Exchange of ion source in ion implanter
专利汇可以提供Exchange of ion source in ion implanter专利检索，专利查询，专利分析的服务。并且PURPOSE: To assure the normal operation of an ion source and improve its operation rate by supplying current to a filament provided in a vacuum chamber and measuring emitted thermionic current quantity in the state of the ion source alone before setting the ion source in an ion implanter.
CONSTITUTION: Before an ion source is set in an ion implanter, it alone is tested about whether the operation of thermionic emission is surely performed or not. In this test, the ion source is set in the chamber 10 of a test equipment, the counter of a filament control circuit 92 is reset and the filament current is raised to a predetermined current, for example, 80A. After a predetermined time, for example, one minute from that, emission current caused by the flow of thermions, which are emitted due to the heating of the filament 72, into an arc chamber 68 is measured with a current detecting circuit and it is examined whether the measured value is a predetermined reference value, for example, 0.1A or less, or not. If the examination indicates NO, the ion source shall be in normal operation that appropriate quantity of thermions are emitted.
COPYRIGHT: (C)1990,JPO&Japio，下面是Exchange of ion source in ion implanter专利的具体信息内容。
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