| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | LASER ABLATIVE DIELECTRIC MATERIAL | US15650535 | 2017-07-14 | US20180019156A1 | 2018-01-18 | Cristina R. Matos-Perez; Tony D. Flaim; Arthur O. Southard; Lisa M. Kirchner; Deborah Blumenshine |
| Dielectric materials with optimal mechanical properties for use in laser ablation patterning are proposed. These materials include a polymer selected from the group consisting of polyureas, polyurethane, and polyacylhydrazones. New methods to prepare suitable polyacylhydrazones are also provided. Those methods involve mild conditions and result in a soluble polymer that is stable at room temperature and can be incorporated into formulations that can be coated onto microelectronic substrates. The dielectric materials exhibit high elongation, low CTE, low cure temperature, and leave little to no debris post-ablation. | ||||||
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