Schottky barrier diode

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专利汇可以提供Schottky barrier diode专利检索,专利查询,专利分析的服务。并且Anisotropic etching is employed in the fabrication of a Schottky barrier diode to provide a recessed geometry having a guard ring of reduced area, thereby avoiding the objectionable degree of parasitic capacitance found in related planar devices. A low series resistance is also provided since the anisotropic etching step inherently permits a precise control of the distance between the surface barrier and a buried substrate layer of low resistivity.,下面是Schottky barrier diode专利的具体信息内容。

  • 2. A surface barrier junction device as set forth in claim 1, further including an insulation layer disposed on said second layer and surrounding said depression in overlying relation to the upper end of said region of opposite conductivity type, and said electrical conductor layer having a marginal flange portion integral therewith and extending laterally from the upper end of said upstaNding continuous conductor layer portion into overlying engagement with the portion of said insulation layer immediately surrounding said depression.
  • 3. A device as in claim 2 wherein said semiconductor body is silicon, said substrate has a resistivity less than 0.01 ohm-centimeter, said first high-resistivity layer has a resistivity of 0.1 to 1.0 ohm-centimeter and said second high-resistivity layer has a resistivity of about 2 to 10 ohm-centimeters.
  • 4. A device as in claim 3 wherein said monocrystalline silicon body has a (100) orientation and wherein said depression has flat sidewalls forming a 54.7* angle with the (100) plane.
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