Light-sensitive diazo compounds and reproduction material employing the same
阅读：653发布：2021-12-22
专利汇可以提供Light-sensitive diazo compounds and reproduction material employing the same专利检索，专利查询，专利分析的服务。并且This invention relates to novel light-sensitive compounds, a process for the preparation of the light-sensitive compounds, and the use of the light-sensitive compounds, the latter being, in each case, a condensation product of an aromatic diazonium compound which comprises repeating units of each of the general types，下面是Light-sensitive diazo compounds and reproduction material employing the same专利的具体信息内容。
1. AN AROMATIC DIAZONIUM COMPOUND COMPRISING REPEATING UNITS OF EACH OF THE GENERAL TYPES A - N2X AND B WHICH ARE LINKED BY METHYLENE GROUPS, IN WHICH A-N2X IS A RADICAL OF A COMPOUND OF ONE OF THE GENERAL FORMULAE
2. A compound according to claim 1 having a molecular weight from 500 to 10,000.
3. A compound according to claim 1 in which the compound of which A is a radical is a 2,4'',5-triethoxy-diphenyl-4-diazonium salt.
4. A compound according to claim 1 in which the compound of which A is a radical is a 4-(4-methyl-phenylmercapto)-2,5-dimethoxy-benzene diazonium salt.
5. A compound according to claim 1 in which the compound of which A is a radical is a 4-(4-methoxy-phenyl-mercapto)-2,5-diethoxy-benzene diazonium salt.
6. A compound according to claim 1 containing, on the average, about 0.1 to 20 B units per unit of A-N2X.
7. A compound according to claim 1 in which the A-N2X units are derived from a compound of the general formula
8. A compound according to claim 1 in which the compound of which B is a radical is an aromatic amine.
9. A compound according to claim 1 in which the compound of which B is a radical is a phenol.
10. A compound according to claim 1 in which the compound of which B is a radical is an aromatic heterocyclic compound.
11. A compound according to claim 1 in which the compound of which B is a radical is a phenolic ether.
12. A compound according to claim 1 in which the compound of which B is a radical is an aromatic thioether.
13. A compound according to claim 1 in which the compound of which B is a radical is an aromatic hydrocarbon.
14. A compound according to claim 1 in which the compound of which B is a radical is an organic acid amide.
15. A compound according to claim 14 in which the compound of which B is a radical is a carboxylic acid amide.
16. A compound according to claim 14 in which the compound of which B is a radical is a sulfonic acid amide.
17. A compound according to claim 1 in which the compound of which A is a radical is a diazo diphenylamine and the compound of which B is a radical is selected from the group consisting of diphenyl ethers and diphenyl sulfides.
18. A compound according to claim 1 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium dihydrogenphosphate and the compound of which B is a radical is 4-methyl-diphenylamine.
19. A compound according to claim 1 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium chloride and the compound of which B is a radical is phenol.
20. A compound according to claim 1 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is mesitylene.
21. A compound according to claim 1 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is 1,3-diisopropyl-benzene.
22. A compound according to claim 1 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogen sulfate and the compound of which B is a radical is anisole.
23. A compound according to claim 1 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is a mixture of phenanthrene and benzene.
24. A compound according to claim 1 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is 3-methylphenoxymethyl phosphonic acid.
25. A compound according to claim 1 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is diphenyl methane.
26. A compound according to claim 1 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium chloride, zinc chloride double salt, and the compound of which B is a radical is diphenyl ether.
27. A compound according to claim 1 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is diphenyl sulfide.
28. A compound according to claim 1 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is diphenyleneoxide.
29. A compound according to claim 1 in which the compound of which A is a radical is a mixture of diphenylamine-4-diazonium dihydrogenphosphate and 3-methoxy-diphenylamine-4-diazonium dihydrogenphosphate and the compound of which B is a radical is thiophene.
