| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 141 | METHOD OF INDICATING DIVERGENT PRODUCT BENEFITS | US12211140 | 2008-09-16 | US20090077931A1 | 2009-03-26 | Jacqueline Westfield; Jeremy Michael Carter |
| A method of indicating divergent product benefits by formulating a hand dishwashing liquid having a cleaning agent and a hand care agent; choosing a sensory element profile comprising one or more soft colors and a pearlescent appearance; and incorporating the sensory element profile into the hand dishwashing liquid, such that the sensory element profile indicates the efficacy of the cleaning agent and the efficacy of the hand care agent. | ||||||
| 142 | Water Softening Product | US11577844 | 2005-10-10 | US20080287340A1 | 2008-11-20 | Fabio Corradini; Emanuele Rossetto |
| A water softening product having an enclosing wall and containing a composition in the form of a powder, said composition comprising a water-softening agent able to bind calcium ions, the wall being permeable to water and to components dissolved therein, wherein, after the product has been contacted with water in a ware washing machine, less than 20 wt % of the composition remains. | ||||||
| 143 | SOLVENT FOR TREATING POLYSILAZANE AND METHOD OF TREATING POLYSILAZANE WITH THE SOLVENT | US11860763 | 2007-09-25 | US20080234163A1 | 2008-09-25 | Yasuo Shimizu; Tadashi Suzuki |
| Polysilazane is treated with a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a C8-C11 alkane mixture, a C8-C11 aromatic hydrocarbon mixture, an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25% by weight of C8 or more aromatic hydrocarbons, and dibutyl ether, wherein the number of 0.5 micron or more fine particles contained in 1 ml of the solvent is 50 or less. As the treatment of polysilazane, there are illustrated, for example, edge-rinsing and back rinsing of a polysilazane film formed by spin coating polysilazane on a semiconductor substrate. The water content of the solvent is preferably 100 ppm or less. | ||||||
| 144 | Washing solution for inkjet printer head and washing method using the solution | US11063474 | 2005-02-23 | US07425525B2 | 2008-09-16 | Ryozo Akiyama; Toru Ushirogouchi; Mitsuru Ishibashi; Kazuhiko Ohtsu; Masashi Hiroki |
| There is proposed a washing solution for washing an inkjet printer head which performs printing by feeding an ink comprising at least two kinds of polymerizable compounds each differing in viscosity, a photopolymerization initiator, and pigment. This washing solution is characterized in that it contains not less than 50 parts by weight of a polymerizable compound selected from the polymerizable compounds included in the ink and having a lowest viscosity among the polymerizable compounds, or not less than 50 parts by weight of a polymerizable compound having a viscosity of 30 mPa·sec or less at ordinary temperature. | ||||||
| 145 | Cleaning Solution for a Semiconductor Wafer | US11914870 | 2005-05-25 | US20080221004A1 | 2008-09-11 | Janos Farkas |
| A cleaning solution for a semiconductor wafer comprises ammonia, hydrogen peroxide, a complexing agent and a block copolymer surfactant diluted in water. The cleaning solution can be used in single wafer cleaning tools to remove both particulate contaminants and metallic residues. | ||||||
| 146 | Clean chemistry composition, method of manufacturing same, and system making use of same | US11644254 | 2006-12-21 | US20080153731A1 | 2008-06-26 | Mark Buehler |
| A clean chemistry composition includes an organic acid and a polar surfactant. The clean chemistry composition is capable of imparting an electrical charge to particles generated during a CMP operation on a wafer made up of semiconductors having a metal gate structure. The imparted electrical charge has the same polarity as that of an electrical charge on the wafer surface, such that the resulting repulsive force between the wafer surface and the newly-charged particles is sufficient to repel the particles from the wafer surface. | ||||||
| 147 | Methods of corrosion prevention and cleaning of copper structures | US11644432 | 2006-12-22 | US20080152812A1 | 2008-06-26 | Ming Fang; Steve Keating; Vani Thirumala; Lin Sha; Bruce Beattie |
| Methods and associated structures of forming a microelectronic device are described. Those methods may comprise forming a thin metal-organic layer on a copper structure, wherein the thin metal-organic layer substantially prevents corrosion of the copper structure, and wherein the thin metal-organic layer comprises an organo-copper compound comprising an alkyl group and a thiol group. In addition, methods of applying a high pH cleaning process using a surfactant to improve surface wetting in a low foaming solution is described. | ||||||
