| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 聚合物，用于制备其的底物、方法和包含其的装置 | CN201480019271.X | 2014-02-06 | CN105339403A | 2016-02-17 | N.B.杜克 |
| 本发明一般涉及用于制备聚合物的底物和用于制备聚合物的方法。本发明一般还涉及聚合物和包含所述聚合物的装置。 | ||||||
| 2 | 聚合物，用于制备其的底物、方法和包含其的装置 | CN201480019443.3 | 2014-02-06 | CN105229054A | 2016-01-06 | N.B.杜克 |
| 本发明一般涉及用于制备聚合物的底物和用于制备聚合物的方法。本发明一般还涉及聚合物和包含所述聚合物的装置。 | ||||||
| 3 | 氰酸酯树脂共混物及包含它们的天线罩 | CN201480036580.8 | 2014-06-26 | CN105339407A | 2016-02-17 | K·切翁; M·J·德默斯; A·帕德沃 |
| 某些实施例涉及包含例如氰酸酯单体与氰酸酯低聚物的混合物的氰酸酯树脂共混物。所述树脂共混物有效地提供低于2.7的介电常数、至少为150℃的玻璃化转变温度和低于1.5％的吸湿性。还描述了使用所述树脂的天线罩。 | ||||||
| 4 | 二氧化硫与乙烯的新型共聚物 | CN86107083 | 1986-10-10 | CN1010099B | 1990-10-24 | 依特·德伦特 |
| 本文介绍了二氧化硫与乙烯，还可含有一氧化碳和(或)一种或多种碳原子数低于20的链烯类不饱和烃的新型共聚物，该共聚物具有线形结构。该共聚物由-Z-(C2H4)-单元组成，其中还可含有-Z-(A)-单元。-Z-(A)-单元在共聚物链上呈无规分布，上述Z代表SO2或CO基团，且至少有一部分Z为SO2基团。 | ||||||
| 5 | 二氧化硫与乙烯的新型共聚物 | CN86107083 | 1986-10-10 | CN86107083A | 1987-04-15 | 依特·德伦特 |
| 本文介绍了二氧化硫与乙烯以及(可有可无)一 氧化碳和(或)一种或多种碳原子数低于20的链烯类 不饱和烃的新型共聚物。该共聚物具有线形结构。该 共聚物由-Z-(C2H4)-单元组成，其中还可含有 -Z-(A)-单元。-Z-(A)-单元在共聚物链上 呈无规分布。上述Z代表SO2或CO基团，且至少有一 部分Z为SO2基团。 | ||||||
| 6 | シリコン含有下層 | JP2017163123 | 2017-08-28 | JP2018036646A | 2018-03-08 | シャーロット・エイ・カットラー; スザンヌ・エム・コーリー; オウェンディ・オンガイ; クリストファー・ピー・サリヴァン; ポール・ジェイ・ラボーム; リー・カイ; シンタロウ・ヤマダ; ミンキ・リー; ジェームス・エフ・キャメロン |
| 【課題】パターン転写中に所望のエッチ選択性を提供し、かつ湿式化学工程によって容易に除去可能なシリコン含有下層を提供する。 【解決手段】(a)Si−O結合を含む骨格を含む1つ以上の硬化性シリコン含有ポリマーと、1つ以上の有機ブレンドポリマーと、1つ以上の有機溶媒とを含むコーティング組成物で基板をコーティングして、基板上に硬化性シリコン含有ポリマー層を形成することと、(b)シリコン含有ポリマー層を硬化させて、シロキサン下層を形成することと、(c)フォトレジスト層をシロキサン下層上に配置することと、(d)フォトレジスト層をパターン的に曝露して、潜像を形成することと、(e)潜像を現像して、レリーフ像を内部に有するパターン化されたフォトレジスト層を形成することと、(f)レリーフ像を基板に転写することと、(g)湿式剥離によってシロキサン下層を除去することと、を含む、方法。 【選択図】なし |
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| 7 | ポリマー、基材、これらを製造する方法およびこれらを備えるデバイス | JP2015557063 | 2014-02-06 | JP2016516098A | 2016-06-02 | ダック，ニコラス・ブレンダン |
| 本発明は、概して、ポリマーを製造するための基材や、ポリマーを製造する方法に関する。また、本発明は、概して、ポリマーおよびこれらを含むデバイスに関する。 | ||||||
| 8 | Rigid polymer | JP51249990 | 1990-08-10 | JP3078011B2 | 2000-08-21 | レイモンド ギャグニ，ロバート; スティーブン トリマー，マーク; ルイス，ザ サード マロッコ，マシュー |
| 9 | Method for producing a poly (arylene ketone) | JP6835785 | 1985-03-29 | JPH0676489B2 | 1994-09-28 | ロバート・ハワード・リーミー |
| 10 | Production of aromatic polymer | JP27938593 | 1993-11-09 | JPH06263871A | 1994-09-20 | BIKUTAAZU JIYANSON; HAINRITSUHI KAARU GOOSU |
| PURPOSE: To easily obtain a heat-resistant high-molecular-weight poly(arylene ether ketone) by polymerizing phosgene or an aromatic diacid dihalide and an aromatic comonomer or a specified acid halide-containing monomer system in the presence of a specified amount of a Lewis acid. CONSTITUTION: A poly(arylene ether ketone) is produced by polymerization reacting phosgene or an aromatic diacid dihalide with a monomer system containing a polycyclic aromatic comonomer of any one of formulas I to IV (wherein (m) is 1-3; and (n) is 2 or 3) or an acid halide of formula V (wherein Z is a halogen; (k), (q) and (r) are each 0, 1 or 3; and (p) is 1 or 2) or an acid halide of formula VI [wherein (n) is 2 or 3; Y is CO-Z or CO-Ar-CO-Z (wherein Z is a halogen)] [in each formula, Ar is a (substituted)phenyl or the like] in the absence of a Lewis acid and in a reaction medium containing a Lewis acid in an amount sufficient as a polymerization catalyst and in an amount equal to the sum of the amount equivalent per equivalence of the CO groups present in the monomer system and 0.05-0.3 equivalent per equivalence of the acid halide and 0-93 wt.%, based on the total reaction mixture, aprotic diluent. COPYRIGHT: (C)1994,JPO | ||||||
| 11 | JPS6223749B2 - | JP2854578 | 1978-03-13 | JPS6223749B2 | 1987-05-25 | ROJAA ENU RUISU; ROORENSU EI BOTSUKU |
