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Vacuum coating apparatus

阅读:546发布:2023-02-04

专利汇可以提供Vacuum coating apparatus专利检索,专利查询,专利分析的服务。并且Vacuum coating apparatus having isolatable coating and vacuum chambers whose volumes are correlated to each other to minimize contamination and pump-down time, with the coating chamber having a closure means mounting a substrate holder for positioning substrates in an evaporant stream from a vapor source contained in the vacuum chamber.,下面是Vacuum coating apparatus专利的具体信息内容。

1. A vacuum coating apparatus comprising: A. an evaporation chamber; B. a coating chamber in communication with said evaporation chamber; C. gate means reciprocally movable between an open and closed position intermediate said coating and evaporation chambers for selectively isolating each from the other; D. a vapor source means in said evaporation chamber for generating an evaporant stream of coating material into said coating chamber; E. a port in a wall of said coating chamber for access thereto and wherein the ratio of the area of said port to the volume of said coating chamber is in the range from about 1:20 to about 1:30; F. door means pivotally mounted on said wall for movement into open and closed positions relative to said port with said closed position securing said door means in sealing relation with said coating chamber; G. substrate holder means mounted on an inner surface of said door means for supporting substrates in a coating position within said evaporant stream in said coating chamber; H. means for rotating said substrates on said holder means; I. means for maintaining said evaporation chamber under a continuous vacuum; J. a second vacuum means for roughing a vacuum in said coating chamber when isolated from said evaporation chamber by said gate means; K. means for isolating said second vacuum means from said coating chamber when said gate means is to be moved to the open position; L. gas means for controllably introducing an inert gas flow in said coating chamber when isolated from said evaporation chamber, when said gate means is in the closed position, to minimize ingress of ambients into said coating chamber when said door means is in the open position; and M. valve means for shutting off the flow of said inert gas to said coating chamber; wherein the ratio of the volumes of said evaporation chamber to said coating chamber is in the range from about 10:1 to about 30:1.
2. A vacuum coating apparatus comprising: A. an evaporation chamber; B. a coating chamber in communciation with said evaporation chamber; C. gate means reciprocally movable between an open and closed position intermediate said coating and evaporation chambers for selectively isolating each from the other; D. a vapor source means in said evaporation chamber for generating an evaporant stream of coating material into said coating chamber; E. a port in a wall of said coating chamber for access thereto and wherein the ratio of the area of said port to the volume of said coating chamber is in the range from about 1:20 to about 1:30; F. door means pivotally mounted on said wall for movement into open and closed positions relative to said port with said closed position securing said door means in sealing relation with said coating chamber; G. substrate holder means mounted on an inner surface of said door means for supporting substrates in a coating position within said evaporant stream in said coating chamber; H. means for rotating said substrates on said holder means; I. means for maintaining said evaporation chamber under a continuous vacuum; wherein said holder means supports said substrates within and at an angle to said evaporant stream; J. a second vacuum means for roughing a vacuum in said coating chamber when isolated from said evaporation chamber by said gate means; K. means for isolating said second vacuum meaNs from said coating chamber when said gate means is to be moved to the open position; L. gas means for controllably introducing an inert gas flow in said coating chamber when isolated from said evaporation chamber, when said gate means is in the closed position, to minimize ingress of ambients into said coating chamber when said door means is in the open position; and M. valve means for shutting off the flow of said inert gas to said coating chamber; wherein the ratio of the volumes of said evaporation chamber to said coating chamber is in the range from about 10:1 to about 30:1.
3. A vacuum coating apparatus comprising: A. an evaporation chamber; B. a coating chamber in communication with said evaporation chamber; C. gate means reciprocally movable between an open and closed position intermediate said coating and evaporation chambers for selectively isolating each from the other; D. a vapor source means in said evaporation chamber for generating an evaporant stream of coating material into said coating chamber; E. a port in a wall of said coating chamber for access thereto and wherein the ratio of the area of said port to the volume of said coating chamber is in the range from about 1:20 to about 1:30; F. door means pivotally mounted on said wall for movement into open and closed positions relative to said port with said closed position securing said door means in sealing relation with said coating chamber; G. substrate holder means mounted on an inner surface of said door means for supporting substrates in a coating position within said evaporant stream in said coating chamber; H. means for rotating said substrates on said holder means; I. means for maintaining said evaporation chamber under a continuous vacuum; wherein said holder means supports said substrates within and at an angle to said evaporant stream; wherein said holder means supports said substrates within and at an angle to said evaporant stream; J. heater means in said coating chamber within said evaporant stream for heating said subtrates to deposition means; K. an evaporant shield for said heater means in said coating chamber; L. a second vacuum means for roughing a vacuum in said coating chamber when isolated from said vacuum chamber by said gate means; M. means for isolating said second vacuum means from said coating chamber when said gate means is to be moved to the open position; N. gas means for controllably introducing an inert gas flow in said coating chamber when isolated from said evaporation chamber, when said gate means is in the closed position, to minimize ingress of ambients into said coating chamber when said door means is in the open position; and O. valve means for shutting off the flow of said inert gas to said coating chamber; wherein the ratio of the volumes of said evaporation chamber to said coating chamber is in the range from about 10:1 to about 30:1.