30. A PROCESS FOR THE PREPARATION OF AN AROMATIC DIAZONIUM COMPOUND WHICH COMPRISES REACTING ONE MOLAR PART OF AT LEAST ONE COMPOUND OF ONE OF THE GENERAL FORMULAE
31. A process according to claim 30 which comprises reacting one molar part of a compound of the general formula
32. A process according to claim 30 in which the condensation medium used is a concentrated acid.
33. A process according to claim 32 in which the condensation medium used is selected from the group consisting of phosphoric acid, methane sulfonic acid, and sulfuric acid, in a concentration in the range of about 70 to 100%.
34. A process according to claim 50 in which the condensation is performed in a temperature range of about 10*C. to 50*C.
35. LIGHT-SENSITIVE MATERIAL COMPRISING A BASE MATERIAL HAVING A LAYER THEREON INCLUDING AN AROMATIC DIAZONIUM COMPOUND COMPRISING REPEATING UNITS OF EACH OF THE GENERAL TYPES A-N2X AND B WHICH ARE LINKED BY METHYLENE GROUPS, IN WHICH A-N2X IS A RADICAL OF A COMPOUND OF ONE OF THE GENERAL FORMULAE
36. Light-sensitive material according to claim 35 in which the base material is a screen.
37. Light-sensitive material according to claim 35 in which the diazonium compound contains, on the average, about 0.1 to 20 B units per unit of A-N2X.
38. Light-sensitive material according to claim 35 in which the A-N2X units are derived from a compound of the general formula
39. Light-sensitive material according to claim 35 in which the compound of which B is a radical is an aromatic amine.
40. Light-sensitive material according to claim 37 in which the compound of which B is a radical is a phenol.
41. Light-sensitive material according to claim 35 in which the compound of which B is a radical an aromatic heterocyclic compound.
42. Light-sensitive material according to claim 35 in which the compound of which B is a radical is a phenolic ether.
43. Light-sensitive material according to claim 35 in which the compound of which B is a radical is an aromatic thioether.
44. Light-sensitive material according to claim 35 in which the compound of which B is a radical is an aromatic hydrocarbon.
45. Light-sensitive material according to claim 35 in which the compound of which B is a radical is an organic acid amide.
46. Light-sensitive material according to claim 45 in which the compound of which B is a radical is carboxylic acid amide.
47. Light-sensitive material according to claim 45 in which the compound of which B is a radical is sulfonic acid amide.
48. Light-sensitive material according to claim 35 in which the compound of which A is a radical is a diazo diphenylamine and the compound of which B is a radical is selected from the group consisting of diphenyl ethers and diphenyl sulfides.
49. Light-sensitive material according to claim 35 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium dihydrogenphosphate and the compound of which B is a radical is 4-methyl-diphenylamine.
50. Light-sensitive material according to claim 35 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium chloride and the compound of which B is a radical is phenol.
51. Light-sensitive material according to claim 35 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is mesitylene.
52. Light-sensitive material according to claim 35 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium hydrogen sulfate and the compound of which B is a radical is 1,3-diisopropyl-benzene.
53. Light-sensitive material according to claim 35 in which the compound of whiCh A is a radical is diphenylamine-4-diazonium hydrogen sulfate and the compound of which B is a radical is anisole.
54. Light-sensitive material according to claim 35 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is a mixture of phenanthrene and benzene.
55. Light-sensitive material according to claim 35 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is 3-methylphenoxymethyl phosphonic acid.
56. Light-sensitive material according to claim 35 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is diphenyl methane.
57. Light-sensitive material according to claim 35 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium chloride, zinc chloride double salt, and the compound of which B is a radical is diphenyl ether.
58. Light-sensitive material according to claim 35 in which the compound of which A is a radical is 3-methoxy-diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is diphenyl sulfide.
59. Light-sensitive material according to claim 35 in which the compound of which A is a radical is diphenylamine-4-diazonium hydrogensulfate and the compound of which B is a radical is diphenyleneoxide.
60. Light-sensitive material according to claim 35 in which the compound of which A is a radical is a mixture of diphenylamine-4-diazonium dihydrogenphosphate and 3-methoxy-diphenylamine-4-diazonium diphydrogenphosphate and the compound of which B is a radical is thiophene.
61. Light-sensitive material according to claim 35 in which the base material is aluminum.
62. Light-sensitive material according to claim 35 in which the base material is paper.
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