| 12 | JPS60500961A - | JP50165284 | 1984-03-29 | JPS60500961A | 1985-06-27 | |
| 13 | Organic peroxide and process for preparing same | JP2854578 | 1978-03-13 | JPS5424840A | 1979-02-24 | ROJIYAA ENU RUISU; ROORENSU EI BOTSUKU |
| 14 | Diacyl-type polymeric peroxide having ester bond and polymerization using the same | JP6281277 | 1977-05-31 | JPS53149918A | 1978-12-27 | KOMAI TAKESHI; MATSUSHIMA MASARU |
| PURPOSE: Peroxide having ester bonds I [R 1 is 1W15C alkylene, phenylene; R 2 is 2W10C alkylene, -(CH 2) 2O(CH 2) 2-,-(CH 2) 2O(CH 2) 2O(CH 2) 2-, II, etc.; X is 2W20]; e.g. diacyl-type polymeric peroxide III (X≈5.5). COPYRIGHT: (C)1978,JPO&Japio | ||||||
| 15 | Shinkisosuiseihorimaa | JP787276 | 1976-01-27 | JPS51100194A | 1976-09-03 | JOOJI HERAA; NAN SO CHOI |
| 16 | JPS4813120B1 - | JP7967968 | 1968-11-02 | JPS4813120B1 | 1973-04-25 | |
| 17 | Processes for enhancing flame retardance and chemical resistance of polymers | US14607399 | 2015-01-28 | US09758616B2 | 2017-09-12 | Jean-Francois Morizur; Paul Dean Sybert; Amanda Marie Flores; Peter Johnson; Andrew Frazee; Thomas L. Evans |
| Processes for increasing the chemical resistance of a surface of a formed article are disclosed. The formed article is produced from a polymeric composition comprising a photoactive additive containing photoactive groups derived from a monofunctional benzophenone. The surface of the formed article is then exposed to ultraviolet light to cause crosslinking of the photoactive additive and produce a crosslinked surface. The crosslinking enhances the chemical resistance of the surface. Various means for controlling the depth of the crosslinking are also discussed. | ||||||
| 18 | METHOD OF MANUFACTURING AROMATIC POLYKETONE FILM, AROMATIC POLYKETONE FILM, SUBSTRATE PROVIDED WITH AROMATIC POLYKETONE FILM, OPTICAL ELEMENT, AND IMAGE DISPLAY DEVICE | US15324935 | 2015-07-02 | US20170203329A1 | 2017-07-20 | Hiroshi MATSUTANI; Nanako MIZUGUCHI; Katsuya MAEYAMA |
| Provided is a method of manufacturing an aromatic polyketone film, the method including: applying a coating liquid to at least a part of a surface of a substrate to form a coating liquid layer, the coating liquid including a solvent and an aromatic polyketone having a structural unit represented by Formula (1) or (2); drying the coating liquid layer; and after the drying, subjecting the coating liquid layer to a heat treatment. In Formula (1) or (2), each R1 independently represents an alkyl group having 1 to 20 carbon atoms; each R2 and each R3 independently represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; X represents a specific divalent aromatic hydrocarbon group, or a divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms; and Y represents a specific divalent functional group. | ||||||
| 19 | HETEROATOM CONTAINING CYCLIC DIMERS | US15393360 | 2016-12-29 | US20170107192A1 | 2017-04-20 | Graciela B. Arhancet; Matthew Mahoney; Xiaojun Wang |
| The present invention provides cyclic dimers of alpha acids and polymers derived therefrom. Also provided are processes for preparing and methods of using the cyclic dimers and the polymers derived from the cyclic dimers. | ||||||
| 20 | POLYMERS, SUBSTRATES, METHODS FOR MAKING SUCH, AND DEVICES COMPRISING THE SAME | US14885557 | 2015-10-16 | US20170044295A1 | 2017-02-16 | Nicholas Brendan Duck |
| The present invention relates generally to substrates for making polymers and methods for making polymers. The present invention also relates generally to polymers and devices comprising the same. | ||||||
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