsiang Lin |
| The present disclosure provides a method for lithography patterning in accordance with some embodiments. The method includes forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer, a sensitizer, and a photo-acid generator (PAG), wherein the PAG includes a first phenyl ring and a second phenyl ring both chemically bonded to a sulfur, the first and second phenyl rings being further chemically bonded with enhanced sensitivity; performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer. | ||||||
| 13 | Polymerizable monomers and polymers | US09970266 | 2001-10-02 | US06495643B1 | 2002-12-17 | Richard Alexander Evans; Ezio Rizzardo; Graeme Moad |
| The invention relates to compounds of the formulae: processes for their preparation, polymers, co-polymers or block co-polymers containing them or their use as monomers or co-monomers in free radical polymerization and in the manufacture of adhesives, dental composites or optical lenses. | ||||||
| 14 | Heterocyclic compounds for the treatment of pain and use thereof | US981932 | 1998-03-25 | US6054474A | 2000-04-25 | John Dimaio; Dilip M. Dixit |
| Polycyclic alkaloids of formula (I), ##STR1## wherein R.sub.1 is H, C.sub.1-6 alkyl, or C.sub.6-12 aryl optionally substituted with polar groups; R.sub.2 and R.sub.3 are independently H, OH, C.sub.1-6 alkyl, --C(NH)--NH.sub.2, a positively charged group, or C.sub.7-13 aralkyl optionally substituted with NH.sub.2, OH, C.sub.1-6 alkyl, or halogen; or R.sub.2 and R.sub.3 together form a 5 to 6 member ring optionally incorporating a heteroatom; R.sub.4 is H, C.sub.1-6 alkyl, OR.sub.6, SR.sub.6 or N(R.sub.6).sub.2, wherein each R.sub.6 is independently H, C.sub.1-3 alkyl; X is O, S, SO, SO.sub.2, N--R.sub.5, or C--(R.sub.5).sub.2, wherein each R.sub.5 is independently H, C.sub.1-6 alkyl, or C.sub.7-13 aralkyl optionally interrupted with one or more heteroatom; n is an integer from 0 to 2; m is an integer from 0 to 3; with the proviso that when X is CH.sub.2 then R1 is not CH.sub.3, R.sub.2 and R.sub.3 are not both H, R.sub.4 is not OH, m is not 3 and n is not 0. For the treatment of pain and pharmaceutically acceptable compositions comprising those compounds. The compounds of this invention acts as agonists at the opiate receptor. | ||||||
| 15 | Polymerisable monomers and polymers | US849529 | 1997-08-26 | US6043361A | 2000-03-28 | Richard Alexander Evans; Ezio Rizzardo; Graeme Moad |
| The invention relates to compounds of the formulae: processes for their preparation, polymers, co-polymers or block co-polymers containing them or their use as monomers or co-monomers in free radical polymerisation and in the manufacture of adhesives, dental composites or optical lenses. | ||||||
| 16 | Tricyclic aminomethyl derivatives | US3639423D | 1967-12-11 | US3639423A | 1972-02-01 | WINTER WERNER; THIEL MAX; STACH KURT; SCHAUMANN WOLFGANG; RIBBENTROP ANNEMARIE |
| NOVEL COMPOUNDS POSSESSING VALUABLE PHARMACOLOGICAL PROPERTIES AND USEFUL AS MUSCLE RELAXANTS, TRANQUILIZING AGENTS, ANTI-CONVULSIVES, ETC. ARE DISCLOSED. THE COMPOUNDS ARE DEFINED BY THE FOLLOWING FORMULA:
