序号 专利名 申请号 申请日 公开(公告)号 公开(公告)日 发明人
161 Processing of semiconductor components with dense processing fluids US11834800 2007-08-07 US20080004194A1 2008-01-03 Wayne McDermott; Hoshang Subawalla; Andrew Johnson; Alexander Schwarz; Richard Ockovic
Methods for generating a single-phase supercritical dense processing fluid have been disclosed. The single-phase supercritical dense processing fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. At least one processing agent is added to the pressurization vessel, or to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber; to produce the single-phase supercritical dense processing fluid. Methods for processing an article with a single-phase supercritical dense processing fluid in a processing chamber are also disclosed.
162 Stabilized body care products, household products, textiles and fabrics US10970112 2004-10-21 US20050186170A1 2005-08-25 Joseph Lupia; Joseph Suhadolnik; Mervin Wood
Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain dialkylhydroxyamine stabilizers, dialkylhydroxylamine stabilizer salts, nitrone stabilizers or amine oxide stabilizers. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.
163 Use of phenylethylamine derivatives for the antimicrobial treatment of surfaces US10204520 2001-02-13 US06846492B2 2005-01-25 Wolfgang Haap; Werner Hölzl; Dietmar Ochs; Karin Petzold; Marcel Schnyder
The use of compounds of formula (1) is described, in which compounds R1, R2 and R3 are each independently of the others hydrogen; C1-C20alkyl; C3-C7cycloalkyl; C2-C20alkenyl; C4-C7cycloalkenyl; C2-C20alkynyl, C4-C7cycloalkynyl; or unsubstituted or C1-C5alkyl-, C3-C7cylcoalkyl-, C1-C5alkoxyl-, C3-C7cycloakoxy-, halo-, oxo-, carboxy-, carboxy-C1-C7alkyl ester-, carboxy-C3-C7cylcloalkyl ester-, cyano-, trifluoromethyl-, pentafluoroethyl-, amino-, N,N-mono- or di-C1-C20alkylamino- or nitro-substituted phenyl-C1-C5alkyl, naphthyl-C1-C5alkyl, phenylcarbonyl-C1-C5alkyl, naphthylcarbonyl-C1-C5alkyl, pyrrolylalkyl, furanylalkyl, thiophenylalkyl, pyrazolylalkyl, imidazolylalkyl, oxazolylalkyl, thiazolylalkyl, isoxazolylalkyl, isothiazolylalkyl, 1,2,3-triazolylalkyl, 1,2,4-triazolylalkyl, 1,2,3-oxadiazolylalkyl, 1,3,4-oxadiazolylalkyl, 1,2,3-thiadiazolylalkyl, 1,3,4-thiadiazolylalkyl, indolylalkyl, pyridylalkyl, pyridazinylalkyl, pyrimidinylalkyl, pyridazinylalkyl, quinolinylalkyl, isoquinolinylalkyl, pyrrolyl, furanyl, thiophenyl, pyrazolyl, imidazolyl, oxazolyl, thiazolyl, isoxazolyl, isothiazolyl, 1,2,3-triazolyl, 1,2,4-triazolyl, 1,2,3-oxadiazolyl, 1,3,4-oxadiazolyl, 1,2,3-thiadiazolyl, 1,3,4-thiadiazolyl, indolyl, pyridyl, pyridazinyl, pyrimidinyl, pyridazinyl, quinolinyl or isoquinolinyl; R4, R5, R6 and R7 are each independently of the others hydrogen; C1-C20alkyl; C3-C7 cycloalky; C2-C20alkenyl; C4-C7 cycloalkenyl; C2-C20alkynyl; or C4-C7 cycloalkynyl; and m and n are each independently of the other 0 or 1, for antimicrobial treatment of surfaces. The compounds exhibit a pronounced activity against pathogenic gram-positive and gram-negative bacteria, and also against yeasts and moulds. They are accordingly suitable for the antimicrobial treatment, especially preservation and disinfection, of surfaces.