| 148 | Cleaning method | US109066 | 1998-07-02 | US6082373A | 2000-07-04 | Naoaki Sakurai; Hisashi Nishigaki; Naoya Hayamizu; Hiroshi Fujita |
| Provided is a cleaning method for effectively removing particles on the surface of an object to be cleaned. This cleaning method includes dissolving oxygen into deaerated pure water to prepare a cleaning fluid, and cleaning an object to be cleaned by bringing the object into contact with the cleaning fluid to which ultrasonic vibration is being applied. | ||||||
| 149 | Cleaning solution and cleaning method | US780502 | 1997-01-08 | US5985811A | 1999-11-16 | Toda Masayuki; Tadahiro Ohmi; Yasuyuki Harada |
| A cleaning solution and cleaning method are provided which: (1) make treatment at room temperature possible, and do not require heating, (2) use little chemicals and water, (3) do not require specialized apparatuses, and moreover, (4) do not require the use of specialized chemicals. The cleaning solution of the present invention comprises pure water containing 20 ppb-100 ppb of oxygen and 2 ppb or more of nitrogen. Furthermore, the cleaning solution may comprise electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen. In the cleaning method of the present invention, the cleaning of a material to be cleaned is conducted in a cleaning solution comprising pure water containing 20 ppb-100 ppb of oxygen and 2 ppb-15 ppm of nitrogen, while applying ultrasound having a frequency of 30 kHz or more. Furthermore, in the cleaning method of the present invention, the cleaning of a material to be cleaned may be conducted in a cleaning solution comprising electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen, while applying ultrasound having a frequency of 30 kHz or more. | ||||||
| 150 | Stabilization of halogenated dialkyl hydantoins | US769542 | 1996-12-19 | US5780641A | 1998-07-14 | Moshe Yerushalmi; Zvi Vainberger; Shimon Herbet; James Rasco |
| Method for stabilizing halogenated hydrantoins, comprising mixing the hydantoin with dry calcium hydroxide. | ||||||
| 151 | Liquid enzyme formulations | US257826 | 1994-06-09 | US5558812A | 1996-09-24 | Wilfried Hahn; Hubert Herrman; Torsten Kiesser; Vera Sander |
| Liquid enzyme formulations which contain the enzyme in the form of aqueous enzyme particle suspension, colloidal fillers and a liquid alkylene oxide polymer based on ethylenediamine and having a molecular weight in the range from 500 to 8200. The liquid enzyme formulations of the invention may contain any enzyme customarily incorporated in detergents or used for cleaning purposes, especially alkaline proteases. Processes for preparing such liquid enzyme formulations and for using them in liquid detergents and/or cleaners are also disclosed. | ||||||
| 152 | Plasticware-compatible rinse aid | US312460 | 1994-09-26 | US5501815A | 1996-03-26 | Victor F. Man |
| A plasticware-compatible low-foaming rinse aid and method for using such rinse-aid to effectuate sheeting of aqueous rinse liquid from solid surface. The rinse aid comprises alkyl polyglycoside (APG) and reverse, polyoxyethylene-containing polyoxyalkylene block copolymer. The aqueous rinse solution obtained by diluting the rinse aid with water is compatible with thermoplastics such as polycarbonate and polysulfone. | ||||||
| 153 | Compressed air coupling | US517503 | 1983-07-25 | US4546956A | 1985-10-15 | Kurt E. L. Moberg |
| A compressed air coupling with a coupling socket and a valve sleeve displaceable therein and lockable by a catch in the socket, and a nipple insertable into the valve sleeve and lockable by a ball catch in the valve sleeve. The valve sleeve (40) together with the nipple (16) is displaceable from its inner end position, while closing the connecting passage (58,64) to a predetermined intermediate position in which a passage (62,64,54,56) is opened between the nipple locked in the valve sleeve and the free atmosphere to release residual compressed air in the nipple. The intermediate position is determined by a shoulder (82) which is arranged on the socket (10) and interacts with the ball catch (78) of the valve sleeve at the same time as the ball catch locks the nipple (16) to the valve sleeve, the locking of the ball catch against the shoulder (82,84) being dependent on the force which the nipple is subjected to due to residual compressed air in the nipple and being arranged to be released when that compressed air has been depressurized to approximately atmospheric pressure, whereafter the compression spring (46) acting on the valve sleeve is free to displace the valve sleeve and the nipple to the outer end position (FIG. 1) of the valve sleeve, in which position the ball catch (78) of the valve sleeve is free to assume a free position (71) to make it possible to withdraw the depressurized nipple. | ||||||
