专利汇可以提供Manufacture of semiconductor device专利检索,专利查询,专利分析的服务。并且PURPOSE: To make it possible to stabilize easily the form of a recess by a method wherein a dielectric dummy gate and a dielectric dummy recess are provided, the dummy gate and the dummy recess are selectively etched away by a wet etching method and a recess region is formed.
CONSTITUTION: A dielectric dummy gate 2, which has a width identical with a gate length and is thicker than the depth of a recess, is formed on a semiconductor active layer 1. A dielectric layer 3b is evenly laminated from the direction vertical to the gate 2. The dielectric layer 3b is etched by an RIE method and a dummy recess 3a is formed. An N
+ semiconductor layer 4 is selectively grown at a place, from where the dielectric layer 3b is removed. A photoresist 5 is applied on the whole surface and the tip part of the gate 2 is made to expose by an etchback or the like. The position of a gate is aligned. The gate 2 and the recess 3a are selectively etched away by a wet etching method and a recess region 6 is formed. Gate electrode metal films 7a and 7b are laminated on the whole surface. Unnecessary gate electrodes 7b and the resist 5 are removed and a gate electrode 7a is formed in the region 6.
COPYRIGHT: (C)1992,JPO&Japio,下面是Manufacture of semiconductor device专利的具体信息内容。
标题 | 发布/更新时间 | 阅读量 |
---|---|---|
调光方法、装置及存储介质 | 2020-05-08 | 297 |
超结器件及其制造方法 | 2020-05-08 | 370 |
一种基于热电器件的FPC连接电路的印刷装置 | 2020-05-11 | 62 |
一种静电放电保护结构及其制作方法 | 2020-05-08 | 895 |
一种微波氮化镓器件非线性电流模型参数提取方法及系统 | 2020-05-08 | 548 |
半导体装置的驱动方法 | 2020-05-08 | 986 |
等离子体改性碳纤维局部增强层积弯曲胶合木的制造方法 | 2020-05-08 | 533 |
一种阵列基板的制造方法和阵列基板 | 2020-05-08 | 65 |
斩波前置放大器和集成电路 | 2020-05-08 | 915 |
缓冲型模数转换器以及集成电路 | 2020-05-08 | 700 |
高效检索全球专利专利汇是专利免费检索,专利查询,专利分析-国家发明专利查询检索分析平台,是提供专利分析,专利查询,专利检索等数据服务功能的知识产权数据服务商。
我们的产品包含105个国家的1.26亿组数据,免费查、免费专利分析。
专利汇分析报告产品可以对行业情报数据进行梳理分析,涉及维度包括行业专利基本状况分析、地域分析、技术分析、发明人分析、申请人分析、专利权人分析、失效分析、核心专利分析、法律分析、研发重点分析、企业专利处境分析、技术处境分析、专利寿命分析、企业定位分析、引证分析等超过60个分析角度,系统通过AI智能系统对图表进行解读,只需1分钟,一键生成行业专利分析报告。