子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 281 | 올레핀성 불포화 오늄염 | KR1019910014765 | 1991-08-26 | KR1019920004343A | 1992-03-27 | 알프레드스타인만; 울리히쇄델리 |
| 내용 없음 | ||||||
| 282 | L-시스테인 염산염의 1수화물의 분리방법 | KR1019870006122 | 1987-06-17 | KR1019900001610B1 | 1990-03-17 | 미야하라쇼이찌로; 가미구찌도시아끼; 하시무까이라다시; 닛따가주나리 |
| A method for sepg. L-systeine hydrochloride monohydrate comprises (a) adding HCl to a soln. contg. L-systeine, L-systine, L-serine and mineral salt until HCl exceeds 15 wt.%; (b) keeping at above 20 deg. C to sep. solid matter contg. L-systine and the salt; (c) cooling to below 10 deg. C to prep. L-systeine hydrochloride monohydrate crystal; and (d) sepg. the L-systeine. The Lsysteine hydrochloride monohydrate is useful as a food and cosmetic additive. | ||||||
| 283 | 메티오닌 하이드록시 동족체 또는 유도체, 및 그의 에스테르의 제조방법 | KR1019840004639 | 1984-08-03 | KR1019850001898A | 1985-04-10 | 마크시세사; 제임스데이비드부링톤 |
| 내용없음 | ||||||
| 284 | TW108103201 | 2019-01-29 | TW201940979A | 2019-10-16 | ENDO TAKAFUMI; GOTO YUICHI; SOMEYA YASUNOBU; MIZUOCHI RYUTA; KAMIBAYASHI SATOSHI | |
| Provided are: a resist underlayer film having, in particular, a high dry etching speed; the resist underlayer film formation composition; a resist pattern formation method, and a method for manufacturing a semiconductor device. The resist underlay film formation composition contains: a bifunctional or higher compound having one or more disulfide bonds; a trifunctional or higher compound and/or a reaction product; and a solvent. The bifunctional or higher compound is preferably a dicarboxylic acid containing a disulfide bond. The trifunctional or higher compound is preferably a compound containing three or more epoxy groups. | ||||||
| 285 | 硫醇化合物、硫醇化合物的製造方法、聚合物、組成物、硬化性組成物、著色組成物、硬化膜及彩色濾光片 | TW104130358 | 2015-09-15 | TW201612156A | 2016-04-01 | 原田昌之; HARADA, MASAYUKI; 鮫島賢; SAMEJIMA, SUGURU; 金子祐士; KANEKO, YUSHI; 出井宏明; IDEI, HIROAKI; 伊藤純一; ITOU, JUNICHI; 原彰宏; HARA, AKIHIRO |
| 一種硫醇化合物，其以式（1）而表示； (HS-R1 -M1 -)n L1 （1） 於式（1）中，L1 表示n價的有機連結基，n表示3～15的整數，M1 表示-O-、-S-、-N(R2 )-、-C(=O)-、-C(=O)-O-、-O-C(=O)-O-、-C(=O)-NH-、-O-C(=O)-NH-、-S(=O)-、-S(=O)-O-、-S(=O)2 -、-S(=O)2 -O-、或-CH=N-，R1 表示伸烷基、或包含伸烷基與醚性氧原子的組合的基，SH表示硫醇基，SH的硫原子、和M1 的與R1 鍵結的原子隔著R1 的5個以上原子。 | ||||||
| 286 | 硫醇化合物、硫醇化合物的製造方法、聚合物、組成物、硬化性組成物、著色組成物、硬化膜及彩色濾光片 | TW104130358 | 2015-09-15 | TWI660937B | 2019-06-01 | 原田昌之; HARADA, MASAYUKI; 鮫島賢; SAMEJIMA, SUGURU; 金子祐士; KANEKO, YUSHI; 出井宏明; IDEI, HIROAKI; 伊藤純一; ITOU, JUNICHI; 原彰宏; HARA, AKIHIRO |
| A thiol compound represented by formula (1); (HS-R 1 -M 1- ) n L 1 (1) In formula (1), L 1 represents an n-valent organic linking group, and n represents 3 Integer to 15, M 1 represents -O-, -S-, -N (R 2 )-, -C (= O)-, -C (= O) -O-, -OC (= O) -O -, -C (= O) -NH-, -OC (= O) -NH-, -S (= O)-, -S (= O) -O-, -S (= O) 2 -,- S (= O) 2 -O- or -CH = N-, R 1 represents an alkylene group or a group containing a combination of an alkylene group and an etheric oxygen atom, SH represents a thiol group, SH sulfur atom, The atom bonded to R 1 with M 1 is separated by 5 or more atoms of R 1 . | ||||||
