子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 成像光学系统和具有该类型的成像光学系统的微光刻投射曝光设备 | CN200880113375.1 | 2008-10-02 | CN101836164B | 2013-03-13 | 汉斯-于尔根·曼 |
| 成像光学系统(7)具有多个镜(M1至M8)。这些镜将物平面(5)中的物场(4)成像到像平面(9)中的像场(8)。镜(M6、M7、M8)的至少一个被遮拦，且由此具有供成像光(15)经过的通孔(21)。在像场(8)之前的光路中的第四最后镜(M5)没有被遮拦，且利用其光学有效反射表面的外边缘(22)提供成像光学系统(7)的光瞳平面中的中心遮蔽。第四最后镜(M5)和最后镜(M8)之间的距离为物场(4)和像场(8)之间的距离的至少10％，最接近像平面(9)的中间像平面(23)设置于最后镜(M8)和像平面(9)之间。成像光学系统(7)具有0.9的数值孔径。这些措施不需所有必须同时实现，且导致了成像光学系统具有改善的成像性能和/或减少的生产成本。 | ||||||
| 2 | 用于头戴显示器的光学装置 | CN200380110982.X | 2003-12-12 | CN1894617A | 2007-01-10 | 拉斯兹罗·多姆简; 加伯尔·萨尔瓦斯; 萨伯尔克斯·迈克 |
| 公开一种利用单个可视显示器屏幕以传输图像到双眼的头戴显示器。聚焦这个显示器屏幕的图像是为了减小分割体积，该图像再被与图像焦点邻近的多个反射面分割。 | ||||||
| 3 | 图像显示设备 | CN03805549.X | 2003-01-23 | CN1723409A | 2006-01-18 | 谷野友哉 |
| 一种图像显示设备，包括：照明光学系统(2)，用于照射包括一反射电极的电灯泡(1)；和投影透镜(3)，用于形成该电灯泡(1)的图像，其中一反射面(4)置于照明光学系统(2)和该电灯泡(1)之间，该反射面(4)用于折转从该照明光学系统(2)延伸至电灯泡(1)的照明光的光路。 | ||||||
| 4 | 星载环境监测仪的立体多视角模拟在轨定标系统 | CN201511023432.5 | 2015-12-30 | CN105988206A | 2016-10-05 | 曾议; 司福祺; 江宇; 薛辉; 江庆伍; 陈军; 刘凤垒; 周海金; 赵敏杰; 黄书华; 汪世美 |
| 本发明公开了一种星载环境监测仪立体多视角模拟在轨定标系统，立体多视角模拟在轨定标系统包含两条光路：模拟太阳光定标光路和主视场测量光路；利用光源发出的光线，使用旋转升降及角度调节装置调整、设置光源的立体方位和视角，模拟在轨时入射的太阳光，通过两镜式望远镜和漫反射器件接收模拟太阳光光源辐射、主视场辐射并会聚输出的光学机械系统。本发明通过光源在多个视角下的入射，模拟在轨时太阳光的入射方位和角度，验证仪器设计参数，辅助仪器装调，校准系统性能，并与在轨定标结果进行对比验证；通过控制旋转光路切换反射板和漫反射板旋转座两处转动机构同时实现两条光路测量，从而降低了系统体积和重量。 | ||||||
| 5 | 防窥结构及其制作方法、显示装置 | CN201610158326.6 | 2016-03-18 | CN105842830A | 2016-08-10 | 武延兵 |
| 本发明提供一种防窥结构，包括透明本体和多个遮挡件，所述透明本体上形成有用于容纳多个所述遮挡件的多个容纳槽，多个所述遮挡件间隔设置，所述透明本体位于相邻两个所述遮挡件之间的部分形成为出光单元，所述出光单元包括入光面和出光面，所述遮挡件的侧面形成为反光面，所述反光面能够将从所述出光单元的入光面射向该反光面的光线的至少一部分朝向所述出光单元的出光面反射，且所述反光面设置为从反光面反射的光线的反射方向与出光面之间的夹角大于入射至反光面的光线的入射方向与入光面之间的夹角。相应地，本发明还提供一种上述防窥结构的制作方法和显示装置。本发明提供的防窥结构能够使得显示装置实现防窥作用的同时提高光线的利用率。 | ||||||
| 6 | 成像光学系统、投射曝光设备、微结构部件及其产生方法 | CN201210297391.9 | 2008-10-02 | CN102819197B | 2016-06-22 | 汉斯-于尔根.曼 |
| 提供了一种成像光学系统（7）、包括该成像光学系统的微光刻投射曝光设备、以及采用所述微光刻投射曝光设备产生微结构的部件的方法。所述成像光学系统包括多个镜（M1至M8；M1至M6）。所述多个镜将物平面（5）中的物场（4）成像到像平面（9）中的像场（8）。镜（M6、M7、M8；M4、M5、M6）的至少一个包括供成像光（15）经过的通孔（21）。在所述物平面（5）和所述像平面（9）之间存在至少一个中间像平面（20，23；27）。最接近像平面（9）的中间像平面（23；27）在物场（4）和像场（8）之间的光路中空间上设置于所述光路中的最后镜（M8；M6）和像平面（9）之间。 | ||||||
| 7 | 一种阵列透镜式激光导星系统 | CN201410543948.1 | 2014-10-15 | CN104267493A | 2015-01-07 | 张岳; 岱钦 |
| 一种阵列透镜式激光导星系统，由激光产生模块产生应用于本系统的激光；通过激光光束调整模块完成对激光的光束直径和光强的调整，使激光光束直径等于沙克-哈德曼透镜阵列的直径并且光强均匀。光强均匀、直径适合的激光光束进入阵列透镜模块。通过阵列透镜模块所形成的激光光斑进入激光发射模块，激光发射模块由半反半透镜、反射镜和望远镜的主镜、次镜组成。其中发射光路通过半反半透镜，由反射镜反射进入望远镜的次镜和主镜，望远镜的次镜和主镜作为激光发射模块的一部分，将激光光斑投射到空中。本发明与分立激光器多激光导星系统相比,本发明采用与望远镜共用主镜、次镜的方式结构简单，容易实现，造价低。 | ||||||