164 Cleaning compositions US737867 1997-06-06 US6001793A 1999-12-14 Phillip E. Figdore; Charles J. Good
There are provided cleaning compositions for removing soils from a substrate. These compositions comprise(a) at least one C.sub.10 or higher terpene hydrocarbon solvent,(b) at least one surfactant,(c) at least one metal corrosion inhibiting agent,(d) at least one hard surface stress crazing inhibiting agent, and(e) water,wherein, if the soil comprises oil, the composition forms an oil-removing oil and water emulsion with said oil for a time sufficient to remove the oil from the substrate, the oil removing emulsion releasing free water within twenty-four hours after formation, the composition having a pH of less than about 10.
165 Cleaning compositions and processes suitable for replacing grit blasting to clean metal mold surfaces for plastics US728461 1996-10-10 US5944908A 1999-08-31 Chester P. Jarema; Michael A. Stuart
Residue that accumulates on metallic molding surfaces during repeated molding of plastics such as PVC can be removed by cleaning with an aqueous solution of a glycol or oligo-glycol monoether, an amine, and a chelating agent. The cleaner is sufficiently effective to replace mechanical blasting that was previously required.
166 Method for cleaning a semiconductor wafer with an improved cleaning solution US645812 1996-05-14 US5814157A 1998-09-29 Tetsuo Mizuniwa; Yoshimi Shiramizu
A method for removing metallic and organic contaminations from a surface of a semiconductor wafer comprises cleaning the semiconductor wafer with a cleaning solution which contains a chlorine compound acting as an oxidant and which has a pH value in the range of 1 to 3. The cleaning solution has an oxidation-reduction potential in the range of 800 mV to 1200 mV when measured on the basis of a saturated calomel electrode at a temperature 25.degree. C.
167 Laundry detergent system US327600 1994-10-24 US5525253A 1996-06-11 Rodger L. Gamblin
A laundry detergent system is described that comprises a chelating agent and ordinary soap. The chelating agent acts in the triple capacity of softening the water used for washing, buffering the wash water to a alkaline pH, and preventing soil redeposition.
168 Halogen scavengers US251634 1994-05-31 US5503768A 1996-04-02 Yoshikazu Tokuoka; Haruo Shibatani
A halogen scavenger contains as an effective ingredient an aromatic compound which has a resonance-effect-relying electron donating group as a substituent. The aromatic compound is constituted, for example, by an aromatic ring such as a substituted or unsubstituted benzene, naphthalene, anthracene and pyridine ring, and at least one group (a resonance-effect-relying electron donating group) which contains a lone-pair-containing hetero atom, such as an oxygen, sulfur or nitrogen atom, adjacent to the aromatic ring.
169 Disinfecting and sanitizing compositions US888878 1992-05-26 US5280042A 1994-01-18 John A. Lopes
This invention relates to sanitizing and disinfecting compositions. More particularly, the present invention concerns anhydrous sanitizing and disinfecting concentrate composition suitable for dilution in water to produce aqueous antimicrobial solutions, particularly suited for use as mouthwashes, in human and animal hygiene, and as fresh fruit and vegetable sanitizers, and sanitizers for food processing and other equipment.
170 Corrosion inhibiting aqueous compositions comprising metal-chelating diphenolamine compounds US5183 1987-01-20 US4790878A 1988-12-13 Walter O. Siegl; Mohinder S. Chattha
This invention relates to an aqueous composition useful to deposit a corrosion inhibiting and adhesion promoting coating on a corrodible metal substrate and a method for doing same. The composition has a pH of between about 2 and about 10 and comprises water-soluble or water-dispersible metal-chelating diphenolamine compounds.
171 Detergent powders of improved solubility US270319 1981-06-04 US4379069A 1983-04-05 Anthony A. Rapisarda; Joseph Romeo; Jose A. Lopez
The present invention relates to a powder detergent composition of improved solubility and methods of making them. The composition comprises a silicate free alkaline blend consisting essentially of about 10-60% builder, about 0.6-6% surfactant. about 20-50% alkaline agent and 0-70% filler; and an admixture of said blend with about 10-30% of solid alkali metal silicate and a chlorine donor providing about 0.4-1.5% available chlorine, the pH of the resulting finished product being about 10.4 or greater at about a 0.25% product use concentration.
172 Cleansing compositions US753070 1976-12-21 US4051055A 1977-09-27 Toan Trinh; Bruce Albert Yeazell
Aqueous hypochlorite-containing cleansing compositions for use on porcelain enamel surfaces wherein said compositions contain a sufficient amount of water-soluble fluoride salt and a clay with cation exchange capacity to inhibit discoloration of the surface by the hypochlorite.