| 287 | 用於半導體微影的共聚合物、組合物及硫醇化合物 | TW095119655 | 2006-06-02 | TWI401534B | 2013-07-11 | 飯島稔; MINORU IIJIMA; 山岸孝則; TAKANORI YAMAGISHI |
| The present invention provides a copolymer for semiconductor lithography, comprising: at least, a recurring unit (A) having a structure wherein an alkali-soluble group has been protected with an acid-dissociating, dissolution-suppressing group, and a terminal structure (F) represented by the following formula (F): (wherein X<SUB>1 </SUB>and X<SUB>2 </SUB>are each independently a hydrogen atom, a halogen atom or a hydrocarbon group of 1 to 4 carbon atoms which may be substituted with halogen atom; Y<SUB>11 </SUB>to Y<SUB>14 </SUB>are a hydrogen atom, or an ether bond or a hydrocarbon bond of 1 to 2 carbon atoms, each formed between Y<SUB>11 </SUB>and Y<SUB>12 </SUB>or between Y<SUB>13 </SUB>and Y<SUB>14</SUB>; Y<SUB>21 </SUB>to Y<SUB>25 </SUB>are each independently a hydrogen atom or a hydrocarbon group of 1 to 4 carbon atoms; and n is an integer of 0 or 1); a composition containing the copolymer; and a thiol compound giving the copolymer. The copolymer of the present invention, when used in semiconductor lithography, is superior in lithography properties such as development contrast, DOF and the like. | ||||||
| 288 | ANÁLOGOS DE CISTINA DIAMIDA PARA CISTINÚRIA | BR112022011572 | 2020-12-11 | BR112022011572A2 | 2022-10-04 | LONGQIN HU; HAIFA ALBANYAN |
| ANÁLOGOS DE CISTINA DIAMIDA PARA CISTINÚRIA. Este documento divulga novos análogos de cistina, métodos de fabricação de análogos de cistina, composições contendo análogos de cistina e métodos de uso de tais análogos para inibir a formação de cálculos de cistina e tratamento de cistinúria. | ||||||
| 289 | Kwas 3-dodecylosulfanylomasłowy do zastosowania jako lek, zwłaszcza do zapobiegania rozwojowi insulinooporności oraz kompozycja farmaceutyczna zawierająca kwas 3-dodecylosulfanylomasłowy jako substancję czynną | PL41478515 | 2015-11-13 | PL414785A1 | 2017-05-22 | ZABŁOCKI KRZYSZTOF; WASILEWSKI JANUSZ |
| Przedmiotem zgłoszenia jest kwas 3-dodecylosulfanylomasłowy do zastosowania jako lek, zwłaszcza do stosowania w leczeniu i profilaktyce rozwoju insulinooporności. Zgłoszenie dotyczy także kompozycji farmaceutycznej, charakteryzującej się tym, że jako substancję czynną zawiera kwas 3-dodecylosulfanylomasłowy oraz zastosowania kwasu 3-dodecylosulfanylomasłowego do wytwarzania leku do zapobiegania insulinooporności. | ||||||
| 290 | INHIBITORS OF HISTONE DEACETYLASE | CA2683557 | 2008-04-09 | CA2683557C | 2016-10-18 | TESSIER PIERRE; LEIT SILVANA; SMIL DAVID; DEZIEL ROBERT; AJAMIAN ALAIN; CHANTIGNY YVES ANDRE; DOMINGUEZ CELIA |
| This invention relates to compounds for the inhibition of histone deacetylase. More particularly, the invention provides for compounds of formula compounds of the Formula (I) and N-oxides, hydrates, solvates, pharmaceutically acceptable salts, prodrugs and complexes thereof, and racemic and scalemic mixtures, diastereomers and enantiomers thereof, wherein groups L, M, X and Y are as defined herein. | ||||||