| 154 | Inhibitor-containing acid cleaning compositions and processes | US534353 | 1983-09-23 | US4541945A | 1985-09-17 | James D. Anderson; Sandra K. Seigle |
| Acid cleaning compositions containing an inhibitor for cleaning metal surfaces, processes for cleaning metal surfaces therewith, and concentrates useful in forming the acid cleaning compositions. The present acid cleaning compositions contain an acid, a Mannich base, a thiourea, an alkyl trimethyl ammonium halide and/or an alkyl (C.sub.8 -C.sub.9) phenoxypolyethoxy ethanol, and a nonionic surfactant which is a condensate of poly(oxyethylene) and poly(oxypropylene) groups. | ||||||
| 155 | Cleaning compositions containing boric acid or an alkali metal borate in phosphoric acid and their use in cleaning solid surfaces | US537591 | 1983-09-30 | US4485027A | 1984-11-27 | Christian Rossmann; Helga Burger |
| This invention is directed to a process for cleaning solid surfaces with aqueous alkaline cleaning compositions comprising (a) strongly alkaline active-substance concentrates and (b) acidic active-substance concentrates comprising dispersions of boric acid or alkali metal borates in orthophosphoric acid. Component (a) is present in an excess over component (b) sufficient to cause an alkaline medium. | ||||||
| 156 | Corrosion inhibitors | US326236 | 1981-12-01 | US4388206A | 1983-06-14 | Eugene V. Hort; Lowell R. Anderson; Dru W. Alwani |
| An aqueous composition for inhibiting the corrosion of metals placed therein is described. The composition comprises a non-oxidizing acid, and, as a corrosion inhibitor, an effective amount of a 3-di(higher)alkylamino-3-phenylprop-1-yne. | ||||||
| 157 | Stripping solution for tin or tin alloys | US366018 | 1982-04-06 | US4374744A | 1983-02-22 | Yutaka Kawanabe; Takeyoshi Kishimoto |
| A stripping solution for tin or tin alloys which comprises an inorganic and/or organic acid, an oxidizing agent and a heterocyclic compound free of a sulfur atom but containing a nitrogen atom in the form of .dbd.NH or .tbd.N as a ring-forming member. | ||||||
| 158 | Water-insoluble, water-permeable bag having a water-soluble or water-dispersable protective layer and containing a particulate detergent composition | US198016 | 1980-07-14 | US4348293A | 1982-09-07 | David E. Clarke; James F. Davies; John B. Tune |
| A detergent product comprises a water-insoluble, water-permeable bag containing a particulate detergent composition, the bag material having a water-soluble or removable water-insoluble layer to protect the bag material from the composition and to reduce dusting. The protective layer may be coated on or impregnated into the bag material or may form a continuous layer laminated to the inside of the bag material or may be in the form of a separate inner bag. The water-soluble material may be soluble polyvinyl alcohol, polyethylene glycol, polysaccharide, alkali metal silicate, soap, nonionic detergent, gelatine, salts or esters of alginic acid. The removable water-insoluble material may be a silicone, a fatty acid, a water-insoluble cationic fabric softener, polyvinylacetate, insoluble polyvinyl alcohol, clay, zeolite, calcite, silica, titania or a wax. The bag material may be paper and/or plastics material such as polypropylene. The detergent composition is a fully formulated composition or other fabric treatment material. | ||||||
| 159 | Use of norbornyl ethers in augmenting or enhancing the aroma of fabric softener articles | US220351 | 1980-12-29 | US4308159A | 1981-12-29 | Mark A. Sprecker |
| Described is a dryer-added fabric softener article consisting of a cloth substrate, a substrate coating and an outer coating, said outer coating being a composition of matter comprising an outer coating base composition and intimately admixed therewith from 0.25% up to 5% of the outer coating composition of a composition of matter consisting essentially of at least one compound having the structure selected from the group consisting of: ##STR1## wherein the R moieties are the same and R represents C.sub.3 --C.sub.6 alkyl; methoxy ethyl; phenethyl; cyclohexyl; allyl or hydroxyethyl. | ||||||
| 160 | Controlled foam detergent additive | US44396 | 1979-05-31 | US4230592A | 1980-10-28 | Jack Miller; Thomas C. Tesdahl |
| Liquid additive for caustic soda cleaning solutions. Provides surfactants, foam control, and scale control; and good wetting and emulsifying properties for improved cleaning and ease of rinsing. | ||||||
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