| 8 | 成像光学系统、投射曝光设备、微结构部件及其产生方法 | CN201210297391.9 | 2008-10-02 | CN102819197A | 2012-12-12 | 汉斯-于尔根.曼 |
| 本发明提供了一种成像光学系统（7）、包括该成像光学系统的微光刻投射曝光设备、以及采用所述微光刻投射曝光设备产生微结构的部件的方法。所述成像光学系统包括多个镜（M1至M8；M1至M6）。所述多个镜将物平面（5）中的物场（4）成像到像平面（9）中的像场（8）。镜（M6、M7、M8；M4、M5、M6）的至少一个包括供成像光（15）经过的通孔（21）。在所述物平面（5）和所述像平面（9）之间存在至少一个中间像平面（20，23；27）。最接近像平面（9）的中间像平面（23；27）在物场（4）和像场（8）之间的光路中空间上设置于所述光路中的最后镜（M8；M6）和像平面（9）之间。 | ||||||
| 9 | 成像光学系统和具有该类型的成像光学系统的微光刻投射曝光设备 | CN200880113375.1 | 2008-10-02 | CN101836164A | 2010-09-15 | 汉斯-于尔根·曼 |
| 成像光学系统(7)具有多个镜(M1至M8)。这些镜将物平面(5)中的物场(4)成像到像平面(9)中的像场(8)。镜(M6、M7、M8)的至少一个被遮拦，且由此具有供成像光(15)经过的通孔(21)。在像场(8)之前的光路中的第四最后镜(M5)没有被遮拦，且利用其光学有效反射表面的外边缘(22)提供成像光学系统(7)的光瞳平面中的中心遮蔽。第四最后镜(M5)和最后镜(M8)之间的距离为物场(4)和像场(8)之间的距离的至少10％，最接近像平面(9)的中间像平面(23)设置于最后镜(M8)和像平面(9)之间。成像光学系统(7)具有0.9的数值孔径。这些措施不需所有必须同时实现，且导致了成像光学系统具有改善的成像性能和/或减少的生产成本。 | ||||||
| 10 | 激光振荡装置 | CN200610163063.4 | 2006-11-30 | CN100540203C | 2009-09-16 | 船冈幸治; 长谷川正彦; 玉谷基亮; 西田聪; 松本康成 |
| 本发明提供一种抑制了激光振荡器的热变形导致的反射镜支承构件的变形的激光振荡装置。该激光振荡装置具有箱体，在该箱体的内部具有产生激光的激光振荡器，引导由该激光振荡器产生的激光的第1反射镜，以及与第1反射镜平行地配置、进一步引导来自第1反射镜的激光的第2反射镜；第1反射镜和第2反射镜都安装于共用的反射镜支承构件，该反射镜支承构件相对激光振荡器的箱体由位于三角形的各顶点的仅3个固定构件机械地接合。 | ||||||
| 11 | 用于头戴显示器的光学装置 | CN200380110982.X | 2003-12-12 | CN100437200C | 2008-11-26 | 拉斯兹罗·多姆简; 加伯尔·萨尔瓦斯; 萨伯尔克斯·迈克 |
| 公开一种利用单个可视显示器屏幕以传输图像到双眼的头戴显示器。聚焦这个显示器屏幕的图像是为了减小分割体积，该图像再被与图像焦点邻近的多个反射面分割。 | ||||||
| 12 | 激光振荡装置 | CN200610163063.4 | 2006-11-30 | CN101085493A | 2007-12-12 | 船冈幸治; 长谷川正彦; 玉谷基亮; 西田聪; 松本康成 |
| 本发明提供一种抑制了激光振荡器的热变形导致的反射镜支承构件的变形的激光振荡装置。该激光振荡装置具有箱体，在该箱体的内部具有产生激光的激光振荡器，引导由该激光振荡器产生的激光的第1反射镜，以及与第1反射镜平行地配置、进一步引导来自第1反射镜的激光的第2反射镜；第1反射镜和第2反射镜都安装于共用的反射镜支承构件，该反射镜支承构件相对激光振荡器的箱体由位于三角形的各顶点的仅3个固定构件机械地接合。 | ||||||
| 13 | 빔 스플리터의 후면 반사를 이용한 다중 광경로 레이저 광학계 | KR1020140150664 | 2014-10-31 | KR1020160051170A | 2016-05-11 | 박익근; 박해성; 사니치로요시다; 박태성; 곽동열 |
| 본발명은빔 스플리터의후면반사를이용한다중광경로레이저광학계를개시한다. 개시된본 발명에따르면, 시편에조사하기위한레이저빔을발생시키는광원부; 상기광원부로부터입사된레이저빔을분열시켜복수의광경로로제공하는다중빔 스플리터; 상기다중빔 스플리터에의해분열된레이저빔을복수의시편에조사하기위한메인빔 스플리터; 상기시편으로조사된레이저빔의신호를변환해주는트랜스듀서; 상기트랜스듀서의신호를토대로시편에대한분석을진행하는제어부;를포함한다. | ||||||
| 14 | 결상 광학계 및 촬상 장치 | KR1020120090090 | 2012-08-17 | KR1020130066489A | 2013-06-20 | 푸나쿠라지로 |