| 291 | PHENYLCETOENOLS SUBSTITUES A LA POSITION 2 OU AUX POSITIONS 2 ET 5 | FR11C0024 | 2011-07-21 | FR11C0024I2 | 2013-08-16 | |
| 292 | BR9715288 | 1997-07-23 | BR9715288B1 | 2010-11-30 | ||
| 293 | PROCESS FOR THE SYNTHESIS OF .ALPHA.-SUBSTITUTED ACRYLIC ACIDS AND THEIR APPLICATION | CA2170822 | 1996-03-01 | CA2170822C | 2010-05-18 | DUHAMEL PIERRE; DUHAMEL LUCETTE; DANVY DENIS; MONTEIL THIERRY; LECOMTE JEANNE-MARIE; SCHWARTZ JEAN-CHARLES |
| Process for the synthesis of .alpha.-substituted acrylic acids of general formula (I) and their application to the synthesis of N-(mercaptoacyl)aminoacid derivatives of formula (II). (see formula I) (see formula II) | ||||||
| 294 | Phthalsaeurediamidderivate, insecticides for agriculture and horticulture, and their use | DE69840489 | 1998-11-23 | DE69840489D1 | 2009-03-05 | TOHNISHI MASANORI; NAKAO HAYAMI; SAKATA KAZUYUKI; FUJIOKA SHINSUKE; KANNO HIDEO; KOHNO EIJI; NISHIDA TATEKI; FURUYA TAKASHI; SHIMIZU TOSHIAKI; SEO AKIRA |
| 295 | An optically active n-(alpha-mercaptopropiony) glycine. | CA2692549 | 2007-12-28 | CA2692549A1 | 2009-01-15 | WANG YONG; ZHANG CANG; TENG ZAIJIN; ZHANG WENPING; QIAN JINYE |
| An optically active N-(.alpha.-mercaptopropionyl)glycine, i.e., R-(-)-N-(.alpha.-mercaptopropionyl)glycine or S-(-)-N-(.alpha.-mercaptopropionyl)glycine, a preparation method thereof, a pharmaceutical preparation containing the compound or a pharmaceutically acceptable salt or ester thereof, and use of the same in preparation of detoxification medicament for improving metabolism, are provided. | ||||||
| 296 | PRODUCTION OF STABILIZED AND DEODORIZED ORGANIC POLYSULPHIDES | MYPI9900293 | 1999-01-28 | MY129547A | 2007-04-30 | DEVAUX JEAN-FRANCOIS; FREMY GEORGES; LABAT YVES |
| THE PRESENT INVENTION RELATES TO THE MANUFACTURE OF STABILIZED AND DEODORIZED ORGANIC POLYSUIPHIDES. ACCORDINGLY, THE PRESENT INVENTION PROVIDES A PROCESS FOR PREPARING A STABILIZED AND DEODORIZED ORGANIC POLYSUIPHIDE, WHICH PROCESS COMPRISES TREATING A RAW ORGANIC POLYSULPHIDE WITH AN ALKYLENE CARBONATE IN THE PRESENCE OF A BASIC CATALYST AND, OPTIONALLY, A SULPHUR DONOR. THE PROCESS ACCORDING TO THE PRESENT INVENTION REDUCES THE LEVEL OF RESIDUAL INERCAPTAN AND H2S TO A LEVEL LOW ENOUGH FOR THE POLYSUIPHIDE TO BE DEODORIZED AND STABILIZED. THE PROCESS IS FAST, USES REACTANTS WHICH ARE ROT VERY TOXIC AND DOES NOT REQUIRE THE USE OF A SOLVENT OR PHASE MIXTURE, OR DISTILLATION. | ||||||
| 297 | FENILCETOENOIS SUBSTITUÍDOS NAS POSIÇÕES 2 E 2, 5 | PT02023660 | 1997-07-23 | PT1277734E | 2007-03-30 | TURBERG ANDREAS DR; BRETSCHNEIDER THOMAS DR; SCHNEIDER UDO DR; ERDELEN CHRISTOPH DR; WACHENDORFF-NEUMANN ULRIKE DR; ANDERSCH WOLFRAM DR; LIEB FOLKER DR; FISCHER REINE DR; RUTHER MICHAEL DR; GRAFF ALAN DR |
| 298 | FENILCETOENOIS SUBSTITUÍDOS NAS POSIÇÕES 2 E 2,5 | PT02023659 | 1997-07-23 | PT1277751E | 2007-02-28 | WACHENDORFF-NEUMANN ULRIKE; BRETSCHNEIDER THOMAS; SCHNEIDER UDO; FISCHER REINER; ERDELEN CHRISTOPH; ANDERSCH WOLFRAM; TURBERG ANDREAS DR; LIEB FOLKER DR; RUTHER MICHAEL DR; GRAFF ALAN DR |
