| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 61 | 洗涤剂组合物 | CN95193893.2 | 1995-06-19 | CN1094513C | 2002-11-20 | 村田进; D·J·吉特科; 岛村清美; A·D·克劳斯 |
| 本发明提供了一种在不大于30℃的水中有效地解脱沉积在聚酯纤维上的渣性污垢和油质污垢的洗涤剂组合物。一种用于在不大于30℃的洗涤水中洗涤聚酯纤维的洗涤剂组合物包含(i)0.05-2%(重)甲基纤维素醚，其2%(重)水溶液在20℃下测定的溶液粘度为80至120厘泊(cps)，其平均甲基取代度(DS甲基)为每个葡糖苷约1.6至约2.3；(ii)25-65%(重)洗涤用表面活性剂；(iii)0-20%(重)漂白组分；和(iv)30-70%(重)助洗剂和碱性物料。 | ||||||
| 62 | 半导体装置用清洗剂和半导体装置的制造方法 | CN00133357.7 | 2000-10-05 | CN1291787A | 2001-04-18 | 菅野至; 横井直树; 森田博之; 一木直树; 根津秀明; 高岛正之 |
| 本发明的主要目的是提供一种不产生布线和埋入导电层的断路的改进的清洗剂。该半导体装置用清洗剂含有氢氧化物、水和用下述一般式(1)/或一般式(2)表示的化合物。HO－((EOx－(PO)y)z－H…(1),R－[((EO)x－(PO)y)z－H]m…(2)。 | ||||||
| 63 | 纤维素酶制剂、酶洗激活剂及其苎麻织物后整理的方法 | CN98112614.6 | 1998-09-03 | CN1246525A | 2000-03-08 | 贺志勇; 孔雷; 吴永红; 赵鸣镝; 凌载虹; 李忠; 任淳 |
| 本发明涉及采用纤维素酶对苎麻织物进行生化处理的技术,它提供一种能有效消除苎麻织物刺痒感、改善手感并改善苎麻织物多项性能的纤维素酶制剂及配套使用的酶洗激活剂,进而推出对苎麻织物进行后整理的方法,以提高织物的服用性能。用于织物酶洗处理的纤维素酶制剂含有高活性纤维素酶,该酶的活性至少满足以下条件:分别用滤纸法、CMC法、水杨素法测定该酶的活性,三种方法测得的活性比为:0.9—1.5∶1.4—1.8∶0.01—0.05。苎麻织物的后整理方法包括酶洗处理和上柔处理,酶洗处理是将纤维素酶制剂、酶洗激活剂与苎麻织物接触来完成的。 | ||||||
| 64 | 废白土制备去污粉的方法 | CN95115748.5 | 1995-09-15 | CN1134976A | 1996-11-06 | 胡小泓 |
| 用油脂精炼脱色后的废白土，经加适量的水，用NaOH在60～120℃皂化，然后加1～15％(w/w)漂白粉漂白，经干燥设备将含水量降至10％以下。最后添加1～15％(w/w)的滑石粉，1～15％(w/w)的Na2SO4，1～6％(w/w)的烷基苯磺酸钠和0～1％(w/w)的香精复配混匀制成工业或民用去污粉。 | ||||||
| 65 | 杀菌清洁粉 | CN88104354 | 1988-07-07 | CN1039056A | 1990-01-24 | 蔡植如 |
| 本发明为杀菌清洁粉，应用于厨房、餐厅、卫生间的去污和杀菌消毒。是由去污剂、磨擦粉和含氯有机杀菌剂组成。该杀菌清洁粉中的磨擦粉、原料来源广泛、价格低廉、制造、运输和使用方便。 | ||||||
| 66 | POWDERED AUTOMATIC DISHWASHING DETERGENT | PCT/US2014/060875 | 2014-10-16 | WO2015057949A1 | 2015-04-23 | SMITH, Daniel; JUDY, Merrill |
This disclosure relates to powdered automatic dishwashing detergents. More particularly, this disclosure relates to powdered automatic dishwashing detergent packets with superior environmental and human safety as well as superior cleaning efficacy and stability. |
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| 67 | ECO-FRIENDLY CLEANERS FOR OILFIELD EQUIPMENT | PCT/US2014/014554 | 2014-02-04 | WO2014126747A1 | 2014-08-21 | PERUMALSAMY, Jayachandran; TATE, Colby |
Methods for removing an organic material from a portion of oilfield equipment are described. The methods include forming a composition that includes a hybrid polymer and introducing the composition to the portion of the oilfield equipment from which the organic material is to be removed. The hybrid polymer includes a synthetic component formed from at least one or more olefinically unsaturated carboxylic acid monomers or salts thereof, and a natural component formed from a hydroxyl-containing natural moiety. |
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| 68 | COMPOSITIONS COMPRISING POLYESTER POLYAMINE AND POLYESTER POLYQUATERNARY AMMONIUM CORROSION INHIBITORS AND CHELATING AGENTS | PCT/EP2012/075680 | 2012-12-17 | WO2013092440A1 | 2013-06-27 | HELLBERG, Per-Erik; GOROCHOVCEVA, Natalija; DE WOLF, Cornelia Adriana; BOUWMAN, Albertus Jacobus Maria; NASR-EL-DIN, Hisham |
The present invention relates to a composition comprising a polyesteramine or a polyester polyquaternary ammonium compound and a chelating agent, and to various uses of such a composition, for example as corrosion inhibitor, cleaning agent or descaling agent for metal surfaces and as stimulation or treatment fluids for methods for treating subterranean formations. |
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| 69 | PEROXY SALT COMPOSITIONS AND USES THEREOF | PCT/US2012/065604 | 2012-11-16 | WO2013081863A1 | 2013-06-06 | ESSINGER, James, F. |
