子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 261 | Dual wavelength method of determining a relative position of a substrate and a template | US10843195 | 2004-05-11 | US06902853B2 | 2005-06-07 | Sidlgata V. Sreenivasan; Byung J. Choi; Matthew Colburn; Todd Bailey |
| The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template. | ||||||
| 262 | Imprint lithography template having opaque alignment marks | US10670980 | 2003-09-25 | US20050067379A1 | 2005-03-31 | Sidlgata Sreenivasan; Philip Schumaker |
| The present invention is directed to providing a template with alignment marks that are opaque to selective wavelength of light. In one embodiment, a template is provided having patterning areas and a template, with the template mark being formed from metal and disposed outside of the patterning areas. The alignment marks may be surrounded by a moat to prevent curable liquid from being in superimposition therewith during imprinting. In this manner, opaque alignment marks may be employed without degrading the quality of the pattern formed during imprinting. | ||||||
| 263 | Pattern forming apparatus | US10941475 | 2004-09-15 | US20050064054A1 | 2005-03-24 | Kazuyuki Kasumi |
| A pattern forming apparatus maintaining alignment between a mold and a substrate. The pattern forming apparatus includes a press pressing the mold against the substrate in a pressing direction, and a mechanism to maintain orientation of the mold and the substrate perpendicular to the pressing direction. | ||||||
| 264 | Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same | US09804217 | 2001-03-12 | US06870952B2 | 2005-03-22 | Katsuya Sangu; Ryoichi Ida; Katsumi Momose; Michitomo Koda |
| The Xray irradiation device 1 issues Xrays to board mark 7 and projects the image of the board mark 7 on the fluorescence screen 3, the fluorescence face 39 of which visibly displays the image of the board mark 7 that can be captured by the CCD camera 2. The CCD camera 2 images the board mark 7 and the mask mark 5 depicted on the photo mask 4 overlapping together. The board 6 and the photo mask 4 are aligned by exposure stage 8 so as to the board mark 7 and the mask mark 5 coincide. | ||||||
| 265 | Method of separating a template from a substrate during imprint lithography | US10617321 | 2003-07-10 | US06870301B2 | 2005-03-22 | Byung Jin Choi; Sidlgata V. Sreenivasan; Stephen C. Johnson |
| Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate. | ||||||
| 266 | Gray scale all-glass photomasks | US10374669 | 2003-02-25 | US20050053844A1 | 2005-03-10 | Che-Kuang Wu |
| A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for at least certain applications. (4) The e-beam induced optical density is a unique function of, and is a very reproducible function of electron dosages for one or more combinations of the parameters of an e-beam writer. The parameters of e-beam writers include beam acceleration voltage, beam current, beam spot size, addressing grid size and number of retraces. A method of fabricating three-dimensional microstructures using HEBS-glass gray scale photomask for three dimensional profiling of photoresist and reproducing the photoresist replica in the substrate with the existing microfabrication methods normally used for the production of microelectronics is described. | ||||||
| 267 | Image exposure apparatus | US10700563 | 2003-11-05 | US06860204B2 | 2005-03-01 | Akihiro Hashiguchi |
| An image exposure apparatus has a rotating drum for winding a printing plate on which an image is recorded; a punch unit for forming punched holes to be used for positioning in printing processing on the printing plate; a conveying guide unit having a guide section that selectively moves to a first position facing the punch unit and a second position facing the rotating drum to guide a printing plate to the selected position so as to supply the printing plate; a width direction moving unit for moving in a width direction while a conveying pin is in contact with a width direction edge of the printing plate that is put on the conveying guide unit; a reference pin moving unit having a reference pin disposed at an opposite side of the width direction moving unit for defining the width direction edge of the printing plate, the reference pin moving unit moving the reference pin in accordance with a size of the printing plate; and a home position sensor mounted on a fixing portion independently of the conveying guide unit for detecting a home position of the reference pin. | ||||||
| 268 | Image pattern recording method | US10838538 | 2004-05-05 | US20050002553A1 | 2005-01-06 | Takao Ozaki |
| An image pattern recording method includes the steps of: recording medium supplying by a supplying device to supply a base plate; first measuring by a measuring device to measure the base plate; transferring by a transfer device to transfer the base plate from the measuring device to a recording device; second measuring on the base plate by the recording device; standard mark position obtaining by the recording device; image data correcting by the recording device; and recording by the recording device and the steps are carried out in this order. Further, the first measuring step is carried out on the next recording medium by the measuring device, which is supplied to the measuring device following the preceding recording medium in the recording medium supplying step, in parallel with one or a plurality of the second measuring step, the standard mark position obtaining step, the image data correcting step and the recording step on the preceding recording medium by the recording device. | ||||||
| 269 | Apparatus to control displacement of a body spaced-apart from a surface | US10806956 | 2004-03-23 | US20040251775A1 | 2004-12-16 | Byung-Jin Choi; Sidlgata V. Sreenivasan; Stephen C. Johnson |
| An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes. | ||||||
| 270 | Method for removing color resist for exposure alignment | US10840707 | 2004-05-06 | US20040241594A1 | 2004-12-02 | Chi-Ming Cheng |
| A method for removing color resist from an exposure alignment mark. In an embodiment, a color resist layer is formed over a color filter substrate with an alignment mark thereon. A concentric tube system is provided with an outer tube surrounding an inner tube. A solvent is injected via the inner tube to contact and dissolve the color resist directly overlying the alignment mark. The dissolved color resist is extracted by the outer tube of the concentric tube system to expose the alignment mark. By repeating the dissolving and extraction steps, all alignment marks on the color filter substrate are consequently uncovered for subsequent exposure alignment. | ||||||