| PURPOSE: An optical imaging system is provided to construct an optical system with sufficient far-infrared transmittance using low cost materials. CONSTITUTION: An optical imaging system(10) includes a first reflective surface(S3), a second reflective surface(S4), and a third reflective surface(S5). Optical axes do not cross each other and are arranged on one plane on the optical imaging system. The second reflective surface is placed on a position where it reflects back the light reflected from the first reflective surface but does not block the other light. The first reflective surface and the third reflective surface, which are odd-numbered reflective surfaces from a subject, are formed in a concave shape, and the second reflective surface, which is an even-numbered reflective surface, is formed in a convex shape. | ||||||
| 15 | 3Ｄ 카메라용 빔스플리터 및 상기 빔스플리터를 채용한 3차원 영상 획득 장치 | KR1020100107012 | 2010-10-29 | KR1020120045462A | 2012-05-09 | 유장우; 박용화; 조용철 |
| PURPOSE: A beam splitter for a three dimensional camera and a three dimensional image acquiring apparatus equipped with the beam splitter are provided to simultaneously photograph color images and depth images based on one lens. CONSTITUTION: A light incident side(110) introduces both light of a first wavelength band and light of a second wavelength band. A light separating side(104) is slantly arranged to the light incident side and reflects the light of the first wavelength band and transmits the light of the second wavelength band. A light emitting side(111) emits the light of the first wavelength band which is reflected from the light separating side. A first reflecting side(112) reflects the light of the second wavelength band through the light separating side. A second reflective side(113) reflects the light of the second wavelength band which is reflected from the first reflecting side. A second light emitting side(114) emits the light of the second wavelength band which is reflected from the second reflecting side. | ||||||
| 16 | 화상 표시 장치 및 두부 장착형 디스플레이 | KR1020100079221 | 2010-08-17 | KR1020110023754A | 2011-03-08 | 무카와히로시 |
| PURPOSE: An image display and a head mounted display are provided to help a user to observe two-dimensional images by allowing the user to wear a Head mounted display on a head. CONSTITUTION: An image display and a head mounted display comprises: an optical system converting the light from an image forming apparatus into parallel lights; and an optical apparatus(120) receiving, guiding, and projecting the parallel lights. A central light is projected from the image forming apparatus