子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 121 | MULTI-ELECTRODE SYSTEM WITH VIBRATING ELECTRODES | US15193884 | 2016-06-27 | US20160320561A1 | 2016-11-03 | Robert G. Wiley; Brett Clark; Jared C. Meitzler; Clyde J. Troutman |
| A multi-electrode system includes a fiber holder that holds at least one optical fiber, a plurality of electrodes arranged to generate a heated field to heat the at least one optical fiber, and a vibration mechanism that causes at least one of the electrodes from the plurality of electrodes to vibrate. The electrodes can be disposed in at least a partial vacuum. The system can be used for processing many types of fibers, such processing including, as examples, stripping, splicing, annealing, tapering, and so on. Corresponding fiber processing methods are also provided. | ||||||
| 122 | ULTRALOW EXPANSION TITANIA-SILICA GLASS | US15003115 | 2016-01-21 | US20160236965A1 | 2016-08-18 | Sezhian Annamalai; Carlos Alberto Duran; Kenneth Edward Hrdina; William Rogers Rosch |
| Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier. | ||||||
| 123 | LOW SCATTERING SILICA GLASS AND METHOD FOR HEAT-TREATING SILICA GLASS | US15014359 | 2016-02-03 | US20160152504A1 | 2016-06-02 | Madoka ONO; Setsuro ITO; Osamu HONMA; Yousuke AMINO |
| To provide low scattering silica glass suitable as a material of an optical communication fiber.Silica glass, which has a fictive temperature of at least 1,000° C., and which has a void radius of at most 0.240 nm as measured by positron annihilation lifetime spectroscopy. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 30 MPa, and cooling the silica glass at an average temperature-decreasing rate of at least 40° C./min during cooling within a temperature range of from 1,200° C. to 900° C. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 140 MPa, and cooling the silica glass in an atmosphere under a pressure of at least 140 MPa during cooling within a temperature range of from 1,200° C. to 900° C. | ||||||
| 124 | Non-Woven Textile Cores and Molds for Making Complex Sculptural Glass Bottle Interiors and Exteriors | US14953261 | 2015-11-27 | US20160152501A1 | 2016-06-02 | Jay Markel |
| Provided herein are novel tools and methods for the formation of vessels having sculpted interior and exterior forms. Novel high-temperature non-woven textile forms may be used to create a glass vessel having a three-dimensional sculpted interior of almost any shape. The non-woven textile forms may also be used as molds to artfully sculpt bottle exteriors. The invention allows for unprecedented control over the form of glass objects in an industrially scalable process. | ||||||
| 125 | Methods and apparatus for additive manufacturing of glass | US14697564 | 2015-04-27 | US20150307385A1 | 2015-10-29 | John Klein; Giorgia Franchin; Michael Stern; Markus Kayser; Chikara Inamura; Shreya Dave; Neri Oxman; Peter Houk |
| In illustrative implementations of this invention, a crucible kiln heats glass such that the glass becomes or remains molten. A nozzle extrudes the molten glass while one or more actuators actuate movements of the nozzle, a build platform or both. A computer controls these movements such that the extruded molten glass is selectively deposited to form a 3D glass object. The selective deposition of molten glass occurs inside an annealing kiln. The annealing kiln anneals the glass after it is extruded. In some cases, the actuators actuate the crucible kiln and nozzle to move in horizontal x, y directions and actuate the build platform to move in a z-direction. In some cases, fluid flows through a cavity or tubes adjacent to the nozzle tip, in order to cool the nozzle tip and thereby reduce the amount of glass that sticks to the nozzle tip. | ||||||
| 126 | Method of making heat treated coated article using carbon based coating and protective film | US13491743 | 2012-06-08 | US09038419B2 | 2015-05-26 | Jens-Peter Müller; Vijayen S. Veerasamy |