173 Novel sulfonium corrosion inhibitors in aqueous acid solutions US386652 1973-08-08 US3996147A 1976-12-07 William J. Settineri; Wayne W. Frenier; James H. Oswald
The corrosion of metal surfaces in contact with aqueous acid cleaning solutions is inhibited by sulfonium salt corresponding to the formula ##STR1## wherein n is 1 or 2; R.sub.1 is an electron withdrawing group; R.sub.2 is a hydrocarbyl radical or inertly-substituted hydrocarbyl radical of up to about 24 carbon atoms; R.sub.3 is alkyl of from 1 to 4 carbon atoms, inertly-substituted alkyl of 2-4 carbon atoms, allyl, phenyl or inertly-substituted phenyl; or R.sub.2 and R.sub.3 are joined to form a 5- or 6-membered heterocyclic ring; and A.sup.- is a compatible anion. These sulfonium salts are effective corrosion inhibitors even in the presence of ferric ions.
174 Heat-producing compositions US37395573 1973-06-27 US3875083A 1975-04-01 MURTAUGH JUSTIN J
This invention pertains to heat-producing compositions which are non-toxic and useful in cleaning pipes, drains, and the like. These compositions are comprised of powdered aluminum, an alkali metal nitrate and an alkali metal salt of an acid having at least one hydrogen atom with an ionization constant in water not exceeding 6.0 X 10 9.
175 Method and composition for removing iron stains from porcelain US3721629D 1969-05-21 US3721629A 1973-03-20 GOODENOUGH R
A solid or liquid composition for removing iron from stains on hard, smooth surfaces, comprising (a) a sufficient amount of a hydrogen ion source to produce a pH of between about 1.5 and 4.5 under operating conditions; (b) an amount of a chelate agent sufficient to couple the Fe present in the stain, said chelate agent having a positive formation constant for Fe in the pH range of 1.5 to 4.5; (c) a soluble Fe salt in an amount less than equimolar with respect to the chelate agent; and, optionally, agents capable of producing effervescent gases; disinfectants; detergents; dyes; binders; solvents; perfumes; etc.
176 Aquenous detergent compositions US3720621D 1970-06-15 US3720621A 1973-03-13 SMEETS A
The present invention provides a homogeneous liquid composition containing by weight: A. FROM 14 TO 35 PERCENT OF SODIUM TRIPOLYPHOSPHATE, B. FROM 0.1 TO 50 PERCENT AT LEAST OF A POTASSIUM AND/OR AMMONIUM SALT OF AN INORGANIC OR ORGANIC ACID, C. FROM 15 TO 85.9 PERCENT OF WATER. The composition is especially useful as a detergent for nonporous surfaces and textile materials.
177 Pulverulent drain cleaning composition US3666670D 1969-08-01 US3666670A 1972-05-30 GILBERT DANIEL EUGENE; NELSON LARRY RALPH; STURGEON CHARLES EDWIN; THOM ROBERT KEITH
A free flowing, pulverulent drain cleaning composition is made by mixing an alkali metal hydroxide such as caustic soda; a halogenated lower aliphatic hydrocarbon such as perchloroethylene, methylene chloride or methylchloroform; particulate silica; and a wetting agent.
178 Inhibitor US3634270D 1969-06-20 US3634270A 1972-01-11 ENGLE JAMES P; OAKES BILLY D; REICH CECIL F
A CORROSION INHIBITOR COMPOSITION FOR AQUEOUS INORGANIC AND ORGANIC ACID SOLUTIONS CONTAINING AN AMINE REACTION PRODUCT IN ETHYLENE GLYCOL, A NONIONIC DETERGENT AND A SULFUR CONTAINING COMPOUND.
179 Preparation containing dextranase US3630924D 1969-01-23 US3630924A 1971-12-28 MILLER GLENDON RICHARD
THIS DISCLOSURE RELATES TO STABLE EFFERVESCENT DENTURE SOAK COMPOSITIONS CONTAINING DEXTRANASE PARTICULARY USEFUL IN REDUCING DENTAL PLAQUE.
180 Process for the surface treatment of aluminum and its alloys US3544356D 1967-11-01 US3544356A 1970-12-01 VAZIRANI HARGOVIND N
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