A composition comprising a peroxy salt, fumed silica, and a non-aqueous, water miscible material. These compositions exhibit improved storage stability relative to compositions lacking fumed silica. The peroxy salt is preferably sodium percarbonate. The preparation of the peroxy salt compositions, such as sodium percarbonate compositions described herein, includes non-aqueous liquids as well as solids. The compositions surprisingly, and unexpectedly, exhibit acceptable chemical stability at room temperature in sealed containers. The improved stability is thought to be due to the inclusion of fumed silica in the non-aqueous compositions described herein. The tendency of the composition to decompose in the container is notably reduced and even eliminated, compared to compositions lacking fumed silica. |
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| 70 | 수소화폴리실록사잔 박막용 린스액 및 이를 이용한 수소화폴리실록사잔 박막의 패턴 형성 방법 | PCT/KR2012/009044 | 2012-10-31 | WO2013069921A1 | 2013-05-16 | 김봉환; 곽택수; 배진희; 윤희찬; 임상학; 김상균; 이진욱 |
알코올계 용매, 에스테르계 용매, 실란올계 용매, 알콕시실란계 용매, 알킬실라잔계 용매 및 이들의 조합으로 이루어진 군에서 선택되는 첨가제를 전체 린스액에 대하여 0.01 중량% 내지 7 중량%로 포함하는 수소화폴리실록사잔 박막용 린스액을 제공한다. |
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| 71 | BENEFIT AGENT CONTAINING DELIVERY PARTICLE | PCT/IB2007/050507 | 2007-02-15 | WO2007099469A2 | 2007-09-07 | DIHORA, Jiten, Odhavji; SANDS, Peggy, Dorothy; FOSSUM, Renae, Dianna; YORK, David, William; LANG, Matthew, Henry; GUINEBRETIERE, Sandra, Jacqueline |
The present invention relates to benefit agent containing delivery particles, compositions comprising said particles, and processes for making and using the aforementioned particles and compositions. When employed in compositions, for example, cleaning or fabric care compositions, such particles increase the efficiency of benefit agent delivery, there by allowing reduced amounts of benefit agents to be employed. In addition to allowing the amount of benefit agent to be reduced, such particles allow a broad range of benefit agents to be employed. |
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| 72 | FLUORINATED SOLVENT COMPOSITIONS CONTAINING HYDROGEN FLUORIDE | PCT/US2000/018516 | 2000-07-06 | WO01075955A1 | 2001-10-11 | |
| Homogeneous compositions containing a fluorinated solvent, hydrogen fluoride, and a co-solvent, and the use of these compositions for cleaning and etching of substrated are described. | ||||||
| 73 | PROCESS FOR MAKING A DETERGENT COMPOSITION | PCT/US1999/028317 | 1999-11-30 | WO01040428A1 | 2001-06-07 | |
| A process for making a granular detergent composition including the steps of: (a) granulating a detersive material that includes a detergent surfactant and a builder; (b) spraying a buffering agent on the granules to substantially coat the granules; (c) drying the granules with a gas that has from about 0.05 % to 5.0 % by weight of carbon dioxide. The buffering agent should have a buffering capability that maintains the pH on the surface of the granule to less than about 13.5. | ||||||
| 74 | LIMPIADOR, DESINCRUSTANTE Y DESINFECTANTE ALCALINO GRANULADO PARA APLICAR EN UN SOLO PASO, COMPOSICIONES Y MÉTODO DE APLICACIÓN A SUPERFICIES DURAS Y SISTEMAS CIP (ACRÓNIMO DE CLEANING IN PLACE) | PCT/CL2018/000003 | 2018-02-12 | WO2018145220A1 | 2018-08-16 | FENOGLIO, José Luis; NOVATTI, Maria Eugenia |
La invención se refiere a composiciones granulares alcalinas que en un mismo paso y a baja temperatura (20 - 45 °C), realizan los procesos de limpieza, desincrustación y desinfección, cuyas composiciones incluyen ingredientes activos, humectantes, emulsionantes, activadores de blanqueo y secuestrantes, todos los ingredientes trabajan a pH alcalino alto. También se describe la metodología para limpiar, desincrustar y desinfectar superficies y circuitos CIP con estas composiciones. |
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| 75 | 処理液および積層体の処理方法 | PCT/JP2017/031042 | 2017-08-30 | WO2018061582A1 | 2018-04-05 | 上村 哲也 |
本発明の課題は、メタルハードマスクおよびこれの残渣物の除去性に優れつつ、絶縁膜のエッチングを抑制できる処理液、および、積層体の処理方法を提供することである。本発明の処理液は、半導体デバイス用の処理液であって、含フッ素化合物と、複素環基を有さずベンゼン環を有する水溶性芳香族化合物と、を含有し、ｐＨが５以下である。 |
