Apparatus for liquid phase epitaxial growth
专利汇可以提供Apparatus for liquid phase epitaxial growth专利检索，专利查询，专利分析的服务。并且PURPOSE: To provide the title system ensuring specified epitaxial layer to be grown stably, so designed that each wafer is put between a disc and an outer peripheral ring specifying the spacings between the wafers and these wafers are arranged in tiers in a cassette, thereby preventing, in discharging the raw material solution, inadequate discharge thereof accruing from wafer floating and/or wafer adherence to the disc(s).
CONSTITUTION: The periphery of each wafer 1 is fixed with a groove formed by a disc 4 and an outer peripheral ring 2 with the lower end of the inner periphery provided with a notch, and these wafers are arranged in tiers in a cassette 7. And, a raw material solution recovering equipment 9, the cassette 7 and a raw material solution reservoir 8 are housed in this order in an outer vessel for the title system. Thence, a raw material solution 6 is introduced from said reservoir 8 into the cassette 7 to grow an epitaxial layer on the surface of each wafer 1 and the remaining solution 6 is then discharged from the cassette 7 to the recovering equipment 9, thus completing the objective growth.
COPYRIGHT: (C)1992,JPO&Japio，下面是Apparatus for liquid phase epitaxial growth专利的具体信息内容。
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