4. A vacuum coating apparatus comprising: A. an evaporation chamber; B. a coating chamber in communication with said evaporation chamber; C. gate means reciprocally movable between an open and closed position intermediate said coating and evaporation chambers for selectively isolating each from the other; D. a vapor source means in said evaporation chamber for generating an evaporant stream of coating material into said coating chamber; E. a port in a wall of said coating chamber for access thereto and wherein the ratio of the area of said port to the volume of said coating chamber is in the range from about 1:20 to about 1:30; F. door means pivotally mounted on said wall for movement into open and closed positions relative to said port with said closed position securing said door means in sealing relation with said coating chamber; G. substrate holder means mounted on an inner surface of said door means for sUpporting substrates in a coating position within said evaporant stream in said coating chamber; H. means for rotating said substrates on said holder means; I. mans for maintaining said evaporation chamber under a continuous vacuum; J. a valve means in said evaporation chamber reciprocally movable between an open and closed position relative to the first said vacuum means for selectively placing said evaporation chamber and the first said vacuum means in communicating and isolating relationship with each other; K. a second vacuum means for roughing a vacuum in said coating chamber when isolated from said evaporation chamber by said gate means; L. means for isolating said second vacuum means from sad coating chamber when said gate means is to be moved to the open position; M. gas means for controllably introducing an inert gas flow in said coating chamber when isolated from said evaporation chamber, when said gate means is in the closed position, to minimize ingress of ambients into said coating chamber when said door means is in the open position; and N. valve means for shutting off the flow of said inert gas to said coating chamber; wherein the ratio of the volumes of said evaporation chamber to said coating chamber is in the range from about 10:1 to about 30:1.
5. A vacuum coating apparatus comprising: A. an evaporation chamber; B. a coating chamber in communication with said evaporation chamber; C. gate means reciprocally movable between an open and closed position intermediate said coating and evaporation chambers for selectively isolating each from the other; D. a vapor source means in said evaporation chamber for generating and evaporant stream of coating material into said coating chamber: E. a port in a wall of said coating chamber for access thereto and wherein the ratio of the area of said port to the volume of said coating chamber is in the range from about 1:20 to about 1:30; F. door means pivotally mounted on said wall for movement into open and closed positions relative to said port with said closed position securing said door means in sealing relation with said coating chamber; G. substrate holder means mounted on an inner surface of said door means for supporting substrates in a coating position within said evaporant stream in said coating chamber; H. means for rotating said substrates on said holder means; I. means for maintaining said evaporation chamber under a continuous vacuum; wherein said holder means supports said substrates within and at an angle to said evaporant stream; J. a valve means in said evaporation chamber reciprocally movable between an open and closed position relative to the first said vacuum means for selectively placing said evaporator section and the first said vacuum means in communicating and isolating relationship with each other; K. a second vacuum means for roughing a vacuum in said coating chamber when isolated from said evaporation chamber by said gate means; L. means for isolating said second vacuum means from said coating chamber when said gate means is to be moved to the open position; M. gas means for controllably introducing an inert gas flow in said coating chamber when isolated from said evaporation chamber, when said gate means is in the closed position, to minimize ingress of ambients into said coating chamber when said door means is in the open position; and N. valve means for shutting off the flow of said inert gas to said coating chamber; wherein the ratio of the volumes of said evaporation chamber to said coating chamber is in the range from about 10:1 to about 30:1.
6. A vacuum coating apparatus comprising: A an evaporation chamber; B. a coating chamber in communication with said evaporation chamber; C. gate means reciprocally movable between an open and closed position intermediate said coating and evaPoration chambers for selectively isolating each from the other; D. a vapor source means in said evaporation chamber for generating an evaporant stream of coating material into said coating chamber; E. a port in a wall of said coating chamber for access thereto and wherein the ratio of the area of said port to the volume of said coating chamber is in the range from about 1:20 to about 1:30; F. door means pivotally mounted on said wall for movement into open and closed positions relative to said port with said closed position securing said door means in sealing relation with said coating chamber; G. substrate holder means mounted on an inner surface of said door means for supporting substrates in a coating position within said evaporant stream in said coating chamber; H. means for rotating said substrates on said holder means; I. means for maintaining said evaporation chamber under a continuous vacuum; wherein said holder means supports said substrates within and at an angle to said evaporant stream; J. heater means in said coating chamber within said evaporant stream for heating said substrates to deposition means; K. an evaporant shield for said heater means in said coating chamber; L. a valve means in said vacuum chamber reciprocally movable between an open and closed position between said evaporation chamber and the first said vacuum means for selectively isolating each from the other; M. a second vacuum means for roughing a vacuum in said coating chamber when isolated from said evaporation chamber by said gate means; N. means for isolating said second vacuum means from said coating chamber when said gate means is to be moved to the open position; O. gas means for controllably introducing an inert gas flow in said coating chamber when isolated from said evaporation chamber, when said gate means is in the closed position, to minimize ingress of ambients into said coating chamber when said door means is in the open position; and P. valve means for shutting off the flow of said inert gas to said coating chamber; wherein the ratio of the volumes of said evaporation chamber to said coating chamber is in the range from about 10:1 to about 30:
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