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| 76 | REMOVAL OF ETCHING PROCESS RESIDUAL IN SEMICONDUCTOR FABRICATION | PCT/US2008051758 | 2008-01-23 | WO2008091923A3 | 2009-12-30 | HERRIN RUSSELL T; LINDGREN PETER J; STAMPER ANTHONY K |
| A semiconductor structure and methods for forming the same. A semiconductor fabrication method includes steps of providing a structure. A structure incl udes (a) a dielectric layer, (b) a first electrically conductive region buried in the dielectric layer, wherein the first electrically conductive region comprises a first electrically conductive material, and (c) a second electrically conductive region buried in the dielectric layer, wherein the second electrically conductive region comprises a second electrically conductive material being different from the first electrically conductive material. The method further includes the steps of creating a first hole and a second hole in the dielectric layer resulting in the first and second electrically conductive regions being exposed to a surrounding ambient through the first and second holes, respectively. Then, the method further includes the steps of introducing a basic solvent to bottom walls and side walls of the first and second holes. | ||||||
| 77 | WASHING OR CLEANING DETERGENT COMPOUNDS AND PRODUCTION THEREOF | PCT/EP2008063380 | 2008-10-07 | WO2009053239A2 | 2009-04-30 | ASSMANN GEORG; BLOCHWITZ OLAF JOACHIM; BLASEY GERHARD; BURG BIRGIT; WELLING HERMANN-JOSEF; PEGELOW ULRICH |
| The invention relates to a method wherein an active substance preparation that is liquid or pasty at 0 to 100°C is granulated by mixing a solid in a fluid bed granulator. Said solid contains one or more carrier materials selected from the group amorphous aluminosilicates, clays, silicic acids, alkaline earth metal silicates, alkaline earth metal carbonates, thus enabling washing or cleaning detergent compounds to be produced, said compounds having a core and at least two shells, containing at least 30 % in weight of one or more active substances selected from the list of non-ionic surfactants, anionic surfactants, cationic surfactants, optical brightening agents, phosphonates, bleach activators, polymers and foam inhibitors. | ||||||
| 78 | BENEFIT AGENT CONTAINING DELIVERY PARTICLE | PCT/IB2007050507 | 2007-02-15 | WO2007099469A3 | 2007-12-21 | DIHORA JITEN ODHAVJI; SANDS PEGGY DOROTHY; FOSSUM RENAE DIANNA; YORK DAVID WILLIAM; LANG MATTHEW HENRY; GUINEBRETIERE SANDRA JACQUELIN |
| The present invention relates to benefit agent containing delivery particles, compositions comprising said particles, and processes for making and using the aforementioned particles and compositions. When employed in compositions, for example, cleaning or fabric care compositions, such particles increase the efficiency of benefit agent delivery, there by allowing reduced amounts of benefit agents to be employed. In addition to allowing the amount of benefit agent to be reduced, such particles allow a broad range of benefit agents to be employed. | ||||||
| 79 | GENERAL SOLVENT SYNTHESIS, PRODUCTION AND UTILITY | PCT/EG2006/000004 | 2006-01-22 | WO2006076927A2 | 2006-07-27 | ABDALLA, Magd Ahmed Kotb |
| 80 | CLEANER COMPOSITIONS CONTAINING FREE RADICAL QUENCHERS | PCT/US2004043307 | 2004-12-23 | WO2005066325A3 | 2006-03-30 | SMALL ROBERT J; HAYDEN CHRISTOPHER G |
| The invention relates to a method of cleaning the surface of a substrate to remove post-etch residue or post chemical mechanical polishing residues from the surface of a substrate. Specifically, the present invention relates to a method of post-CMP or post-etch cleaning. The method involves contacting the surface of a substrate with a CMP composition or an etching composition, that contains free radicals, and subsequently contacting the surface of the substrate with a composition that comprises a free radical quencher. | ||||||
