专利汇可以提供Schottky junction in a cavity专利检索,专利查询,专利分析的服务。并且The invention relates to a method of manufacturing a semiconductor device having a schottky junction, for example, a schottky diode, in which a masking layer which is provided with a window is provided on a semiconductor body and at the area of the window a cavity extending to below the masking layer is provided in but not through said semiconductor body, the schottky electrode layer which extends to below the masking layer but not up to the masking layer being provided in said cavity by vapourdeposition or sputtering. The invention also relates to a semiconductor device manufactured by said method. A pressure contact is preferably provided on the schottky electrode layer.,下面是Schottky junction in a cavity专利的具体信息内容。
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