| A method of making a heat treated (HT) substantially transparent coated article to be used in shower door applications, window applications, tabletop applications, or any other suitable applications. Certain embodiments relate to a method of making a coated article including heat treating a glass substrate coated with at least layer of or including carbon (e.g., diamond-like carbon (DLC)) and an overlying protective film thereon. The protective film may be of or include both (a) an oxygen blocking or barrier layer, and (b) a release layer of or including zinc oxynitride (e.g., ZnOxNz). Following and/or during heat treatment (e.g., thermal tempering, or the like) the protective film may be entirely or partially removed. | ||||||
| 127 | Method of making shaped glass articles | US12493674 | 2009-06-29 | US09010153B2 | 2015-04-21 | Ljerka Ukrainczyk; John Robert Saltzer, Jr. |
| In a method of making shaped glass articles, a glass sheet is placed on a mold having a shaping surface with a desired surface profile of a shaped glass article. The glass sheet is preferentially and rapidly heated by radiation while in the vicinity of the mold so that the mold remains substantially cooler than the glass sheet during the heating. The glass sheet is sagged onto the shaping surface of the mold so that at least a portion of the sagged sheet assumes the desired surface profile of the shaped glass article. After sagging and shaping, the sagged and shaped glass sheet is removed from the mold. | ||||||
| 128 | TECHNIQUE FOR MANUFACTURING GLASS TUBE CASE OF ELECTRODELESS LAMP | US14403192 | 2012-05-23 | US20150101367A1 | 2015-04-16 | Guozhen Tan; Wenfeng He |
| The present invention provides a process for manufacturing glass tube shell of electrodeless lamp, which comprises seven steps: washing, coating, bepowdering, wiping off, abutting and annealing, wherein the coating step introduced in the present invention is primarily for increasing the evenness and densification degree of the inner wall of the glass tube, so as to guarantee the adhesion homogeneity of the step of bepowdering; besides, the present invention uses multi-step temperature controlling process for steps of coating, bepowdering and baking to effectively guarantee the coating thickness, and increase the productivity by 50%, in addition, a fan is introduced to align to the entrance of the glass tube when baking the powder, so as to increase the entrance of oxygen, and improve the baking efficiency, at last, high temperature annealing is performed to the joint to eliminate the stress after abutting. | ||||||
| 129 | ULTRALOW EXPANSION GLASS | US14474427 | 2014-09-02 | US20150080206A1 | 2015-03-19 | Carlos Alberto Duran |
| Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition. | ||||||
| 130 | Single surface annealing of glass disks | US13187936 | 2011-07-21 | US08893527B1 | 2014-11-25 | Richie Y. Chan; Magenthiran Verapatran; Mohamad F. Azmi; Beehuah Ong |
| A method for annealing a glass disk is disclosed. The glass disk is placed on a base, whereby the bottom surface of the glass disk makes a contact with the base, and the top surface of the glass disk is exposed to air. The glass disk is heated with thermal energy supplied to the glass disk, the thermal energy comprising first thermal energy supplied from the air through the top surface and second thermal energy supplied from the base through the bottom surface. | ||||||
| 131 | Methods for producing crucibles with a reduced amount of bubbles | US13299926 | 2011-11-18 | US08857214B2 | 2014-10-14 | Steven L. Kimbel; Harold W. Korb; Richard J. Phillips; Shailendra B. Rathod |
| Methods for producing crucibles for holding molten material that contain a reduced amount of gas pockets are disclosed. The methods may involve use of molten silica that may be outgassed prior to or during formation of the crucible. Crucibles produced from such methods and ingots and wafers that are produced from crucibles with a reduced amount of gas pockets are also disclosed. | ||||||
| 132 | EUV LITHOGRAPHY MEMBER, MAKING METHOD, AND TITANIA-DOPED QUARTZ GLASS | US14146182 | 2014-01-02 | US20140206524A1 | 2014-07-24 | Shigeru Maida; Hisatoshi Otsuka; Tetsuji Ueda; Masanobu Ezaki |
| A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography. | ||||||
| 133 | Optical member comprising TiO2-containing silica glass | US12718776 | 2010-03-05 | US08735308B2 | 2014-05-27 | Akio Koike; Chikaya Tamitsuji; Kunio Watanabe; Tomonori Ogawa |
