TRANSFER SYSTEM, EXPOSURE APPARATUS, TRANSFER METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUCTION APPARATUS |
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| 申请号 | EP13859307 | 申请日 | 2013-11-27 | 公开(公告)号 | EP2950329A4 | 公开(公告)日 | 2016-10-12 |
| 申请人 | NIPPON KOGAKU KK; | 发明人 | HARA HIDEAKI; | ||||
| 摘要 | A carrier system is provided with a wafer stage (WST) which holds a mounted wafer (W) and is also movable along an XY plane, a chuck unit (153) which holds the wafer from above in a non-contact manner above a predetermined position and is vertically movable, and a plurality of vertical movement pins (140), which can support from below the wafer held by the chuck unit (153) on the wafer stage (WST) when the wafer stage (WST) is positioned at the predetermined position above and can also move vertically. Then, flatness of the wafer (W) is measured by a Z position detection system (146), and based on the measurement results, the chuck unit(153) and the vertical movement pins (140) that hold (support) the wafer (W) are independently driven. | ||||||
| 权利要求 | |||||||
| 说明书全文 | |||||||
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