| 271 | Scaling and registration calibration especially in printed circuit board fabrication | US09708160 | 2000-11-08 | US06819789B1 | 2004-11-16 | Zeev Kantor; Amnon Ganot |
| A method is disclosed for calibrating a camera used in a scanner for scanning images onto a printed circuit board. The calibration method determines a transformation between the camera and the scanner by writing a pattern on a photosensitized substrate using the scanner, where the pattern is visible without development, and using the camera to image the pattern, from which a transformation between the imager and scanner coordinate systems is determined. | ||||||
| 272 | Methods of forming patterns for semiconductor constructions; and molds configured to pattern masses associated with semiconductor constructions | US10461811 | 2003-06-12 | US20040214440A1 | 2004-10-28 | James J. Hofmann |
| The invention includes methods of forming patterns in low-k dielectric materials by contact lithography. In a particular application, a mold having a first pattern is pressed into a low-k dielectric material to form a second pattern within the material. The second pattern is substantially complementary to the first pattern. The mold is then removed from the low-k dielectric material. The invention also includes a method of forming a mold; and includes a mold configured to pattern a mass over a semiconductor substrate during contact lithography of the mass. | ||||||
| 273 | Method and apparatus of registering a printed circuit board | US09808730 | 2001-03-14 | US06804388B2 | 2004-10-12 | Marc Vernackt |
| An apparatus and method of registering a panel is disclosed. The panel is held in a frame. The frame includes a transparent plate that covers the panel. The transparent plate has a pattern on at least one surface. Next, an image of each one of a number of registration targets on the surface of the panel is received. The image is received through the transparent panel. The actual location of each one of the registration targets relative to the pattern is then determined. | ||||||
| 274 | Projection exposure apparatus having compact substrate stage | US09634328 | 2000-08-07 | US06798516B1 | 2004-09-28 | Nobutaka Magome |
| The projection exposure apparatus is provided with a moving mirror (24X, 24Y) having a length Lm set so as to satisfy a relationship as represented by Lm |
||||||
| 275 | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process | US09922656 | 2001-08-07 | US06794118B2 | 2004-09-21 | Yoshihiko Okamoto; Noboru Moriuchi |
| Herein disclosed is an exposure technology for a semiconductor integrated circuit device which has a pattern as fine as that of an exposure wavelength. The technology contemplates to improve the resolution characteristics of the pattern by making use of the mutual interference of exposure luminous fluxes. | ||||||
| 276 | Device and method for detecting the edge of a recording material | US10695368 | 2003-10-28 | US20040178570A1 | 2004-09-16 | Gerhard Fritz Blohdorn; Peter Klaus Melzer; Heinz Gerhard Franke; Volker Haushahn |
| A device and a method detect an edge of a recording material, in particular a printing plate, in an exposer for recording printing originals. An exposer has an exposure drum for holding the printing plate, and an exposure head, which is moved axially along the exposure drum and focuses exposure beams onto the printing plate. The position of the edge of the printing plate is determined by a sensing device. To this end, a sensing finger is pivoted into a groove in the surface of the exposure drum and a signal is generated by a sensor when the sensing finger moves when it touches the edge of the recording material. The sensor used is preferably a microswitch. The axial position of the edge of the printing plate is determined by counting the cycles of the feed drive that moves the sensing device. | ||||||
| 277 | Method of creating a dispersion of a liquid on a substrate | US10755918 | 2004-01-13 | US20040170771A1 | 2004-09-02 | Todd Bailey; Byung J. Choi; Matthew Colburn; S. V. Sreenivasan; C. Grant Willson; John Ekerdt |
| The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location. | ||||||
| 278 | Apparatus to orientate a body with respect to a surface | US10775707 | 2004-02-10 | US20040169441A1 | 2004-09-02 | Byung Jin Choi; Sidlgata V. Sreenivasan; Stephen C. Johnson |
| An apparatus to orientate a body with respect to a surface spaced-apart from the body. The apparatus comprises a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system, and an actuation system is coupled to the flexure system. The body is coupled to the flexure system to rotate about the first and the second axes in response to movement caused by the actuation system. The movement of the body about the first axis being decoupled from movement of the body about the second axis. | ||||||
| 279 | Imprint lithography template comprising alignment marks | US10747795 | 2003-12-29 | US20040141168A1 | 2004-07-22 | S. V. Sreenivasan; Byung J. Choi; Matthew Colburn; Todd Bailey |
| A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed. | ||||||
| 280 | Registration pin system | US10347834 | 2003-01-22 | US06755132B1 | 2004-06-29 | Calvin D. Cummings |
| A surface for a plate handling machine is movable in a plate handling direction relative to the plate handling machine. The surface has at least two groups of stops. The stops permit various arrangements of plates to be registered on the surface. Two smaller-sized plates or one larger-sized plate can be registered on the surface. An example surface has a first stop positioned on the surface in a range of 80-90 centimeters in a first lateral direction from a plane parallel to the plate handling direction which bisects surface, a second stop positioned on the surface in a range of 60-70 centimeters in the first lateral direction from the plane, a third stop positioned on the surface in a range of 30-40 centimeters in the first lateral direction from the plane, a fourth stop positioned on the surface in a range of 30-40 centimeters in a second lateral direction opposite the first lateral direction from the plane, a fifth stop positioned on the surface in a range of 60-70 centimeters in the second direction from the plane and a sixth stop positioned on the surface in a range of 80-90 centimeters in the second direction from the plane. The third and fourth stops are positioned approximately on a reference line located on the surface perpendicular to the plate handling direction. The second and fifth stops are offset by a first distance from the reference line in the plate handling direction, and the first and sixth stops are offset by a second distance from the reference line in the plate handling direction, wherein the first distance is greater than the second distance. | ||||||
QQ群二维码
意见反馈
意见反馈