1-R1,3,4-(-CH(-CH(-R2)-N(-R3)-R4)-(1,2-PHENYLENE)-X-) BENZENE WHEREIN X IS SULFUR, OXYMETHYLENE, THIAMETHYLENE, THIAETHYLENE, IMINOMETHYLENE, PROPYLENE - 1,3 OR ALKYLATED IMINOMETHYLENE; R1 IS HYDROGEN, LOWER ALKYL, HALOGEN, ALKOXY TRIFLUOROMETHYL, OR ALKYL MERCAPTO AND R2, R3 AND R4 ARE EACH HYDROGEN OR LOWER ALKYL; OR A PHYSIOLOGICALLY ACCEPTABLE ACID ADDITION SALT THEREOF. THERE ARE ALSO DISCLOSED COMPOSITIONS CONTAINING THE ABOVE COMPOUNDS AS ACTIVE INGREDIENT AND METHODS OF USING THE SAME. |
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| 17 | Polymerizable monomer and polymer | JP51936096 | 1995-12-18 | JPH10511937A | 1998-11-17 | エバンス，リチャード・アレキサンダー; モード，グレアム; リザード，エジオ |
| (57)【要約】 本発明は、式： | ||||||
| 18 | Tricyclic amine derivative | JP5765689 | 1989-03-09 | JPH024740A | 1990-01-09 | DANKAN ROBAATOSON REI; JIEEMUSU KEENZU |
| NEW MATERIAL: A compd. represented by formula I [wherein V is O, S, NR (wherein R is H or a 1-4C or 1-4C alkyl or -CH 2-, R 1 and R 2 are each H, OH, a 1-6C alkyl, alkoxy, halogen or 1-4 substituents at a benzo region of CF 3CN, R 3 and R 4 are H or a 1-6C alkyl or combined with N to form a 5- or 6-membered heterocycle] and a salt thereof. EXAMPLE: 3-Chloro-6,7-dihydro-N-methyl-5H-dibenzo[b,g]-oxogen-6amine hydrochloride. USE: A medicine having strong anti-dopamine and anti-5HT 2 activity and useful for use as antipsychotic compd. having no side effect of an extrapyramidal tract. PROCESS: For example, a ketone represented by formula II and amine represented by formula III are reduced and aminated in the presence of a reducing agent such as metal hydride like formic acid or LiAlH 4 to obtain the compd. represented by the formula I. COPYRIGHT: (C)1990,JPO | ||||||
| 19 | NOVEL HETEROCYCLIC COMPOUNDS FOR THE TREATMENT OF PAIN AND USE THEREOF | EP96921855.0 | 1996-07-12 | EP0850234A1 | 1998-07-01 | DIMAIO, John; DIXIT, Dilip M |
| Polycyclic alkaloids of formula (I), wherein R1 is H, C1-6 alkyl, or C6-12 aryl optionally substituted with polar groups; R2 and R3 are independently H, OH, C1-6 alkyl, -C(NH)-NH2, a positively charged group, or C7-13 aralkyl optionally substituted with NH2, OH, C1-6 alkyl, or halogen; or R2 and R3 together form a 5 to 6 member ring optionally incorporating a heteroatom; R4 is H, C1-6 alkyl, OR6, SR6 or N(R6)2, wherein each R6 is independently H, C1-3 alkyl, or halogen; X is O, S, SO, SO2, N-R5, or C-(R5)2, wherein each R5 is independently H, C1-6 alkyl, or C7-13 aralkyl optionally interrupted with one or more heteroatom; n is an integer from 0 to 2; m is an integer from 0 to 3; with the proviso that when X is CH2 then R1 is not CH3, R2 and R3 are not both H, R4 is not OH, m is not 3 and n is not 0. For the treatment of pain and pharmaceutically acceptable compositions comprising those compounds. The compounds of this invention act as agonists at the opiate receptor. | ||||||
| 20 | Procédé de synthèse d'hétérocycles à partir de complexes palladocycliques | EP87111247.0 | 1987-08-04 | EP0255715A1 | 1988-02-10 | Pfeffer, Michel, Dr.; Maassarani, Figa; Dupont, Jairton |
L'invention a pour objet un procédé de synthèse d'hétérocycles à partir de complexes palladocycliques, par réaction avec des alcynes, caractérisé en ce que l'on utilise les complexes palladocycliques sous la forme de complexes iodés ou cationiques. Ce procédé s'applique en particulier à la synthèse d'hétérocycles azotés. |
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