| The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less. | ||||||
| 134 | APPARATUS FOR HEAT TREATING AN OPTICAL CERAMIC MATERIAL, METHOD FOR HEAT TREATING AN OPTICAL CERAMIC MATERIAL, METHOD FOR HEAT TREATING SYNTHETIC SILICA GLASS, METHOD FOR PRODUCING AN OPTICAL SYSTEM, AND METHOD FOR PRODUCING AN EXPOSURE APPARATUS | US14016568 | 2013-09-03 | US20140000090A1 | 2014-01-02 | Yuta HARA |
| An optical ceramic material heat treatment apparatus, comprising: a furnace body that is capable to contain an optical ceramic material to be heat treated in the inside thereof; a temperature drop control heater that generates heat during dropping a temperature of the optical ceramic material; a refrigerant intake unit that introduces a refrigerant into the inside of the furnace body to flow the refrigerant therein; and a control unit that controls the temperature drop rate, wherein the temperature drop control heater is arranged in the inside of the furnace body and/or in the refrigerant intake unit, the control unit controls at least one of an amount of heat generation of the temperature drop control heater, and a flow rate of the refrigerant in the inside of the furnace body to control a temperature drop rate at the optical ceramic material or in the vicinity thereof to be kept in a predetermined profile. | ||||||
| 135 | METHODS FOR PRODUCING CRUCIBLES WITH A REDUCED AMOUNT OF BUBBLES | US13299926 | 2011-11-18 | US20130125587A1 | 2013-05-23 | Steven L. Kimbel; Harold W. Korb; Richard J. Phillips; Shailendra B. Rathod |
| Methods for producing crucibles for holding molten material that contain a reduced amount of gas pockets are disclosed. The methods may involve use of molten silica that may be outgassed prior to or during formation of the crucible. Crucibles produced from such methods and ingots and wafers that are produced from crucibles with a reduced amount of gas pockets are also disclosed. | ||||||
| 136 | MULTI-ELECTRODE SYSTEM WITH VIBRATING ELECTRODES | US13185223 | 2011-07-18 | US20110277511A1 | 2011-11-17 | Robert G. Wiley; Brett Clark; Jared C. Meitzler; Clyde J. Troutman |
| A multi-electrode system includes a fiber holder that holds at least one optical fiber, a plurality of electrodes arranged to generate a heated field to heat the at least one optical fiber, and a vibration mechanism that causes at least one of the electrodes from the plurality of electrodes to vibrate. The electrodes can be disposed in at least a partial vacuum. The system can be used for processing many types of fibers, such processing including, as examples, stripping, splicing, annealing, tapering, and so on. Corresponding fiber processing methods are also provided. | ||||||
| 137 | Methods and apparatus for thermal development of large area solids | US11548447 | 2006-10-11 | US08043087B2 | 2011-10-25 | Oleg Efimov; David Hammon |
| Methods and apparatus to rotate a sample about first and second axes in a heat chamber to obtain a desired homogeneous modification of properties of the sample and maintain a surface figure. | ||||||
| 138 | OPTICAL MEMBER COMPRISING TIO2-CONTAINING SILICA GLASS | US12718776 | 2010-03-05 | US20100179047A1 | 2010-07-15 | Akio KOIKE; Chikaya Tamitsuji; Kunio Watanabe; Tomonori Ogawa |
| The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less. | ||||||
| 139 | Localized surface annealing of components for substrate processing chambers | US11181041 | 2005-07-13 | US20070014949A1 | 2007-01-18 | Ashish Bhatnagar; Laxman Murugesh; Padma Gopalakrishnan |
| A substrate processing chamber component has a structural body with localized surface regions having annealed microcracks. The annealed microcracks reduce crack propagation and increase fracture resistance. In one method of manufacture, the structural body of the component is formed by conventional means, and a laser beam is directed onto localized surface regions of the body for a sufficient time to anneal the surface microcracks. | ||||||
| 140 | AlGaN substrate and production method thereof | US11390316 | 2006-03-28 | US20060225643A1 | 2006-10-12 | Hiroshi Amano; Akira Bando |
| A substrate is formed of AlxGa1-xN, wherein 0 | ||||||
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