and is passed through a node to be projected on the center of the optical apparatus. If an X-axis is defines as a parallel line with the axis of the optical apparatus while passing the center of the optical apparatus and a Y-axis is corresponded to the normal line of the optical apparatus while passing the center of the optical apparatus, a central optical light is crossed on an XY plane at angles other than 0 degree. | ||||||
| 17 | 투영 노광 장치 | KR1020077001660 | 2005-06-22 | KR1020070043979A | 2007-04-26 | 고마츠다히데키; 다카하시도모와키; 스즈키마사유키 |
| A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship. | ||||||
| 18 | 박형 프로젝터 | KR1020050045000 | 2005-05-27 | KR1020060122481A | 2006-11-30 | 조한경; 이승규; 김남식; 복기소; 이준호; 권순형 |
| A thin type projector is provided to minimize the space of an optical system through the new optical system, thereby reducing the thickness of a projector. A lens shift control screw is exposed to a side of a housing and moves a projection lens member. An air suction hole is formed at the side and lower portions of the housing, and an air discharge hole is formed at the upper portion of the housing. A light source is positioned at the lower portion of the air discharge hole. A sensor is installed within the housing, senses the inclination of the housing and cuts off the power of an illumination member when the inclination of the housing is above the reference point. | ||||||
| 19 | 스테이브 두께 측정 장치 및 방법 | KR1020140190198 | 2014-12-26 | KR101594719B1 | 2016-02-17 | 최상우; 신남호; 최태화; 차주영 |
| 본발명인스테이브두께측정장치는, 초음파를송수신할수 있는초음파센서부; 및상기초음파센서부에연결되는구동부;를포함하고, 상기구동부는상기초음파센서부를로의스테이브에구비되는냉각수유로에따라이동하게하고, 상기구동부는, 구동부본체; 상기구동부본체에결합되는가이드로드; 및상기가이드로드의일측에연결되는센서연결부;를포함하고, 상기초음파센서부는상기센서연결부에연결된다. | ||||||
| 20 | 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치 | KR1020147033292 | 2008-10-02 | KR1020150006019A | 2015-01-15 | 만,한스-위르겐 |
| 결상 광학 시스템(7)은 물체면(5)의 물체 필드(4)를 이미지면(9)의 이미지 필드(8)로 결상하는, 다수의 미러들(M1 내지 M8)을 구비한다. 미러들 중 적어도 하나(M6,M7,M8)는 차폐되고, 따라서 결상광(15)이 관통하여 통과하기 위한 관통-개구(21)를 갖는다. 이미지 필드(8) 앞의 광경로 내의 마지막에서 네 번째 미러(M5)는 차폐되지 않고, 그 광학 유효 반사면의 외부 엣지(22)로 결상 광학 시스템(7)의 동공면(17) 내의 중앙 음영부를 제공한다. 마지막에서 네 번째 미러(M5) 및 마지막 미러(M8) 사이의 거리는 물체 필드(4)와 이미지 필드(8) 사이의 거리의 약 10%이다. 이미지면(9)에 가장 가까운 중간 이미지면(23)은 마지막 미러(M8)와 이미지면(9) 사이에 배치된다. 결상 광학 시스템(7)은 0.9인 개구수를 갖는다. 모두 동시에 영향을 받아야 하는 것은 아닌 이 값들은 개선된 결상 특성들 및/또는 감소된 제조 비용을 갖는 결상 광학 시스템을 가져온다. | ||||||
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