| 299 | C10 TAXANE DERIVATIVES AND PHARMACEUTICAL COMPOSITIONS | CA2153805 | 1994-01-14 | CA2153805C | 2006-03-28 | HOLTON ROBERT A; CHAI KI-BYUNG |
| Taxane derivatives substituted on the C10 position with novel substituents are disclosed. The novel compounds have utility as antileukemia and antitumor agents. The derivatives have the formula: (see formula III) wherein X1 is -OX6, or -SX7; X2 is hydrogen, alkyl, alkenyl, alkynyl, aryl, or heteroaryl; X3 and X4 are independently hydrogen, alkyl, alkenyl, alkynyl, or heteroaryl; X5 is -COX10, or -SO2X11; X6 is hydrogen, alkyl, alkenyl, alkynyl, aryl, or heteroaryl; X7 is alkyl, alkenyl, alkynyl, aryl, or heteroaryl; X8 is hydrogen, alkyl, alkenyl, alkynyl, aryl, heteroaryl, or substituted alkyl, alkenyl, alkynyl, aryl or heteroaryl, wherein the substituent is selected from nitrogen, oxygen, sulphur and halogen; X10 is alkyl, alkenyl, alkynyl, aryl, heteroaryl, or heterosubstituted alkyl, alkenyl, alkynyl, aryl or heteroaryl; X11 is alkyl, alkenyl, alkynyl, aryl, heteroaryl, -OX10, or -NX8X14; X14 is hydrogen, alkyl, alkenyl, alkynyl, aryl, or heteroaryl; R1 is hydrogen, hydroxy, or together with R14 forms a carbonate; R2 is hydrogen, hydroxy, -OCOR31, or together with R2a forms an oxo; R2a is hydrogen or together with R2 forms an oxo; R4 is hydrogen, together with R4a forms an oxo, oxirane or methylene, or together with R5a and the carbon atoms to which they are attached form an oxetanering; R4a is hydrogen, alkyl, alkenyl, alkynyl, aryl, heteroaryl, cyano, hydroxy, -OCOR30, or together with R4 forms an oxo, oxirane or methylene; R5 is hydrogen or together with R5a forms an oxo; R5a is hydrogen, hydroxy, acyloxy, together with R5 forms an oxo, or together with R4 and the carbon atoms to which they are attached form an oxetane ring; R6 is hydrogen; R6a is hydrogen, alkyl, alkenyl, alkynyl, aryl, or heteroaryl; R7 is hydrogen or together with R7a forms an oxo; R7a is hydroxy, or together with R7 forms an oxo; R9 together with R9a forms an oxo; R9a together with R9 forms an oxo; R10 is hydrogen or together with R10a forms an oxo; R10a is hydrogen or together with R10 forms an oxo; R14 is hydrogen, alkyl, alkenyl, alkynyl, aryl, or heteroaryl, hydroxy, or together with R1 forms a carbonate; R14a is hydrogen, alkyl, alkenyl, alkynyl, aryl, or heteroaryl; and R30 and R31 are independently hydrogen, alkyl, alkenyl, alkynyl, monocyclic aryl or monocyclic heteroaryl; provided, however, when R10 and R10a are hydrogen (a) R14 is other than hydrogen, (b) R4a is other than acetoxy, (c) R2 is other than benzoyloxy, (d) R1 is other than hydroxy, (e) X3 or X4 is cycloalkyl, alkenyl, or heteroaryl, or (f) X5 is -COX10 with X10 being heteroaryl. | ||||||
| 300 | Long-acting, chemically resistant skin-softening, humectants and amplifiers | DE69829993 | 1998-09-10 | DE69829993T2 | 2006-03-16 | ROSE D; HARTMAN F; CHOW CARMEN; ROSE DANIEL; ROSE M |
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