APPARATUS AND METHODS FOR RETICLE HANDLING IN AN EUV RETICLE INSPECTION TOOL |
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| 申请号 | EP13769488 | 申请日 | 2013-03-25 | 公开(公告)号 | EP2831673A4 | 公开(公告)日 | 2015-11-11 |
| 申请人 | KLA TENCOR CORP; | 发明人 | CHILESE FRANCIS CHARLES; POHLMANN ULRICH; WOLTER DETLEF; WALSH JOSEPH FLEMING; | ||||
| 摘要 | Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees. | ||||||
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